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    LOW COHERENCE INTERFEROMETRY WITH SCAN ERROR CORRECTION
    1.
    发明申请
    LOW COHERENCE INTERFEROMETRY WITH SCAN ERROR CORRECTION 有权
    低相干干涉与扫描误差校正

    公开(公告)号：US20130155413A1

    公开(公告)日：2013-06-20

    申请号：US13765936

    申请日：2013-02-13

    Applicant: Jan Liesener ,  Mark Davidson ,  Peter J. de Groot ,  Xavier Colonna de Lega ,  Leslie L. Deck

    Inventor： Jan Liesener ,  Mark Davidson ,  Peter J. de Groot ,  Xavier Colonna de Lega ,  Leslie L. Deck

    IPC: G01B9/02

    CPC classification number: G01B9/0209 ,  G01B9/02007 ,  G01B9/0201 ,  G01B9/02027 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02068 ,  G01B9/02077 ,  G01B11/2441 ,  G01B2290/45 ,  G01B2290/70 ,  Y10T29/49002

    Abstract: A system includes an interference microscope having one or more optical elements arranged to image a test object to an image plane by combining test light from the test object with reference light from a reference object to form an interference pattern at the image plane, wherein the test and reference light are derived from a common broadband light source. The system includes a scanning stage configured to scan an optical path difference (OPD) between the test and reference light, a multi-element detector positioned at the image plane and configured to record the interference pattern for each of a series of OPD increments and to generate multiple interferometry signals each having a fringe carrier frequency indicative of changes in the OPD as the OPD is scanned, where there is phase diversity among the interferometry signals, and an electronic processor coupled to the multi-element detector and scanning stage and configured to process the interference signals based on the phase diversity to determine information about the OPD increments having sensitivity to perturbations to the OPD increments at frequencies greater than the fringe carrier frequency.

    Abstract translation: 一种系统包括具有一个或多个光学元件的干涉显微镜，该光学元件被布置成通过将来自测试对象的测试光与来自参考对象的参考光组合在一起而在图像平面上形成干涉图案来将测试对象图像成像平面，其中测试 参考光源自普通宽带光源。 该系统包括被配置为扫描测试和参考光之间的光程差（OPD）的扫描级，位于图像平面处的多元件检测器，并且被配置为记录一系列OPD增量中的每一个的干涉图案，并且 生成多个干涉测量信号，每个干涉测量信号具有指示在扫描OPD时OPD变化的边缘载波频率，其中在干涉测量信号之间存在相位分集，以及耦合到多元件检测器和扫描级的电子处理器并且被配置为处理 基于相位分集的干扰信号以确定关于具有对大于边缘载波频率的频率的对OPD的扰动敏感度的OPD增量的信息。

    SCANNING INTERFEROMETRY FOR THIN FILM THICKNESS AND SURFACE MEASUREMENTS
    2.
    发明申请
    SCANNING INTERFEROMETRY FOR THIN FILM THICKNESS AND SURFACE MEASUREMENTS 有权
    扫描干涉薄膜厚度和表面测量

    公开(公告)号：US20080180694A1

    公开(公告)日：2008-07-31

    申请号：US12020351

    申请日：2008-01-25

    Applicant: Peter J. de Groot ,  Xavier Colonna de Lega

    Inventor： Peter J. de Groot ,  Xavier Colonna de Lega

    IPC: G01B9/02

    CPC classification number: G01B11/0675 ,  G01B9/02057 ,  G01B9/0207 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B2290/50 ,  G01B2290/70 ,  G01N21/8422 ,  G02F1/13392 ,  G02F2001/133354

    Abstract: A method including: providing a low coherence scanning interferometry data for at least one spatial location of a sample having multiple interfaces, wherein the data is collected using a low coherence scanning interferometer having an illumination geometry and an illumination frequency spectrum, and wherein the data comprises a low coherence scanning interferometry signal having multiple regions of fringe contrast corresponding to the multiple interfaces; and determining a distance between at least one pair of interfaces based on a distance between the corresponding regions of fringe contrast and information about the illumination geometry.

    Abstract translation: 一种方法，包括：为具有多个接口的样本的至少一个空间位置提供低相干扫描干涉测量数据，其中使用具有照明几何形状和照明频谱的低相干扫描干涉仪来收集数据，并且其中数据包括 低相干扫描干涉测量信号，具有对应于多个界面的多个边缘对比区域; 以及基于条纹对比的对应区域和关于照明几何形状的信息之间的距离来确定至少一对界面之间的距离。

    Scanning interferometry for thin film thickness and surface measurements
    3.
    发明授权
    Scanning interferometry for thin film thickness and surface measurements 有权
    用于薄膜厚度和表面测量的扫描干涉测量

    公开(公告)号：US07468799B2

    公开(公告)日：2008-12-23

    申请号：US12020351

    申请日：2008-01-25

    Applicant: Peter J. de Groot ,  Xavier Colonna de Lega

    Inventor： Peter J. de Groot ,  Xavier Colonna de Lega

    IPC: G01B9/02 ,  G01B11/28

    CPC classification number: G01B11/0675 ,  G01B9/02057 ,  G01B9/0207 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B2290/50 ,  G01B2290/70 ,  G01N21/8422 ,  G02F1/13392 ,  G02F2001/133354

    Abstract: A method including: providing a low coherence scanning interferometry data for at least one spatial location of a sample having multiple interfaces, wherein the data is collected using a low coherence scanning interferometer having an illumination geometry and an illumination frequency spectrum, and wherein the data comprises a low coherence scanning interferometry signal having multiple regions of fringe contrast corresponding to the multiple interfaces; and determining a distance between at least one pair of interfaces based on a distance between the corresponding regions of fringe contrast and information about the illumination geometry.

    Abstract translation: 一种方法，包括：为具有多个接口的样本的至少一个空间位置提供低相干扫描干涉测量数据，其中使用具有照明几何形状和照明频谱的低相干扫描干涉仪来收集数据，并且其中数据包括 低相干扫描干涉测量信号，具有对应于多个界面的多个边缘对比区域; 以及基于条纹对比的对应区域和关于照明几何形状的信息之间的距离来确定至少一对界面之间的距离。

    INTERFEROMETRY FOR LATERAL METROLOGY
    5.
    发明申请
    INTERFEROMETRY FOR LATERAL METROLOGY 有权
    横向计量学的干涉

    公开(公告)号：US20090303493A1

    公开(公告)日：2009-12-10

    申请号：US12540709

    申请日：2009-08-13

    Applicant: Xavier Colonna de Lega ,  Robert Stoner ,  Peter de Groot

    Inventor： Xavier Colonna de Lega ,  Robert Stoner ,  Peter de Groot

    IPC: G01B11/02

    CPC classification number: G01B9/02063 ,  G01B9/02057 ,  G01B9/02087 ,  G01B9/0209

    Abstract: A method is disclosed which includes: using a scanning interferometry system, generating a sequence of phase-shifted interferometry images at different scan positions of an object comprising a buried surface, identifying a scan position corresponding to a position of best focus for the buried surface based on the sequence of phase-shifted interferometry images of the object, and generating a final image based on the phase-shifted interferometry images and the scan position, where the interferometric fringes in the final image are reduced relative to the interferometric fringes in the phase-shifted interferometry images.

    Abstract translation: 公开了一种方法，其包括：使用扫描干涉测量系统，在包括掩埋表面的物体的不同扫描位置处产生相移干涉测量图像序列，识别对应于掩埋表面的最佳焦点位置的扫描位置 根据对象的相移干涉图像的序列，并且基于相移干涉测量图像和扫描位置生成最终图像，其中最终图像中的干涉条纹相对于相位干涉图像中的干涉条纹减小， 移位干涉图像。

    Interferometer for determining overlay errors
    6.
    发明授权
    Interferometer for determining overlay errors 有权
    用于确定重叠错误的干涉仪

    公开(公告)号：US08189202B2

    公开(公告)日：2012-05-29

    申请号：US12535357

    申请日：2009-08-04

    Applicant: Jan Liesener ,  Xavier Colonna de Lega ,  Peter de Groot

    Inventor： Jan Liesener ,  Xavier Colonna de Lega ,  Peter de Groot

    IPC: G01B11/02

    CPC classification number: G01B9/02043 ,  G01B9/02057 ,  G01B9/02083 ,  G01B9/0209 ,  G01B2290/70 ,  G03F7/70633 ,  H01L23/544 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: Systems are disclosed that include an interferometer configured to direct test light to an overlay test pad and subsequently combine it with reference light, the test and reference light being derived from a common source, one or more optics configured to direct at least a portion of the combined light to a multi-element detector so that different regions of the detector correspond to different illumination angles of the overlay test pad by the test light, the detector being configured to produce an interference signal based on the combined light, and an electronic processor in communication with the multi-element detector. The overlay test pad comprises a first patterned structure and a second patterned structure and the electronic processor is configured to determine information about the relative alignment between the first and second patterned structures based on the interference signal.

    Abstract translation: 公开了一种系统，其包括被配置为将测试光引导到覆盖测试焊盘并随后将其与参考光组合的干涉仪，测试和参考光源自公共源，一个或多个光学器件被配置为引导至少一部分 将光组合到多元件检测器，使得检测器的不同区域对应于测试光的覆盖测试垫的不同照明角度，检测器被配置为基于组合的光产生干涉​​信号，以及电子处理器 与多元素检测器通信。 覆盖测试焊盘包括第一图案化结构和第二图案化结构，并且电子处理器被配置为基于干扰信号来确定关于第一和第二图案化结构之间的相对对准的信息。

    Full-field geometrically desensitized interferometer using refractive optics
    7.
    发明授权
    Full-field geometrically desensitized interferometer using refractive optics 有权
    使用折射光学的全场几何去敏干涉仪

    公开(公告)号：US06226092B1

    公开(公告)日：2001-05-01

    申请号：US09321475

    申请日：1999-05-27

    Applicant: Xavier Colonna de Lega

    Inventor： Xavier Colonna de Lega

    IPC: G01B902

    CPC classification number: G01B9/02098 ,  G01B9/02022 ,  G01B11/2441

    Abstract: A full-field, geometrically-desensitized interferometer (GDI) instrument incorporates a combination of reflecting and refracting optics to perform beam splitting and recombining operations for surface profilometry. Symmetrically-positioned inbound and outbound optical subassemblies typically are arranged to direct inbound collimated beams from a light generator to the profiled surface of a test object and to direct outbound reflected beams to an imaging device as a single recombined outbound interference beam. Every point on the detector has a corresponding point on the object from which reflected illumination originated from both reflected beams. The optical path difference between the two inbound beams or between the two reflected outbound beams can be substantially independent of field position. The resultant instrument, in addition to being capable of full-field imaging, exhibits several advantages including 1) a large working distance, 2) the employment of readily-available non-diffractive elements, and 3) the ability to transmit light with high efficiency.

    Abstract translation: 全场，几何脱敏干涉仪（GDI）仪器结合了反射和折射光学元件，以进行表面轮廓测量的分束和重组操作。 对称定位的入射和出射光学子组件通常被布置成将来自光发生器的入射准直光束引导到测试对象的成型表面，并且将出射反射光束作为单个重新组合的出射干涉光束引导到成像装置。 检测器上的每个点在物体上具有对应的点，反射照明源自两个反射光束。 两个入射光束之间或两个反射出射光束之间的光程差可以基本上与场位置无关。 所得到的仪器除了能够进行全场成像外，还具有以下优点：1）工作距离大，2）使用易于获得的非衍射元件，以及3）高效传输光的能力 。

    INTERFEROMETER FOR DETERMINING OVERLAY ERRORS
    9.
    发明申请
    INTERFEROMETER FOR DETERMINING OVERLAY ERRORS 有权
    用于确定重叠错误的干涉仪

    公开(公告)号：US20110032535A1

    公开(公告)日：2011-02-10

    申请号：US12535357

    申请日：2009-08-04

    Applicant: Jan Liesener ,  Xavier Colonna de Lega ,  Peter de Groot

    Inventor： Jan Liesener ,  Xavier Colonna de Lega ,  Peter de Groot

    IPC: G01B11/02

    CPC classification number: G01B9/02043 ,  G01B9/02057 ,  G01B9/02083 ,  G01B9/0209 ,  G01B2290/70 ,  G03F7/70633 ,  H01L23/544 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: Systems are disclosed that include an interferometer configured to direct test light to an overlay test pad and subsequently combine it with reference light, the test and reference light being derived from a common source, one or more optics configured to direct at least a portion of the combined light to a multi-element detector so that different regions of the detector correspond to different illumination angles of the overlay test pad by the test light, the detector being configured to produce an interference signal based on the combined light, and an electronic processor in communication with the multi-element detector. The overlay test pad comprises a first patterned structure and a second patterned structure and the electronic processor is configured to determine information about the relative alignment between the first and second patterned structures based on the interference signal.

    Abstract translation: 公开了一种系统，其包括被配置为将测试光引导到覆盖测试焊盘并随后将其与参考光组合的干涉仪，测试和参考光源自公共源，一个或多个光学器件被配置为引导至少一部分 将光组合到多元件检测器，使得检测器的不同区域对应于测试光的覆盖测试垫的不同照明角度，检测器被配置为基于组合的光产生干涉​​信号，以及电子处理器 与多元素检测器通信。 覆盖测试焊盘包括第一图案化结构和第二图案化结构，并且电子处理器被配置为基于干扰信号来确定关于第一和第二图案化结构之间的相对对准的信息。

    INTERFEROMETER FOR OVERLAY MEASUREMENTS
    10.
    发明申请
    INTERFEROMETER FOR OVERLAY MEASUREMENTS 失效
    用于覆盖测量的干扰仪

    公开(公告)号：US20090262362A1

    公开(公告)日：2009-10-22

    申请号：US12427079

    申请日：2009-04-21

    Applicant: Peter de Groot ,  Jan Liesener ,  Xavier Colonna de Lega

    Inventor： Peter de Groot ,  Jan Liesener ,  Xavier Colonna de Lega

    IPC: G01B11/02 ,  H05K3/00 ,  H01J9/42

    CPC classification number: G01B9/02084 ,  G01B9/02057 ,  G01B9/0209 ,  G01B2290/70 ,  G01N21/95607 ,  G03F7/70633 ,  Y10T29/49004

    Abstract: In general, in a first aspect, the invention features a system including an interferometer configured to direct test light to an overlay target and subsequently combine it with reference light to form an interference pattern, the test and reference light being derived from a common source, a multi-element detector, one or more optics to image the overlay target on the multi-element detector; and an electronic processor in communication with the multi-element detector. The overlay target includes a first pattern and a second pattern and the electronic processor is configured to determine information about the relative alignment between the first and second patterns.

    Abstract translation: 通常，在第一方面，本发明的特征在于一种包括干涉仪的系统，该干涉仪被配置为将测试光引导到覆盖目标，并随后将其与参考光组合以形成干涉图案，测试和参考光源自公共源， 多元素检测器，用于对多元件检测器上的覆盖目标进行成像的一个或多个光学元件; 以及与多元件检测器通信的电子处理器。 覆盖目标包括第一图案和第二图案，并且电子处理器被配置为确定关于第一图案和第二图案之间的相对对准的信息。

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