摘要:
A treatment method for an optical fiber including accommodating an optical fiber inside a treatment chamber; introducing a deuterium containing gas into the treatment chamber; and in a deuterium treatment step, exposing the optical fiber to atmosphere of the deuterium containing gas. In the deuterium treatment step, a deuterium concentration D in the treatment chamber during the deuterium treatment is calculated from an initial value A of a deuterium concentration in the deuterium containing gas inside the treatment chamber, a concentration B of oxygen in an ambient atmosphere of the treatment chamber, and a concentration C of oxygen in the deuterium containing gas inside the treatment chamber, and the deuterium concentration in the treatment chamber is controlled based on the deuterium concentration D calculated. Other gases such as hydrogen containing gas or nitrogen containing gas may also be used according to the invention.
摘要:
A method of treating optical fiber includes at least a first step of creating a reduced-pressure atmosphere in a space which holds the optical fiber, and a second step of introducing to the space a deuterium-containing gas so as to expose the optical fiber to the gas.
摘要:
A treatment method for an optical fiber including accommodating an optical fiber inside a treatment chamber; introducing a deuterium containing gas into the treatment chamber; and in a deuterium treatment step, exposing the optical fiber to atmosphere of the deuterium containing gas. In the deuterium treatment step, a deuterium concentration D in the treatment chamber during the deuterium treatment is calculated from an initial value A of a deuterium concentration in the deuterium containing gas inside the treatment chamber, a concentration B of oxygen in an ambient atmosphere of the treatment chamber, and a concentration C of oxygen in the deuterium containing gas inside the treatment chamber, and the deuterium concentration in the treatment chamber is controlled based on the deuterium concentration D calculated. Other gases such as hydrogen containing gas or nitrogen containing gas may also be used according to the invention.
摘要:
An optical fiber coating die is made such that an interfacial shear rate of the optical fiber to the resin coat is calculated in accordance with a pressure value of resin inside a coating cup, and the interfacial shear rate is in a range of −1.5×105 to 0 sec−1. Also, an optical fiber drawing die is made such that the interfacial shear rate of the optical fiber to the resin coat is calculated in accordance with a diameter of a coating resin, and the interfacial shear rate is in a range of range of −3×105 to 2×105 sec−1. By doing this, an optical fiber drawing die which can be used in an optical fiber drawing method so as to realize stable resin coating operation even in high-speed drawing operation and high productivity can be realized.
摘要:
An optical fiber coating die is made such that an interfacial shear rate of the optical fiber to the resin coat is calculated in accordance with a pressure value of resin inside a coating cup, and the interfacial shear rate is in a range of −1.5×105 to 0 sec−1. Also, an optical fiber drawing die is made such that the interfacial shear rate of the optical fiber to the resin coat is calculated in accordance with a diameter of a coating resin, and the interfacial shear rate is in a range of range of −3×105 to 2×105 sec−1. By doing this, an optical fiber drawing die which can be used in an optical fiber drawing method so as to realize stable resin coating operation even in high-speed drawing operation and high productivity can be realized.
摘要:
A method of treating optical fiber includes at least a first step of creating a reduced-pressure atmosphere in a space which holds the optical fiber, and a second step of introducing to the space a deuterium-containing gas so as to expose the optical fiber to the gas.
摘要:
There is provided a sliding member including a base body and a hard carbon coating formed on the base body to define a sliding surface for sliding contact with an opposing member under lubrication according to one embodiment of the present invention. The hard carbon coating has an outermost surface portion lower in hydrogen content than a remaining portion thereof, or an outermost coating layer lower in hydrogen content than at least one other coating layer.
摘要:
A solar cell includes a graphite substrate, an amorphous carbon layer having a thickness of not less than 20 nm and not more than 60 nm formed on the graphite substrate, an AlN layer formed on the amorphous carbon layer, a n-type nitride semiconductor layer formed on the AlN layer; a light-absorption layer including a nitride semiconductor layer formed on the n-type nitride semiconductor layer; a p-type nitride semiconductor layer formed on the light-absorption layer; a p-side electrode electrically connected to the p-type nitride semiconductor layer; and an n-side electrode electrically connected to the n-type nitride semiconductor layer. The amorphous carbon layer is obtained by oxidizing the surface of the graphite substrate.
摘要:
The invention provides a low-friction sliding mechanism, a low-friction agent composition, a friction reduction method, a manual transmission and a final reduction gear unit that can exert very excellent low friction characteristics to sliding surfaces present under various applications, and, in particular, that have more excellent low friction characteristics than that of a combination of an existing steel material and an organic Mo compound.The low-friction sliding mechanism has an oxygen-containing organic compound or an aliphatic amine compound interposed between sliding surfaces that a DLC coated sliding member and a sliding member form.The low-friction agent composition contains an oxygen-containing organic compound or an aliphatic amine compound.The friction reduction method includes supplying the low-friction agent composition between sliding surfaces that a DLC coated sliding member and a sliding member form.The manual transmission includes, as at least one of sliding members, a DLC coated sliding section.The final reduction gear unit includes, as at least one of sliding members, a DLC coated sliding section.
摘要:
A substrate for semiconductor device includes a graphite substrate, an amorphous carbon layer having a thickness of not less than 20 nm and not more than 60 nm formed on the graphite substrate and an AlN layer formed on the amorphous carbon layer. The amorphous carbon layer is obtained by oxidizing the surface of the graphite substrate.