Breakaway pinata
    2.
    发明申请
    Breakaway pinata 审中-公开
    分裂pinata

    公开(公告)号:US20060234595A1

    公开(公告)日:2006-10-19

    申请号:US11106954

    申请日:2005-04-15

    申请人: Jim Bell Randy Harris

    发明人: Jim Bell Randy Harris

    IPC分类号: A63H33/00

    CPC分类号: A63H37/00

    摘要: A piñata-like device is formed from cardboard panels and sub-panels. The structure is formed and held together by masking tape which is partially cut, across the seams of the panels and sub-panels. The container has an access opening to facilitate placement of goodies into the cavity. Each panel and sub-panel is provided with a ribbon. By pulling on the ribbons, the panels are frangibly detachable from one another. The strength of the attachment of the ribbons to the panels and sub-panels exceeds the strength of the masking tape holding the panels and sub-panels into a container form. When the ribbons are pulled, preferably substantially simultaneously, the panels substantially detach from one another, and any contents disposed within the cavity are made available, usually in a somewhat explosive manner. An end of each ribbon is passed through one or more slits in each panel and securely attached to a surface of the panel.

    摘要翻译: 由纸板和子板形成一个类似的装置。 该结构由穿过面板和子面板的接缝部分切割的遮蔽胶带形成并保持在一起。 容器具有进入口以便于将食品放入空腔中。 每个面板和子面板都有一个色带。 通过拉扯丝带,面板彼此易碎地拆卸。 带子连接到面板和子面板上的强度超过将面板和子面板保持为容器形式的遮蔽带的强度。 当带子被拉动时,优选基本上同时地,所述面板基本上彼此分离,并且通常以有点爆炸的方式,设置在空腔内的任何内容物可用。 每个带的端部穿过每个面板中的一个或多个狭缝并牢固地附接到面板的表面。

    Wet chemical processing chambers for processing microfeature workpieces
    3.
    发明申请
    Wet chemical processing chambers for processing microfeature workpieces 审中-公开
    用于加工微型工件的湿化学处理室

    公开(公告)号:US20050050767A1

    公开(公告)日:2005-03-10

    申请号:US10859748

    申请日:2004-06-03

    摘要: A wet chemical processing chamber comprising a fixed unit, a detachable unit releasably coupled to the fixed unit, a seal contacting the fixed unit and the detachable unit, and a processing component disposed in the fixed unit and/or the detachable unit. The fixed unit can have a first flow system configured to direct a processing fluid through the fixed unit and a mounting fixture for fixedly attaching the fixed unit to a platform or deck of an integrated processing tool. The detachable unit can include a second flow system configured to direct the processing fluid to and/or from the first flow system of the fixed unit. The seal has an orifice through which processing fluid can flow between the first and second flow systems, and the processing component can impart a property to the processing fluid for processing a surface on a microfeature workpiece having submicron microfeatures.

    摘要翻译: 一种湿化学处理室,包括固定单元,可释放地联接到固定单元的可拆卸单元,接触固定单元和可拆卸单元的密封件,以及设置在固定单元和/或可拆卸单元中的处理部件。 固定单元可以具有构造成引导处理流体通过固定单元的第一流动系统和用于将固定单元固定地附接到集成处理工具的平台或甲板的安装夹具。 可拆卸单元可以包括构造成将处理流体引导到和/或从固定单元的第一流动系统引导的第二流动系统。 密封件具有孔口,处理流体可以通过该孔口在第一和第二流动系统之间流动,并且处理部件可以赋予处理流体以处理具有亚微米特征的微特征工件上的表面的性质。

    Apparatus and method for cleaning and drying a container for semiconductor workpieces
    4.
    发明申请
    Apparatus and method for cleaning and drying a container for semiconductor workpieces 有权
    用于清洁和干燥半导体工件的容器的装置和方法

    公开(公告)号:US20070125404A1

    公开(公告)日:2007-06-07

    申请号:US11294921

    申请日:2005-12-05

    IPC分类号: B08B7/00 B08B3/00

    摘要: The invention provides an apparatus for cleaning and drying a container for semiconductor workpieces. The apparatus comprises a load port with a fixture that receives a dirty container and delivers it to a deck assembly with a carrier that removably receives the container for further handling. While the container is received by the carrier, a robot with a first end effector removes the container door and places it on a portion of the carrier. The robot includes a second end effector that engages the carrier and elevates the carrier and container for insertion into a process chamber. The process chamber includes a rotor with at least one receptacle wherein the rotor is rotated to create both high pressure and low pressure regions. Once the container and carrier are loaded into the rotor, the rotor is rotated and means for cleaning injects a processing fluid onto the container and carrier. After a rinse stage and while the rotor is rotating, the means for drying delivers air across the container and carrier. Upon completion of the drying stage, the robot removes both the container and the carrier from the process chamber and reassembles the door to the container such that container can be returned to use.

    摘要翻译: 本发明提供一种用于清洁和干燥半导体工件的容器的装置。 该装置包括具有固定装置的装载端口,该装置接收脏污的容器并将其传送到具有可移除地容纳容器以进一步处理的载体的甲板组件。 当容器被承载件容纳时,具有第一端部执行器的机器人移除容器门并将其放置在承载件的一部分上。 机器人包括第二端部执行器,其接合载体并提升载体和容器以插入处理室。 处理室包括具有至少一个容器的转子,其中转子旋转以产生高压和低压区域。 一旦容器和载体被装载到转子中,则转子旋转,并且用于清洁的装置将处理流体注入到容器和载体上。 在冲洗阶段之后,当转子旋转时,干燥装置将空气穿过容器和载体。 干燥阶段完成后,机器人从处理室中移除容器和载体,并将门重新组装到容器上,使得容器可以返回使用。

    End-effectors and associated control and guidance systems and methods
    6.
    发明申请
    End-effectors and associated control and guidance systems and methods 审中-公开
    终结效应器和相关的控制和指导系统和方法

    公开(公告)号:US20070014656A1

    公开(公告)日:2007-01-18

    申请号:US11480313

    申请日:2006-06-29

    IPC分类号: B66C23/00

    CPC分类号: H01L21/67742 H01L21/68707

    摘要: End-effectors and associated control and guidance systems and methods are disclosed. A transfer device in one embodiment includes a base unit, an arm carried by the base unit and movable relative to the base unit, and an end-effector carried by the arm and rotatable relative to the arm. The end-effector includes two grippers, at least one being movable toward and away from the other between a grip position and a release position. A transmission is coupled between a motor and the movable gripper to receive an input force from the motor and apply an output force to the gripper that increases as the gripper moves to the grip position.

    摘要翻译: 公开了终端效应器和相关的控制和引导系统和方法。 在一个实施例中的传送装置包括基座单元,由基座单元承载并可相对于基座单元运动的臂,以及由臂承载并可相对于臂旋转的端部执行器。 末端执行器包括两个夹持器,至少一个可在夹持位置和释放位置之间朝向和远离另一个移动。 传动装置联接在电动机和可动夹具之间以接收来自电动机的输入力,并且向夹具施加输出力,该夹持器随着夹持器移动到把手位置而增加。

    Interchangeable workpiece handling apparatus and associated tool for processing microfeature workpieces
    8.
    发明申请
    Interchangeable workpiece handling apparatus and associated tool for processing microfeature workpieces 审中-公开
    可更换的工件处理设备及相关的加工微型工件的工具

    公开(公告)号:US20050063798A1

    公开(公告)日:2005-03-24

    申请号:US10860592

    申请日:2004-06-03

    IPC分类号: B65G1/00

    CPC分类号: B65G1/00

    摘要: Interchangeable workpiece handling apparatuses and associated tools for processing microfeature workpieces are disclosed. In one embodiment, an apparatus includes a device support having a first alignment surface at an alignment plane. A processing chamber is received in an aperture at the alignment plane. A workpiece handling device is positioned proximate to the processing chamber and includes a workpiece support, a drive unit operatively coupled to the workpiece support to move the workpiece support along a generally linear motion axis, and a mounting portion coupled to the workpiece support and having a second alignment surface removably mated with the first alignment surface. In a particular embodiment, the workpiece handling device is supported relative to the device support only at or above the alignment plane. Accordingly, the workpiece handling device can be easily removed from the device support and need not impede access to components beneath the alignment plane.

    摘要翻译: 公开了可互换的工件处理装置和用于加工微型工件的相关工具。 在一个实施例中,一种装置包括具有在对准平面处的第一对准表面的装置支撑件。 处理室被容纳在对准平面的孔中。 工件处理装置位于处理室附近,并且包括工件支撑件,可操作地联接到工件支撑件的驱动单元,以沿着大致线性的运动轴线移动工件支撑件,以及联接到工件支撑件的安装部分, 第二对准表面可拆卸地与第一对准表面配合。 在特定实施例中,工件处理装置仅在对准平面上或上方支撑相对于装置支撑。 因此,工件处理装置可以容易地从装置支撑件移除,并且不需要阻碍对准对准平面下方的部件。

    Lift and rotate assembly for use in a workpiece processing station and a method of attaching the same
    9.
    发明授权
    Lift and rotate assembly for use in a workpiece processing station and a method of attaching the same 有权
    用于工件加工站的提升和旋转组件及其附接方法

    公开(公告)号:US06623609B2

    公开(公告)日:2003-09-23

    申请号:US09875424

    申请日:2001-06-05

    IPC分类号: C25D1706

    摘要: A lift and rotate assembly for use in a workpiece processing station. The lift and rotate assembly includes a body having a slim profile and pins located on opposite sides for mounting the assembly onto a tool frame. The lift and rotate assembly is removably and pivotally mounted to an exposed outer surface of the frame. The lift and rotate assembly has a body, a process head movably connected to the body, and control components mounted within the body and configured to move the process head relative to the body. The lift and rotate assembly in one embodiment is positionable in a forward, operating position with the body adjacent to the frame, and in a tilted, service position with the body tilted away from the frame.

    摘要翻译: 用于工件加工台的升降和旋转组件。 提升和旋转组件包括具有细长轮廓的主体和位于相对侧上的销,用于将组件安装到工具框架上。 提升和旋转组件可拆卸地枢转地安装到框架的暴露的外表面。 提升和旋转组件具有主体,可移动地连接到主体的过程头,以及安装在主体内并被配置为相对于主体移动过程头的控制部件。 一个实施例中的提升和旋转组件可定位在身体相邻于框架的向前的操作位置中,并且在倾斜的使用位置,其中身体从框架倾斜。

    Automated semiconductor immersion processing system
    10.
    发明授权
    Automated semiconductor immersion processing system 有权
    自动半导体浸没处理系统

    公开(公告)号:US06439824B1

    公开(公告)日:2002-08-27

    申请号:US09611507

    申请日:2000-07-07

    IPC分类号: B65B2102

    摘要: A process system for processing semiconductor wafers includes a stocker module, and immersion module, and a process module. A process robot moves on a lateral rail to transfer wavers between the modules. The immersion module is separated from the other modules, to avoid transmission of vibration. Immersion tanks are radially positioned within the immersion module, to provide a compact design. An immersion robot moves batches of wafers on an end effector between the immersion tanks. The end effector may be detachable from the immersion robot, so that the immersion robot can move a second batch of wafers, while the first batch of wafers undergoes an immersion process.

    摘要翻译: 用于处理半导体晶片的处理系统包括储料器模块和浸没模块以及处理模块。 过程机器人在横向轨道上移动以在模块之间传递波浪。 浸没模块与其他模块分离,以避免振动传播。 沉浸池径向定位在浸没模块内,以提供紧凑的设计。 浸没式机器人在浸没池之间的端部执行器上移动批次的晶片。 末端执行器可以从浸没机器人脱离,使得浸没式机器人可以移动第二批晶片,同时第一批晶片经历浸没过程。