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公开(公告)号：US3915717A
公开(公告)日：1975-10-28
申请号：US41511373
申请日：1973-11-12
Applicant: RCA CORP
Inventor： FELDSTEIN NATHAN , WEINER JOEL ALAN
Abstract: Autocatalytic metal deposition baths stabilized with a vanadate, stannate or silicate.
Abstract translation: 自动催化金属沉积浴用钒酸盐，锡酸盐或硅酸盐稳定。
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公开(公告)号：US3690944A
公开(公告)日：1972-09-12
申请号：US3690944D
申请日：1970-03-10
Applicant: RCA CORP
Inventor： FELDSTEIN NATHAN
CPC classification number: C23C18/36
Abstract: A METHOD FOR ELECTROLESSLY PLATING NICKEL FROM A BATH COMPRISING (I) A NICKEL SALT; (II) A NICKEL ION COMPLEXING AGENT; (III) A SOURCE OF HYDROPHOSPHITE IONS; AND (IV) AMMONIUM HYDROXIDE, IN WHICH THE MOLAR CONCENTRATION RATIO OF NICKEL TO HYPOPHOSPHITE IONS IS LESS THAN 0.2. THE BATH EXHIBITS A PLATING RATE SUBSTANTIALLY INDEPENDENT OF HYPOPHOSPHITE ION CONCENTRATION.
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公开(公告)号：US3900599A
公开(公告)日：1975-08-19
申请号：US37538073
申请日：1973-07-02
Applicant: RCA CORP
Inventor： FELDSTEIN NATHAN
CPC classification number: C23C18/31 , C23C18/1683 , H05K3/187
Abstract: The tendency of an electroless plating bath having a considerable amount of oxygen dissolved therein to ''''skipplate'''' on catalytic surfaces of objects immersed therein, is inhibited by the removal of at least most of the oxygen initially present in the bath.
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4.发明授权Method of preparing a substrate for depositing a metal on selected portions thereof 失效制备用于在其选定部分上沉积金属的基板的方法
公开(公告)号：US3672925A
公开(公告)日：1972-06-27
申请号：US3672925D
申请日：1970-10-02
Applicant: RCA CORP
Inventor： FELDSTEIN NATHAN
CPC classification number: H05K3/184 , C23C18/1605 , G03F7/00 , H05K2203/0713 , H05K2203/1415 , Y10T428/24917
Abstract: STRATE AND MASKING FILM ARE NEXT TREATED WITH A CATALYTIC ACTIVATING SOLUTION, AND A THIN LAYER OF THE CATALYST IS DEPOSITED ONLY ON THE SENSITIZED SELECTED PORTIONS OF THE SUBSTRATE SURFACE.
A METHOD OF PREPARING A SUBSTRATE FOR THE DEPOSITION OF A METAL ON SELECTED PORTIONS OF THE SUBSTRATE SURFACE BY ELECTROLESS PLATING, IN THE PRESENCE OF A CATALYST COMPRISES FIRST COVERING THE UNSELECTED PORTIONS OF THE SUBSTRATE SURFACE WITH A MASKING FILM THAT INCLUDES AN OXIDIZING AGENT. THE SUBSTRATE, INCLUDING THE MASKING FILM, IS THEN TREATED WITH A SENSITIZING SOLUTION AND HEATED TO CAUSE THE OXIDIZING AGENT TO OXIDIZE, AND DESENSITIZE, THE SENSITIZING SOLUTION THAT IS ADSORBED ON THE MASKING FILM, RENDERING THE MASKING FILM INCAPABLE OF ACCEPTING A CATALYST. THE SUB--
公开(公告)号：US3619285A
公开(公告)日：1971-11-09
申请号：US3619285D
申请日：1969-12-10
Applicant: RCA CORP
Inventor： FELDSTEIN NATHAN
Abstract: A method of making a patterned metal film article comprising depositing an organic resist material on the surface of a relatively nonporous insulating substrate in the pattern desired for the metal, leaving portions of the substrate surface exposed, treating both the exposed substrate surface portions and the resist surface with a sensitizer and with an activator for electroless deposition of a metal on both these surfaces, treating both said surfaces with an etching solution so that only the exposed substrate surface portions become deactivated, and treating both the surfaces with an electroless metal plating solution such that metal deposits only on the resist surface.
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Patent Agency Ranking
公开(公告)号：US3922420A
公开(公告)日：1975-11-25
申请号：US47509474
申请日：1974-05-31
Applicant: RCA CORP
Inventor： SCHNABLE GEORGE LUTHER , FELDSTEIN NATHAN
CPC classification number: G03F1/54 , G03F1/50 , Y10T428/24926
Abstract: A method of making a semi-transparent photomask of the iron oxide type comprising depositing a thin film of nickel or of a nickel alloy on a glass substrate, forming on the nickel or nickel alloy film a pattern of a resist which is the negative of the desired photomask, electrolytically depositing a layer of iron on the areas of the alloy film not covered by the resist, removing the resist and heating the assembly in an oxidizing atmosphere to convert the iron layer to iron oxide and also to convert the nickel or nickel alloy film to transparent oxides, at the same time providing improved adherence.
Abstract translation: 一种制造氧化铁半透明光掩模的方法，包括在玻璃基板上沉积镍或镍合金薄膜，在镍或镍合金膜上形成抗蚀剂的图案，该图案为 在未被抗蚀剂覆盖的合金膜的区域上电解沉积铁层，除去抗蚀剂并在氧化气氛中加热组件以将铁层转化为氧化铁，并将镍或镍合金 膜到透明氧化物，同时提供改善的附着力。
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公开(公告)号：US3916056A
公开(公告)日：1975-10-28
申请号：US31933972
申请日：1972-12-29
Applicant: RCA CORP
Inventor： FELDSTEIN NATHAN
CPC classification number: G03F1/54 , G03F1/50 , H05K1/0306 , H05K3/108 , H05K2201/0108 , H05K2201/0344 , H05K2201/0347 , H05K2203/0315 , H05K2203/1142 , Y10T428/24917 , Y10T428/24926
Abstract: A thin layer of nickel or a nickel alloy, having a thickness such that it transmits about 30-40% of the visible and ultraviolet light, is deposited on an insulating substrate. A pattern of opaque metal areas is deposited on the thin layer of metal and the thin metal layer is heat-treated in air for a time and at a temperature sufficient to make the thin layer sufficiently transparent, adherent, and durable for the intended purpose.
Abstract translation: 1452116光掩模RCA公司1973年12月18日[1972年12月29日] 58555/73标题G2X [也在C7部分]通过蒸汽或无电沉积或通过溅射在玻璃或塑料基板上沉积Ni或Ni合金层而形成光掩模， 施加光刻胶的图案，无电沉积Ni，Co或Cu层，然后在空气中加热形成Ni氧化物，并使第一层对可见光或紫外光透明至少70％。
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8.发明授权Method of depositing a pattern of metal plated areas on an insulating substrate 失效在绝缘基板上沉积金属镀覆区域图案的方法
公开(公告)号：US3878007A
公开(公告)日：1975-04-15
申请号：US36754173
申请日：1973-06-06
Applicant: RCA CORP
Inventor： FELDSTEIN NATHAN , LAW HAROLD BELL
CPC classification number: G03F1/72 , C23C18/1608 , C23C18/1689 , H05K1/0306 , H05K3/062 , H05K3/108 , H05K3/181 , H05K3/225 , H05K2201/0344 , H05K2203/0542 , H05K2203/072
Abstract: The method comprises depositing a thin layer of a first metal having a relatively high degree of solubility in a particular etchant on a substrate, this first metal being catalytic to electroless deposition of a second metal to be subsequently deposited, electrolessly depositing on the first metal a pattern of areas of a second metal which has a relatively low degree of solubility in the etchant, and then treating the plated areas with the etchant, so that the first metal is removed where it is not covered by the second metal but the second metal is substantially unaffected.
Abstract translation: 该方法包括在衬底上的特定蚀刻剂中沉积具有较高溶解度的第一金属薄层，该第一金属被催化以无序沉积待随后沉积的第二金属，无电沉积在第一金属a上 在蚀刻剂中具有相对低的溶解度的第二金属的区域图案，然后用蚀刻剂处理镀覆区域，使得第一金属在不被第二金属覆盖的地方被除去，但第二金属是 基本上不受影响。
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公开(公告)号：US3878061A
公开(公告)日：1975-04-15
申请号：US44597074
申请日：1974-02-26
Applicant: RCA CORP
Inventor： FELDSTEIN NATHAN
IPC: C25D1/10 , C25D1/08 , H01J9/14 , H01J9/233 , H01L21/288 , H01L23/48 , H01L29/00 , C23B7/00 , B01K1/00
CPC classification number: H01L23/48 , C25D1/08 , H01J9/14 , H01L21/288 , H01L29/00 , H01L2924/0002 , H01L2924/00
Abstract: The matrix comprises a highly polished degenerately doped silicon single crystal substrate having a layer of an inorganic dielectric thereon and a pattern of grooves in the dielectric coating, exposing the silicon surface.
Abstract translation: 该基质包括具有无机介电层的高度抛光的简并掺杂的硅单晶衬底，以及介电涂层中的凹槽图案，暴露硅表面。
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公开(公告)号：US3877810A
公开(公告)日：1975-04-15
申请号：US30459472
申请日：1972-11-08
Applicant: RCA CORP
Inventor： FELDSTEIN NATHAN
CPC classification number: G03F1/54
Abstract: A photomask which comprises a transparent, smooth glass plate and a pattern of opaque, light-absorbing areas of oxides of cobalt on a surface of the plate is obtained by sequentially coating the glass plate with layers of cobalt and a photoresist, exposing the photoresist, developing the photoresist to expose areas of cobalt, etching away the exposed areas of cobalt, and heating the remaining areas of cobalt in the presence of oxgen to convert the same to cobalt oxides.
Abstract translation: 通过依次在玻璃板上涂覆钴和光致抗蚀剂层，曝光光致抗蚀剂，获得包含透明光滑玻璃板的光掩模和在该表面上的钴氧化物的不透明光吸收区域的图案， 显影光致抗蚀剂以暴露钴的区域，蚀刻钴的暴露区域，并在氧存在下加热钴的剩余区域以将其转化成钴氧化物。
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