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    Vapor deposition apparatus, vapor deposition method and method of manufacturing organic light emitting display apparatus
    2.
    发明授权
    Vapor deposition apparatus, vapor deposition method and method of manufacturing organic light emitting display apparatus 有权
    蒸镀装置，蒸镀法及制造有机发光显示装置的方法

    公开(公告)号：US09481929B2

    公开(公告)日：2016-11-01

    申请号：US14177180

    申请日：2014-02-10

    申请人： Samsung Display Co., Ltd.

    发明人： Choel-Min Jang ,  Sung-Hun Key ,  In-Kyo Kim ,  Suk-Won Jung ,  Myung-Soo Huh

    IPC分类号： H01L21/36 ,  C23C16/455

    CPC分类号： C23C16/45551

    摘要： A vapor deposition apparatus for depositing thin films on a substrate includes a supply unit including a plurality of linear supply members configured to supply at least one gas; and a nozzle unit including a plurality of nozzle members connected to the plurality of supply members and configured to supply the at least one gas toward the substrate, wherein two adjacent nozzle members of the plurality of nozzle members are connected to at least one common supply member of the plurality of supply members.

    摘要翻译： 一种用于在衬底上沉积薄膜的气相沉积设备包括：供给单元，包括多个线性供应构件，其被构造成供应至少一种气体; 以及喷嘴单元，其包括连接到所述多个供应构件并被配置为朝向所述基板供应所述至少一种气体的多个喷嘴构件，其中所述多个喷嘴构件中的两个相邻的喷嘴构件连接到至少一个共同的供应构件 的多个供应构件。

    Canister
    3.
    发明授权
    Canister 有权
    罐

    公开(公告)号：US09057125B2

    公开(公告)日：2015-06-16

    申请号：US13710310

    申请日：2012-12-10

    申请人： SAMSUNG DISPLAY CO., LTD.

    发明人： Choel-Min Jang ,  Myung-Soo Huh ,  Suk-Won Jung ,  Sung-Yong Lee ,  Cheol-Rae Jo ,  In-Kyo Kim ,  Sung-Hun Key

    IPC分类号： B01F3/04 ,  C23C16/00 ,  C23C16/448

    CPC分类号： C23C16/00 ,  B01F3/04 ,  C23C16/4481 ,  C23C16/4482

    摘要： A canister includes an accommodation portion for accommodating a liquid material; an outlet pipe that is connected to the accommodation portion so as to discharge a gas material obtained by vaporizing the liquid material; a blocking cover that is connected to an upper surface of the accommodation portion; and a plurality of baffle plates that are disposed in the accommodation portion and are spaced apart from each other. The canister further includes a restrictor including a main body member that is disposed between the plurality of baffle plates and the blocking cover and is connected to an internal surface of the accommodation portion, an extension member extending from the main body member, and a through portion that is formed through the main body member and the extension member. A deposition procedure using the canister is efficiently performed and characteristics of a deposition layer are easily improved.

    摘要翻译： 罐包括用于容纳液体材料的容纳部分; 出口管，其连接到容纳部分，以排出通过汽化液体材料获得的气体材料; 阻挡盖，其连接到所述容纳部的上表面; 以及设置在容纳部分中并彼此间隔开的多个挡板。 所述罐还包括限制器，所述限制器包括主体部件，所述主体部件设置在所述多个挡板和所述阻挡盖之间，并且连接到所述容纳部的内表面，从所述主体部件延伸的延伸部件， 其通过主体构件和延伸构件形成。 可以有效地进行使用罐的沉积工序，容易地提高沉积层的特性。

    VAPOR DEPOSITION APPARATUS
    5.
    发明申请
    VAPOR DEPOSITION APPARATUS 审中-公开
    蒸气沉积装置

    公开(公告)号：US20150101535A1

    公开(公告)日：2015-04-16

    申请号：US14188017

    申请日：2014-02-24

    申请人： Samsung Display Co., Ltd.

    发明人： Sung-Yong Lee ,  Sung-Hun Key ,  In-Kyo Kim ,  Cheol-Min Jang ,  Myung-Soo Huh

    IPC分类号： C23C16/455 ,  C23C16/50 ,  C23C16/52

    CPC分类号： C23C16/45563 ,  C23C16/452 ,  C23C16/45536 ,  C23C16/45551

    摘要： A vapor deposition apparatus includes a substrate mount unit on which a substrate is mounted, a plurality of first nozzle units which injects a first raw material in a direction of the substrate mount unit, a plurality of second nozzle units which is alternately disposed with the plurality of first nozzle units and injects a second raw material in the direction of the substrate mount unit, and a plasma module unit which supplies the second raw material to the plurality of second nozzle units. The second raw material is a radical, and the substrate mount unit includes an electrostatic generation part.

    摘要翻译： 一种气相沉积设备，包括：基板安装单元，其上安装有基板;多个第一喷嘴单元，其在所述基板安装单元的方向上注入第一原料;多个第二喷嘴单元，其与所述多个第一喷嘴单元交替布置; 的第一喷嘴单元，并且在所述基板安装单元的方向上注入第二原料;以及等离子体模块单元，其将所述第二原料供给到所述多个第二喷嘴单元。 第二原料是自由基，基板安装单元包括静电发生部。

    VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD AND METHOD OF MANUFACTURING ORGANIC LIGHT EMITTING DISPLAY APPARATUS
    6.
    发明申请
    VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD AND METHOD OF MANUFACTURING ORGANIC LIGHT EMITTING DISPLAY APPARATUS 有权
    蒸气沉积装置，蒸气沉积方法及制造有机发光显示装置的方法

    公开(公告)号：US20150072453A1

    公开(公告)日：2015-03-12

    申请号：US14177180

    申请日：2014-02-10

    申请人： Samsung Display Co., Ltd.

    发明人： Choel-Min Jang ,  Sung-Hun Key ,  In-Kyo Kim ,  Suk-Won Jung ,  Myung-Soo Huh

    IPC分类号： H01L51/00 ,  H01L51/56

    CPC分类号： C23C16/45551

    摘要： A vapor deposition apparatus for depositing thin films on a substrate includes a supply unit including a plurality of linear supply members configured to supply at least one gas; and a nozzle unit including a plurality of nozzle members connected to the plurality of supply members and configured to supply the at least one gas toward the substrate, wherein two adjacent nozzle members of the plurality of nozzle members are connected to at least one common supply member of the plurality of supply members.

    摘要翻译： 一种用于在衬底上沉积薄膜的气相沉积设备包括：供给单元，包括多个线性供应构件，其被构造成供应至少一种气体; 以及喷嘴单元，其包括连接到所述多个供应构件并被配置为朝向所述基板供应所述至少一种气体的多个喷嘴构件，其中所述多个喷嘴构件中的两个相邻的喷嘴构件连接到至少一个共同的供应构件 的多个供应构件。

    VAPOR DEPOSITION APPARATUS
    7.
    发明申请
    VAPOR DEPOSITION APPARATUS 审中-公开
    蒸气沉积装置

    公开(公告)号：US20140053777A1

    公开(公告)日：2014-02-27

    申请号：US13689638

    申请日：2012-11-29

    申请人： SAMSUNG DISPLAY CO., LTD.

    发明人： Jai-Hyuk Choi ,  Myung-Soo Huh ,  Choel-Min Jang ,  Dong-Kyun Ko ,  In-Kyu Kim ,  Sung-Hun Key

    IPC分类号： C23C16/50

    CPC分类号： C23C16/50 ,  C23C16/45519 ,  C23C16/45536 ,  C23C16/45551

    摘要： A vapor deposition apparatus that includes a first region having a first injecting unit for injecting a first raw material and a second region having a second injecting unit for injecting a second raw material, wherein the second injecting unit comprises a plasma generation unit, wherein the plasma generation unit comprises a plasma generator, a corresponding surface surrounding the plasma generator, and a plasma generation space formed between the plasma generator and the corresponding surface, and wherein distances between the plasma generator and the corresponding surface periodically vary along an outer circumference of the plasma generator. In the vapor deposition apparatus, the quality of thin film is increased by forming stable volume plasma through set positions where the plasma is generated in the plasma generation space.

    摘要翻译： 一种蒸镀装置，其特征在于，具备：第一区域，具有用于注入第一原料的第一注入单元和具有用于注入第二原料的第二注入单元的第二区域，其中，所述第二注入单元包括等离子体产生单元， 生成单元包括等离子体发生器，围绕等离子体发生器的对应表面以及形成在等离子体发生器和对应表面之间的等离子体产生空间，并且其中等离子体发生器与对应表面之间的距离周期性地沿等离子体的外周变化 发电机。 在气相沉积装置中，通过在等离子体产生空间中产生等离子体的设定位置形成稳定的体积等离子体来提高薄膜的质量。

    Method of depositing an atomic layer
    8.
    发明授权
    Method of depositing an atomic layer 有权
    沉积原子层的方法

    公开(公告)号：US09556520B2

    公开(公告)日：2017-01-31

    申请号：US14296029

    申请日：2014-06-04

    申请人： Samsung Display Co., Ltd.

    发明人： Choel-Min Jang ,  Sung-Hun Key ,  In-Kyo Kim ,  Suk-Won Jung ,  Myung-Soo Huh

    IPC分类号： C23C16/455 ,  C23C16/458

    CPC分类号： C23C16/45574 ,  C23C16/45551 ,  C23C16/458

    摘要： A method of depositing a layer includes spraying a source gas and a reactant gas onto a substrate disposed on a susceptor unit using at least one source gas spray nozzle and at least one reactant gas nozzle to form a first source gas region and a first reactant gas region on the substrate, respectively, moving the susceptor unit by a distance corresponding to a width of the source gas spray nozzle or a width of the reactant gas spray nozzle in a first direction, and spraying the source gas and the reactant gas onto the first reactant gas region and the first source gas region using the source gas spray nozzle and the reactant gas nozzle, respectively, to form a first monolayer.

    摘要翻译： 沉积层的方法包括使用至少一个源气体喷嘴和至少一个反应气体喷嘴将源气体和反应气体喷射到设置在基座单元上的基板上，以形成第一源气体区域和第一反应气体 区域，分别使基座单元沿着第一方向移动对应于源气体喷嘴的宽度的距离或反应气体喷嘴的宽度，并将源气体和反应气体喷射到第一方向上 反应气体区域和第一源气体区域分别使用源气体喷嘴和反应气体喷嘴形成第一单层。