Semiconductor device and manufacturing method of semiconductor device

    公开(公告)号:US11152318B2

    公开(公告)日:2021-10-19

    申请号:US16649539

    申请日:2018-11-21

    IPC分类号: H01L23/00 H01L29/16

    摘要: A semiconductor device of the present invention includes a first main electrode and a second main electrode respectively disposed on a first main surface and a second main surface of a semiconductor substrate, a protective film disposed on an edge part of the first main electrode; and a first metal film disposed in a region enclosed by the protective film on the first main electrode. The first metal film has a film thickness at a central portion larger than that at a part in contact with the protective film, and has irregularities on a surface thereof.