Integrated multiple-path power amplifier with interdigitated transistors

    公开(公告)号:US11108361B2

    公开(公告)日:2021-08-31

    申请号:US16541551

    申请日:2019-08-15

    Applicant: NXP USA, Inc.

    Abstract: A multiple-path amplifier (e.g., a Doherty amplifier) includes first and second amplifier input terminals and an amplifier output terminal integrally-formed with a semiconductor die, and at least two amplifier cells positioned adjacent to each other between the amplifier input terminals and the amplifier output terminal. Each amplifier cell includes first and second transistors (e.g., field effect transistors) integrally-formed with the semiconductor die, where the first and second transistors each include a transistor input (e.g., a gate terminal) and a transistor output (e.g., a drain terminal). The first transistor input is coupled to the first amplifier input terminal, and the second transistor input is coupled to the second amplifier input terminal. A combining node is coupled to the second transistor output and to the amplifier output terminal, and a first phase shift element (e.g., an inductor) is electrically connected between the first transistor output and the combining node.

    Transistor with shield system including multilayer shield structure arrangement

    公开(公告)号:US11430743B1

    公开(公告)日:2022-08-30

    申请号:US17223410

    申请日:2021-04-06

    Applicant: NXP USA, Inc.

    Abstract: A transistor includes a semiconductor substrate having first and second terminals. An interconnect structure, on an upper surface of the substrate, is formed of layers of dielectric material and electrically conductive material. The conductive material includes a first pillar connected with the first terminal, a second pillar connected with the second terminal, and a shield system between the first and second pillars. The shield system includes forked structures formed in at least two conductive layers of the interconnect structure and at least partially surrounding segments of the second pillar. The shield system may additionally include shield traces formed in a first conductive layer positioned between gate fingers and the first pillars and/or the shield system may include shield runners that are located in an electrically conductive layer that is below a topmost electrically conductive layer with the first pillar being connected to a runner in the topmost conductive layer.

    TRANSISTOR WITH SOURCE MANIFOLD IN NON-ACTIVE DIE REGION

    公开(公告)号:US20240339409A1

    公开(公告)日:2024-10-10

    申请号:US18296786

    申请日:2023-04-06

    Applicant: NXP USA, Inc.

    CPC classification number: H01L23/5384 H01L23/5386 H01L23/66 H01L2223/6616

    Abstract: A transistor includes a semiconductor die with an active region and one or more non-active regions that do not overlap or overlie the active region. The transistor further includes a group of multiple transistor fingers in the active region. One or more source vias are located adjacent to sides of the group of transistor fingers. One or more source manifolds are located in the non-active region(s), and the source manifold(s) electrically connect the source via(s) with at least one source region of the multiple transistor fingers.

    SEMICONDUCTOR DEVICE WITH CONDUCTIVE ELEMENT FORMED OVER DIELECTRIC LAYERS AND METHOD OF FABRICATION THEREFOR

    公开(公告)号:US20220376060A1

    公开(公告)日:2022-11-24

    申请号:US17325995

    申请日:2021-05-20

    Applicant: NXP USA, INC.

    Abstract: An embodiment of a semiconductor device includes a semiconductor substrate, a first current-carrying electrode, and a second current-carrying electrode formed over the semiconductor, a control electrode formed over the semiconductor substrate between the first current carrying electrode and the second current carrying electrode, and a first dielectric layer disposed over the control electrode, and a second dielectric layer disposed over the first dielectric layer. A first opening is formed in the second dielectric layer, adjacent the control electrode and the second current-carrying electrode, having a first edge laterally adjacent to and nearer the second current-carrying electrode, and a second edge laterally adjacent to and nearer to the control electrode, and a conductive element formed over the first dielectric layer and within the first opening, wherein the portion of the conductive element formed within the first opening forms a first metal-insulator-semiconductor region within the first opening.

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