METHOD FOR PRODUCING A MICROELECTROMECHANICAL COMPONENT

    公开(公告)号:US20240182298A1

    公开(公告)日:2024-06-06

    申请号:US18525410

    申请日:2023-11-30

    申请人: Robert Bosch GmbH

    发明人: Johannes Classen

    IPC分类号: B81C1/00

    摘要: A method producing a microelectromechanical component. A dielectric layer is structured on an upper side of a substrate forming a grating, and a blind hole is formed beneath the grating. A cover layer is arranged on the dielectric layer closing the blind hole. A layer sequence is arranged on the cover layer and above the blind hole. Functional structures are formed in the layer sequence and an access channel extending through the layer sequence to the blind hole is formed. A further substrate is connected to the substrate. The functional structures are enclosed in a cavity, connected to the blind hole, between the substrate and the further substrate. Another blind hole is formed on an underside of the substrate. The blind hole is opened in the region of the other blind hole. A cavity internal pressure is set, and the blind hole is closed.

    Micromechanical sensor
    3.
    发明授权

    公开(公告)号:US11768221B2

    公开(公告)日:2023-09-26

    申请号:US17447764

    申请日:2021-09-15

    申请人: Robert Bosch GmbH

    IPC分类号: B81B7/02 G01P15/18

    摘要: A micromechanical sensor, including a micromechanical chip having a first micromechanical structure, a first evaluation chip, having a first application-specific integrated circuit, and a second evaluation chip having a second application-specific integrated circuit. The first evaluation chip and the micromechanical chip are situated in a stacked manner, the micromechanical chip being directly electrically conductively connected with the first evaluation chip and the first evaluation chip being directly electrically conductively connected with the second evaluation chip. The first application-specific integrated circuit primarily includes analog circuit elements and the second application-specific circuit primarily includes digital circuit elements.

    Micromechanical component for a sensor device and manufacturing method for a micromechanical component for a sensor device

    公开(公告)号:US11623861B2

    公开(公告)日:2023-04-11

    申请号:US17169250

    申请日:2021-02-05

    申请人: Robert Bosch GmbH

    发明人: Johannes Classen

    IPC分类号: B81B3/00 B81C1/00

    摘要: A micromechanical component for a sensor device including a substrate having a substrate surface, at least one stator electrode situated on the substrate surface and/or on the at least one intermediate layer covering at least partially the substrate surface, which is formed in each case from a first semiconductor and/or metal layer, at least one adjustably situated actuator electrode, which is formed in each case from a second semiconductor and/or metal layer, and a diaphragm spanning the at least one stator electrode and the at least one actuator electrode, including a diaphragm exterior side directed away from the at least one stator electrode, which is formed from a third semiconductor and/or metal layer, a stiffening and/or protective structure protruding at the diaphragm exterior side being formed from a fourth semiconductor and/or metal layer.

    Micromechanical sensor system, method for using a micromechanical sensor system

    公开(公告)号:US11619647B2

    公开(公告)日:2023-04-04

    申请号:US17236662

    申请日:2021-04-21

    申请人: Robert Bosch GmbH

    发明人: Johannes Classen

    摘要: A micromechanical sensor system, in particular, an acceleration sensor, including a substrate having a main extension plane, the sensor system including a first mass and a second mass. The first and second masses are each designed to be at least partially movable in a vertical direction, perpendicular to the main extension plane of the substrate. The first mass includes a stop structure, wherein the stop structure has an overlap with the second mass in the vertical direction.

    Method for manufacturing a micromechanical sensor

    公开(公告)号:US11111137B2

    公开(公告)日:2021-09-07

    申请号:US16323133

    申请日:2017-07-05

    申请人: Robert Bosch GmbH

    发明人: Johannes Classen

    摘要: A method for manufacturing a micromechanical sensor, including the steps: providing a MEMS wafer that includes a MEMS substrate, a defined number of etching trenches being formed in the MEMS substrate in a diaphragm area, the diaphragm area being formed in a first silicon layer that is situated at a defined distance from the MEMS substrate; providing a cap wafer; bonding the MEMS wafer to the cap wafer; and forming a media access point to the diaphragm area by grinding the MEMS substrate.

    METHOD FOR SETTING A PRESSURE IN A CAVERN FORMED WITH THE AID OF A SUBSTRATE AND OF A SUBSTRATE CAP, SEMICONDUCTOR SYSTEM, IN PARTICULAR, WAFER SYSTEM

    公开(公告)号:US20200180947A1

    公开(公告)日:2020-06-11

    申请号:US16700391

    申请日:2019-12-02

    申请人: Robert Bosch GmbH

    发明人: Johannes Classen

    IPC分类号: B81C1/00 B81B7/04

    摘要: A method for setting a pressure in a cavern formed using a substrate and a substrate cap, the cavern being part of a semiconductor system, including an additional cavern formed with using the substrate and of the substrate cap, a microelectromechanical system being situated in the cavern, an additional microelectromechanical system being situated in the additional cavern, a diffusion area being situated in the substrate and/or in the substrate cap, the method includes a gas diffusing with the aid of the diffusion area from the surroundings into the cavern, during the diffusing, a diffusivity and/or a diffusion flow of the gas from the surroundings into the cavern being greater than an additional diffusivity and/or an additional diffusion flow of the gas from the surroundings into the additional cavern, and/or during the diffusing, the additional cavern being at least essentially protected from a penetration of the gas into the additional cavern.

    Micromechanical structure for an acceleration sensor

    公开(公告)号:US10215772B2

    公开(公告)日:2019-02-26

    申请号:US15119010

    申请日:2014-12-22

    申请人: Robert Bosch GmbH

    发明人: Johannes Classen

    IPC分类号: G01P15/125 G01P15/08

    摘要: A micromechanical structure for an acceleration sensor, including a seismic mass that is constituted definedly asymmetrically with reference to the rotational Z axis of the structure of the acceleration sensor, spring elements that are fastened on the seismic mass and on at least one fastening element, a rotational motion of the seismic mass being generatable by way of the spring elements substantially only upon an acceleration in a defined sensing direction within a plane constituted substantially orthogonally to the rotational Z axis.