CMP polishing pad
    1.
    发明授权

    公开(公告)号:US06217426B1

    公开(公告)日:2001-04-17

    申请号:US09287575

    申请日:1999-04-06

    IPC分类号: B24B100

    摘要: A polishing pad for use in a chemical mechanical polishing system is provided. The pad is mounted to a rotatable platen and comprises a polishing surface and a deflection surface which provides a desired degree of rigidity and compliance to the pad when brought into contact with a substrate. The deflection surface may comprise one or more passageways extending through the pad which vent to atmosphere. In one embodiment, the deflection area defines a raised area and a recessed area. The raised area provides a mounting surface for the platen while the recessed area allows for compliance of the pad. In another embodiment, the deflection area comprises a plurality of channels defining a plurality of slanted protrusions. The channels may be non-intersecting such that the slanted protrusions are elongated portions disposed on the pad. Alternatively, the channels may be intersecting such that the slanted protrusions are isolated from one another and are disposed on the pad in spaced relation.

    CMP polishing pad
    2.
    发明授权
    CMP polishing pad 有权
    CMP抛光垫

    公开(公告)号:US06575825B2

    公开(公告)日:2003-06-10

    申请号:US09759858

    申请日:2001-01-12

    IPC分类号: B24D1102

    摘要: A polishing pad for use in a chemical mechanical polishing system is provided. The pad is mounted to a rotatable platen and comprises a polishing surface and a deflection surface which provides a desired degree of rigidity and compliance to the pad when brought into contact with a substrate. The deflection surface may comprise one or more passageways extending through the pad which vent to atmosphere. In one embodiment, the deflection area defines a raised area and a recessed area. The raised area provides a mounting surface for the platen while the recessed area allows for compliance of the pad. In another embodiment, the deflection area comprises a plurality of channels defining a plurality of slanted protrusions. The channels may be non-intersecting such that the slanted protrusions are elongated portions disposed on the pad. Alternatively, the channels may be intersecting such that the slanted protrusions are isolated from one another and are disposed on the pad in spaced relation.

    摘要翻译: 提供了一种用于化学机械抛光系统的抛光垫。 衬垫安装到可旋转的压板上并且包括抛光表面和偏转表面,当与衬底接触时,该抛光表面和偏转表面提供期望的刚度和顺应性。 偏转表面可以包括延伸穿过垫的一个或多个通道,其通向大气。 在一个实施例中,偏转区域限定凸起区域和凹陷区域。 凸起区域为压板提供安装表面,而凹陷区域允许焊盘的顺应性。 在另一个实施例中,偏转区域包括限定多个倾斜突起的多个通道。 通道可以不相交,使得倾斜突起是设置在垫上的细长部分。 或者,通道可以相交,使得倾斜的突起彼此隔离并且以间隔的关系设置在垫上。

    CMP platen with patterned surface
    4.
    发明授权
    CMP platen with patterned surface 有权
    带有图案表面的CMP压板

    公开(公告)号:US06592438B2

    公开(公告)日:2003-07-15

    申请号:US09759556

    申请日:2001-01-12

    IPC分类号: B24B700

    摘要: A chemical mechanical polishing system is provided having one more polishing stations. The polishing stations include a platen and pad mounted to an upper surface of the platen. The upper surface of the platen is patterned to define a raised area and a recessed area. The raised area provides a rigid mounting surface for the pad and the recessed area provides the pad a desired degree of flexibility and compliance of the pad when brought into contact with a substrate.

    摘要翻译: 提供了具有一个以上抛光站的化学机械抛光系统。 抛光站包括安装到压板上表面的压板和衬垫。 将压板的上表面图案化以限定凸起区域和凹陷区域。 凸起区域为衬垫提供刚性的安装表面,并且凹陷区域在衬垫与衬底接触时向衬垫提供期望程度的柔性和顺应性。

    Chemical mechanical polishing pad conditioning element with discrete points and compliant membrane
    6.
    发明授权
    Chemical mechanical polishing pad conditioning element with discrete points and compliant membrane 失效
    化学机械抛光垫调节元件,具有离散点和柔顺膜

    公开(公告)号:US06572446B1

    公开(公告)日:2003-06-03

    申请号:US09664603

    申请日:2000-09-18

    IPC分类号: B24B5100

    摘要: A pad conditioning assembly includes a conditioner head with an end effector movable into contact with a polishing pad,a plurality of downwardly-projecting movable conditioning elements disposed at a bottom of the end effector; and a compliant backing member disposed above and adjacent the conditioning elements, wherein forces applied by the compliant backing member are transferred to the movable conditioning elements to move the conditioning elements. In one aspect, a pressurization circuit applies a pressure from a pressure source to the compliant backing member to flex the compliant backing member against the movable conditioning elements.

    摘要翻译: 垫调节组件包括具有可与抛光垫接触的末端执行器的调节头,设置在末端执行器底部的多个向下突出的可移动调节元件; 以及设置在调节元件上方并与其相邻的柔顺背衬构件,其中由柔性背衬构件施加的力被传递到可移动调节元件以移动调节元件。 在一个方面,加压电路将来自压力源的压力施加到柔性背衬构件上,以使柔顺背衬构件抵靠可动调节元件弯曲。

    Methods of forming a photovoltaic cell
    9.
    发明授权
    Methods of forming a photovoltaic cell 失效
    形成光伏电池的方法

    公开(公告)号:US07754519B1

    公开(公告)日:2010-07-13

    申请号:US12465351

    申请日:2009-05-13

    IPC分类号: H01L21/00 H01L21/46

    摘要: In some embodiments, a method of forming a photovoltaic cell includes (1) forming a cleave plane in a donor body so as to define a lamina to be bonded to a receiver element and exfoliated from the donor body; (2) prior to bonding, pre-heating the donor body without the receiver element to a temperature of greater than about 200° C. for a first time period that is less than a time period required for exfoliation of the lamina from the donor body; (3) cooling the donor body after pre-heating the donor body; (4) bonding the donor body to the receiver element; and (5) heating the bonded donor body and receiver element for a second time period so as to complete the exfoliation of the lamina from the donor body. Numerous other aspects are provided.

    摘要翻译: 在一些实施方案中,形成光伏电池的方法包括(1)在施主体中形成解理面,以便限定待结合到受体元件并从供体体剥离的层; (2)在接合之前,将没有接收器元件的施主体预热到大于约200℃的温度,所述第一时间段小于从供体体层剥离薄片所需的时间段 ; (3)在对供体进行预热后冷却供体; (4)将供体体接合到接收器元件; 和(5)加热结合的供体体和受体元件第二时间段,以便完成层从供体体的剥离。 提供了许多其他方面。

    Carrier head with layer of conformable material for a chemical mechanical polishing system
    10.
    发明授权
    Carrier head with layer of conformable material for a chemical mechanical polishing system 有权
    载体头,具有用于化学机械抛光系统的适合材料层

    公开(公告)号:US06443823B1

    公开(公告)日:2002-09-03

    申请号:US09478123

    申请日:2000-01-05

    IPC分类号: B24B722

    CPC分类号: B24B37/30

    摘要: A carrier head for a chemical mechanical polishing apparatus. A layer of conformable material is disposed in a recess of the carrier head to provide a mounting surface for a substrate. The conformable material may be elastic and undergo normal strain in response to an applied load. The carrier head may also include a support fixture detachably connected to a backing fixture, a retaining ring connected directly to the conformable material, and a shield ring which projects over a portion of the layer of conformable material.

    摘要翻译: 用于化学机械抛光装置的载体头。 一层适形材料设置在承载头的凹槽中以提供用于基底的安装表面。 适形材料可以是弹性的并且响应于所施加的负载而经历正常应变。 承载头还可以包括可拆卸地连接到背衬固定件的支撑固定件,直接连接到适形材料的保持环,以及在适形材料层的一部分上突出的屏蔽环。