Integrated micro-plasma limiter
    4.
    发明授权
    Integrated micro-plasma limiter 有权
    集成微型等离子体限制器

    公开(公告)号:US09054500B2

    公开(公告)日:2015-06-09

    申请号:US13865921

    申请日:2013-04-18

    Abstract: A plasma power limiter fabricated using wafer-level fabrication techniques with other circuit elements. The plasma limiter includes a signal substrate and a trigger substrate defining a hermetically sealed cavity therebetween in which is encapsulated an ionizable gas. The signal substrate includes a signal line within the cavity and the trigger substrate includes at least one trigger probe extending from the trigger substrate towards the transmission line. If a signal propagating on the transmission line exceeds a power threshold, the gas within the cavity is ionized creating a conduction path between the transmission line and the trigger probe that draws off the high power current.

    Abstract translation: 使用晶圆级制造技术与其他电路元件制造的等离子体功率限制器。 等离子体限制器包括信号基板和触发基板,其在其间限定密封腔,其中封装有可电离气体。 信号衬底包括腔内的信号线,并且触发衬底包括从触发衬底朝向传输线延伸的至少一个触发探针。 如果在传输线上传播的信号超过功率阈值,则空腔内的气体被电离,在传输线和触发探头之间产生一个导通路径,从而消除高功率电流。

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