Abstract:
Disclosed are semiconductor fabrication systems, chemical supply apparatuses, and substrate processing methods. The semiconductor fabrication system comprises a substrate processing apparatus and a chemical supply apparatus that supplies the substrate processing apparatus with a chemical. The chemical supply apparatus includes a main tank, a supply line that connects the main tank to an inlet of the substrate processing apparatus, a recycle tank connected to an outlet of the substrate processing apparatus, and a recycle filtering device between the recycle tank and the main tank. The recycle filtering device includes a photocatalytic reactor, a nanofilter between the photocatalytic reactor and the main tank, and a connection line that connects the photocatalytic reactor to the nanofilter.
Abstract:
A system including: a master device configured to generate a first signal having a periodic pulse, wherein the first signal includes data; and a slave device including a pin, a delay circuit, a buffer, and a processing circuit, wherein the slave device receives the first signal at the pin, delays the first signal with the delay circuit to generate a second signal having a first delay, delays the first signal with the buffer to generate a third signal having a second delay, and reads the data from the second signal using the third signal at the processing circuit.
Abstract:
A semiconductor integrated circuit includes a central processing unit, a hardware function block that outputs a plurality of hardware signals to be transmitted to an external device independently of the central processing unit, a virtual general purpose input/output (GPIO) finite state machine that transforms the plurality of hardware signals to a virtual GPIO payload, and an I3C communication block that transmits the virtual GPIO payload to the external device through a serial data line and a serial clock line.