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公开(公告)号：US08641958B2
公开(公告)日：2014-02-04
申请号：US13743772
申请日：2013-01-17
申请人： Niyaz Khusnatdinov , Christopher Ellis Jones , Joseph G. Perez , Dwayne L. LaBrake , Ian Matthew McMackin
发明人： Niyaz Khusnatdinov , Christopher Ellis Jones , Joseph G. Perez , Dwayne L. LaBrake , Ian Matthew McMackin
CPC分类号： B29C59/026 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/2022
摘要： Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified.
摘要翻译： 位于能量源和压印光刻模板之间的装置可以阻挡能量暴露于分配在基底上的可聚合材料的部分。 被能量阻挡的可聚合材料的一部分可以保持流体，而剩余的可聚合材料固化。
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公开(公告)号：US08361371B2
公开(公告)日：2013-01-29
申请号：US12367079
申请日：2009-02-06
申请人： Niyaz Khusnatdinov , Christopher Ellis Jones , Joseph G. Perez , Dwayne L. LaBrake , Ian Matthew McMackin
发明人： Niyaz Khusnatdinov , Christopher Ellis Jones , Joseph G. Perez , Dwayne L. LaBrake , Ian Matthew McMackin
CPC分类号： B29C59/026 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/2022
摘要： Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified.
摘要翻译： 位于能量源和压印光刻模板之间的装置可以阻挡能量暴露于分配在基底上的可聚合材料的部分。 被能量阻挡的可聚合材料的一部分可以保持流体，而剩余的可聚合材料固化。
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公开(公告)号：US20090200710A1
公开(公告)日：2009-08-13
申请号：US12367079
申请日：2009-02-06
申请人： Niyaz Khusnatdinov , Christopher Ellis Jones , Joseph G. Perez , Dwayne L. LaBrake , Ian Matthew McMackin
发明人： Niyaz Khusnatdinov , Christopher Ellis Jones , Joseph G. Perez , Dwayne L. LaBrake , Ian Matthew McMackin
CPC分类号： B29C59/026 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/2022
摘要： Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified.
摘要翻译： 位于能量源和压印光刻模板之间的装置可以阻挡能量暴露于分配在基底上的可聚合材料的部分。 被能量阻挡的可聚合材料的一部分可以保持流体，而剩余的可聚合材料固化。
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公开(公告)号：US20130241109A1
公开(公告)日：2013-09-19
申请号：US13743772
申请日：2013-01-17
申请人： Niyaz Khusnatdinov , Christopher Ellis Jones , Joseph G. Perez , Dwayne L. LaBrake , Ian Matthew McMackin
发明人： Niyaz Khusnatdinov , Christopher Ellis Jones , Joseph G. Perez , Dwayne L. LaBrake , Ian Matthew McMackin
IPC分类号： B29C59/02
CPC分类号： B29C59/026 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/2022
摘要： Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified.
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公开(公告)号：US20100078846A1
公开(公告)日：2010-04-01
申请号：US12568730
申请日：2009-09-29
申请人： Douglas J. Resnick , Ian Matthew McMackin , Gerard M. Schmid , Niyaz Khusnatdinov , Ecron D. Thompson , Sidlgata V. Sreenivasan
发明人： Douglas J. Resnick , Ian Matthew McMackin , Gerard M. Schmid , Niyaz Khusnatdinov , Ecron D. Thompson , Sidlgata V. Sreenivasan
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： Particles may be present on substrates and/or templates during nano-lithographic imprinting. Particles may be mitigated and/or removed using localized removal techniques and/or imprinting techniques as described.
摘要翻译： 在纳米光刻印迹过程中，颗粒可能存在于底物和/或模板上。 可以使用如所述的局部去除技术和/或印记技术来减轻和/或去除颗粒。
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公开(公告)号：US20110031650A1
公开(公告)日：2011-02-10
申请号：US12846211
申请日：2010-07-29
摘要： Methods for imprinting on abutted fields of a substrate are described. Generally, a first field of a substrate may be imprinted using an imprint lithography template. The template may then be placed such that a portion of the template overlaps the first field of the substrate while imprinting a second field of the substrate.
摘要翻译： 描述了用于在基板的邻接场上印刷的方法。 通常，可以使用压印光刻模板印刷衬底的第一场。 然后可以将模板放置成使得模板的一部分与衬底的第一场重叠，同时压印衬底的第二场。
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公开(公告)号：US20090136654A1
公开(公告)日：2009-05-28
申请号：US12336821
申请日：2008-12-17
申请人： Frank Y. Xu , Ian Matthew McMackin , Pankaj B. Lad
发明人： Frank Y. Xu , Ian Matthew McMackin , Pankaj B. Lad
IPC分类号： C23C22/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y30/00 , B82Y40/00
摘要： A template is treated to provide a surfactant rich region and a surfactant depleted region. A contact angle at the surfactant rich region may be greater than, less than, or substantially similar to a contact angle of the surfactant depleted region.
摘要翻译： 处理模板以提供表面活性剂富集区域和表面活性剂贫化区域。 表面活性剂富集区域处的接触角可以大于，小于或基本上类似于表面活性剂贫化区域的接触角。
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公开(公告)号：US08282383B2
公开(公告)日：2012-10-09
申请号：US12707345
申请日：2010-02-17
IPC分类号： B29D11/00
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed towards a system for expelling a gas positioned between a substrate and a mold, the substrate and the mold further having a liquid positioned therebetween.
摘要翻译： 本发明涉及一种用于排出位于基底和模具之间的气体的系统，所述基底和模具进一步具有位于其间的液体。
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公开(公告)号：US08268220B2
公开(公告)日：2012-09-18
申请号：US12905192
申请日：2010-10-15
申请人： Frank Y. Xu , Pankaj B. Lad , Ian Matthew McMackin , Van Nguyen Truskett , Edward Brian Fletcher
发明人： Frank Y. Xu , Pankaj B. Lad , Ian Matthew McMackin , Van Nguyen Truskett , Edward Brian Fletcher
CPC分类号： G03F7/0002 , B41C1/10 , B41M7/0072 , B41M7/0081 , B82Y10/00 , B82Y30/00 , B82Y40/00 , Y10S977/887
摘要： Improved wetting characteristics together with improved release characteristics with respect to a substrate and an imprint lithography mold having imprinting material disposed therebetween.
摘要翻译： 改进的润湿特性以及相对于基底的改进的剥离特性和其间设置有压印材料的压印光刻模具。
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公开(公告)号：US20100092599A1
公开(公告)日：2010-04-15
申请号：US12575834
申请日：2009-10-08
申请人： Kosta S. Selinidis , Gerard M. Schmid , Ecron D. Thompson , Ian Matthew McMackin , Douglas J. Resnick
发明人： Kosta S. Selinidis , Gerard M. Schmid , Ecron D. Thompson , Ian Matthew McMackin , Douglas J. Resnick
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7042 , G03F9/7076 , G03F9/708 , G03F9/7084
摘要： Systems and methods for minimizing overlay error during alignment of a template with a substrate are described. Templates generally include two distinct types of alignment marks: buried alignment marks and complementary alignment marks. Buried marks may be fabricated separately from the patterning surface, and the complementary marks may be fabricated in the same step as the patterning surface.
摘要翻译： 描述了在模板与衬底对准期间最小化覆盖误差的系统和方法。 模板通常包括两种不同类型的对准标记：掩埋对准标记和互补对准标记。 掩埋标记可以与图案化表面分开制造，并且补充标记可以在与图案化表面相同的步骤中制造。
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