公开(公告)号：US06869890B2

公开(公告)日：2005-03-22

申请号：US10034373

申请日：2002-01-03

申请人： Nobuharu Noji ,  Hiroshi Sobukawa ,  Masami Nagayama ,  Koji Ono ,  Mutsumi Saito

发明人： Nobuharu Noji ,  Hiroshi Sobukawa ,  Masami Nagayama ,  Koji Ono ,  Mutsumi Saito

IPC分类号： B08B3/04 ,  C23C16/04 ,  C23C16/44 ,  H01L21/00 ,  H01L21/205 ,  H01L21/304 ,  H01L21/31

CPC分类号： C23C16/4409 ,  B08B3/04 ,  B08B3/041 ,  C23C16/04 ,  H01L21/67126

摘要： A processing apparatus is used for processing a workpiece such as a semiconductor wafer. The processing apparatus comprises a cover for covering a portion of a surface, to be processed, of a workpiece, a process chamber formed by the cover and the surface, to be processed, of the workpiece, and a sealing portion provided between the cover and the surface of the workpiece for sealing the process chamber.

摘要翻译： 处理装置用于处理诸如半导体晶片的工件。 该处理装置包括用于覆盖被加工物的表面的一部分的盖，由盖的加工室和待加工的工件的表面形成的处理室，以及设置在盖和 工件的表面用于密封加工室。

公开(公告)号：US07098045B2

公开(公告)日：2006-08-29

申请号：US11054061

申请日：2005-02-10

申请人： Nobuharu Noji ,  Hiroshi Sobukawa ,  Masami Nagayama ,  Koji Ono ,  Mutsumi Saito

发明人： Nobuharu Noji ,  Hiroshi Sobukawa ,  Masami Nagayama ,  Koji Ono ,  Mutsumi Saito

IPC分类号： H01L21/00

CPC分类号： C23C16/4409 ,  B08B3/04 ,  B08B3/041 ,  C23C16/04 ,  H01L21/67126

摘要： A processing method is performed for processing a workpiece such as a semiconductor wafer. The processing method utilizes an apparatus comprising a cover for covering a portion of a surface, to be processed, of a workpiece, a process chamber formed by the cover and the surface, to be processed, of the workpiece, and a sealing portion provided between the cover and the surface of the workpiece for sealing the process chamber.

摘要翻译： 执行用于处理诸如半导体晶片的工件的处理方法。 该处理方法利用一种装置，该装置包括用于覆盖被加工的工件的表面的一部分，被加工的被加工的表面和被处理的表面的处理室， 盖子和工件的表面用于密封处理室。

公开(公告)号：US20050145171A1

公开(公告)日：2005-07-07

申请号：US11054061

申请日：2005-02-10

申请人： Nobuharu Noji ,  Hiroshi Sobukawa ,  Masami Nagayama ,  Koji Ono ,  Mutsumi Saito

发明人： Nobuharu Noji ,  Hiroshi Sobukawa ,  Masami Nagayama ,  Koji Ono ,  Mutsumi Saito

IPC分类号： B08B3/04 ,  C23C16/04 ,  C23C16/44 ,  H01L21/00 ,  H01L21/205 ,  H01L21/304 ,  B24B49/00 ,  B24B51/00 ,  C23C16/00

CPC分类号： C23C16/4409 ,  B08B3/04 ,  B08B3/041 ,  C23C16/04 ,  H01L21/67126

摘要： A processing method is performed for processing a workpiece such as a semiconductor wafer. The processing method utilizes an apparatus comprising a cover for covering a portion of a surface, to be processed, of a workpiece, a process chamber formed by the cover and the surface, to be processed, of the workpiece, and a sealing portion provided between the cover and the surface of the workpiece for sealing the process chamber.

摘要翻译： 执行用于处理诸如半导体晶片的工件的处理方法。 该处理方法利用一种装置，该装置包括用于覆盖被加工的工件的表面的一部分，被加工的被加工的表面和被处理的表面的处理室， 盖子和工件的表面用于密封处理室。

公开(公告)号：US07411191B2

公开(公告)日：2008-08-12

申请号：US11806573

申请日：2007-06-01

申请人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hiroshi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hiroshi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

IPC分类号： H01J37/26

CPC分类号： H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.

摘要翻译： 电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器， 光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。

公开(公告)号：US20070235644A1

公开(公告)日：2007-10-11

申请号：US11806573

申请日：2007-06-01

申请人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hiroshi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hiroshi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

IPC分类号： G01N23/00

CPC分类号： H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.

摘要翻译： 电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器， 光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。

公开(公告)号：US06589009B1

公开(公告)日：2003-07-08

申请号：US09592411

申请日：2000-06-13

申请人： Atsushi Shiokawa ,  Matsutaro Miyamoto ,  Hiroyuki Kawasaki ,  Hiroshi Sobukawa ,  Hiroaki Ogamino

发明人： Atsushi Shiokawa ,  Matsutaro Miyamoto ,  Hiroyuki Kawasaki ,  Hiroshi Sobukawa ,  Hiroaki Ogamino

IPC分类号： F04D1904

CPC分类号： F04D19/042 ,  F04D29/522 ,  F04D29/701

摘要： A turbo-molecular pump includes a casing having an intake port, a stator fixedly mounted in the casing, and a rotor supported in the casing for rotation relatively to the stator. The stator and the rotor make up a turbine blade pumping section and a groove pumping section for evacuating gas. A scattering prevention member is provided for preventing fragments of the rotor from being scattered through the intake port.

摘要翻译： 涡轮分子泵包括壳体，其具有进气口，固定地安装在壳体中的定子和支撑在壳体中以相对于定子旋转的转子。 定子和转子构成涡轮叶片泵送部分和用于抽空气体的槽泵送部分。 提供防止转子碎片通过进气口散射的防散射构件。

公开(公告)号：US06343910B1

公开(公告)日：2002-02-05

申请号：US09531894

申请日：2000-03-21

申请人： Hiroyuki Kawasaki ,  Hiroshi Sobukawa

发明人： Hiroyuki Kawasaki ,  Hiroshi Sobukawa

IPC分类号： F01D136

CPC分类号： F04D19/046 ,  F04D19/044 ,  F04D27/0292 ,  F04D29/321

摘要： A turbo-molecular pump has a casing, a stator fixedly mounted in the casing, and a rotor supported in the casing for rotation relatively to the stator. A turbine blade pumping assembly and a thread groove pumping assembly for discharging gas molecules are disposed between the stator and the rotor. The rotor comprises at least two components constituting the turbine blade pumping assembly and the thread groove pumping assembly. The components are separable from each other at a predetermined position, and joined to each other to form the rotor.

摘要翻译： 涡轮分子泵具有壳体，固定地安装在壳体中的定子和支撑在壳体中以相对于定子旋转的转子。 涡轮叶片泵送组件和用于排放气体分子的螺纹槽泵送组件设置在定子和转子之间。 转子包括构成涡轮机叶片泵送组件和螺纹槽泵送组件的至少两个部件。 这些部件在预定位置彼此分离，并且彼此接合以形成转子。

公开(公告)号：US08624182B2

公开(公告)日：2014-01-07

申请号：US13195927

申请日：2011-08-02

申请人： Kenji Watanabe ,  Masahiro Hatakeyama ,  Yoshihiko Naito ,  Tatsuya Kohama ,  Kenji Terao ,  Takeshi Murakami ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Hiroshi Sobukawa ,  Norio Kimura

发明人： Kenji Watanabe ,  Masahiro Hatakeyama ,  Yoshihiko Naito ,  Tatsuya Kohama ,  Kenji Terao ,  Takeshi Murakami ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Hiroshi Sobukawa ,  Norio Kimura

IPC分类号： H01J37/244 ,  H01J37/285 ,  H01J37/29

CPC分类号： H01J37/22 ,  H01J37/265 ,  H01J37/29 ,  H01J2237/004 ,  H01J2237/022 ,  H01J2237/24495 ,  H01J2237/24564 ,  H01J2237/2817

摘要： An electro-optical inspection apparatus prevents adhesion of dust or particles to a sample surface, wherein a stage on which a sample is placed is disposed inside a vacuum chamber that can be evacuated, and a dust collecting electrode is disposed to surround a periphery of the sample. The dust collecting electrode is applied with a voltage having the same polarity as a voltage applied to the sample and an absolute value that is the same or larger than an absolute value of the voltage. Because dust or particles adhere to the dust collecting electrode, adhesion of the dust or particles to the sample surface can be reduced. Instead of using the dust collecting electrode, it is possible to form a recess on a wall of the vacuum chamber, or to dispose on the wall a metal plate having a mesh structure to which a predetermined voltage is applied.

摘要翻译： 电光检查装置防止灰尘或颗粒附着到样品表面，其中放置样品的阶段设置在可以抽真空的真空室内，并且集尘电极被设置成围绕 样品。 集尘电极施加与施加到样品的电压极性相同的电压，绝对值等于或大于电压的绝对值。 由于灰尘或颗粒附着在集尘电极上，所以可以减少灰尘或颗粒附着到样品表面。 代替使用集尘电极，可以在真空室的壁上形成凹部，或者在壁上设置具有施加了预定电压的网状结构的金属板。

公开(公告)号：US20110266468A1

公开(公告)日：2011-11-03

申请号：US13184047

申请日：2011-07-15

申请人： Shinji NAGAI ,  Takanobu Ishihara ,  Kouji Kakizaki ,  Hiroshi Sobukawa ,  Takeshi Murakami ,  Masahiro Inoue

发明人： Shinji NAGAI ,  Takanobu Ishihara ,  Kouji Kakizaki ,  Hiroshi Sobukawa ,  Takeshi Murakami ,  Masahiro Inoue

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  G03F7/70983 ,  H05G2/005

摘要： An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.

摘要翻译： 极紫外光源装置包括将目标供给到真空室中的目标供给单元，将激光输出到真空室中的激光振荡器，通过反射从目标发射的极紫外光而向外部输出极紫外光的集光镜 通过在真空室中的等离子体发光点用激光照射等离子体，以及离子碎片去除单元，其至少一部分位于包括等离子体发光点的遮蔽区域中。

公开(公告)号：US08003963B2

公开(公告)日：2011-08-23

申请号：US12605725

申请日：2009-10-26

申请人： Shinji Nagai ,  Takanobu Ishihara ,  Kouji Kakizaki ,  Hiroshi Sobukawa ,  Takeshi Murakami ,  Masahiro Inoue

发明人： Shinji Nagai ,  Takanobu Ishihara ,  Kouji Kakizaki ,  Hiroshi Sobukawa ,  Takeshi Murakami ,  Masahiro Inoue

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  G03F7/70983 ,  H05G2/005

摘要： An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.

摘要翻译： 极紫外光源装置包括将目标供给到真空室中的目标供给单元，将激光输出到真空室中的激光振荡器，通过反射从目标发射的极紫外光而向外部输出极紫外光的集光镜 通过在真空室中的等离子体发光点用激光照射等离子体，以及离子碎片去除单元，其至少一部分位于包括等离子体发光点的遮蔽区域中。