Semiconductor device including a field effect transistor

    公开(公告)号:US10916535B2

    公开(公告)日:2021-02-09

    申请号:US16727280

    申请日:2019-12-26

    摘要: A semiconductor device includes a substrate having a plurality of active patterns. A plurality of gate electrodes intersects the plurality of active patterns. An active contact is electrically connected to the active patterns. A plurality of vias includes a first regular via and a first dummy via. A plurality of interconnection lines is disposed on the vias. The plurality of interconnection lines includes a first interconnection line disposed on both the first regular via and the first dummy via. The first interconnection line is electrically connected to the active contact through the first regular via. Each of the vias includes a via body portion and a via barrier portion covering a bottom surface and sidewalls of the via body portion. Each of the interconnection lines includes an interconnection line body portion and an interconnection line barrier portion covering a bottom surface and sidewalls of the interconnection line body portion.

    SEMICONDUCTOR DEVICE INCLUDING A FIELD EFFECT TRANSISTOR

    公开(公告)号:US20210143144A1

    公开(公告)日:2021-05-13

    申请号:US17154282

    申请日:2021-01-21

    摘要: A semiconductor device includes a substrate having a plurality of active patterns. A plurality of gate electrodes intersects the plurality of active patterns. An active contact is electrically connected to the active patterns. A plurality of vias includes a first regular via and a first dummy via. A plurality of interconnection lines is disposed on the vias. The plurality of interconnection lines includes a first interconnection line disposed on both the first regular via and the first dummy via. The first interconnection line is electrically connected to the active contact through the first regular via. Each of the vias includes a via body portion and a via barrier portion covering a bottom surface and sidewalls of the via body portion. Each of the interconnection lines includes an interconnection line body portion and an interconnection line barrier portion covering a bottom surface and sidewalls of the interconnection line body portion.

    Semiconductor device including a field effect transistor

    公开(公告)号:US10332870B2

    公开(公告)日:2019-06-25

    申请号:US15870143

    申请日:2018-01-12

    摘要: A semiconductor device includes a substrate having a plurality of active patterns. A plurality of gate electrodes intersects the plurality of active patterns. An active contact is electrically connected to the active patterns. A plurality of vias includes a first regular via and a first dummy via. A plurality of interconnection lines is disposed on the vias. The plurality of interconnection lines includes a first interconnection line disposed on both the first regular via and the first dummy via. The first interconnection line is electrically connected to the active contact through the first regular via. Each of the vias includes a via body portion and a via barrier portion covering a bottom surface and sidewalls of the via body portion. Each of the interconnection lines includes an interconnection line body portion and an interconnection line barrier portion covering a bottom surface and sidewalls of the interconnection line body portion.

    Semiconductor device including a field effect transistor

    公开(公告)号:US11557585B2

    公开(公告)日:2023-01-17

    申请号:US17154282

    申请日:2021-01-21

    摘要: A semiconductor device includes a substrate having a plurality of active patterns. A plurality of gate electrodes intersects the plurality of active patterns. An active contact is electrically connected to the active patterns. A plurality of vias includes a first regular via and a first dummy via. A plurality of interconnection lines is disposed on the vias. The plurality of interconnection lines includes a first interconnection line disposed on both the first regular via and the first dummy via. The first interconnection line is electrically connected to the active contact through the first regular via. Each of the vias includes a via body portion and a via barrier portion covering a bottom surface and sidewalls of the via body portion. Each of the interconnection lines includes an interconnection line body portion and an interconnection line barrier portion covering a bottom surface and sidewalls of the interconnection line body portion.

    Memory device of a single-ended bitline structure including reference voltage generator
    7.
    发明授权
    Memory device of a single-ended bitline structure including reference voltage generator 有权
    包含参考电压发生器的单端位线结构的存储器件

    公开(公告)号:US09524772B2

    公开(公告)日:2016-12-20

    申请号:US14793053

    申请日:2015-07-07

    摘要: A memory device includes a first memory cell array including memory cells of a single-ended bitline structure, a second memory cell array including memory cells of a single-ended bitline structure, a reference voltage generator configured to output a bitline voltage of a selected one of the first and second memory cell arrays as a sensing voltage according to an array select signal and output a bitline voltage of an unselected memory cell array as a reference voltage, and a differential sense amplifier configured to amplify and output a difference between the sensing voltage and the reference voltage. Logic states of the sensing voltage and the reference voltage are complementary to each other.

    摘要翻译: 存储器件包括包括单端位线结构的存储器单元的第一存储单元阵列,包括单端位线结构的存储单元的第二存储单元阵列,配置为输出所选择的位线的位线电压的参考电压发生器 的第一和第二存储单元阵列作为根据阵列选择信号的感测电压,并输出未选择的存储单元阵列的位线电压作为参考电压;以及差分读出放大器,被配置为放大和输出感测电压 和参考电压。 感测电压和参考电压的逻辑状态彼此互补。

    MEMORY DEVICE INCLUDING REFERENCE VOLTAGE GENERATOR
    10.
    发明申请
    MEMORY DEVICE INCLUDING REFERENCE VOLTAGE GENERATOR 有权
    包括参考电压发生器的存储器件

    公开(公告)号:US20160042785A1

    公开(公告)日:2016-02-11

    申请号:US14793053

    申请日:2015-07-07

    IPC分类号: G11C11/419 G11C11/418

    摘要: A memory device includes a first memory cell array including memory cells of a single-ended bitline structure, a second memory cell array including memory cells of a single-ended bitline structure, a reference voltage generator configured to output a bitline voltage of a selected one of the first and second memory cell arrays as a sensing voltage according to an array select signal and output a bitline voltage of an unselected memory cell array as a reference voltage, and a differential sense amplifier configured to amplify and output a difference between the sensing voltage and the reference voltage. Logic states of the sensing voltage and the reference voltage are complementary to each other.

    摘要翻译: 存储器件包括包括单端位线结构的存储器单元的第一存储单元阵列,包括单端位线结构的存储单元的第二存储单元阵列,配置为输出所选择的位线的位线电压的参考电压发生器 的第一和第二存储单元阵列作为根据阵列选择信号的感测电压,并输出未选择的存储单元阵列的位线电压作为参考电压;以及差分读出放大器,被配置为放大和输出感测电压 和参考电压。 感测电压和参考电压的逻辑状态彼此互补。