Treatment method for optical fiber
    1.
    发明授权
    Treatment method for optical fiber 有权
    光纤的处理方法

    公开(公告)号:US07596292B2

    公开(公告)日:2009-09-29

    申请号:US11289335

    申请日:2005-11-30

    IPC分类号: G02B6/02

    摘要: A treatment method for an optical fiber including accommodating an optical fiber inside a treatment chamber; introducing a deuterium containing gas into the treatment chamber; and in a deuterium treatment step, exposing the optical fiber to atmosphere of the deuterium containing gas. In the deuterium treatment step, a deuterium concentration D in the treatment chamber during the deuterium treatment is calculated from an initial value A of a deuterium concentration in the deuterium containing gas inside the treatment chamber, a concentration B of oxygen in an ambient atmosphere of the treatment chamber, and a concentration C of oxygen in the deuterium containing gas inside the treatment chamber, and the deuterium concentration in the treatment chamber is controlled based on the deuterium concentration D calculated. Other gases such as hydrogen containing gas or nitrogen containing gas may also be used according to the invention.

    摘要翻译: 一种光纤的处理方法,包括在处理室内容纳光纤; 将含氘气体引入处理室中; 并且在氘处理步骤中,将光纤暴露于含氘气体的气氛中。 在氘处理工序中,从处理室内的含氘气体中的氘浓度的初始值A计算氘处理时的处理室中的氘浓度D,在室温下的氧气浓度B 处理室内的含氘气体中的氧浓度C和处理室中的氘浓度基于计算出的氘浓度D进行控制。 根据本发明,也可以使用其它气体,例如含氢气体或含氮气体。

    Optical fiber drawing die and drawing method therefor

    公开(公告)号:US07041334B2

    公开(公告)日:2006-05-09

    申请号:US10313402

    申请日:2002-12-06

    IPC分类号: B05D5/06

    摘要: An optical fiber coating die is made such that an interfacial shear rate of the optical fiber to the resin coat is calculated in accordance with a pressure value of resin inside a coating cup, and the interfacial shear rate is in a range of −1.5×105 to 0 sec−1. Also, an optical fiber drawing die is made such that the interfacial shear rate of the optical fiber to the resin coat is calculated in accordance with a diameter of a coating resin, and the interfacial shear rate is in a range of range of −3×105 to 2×105 sec−1. By doing this, an optical fiber drawing die which can be used in an optical fiber drawing method so as to realize stable resin coating operation even in high-speed drawing operation and high productivity can be realized.

    Optical fiber drawing die and drawing method therefor

    公开(公告)号:US20060016393A1

    公开(公告)日:2006-01-26

    申请号:US11187662

    申请日:2005-07-22

    IPC分类号: B29D11/00

    摘要: An optical fiber coating die is made such that an interfacial shear rate of the optical fiber to the resin coat is calculated in accordance with a pressure value of resin inside a coating cup, and the interfacial shear rate is in a range of −1.5×105 to 0 sec−1. Also, an optical fiber drawing die is made such that the interfacial shear rate of the optical fiber to the resin coat is calculated in accordance with a diameter of a coating resin, and the interfacial shear rate is in a range of range of −3×105 to 2×105 sec−1. By doing this, an optical fiber drawing die which can be used in an optical fiber drawing method so as to realize stable resin coating operation even in high-speed drawing operation and high productivity can be realized.

    Solar cell and method for fabricating the same
    8.
    发明授权
    Solar cell and method for fabricating the same 有权
    太阳能电池及其制造方法

    公开(公告)号:US08247684B2

    公开(公告)日:2012-08-21

    申请号:US13097860

    申请日:2011-04-29

    IPC分类号: H01L31/00 H01L21/00 H01L27/14

    摘要: A solar cell includes a graphite substrate, an amorphous carbon layer having a thickness of not less than 20 nm and not more than 60 nm formed on the graphite substrate, an AlN layer formed on the amorphous carbon layer, a n-type nitride semiconductor layer formed on the AlN layer; a light-absorption layer including a nitride semiconductor layer formed on the n-type nitride semiconductor layer; a p-type nitride semiconductor layer formed on the light-absorption layer; a p-side electrode electrically connected to the p-type nitride semiconductor layer; and an n-side electrode electrically connected to the n-type nitride semiconductor layer. The amorphous carbon layer is obtained by oxidizing the surface of the graphite substrate.

    摘要翻译: 太阳能电池包括石墨基板,形成在石墨基板上的厚度不小于20nm且不大于60nm的非晶碳层,形成在非晶碳层上的AlN层,n型氮化物半导体层 形成在AlN层上; 包括形成在所述n型氮化物半导体层上的氮化物半导体层的光吸收层; 形成在所述光吸收层上的p型氮化物半导体层; 电连接到p型氮化物半导体层的p侧电极; 和与n型氮化物半导体层电连接的n侧电极。 无定形碳层通过氧化石墨基材的表面而获得。