Method for manufacturing non-volatile memory devices integrated in a semiconductor substrate
    3.
    发明授权
    Method for manufacturing non-volatile memory devices integrated in a semiconductor substrate 有权
    用于制造集成在半导体衬底中的非易失性存储器件的方法

    公开(公告)号:US07419876B2

    公开(公告)日:2008-09-02

    申请号:US11319798

    申请日:2005-12-27

    IPC分类号: H01L21/336

    摘要: A method manufactures non-volatile memory devices integrated on a semiconductor substrate and including a matrix of non-volatile memory cells and associated circuitry. The manufacturing method includes: forming a plurality of electrodes of the matrix memory cells, each electrode including a first dielectric layer, a first conductive layer, a second dielectric layer and a second conductive layer; and forming a plurality of electrodes of transistors of the circuitry each including a first dielectric layer and a first conductive layer. The method also includes forming first coating spacers on the side walls of the gate electrodes of the memory cell and second coating spacers on the side walls of the gate electrodes of the circuitry, the second spacers being wider than the first spacers.

    摘要翻译: 一种方法制造集成在半导体衬底上并包括非易失性存储器单元矩阵和相关电路的非易失性存储器件。 该制造方法包括:形成矩阵存储单元的多个电极,每个电极包括第一介电层,第一导电层,第二介电层和第二导电层; 以及形成所述电路的多个晶体管的电极,每个电极包括第一介电层和第一导电层。 该方法还包括在存储单元的栅极电极的侧壁上形成第一涂覆间隔物和在电路的栅极电极的侧壁上的第二涂覆间隔物,第二间隔物比第一间隔物宽。

    Non-volatile memory
    10.
    发明授权
    Non-volatile memory 有权
    非易失性存储器

    公开(公告)号:US08211762B1

    公开(公告)日:2012-07-03

    申请号:US12512907

    申请日:2009-07-30

    CPC分类号: H01L29/7881 H01L27/11521

    摘要: Briefly, embodiments of non-volatile memory and embodiments of fabrication thereof are disclosed. For example, a non-volatile memory device having a gate assembly with a floating gate and a control gate assembly is described. The control gate assembly includes a non-metal conductive control gate and a metal control gate in one embodiment. Additional embodiments are described, including use of a sacrificial nitride layer and forming contact recesses to create source or drain contacts, as other examples.

    摘要翻译: 简而言之,公开了非易失性存储器的实施例及其制造的实施例。 例如,描述了具有带有浮动栅极和控制栅极组件的栅极组件的非易失性存储器件。 在一个实施例中,控制门组件包括非金属导电控制栅极和金属控制栅极。 描述了另外的实施例,包括使用牺牲氮化物层和形成接触凹部来产生源极或漏极接触,如其他示例。