公开(公告)号：US20230026579A1

公开(公告)日：2023-01-26

申请号：US17733743

申请日：2022-04-29

Applicant: SAMSUNG SDI CO., LTD. ,  SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ran NAMGUNG ,  Shinhyo BAE ,  Hyeon PARK ,  Daeseok SONG ,  Minki CHON ,  Jun Soo KIM ,  Hyun-Woo KIM ,  Hyun-Ji SONG ,  Young Joo CHOI ,  Suk-Koo HONG

IPC: G03F7/11 ,  C08F220/28 ,  C09D133/16 ,  H01L21/027 ,  H01L21/311

Abstract: A method of forming a photoresist pattern and a semiconductor device on which a photoresist pattern manufactured according to the same is formed. The method includes forming a photoresist pattern on a substrate; coating an organic topcoat composition including an acrylic polymer including a structural unit containing a hydroxy group and a fluorine and an acidic compound on the photoresist pattern; drying and heating the substrate on which the organic topcoat composition is coated to coat it with a topcoat; and spraying a rinse solution including an ether-based compound on the substrate coated with the topcoat to remove the topcoat.

公开(公告)号：US20180033164A1

公开(公告)日：2018-02-01

申请号：US15664104

申请日：2017-07-31

Applicant: Samsung Electronics Co., Ltd.

Inventor： Young-Seung SEO ,  Hyun-Woo KIM ,  Eun-Yeung LEE

IPC: G06T11/00 ,  G09G5/02 ,  G09G5/10 ,  G06T11/60 ,  G06T7/90

CPC classification number: G06T11/001 ,  G06T7/90 ,  G06T11/60 ,  G06T2207/10024 ,  G09G5/026 ,  G09G5/10 ,  G09G5/377 ,  G09G2320/0626 ,  G09G2320/066 ,  G09G2320/0666 ,  G09G2320/0686 ,  G09G2340/10 ,  G09G2340/14 ,  G09G2370/022 ,  G09G2380/08

Abstract: An electronic device may include a display; and a processor that selects a first area where text is to be written on a first image displayed on the display, determines a representative color of the first area; determines a color of the text to contrast with the representative color, generates a second image for the first area including the text in the determined color, and displays the second image in the first area of the first image.

公开(公告)号：US20170153305A1

公开(公告)日：2017-06-01

申请号：US15366653

申请日：2016-12-01

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hyun-Woo KIM ,  Han Lim LEE ,  Ju Hyung LEE

IPC: G01R33/36 ,  G01R33/54 ,  G01R33/34

CPC classification number: G01R33/3664

Abstract: A device for switching a connection relationship between an input channel and an output channel group determined according to a selection mode, a magnetic resonance imaging (MRI) apparatus including the switching device, and a method for controlling the MRI apparatus are disclosed. The device includes: a plurality of input channels capable of being respectively connected to a plurality of coils, each of which receives a radio frequency (RF) signal from a target object to which a magnetic field is applied; a plurality of output channels capable of being connected to an image processor designed to generate a magnetic resonance image on the basis of the received RF signal; and a switching portion configured to switch a connection relationship between the plurality of input channels and the plurality of output channels. If a first mode or a second mode is selected, the switching portion performs switching so that a first output channel group including the plurality of output channels outputs, or so that a second output channel group including predetermined parts from among the plurality of output channels outputs, the RF signal.

公开(公告)号：US20170197440A1

公开(公告)日：2017-07-13

申请号：US15266619

申请日：2016-09-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hyun-Woo KIM ,  Yu Jin OH

IPC: B41J11/00 ,  B41J13/10

CPC classification number: B41J11/0005 ,  B41J2/32 ,  B41J13/10 ,  B41J15/042 ,  B41J15/044

Abstract: A cartridge for a recording medium and an image forming apparatus are provided. The image forming apparatus includes a housing, a printing unit disposed inside the housing, and having a thermal head with a heating element, and a cartridge for a recording medium, in which a recording medium wound in a roll shape is installed and which is provided to supply the recording medium to the printing unit, wherein the cartridge for a recording medium has a de-curl roller which guides the recording medium to be curved in a direction opposite to a winding direction, and is provided to be movable in a direction adjacent to the recording medium when the recording medium is supplied to the printing unit.

公开(公告)号：US20150030983A1

公开(公告)日：2015-01-29

申请号：US14444169

申请日：2014-07-28

Applicant: Shin-Etsu Chemical Co., Ltd. ,  SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jun HATAKEYAMA ,  Hyun-Woo KIM

IPC: G03F7/038 ,  C08F216/10 ,  G03F7/30

CPC classification number: G03F7/11 ,  C08F12/20 ,  C08F12/24 ,  C08F212/08 ,  C08F214/182 ,  C08F214/186 ,  C08F232/08 ,  C09D125/18 ,  G03F7/0392 ,  G03F7/09 ,  G03F7/091 ,  G03F7/2037 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/322 ,  C08F212/14

Abstract: A resist top coat composition includes a polymer including a base resin having a repeating unit p of styrene having a 1,1,1,3,3,3-hexafluoro-2-propanol group and a repeating unit q of acenaphthylene having chemical formula 1. R is hydrogen, hydroxyl. R1 is hydrogen, hydroxyl, linear or branched C1-C10-alkyl, cycloalkyl, acyloxy, alkoxycarbonyl, carboxyl, —OC(═O)R2. R2 is linear or branched C1-C10-alkyl, cycloalkyl or fluorinated alkyl. m is 1 or 2. p and q are positive numbers satisfying the expressions 0

Abstract translation: 抗蚀剂面漆组合物包括含有具有1,1,1,3,3,3-六氟-2-丙醇基的苯乙烯的重复单元p和具有化学式1的苊的重复单元q的基础树脂的聚合物 R是氢，羟基。 R 1是氢，羟基，直链或支链C 1 -C 10 - 烷基，环烷基，酰氧基，烷氧基羰基，羧基，-OC（= O）R 2。 R2是直链或支链C1-C10-烷基，环烷基或氟化烷基。 m为1或2. p和q为满足表达式0

公开(公告)号：US20230024422A1

公开(公告)日：2023-01-26

申请号：US17746811

申请日：2022-05-17

Applicant: SAMSUNG SDI CO., LTD. ,  SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ran NAMGUNG ,  Hyeon PARK ,  Minsoo KIM ,  Daeseok SONG ,  Minki CHON ,  Jun Soo KIM ,  Hyun-Woo KIM ,  Hyun-Ji SONG ,  Young Joo CHOI ,  Suk-Koo HONG

IPC: C09D133/08 ,  C09D133/16 ,  C07C309/80 ,  C07C53/18 ,  C07C53/21 ,  C07C53/23

Abstract: A resist topcoat composition includes an acrylic polymer including a structural unit containing a hydroxy group and a fluorine; a mixture including a sulfonic acid compound containing at least one fluorine and a carboxylic acid compound containing at least one fluorine in a weight ratio of about 1:0.1 to about 1:50; and a solvent. A method of forming patterns uses the resist topcoat composition to form a topcoat over a patterned substrate.

公开(公告)号：US20130346923A1

公开(公告)日：2013-12-26

申请号：US13925930

申请日：2013-06-25

Applicant: Samsung Electronics Co., Ltd.

Inventor： Han-Jun KU ,  Hyun-Woo KIM ,  Eun-Young CHO

IPC: G06F3/0484

CPC classification number: G06F3/04842 ,  G06F3/04817 ,  G06F3/0482 ,  G06F3/0488

Abstract: Disclosed is a method and apparatus for displaying a menu in a mobile device. An object generating event is detected for at least one selected menu item icon of at least one menu displayed on a touch screen. When the object generating event is detected, an object is generated and displayed, which performs an equivalent function to that of the at least one selected menu item icon.

Abstract translation: 公开了一种用于在移动设备中显示菜单的方法和装置。 对于在触摸屏上显示的至少一个菜单的至少一个选择的菜单项图标，检测到对象生成事件。 当检测到对象生成事件时，生成并显示对象，其执行与至少一个选择的菜单项图标的等效功能。

公开(公告)号：US20170256609A1

公开(公告)日：2017-09-07

申请号：US15296077

申请日：2016-10-18

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Krishna Kumar BHUWALKA ,  Seong-Je KIM ,  Jong-Chol KIM ,  Hyun-Woo KIM

IPC: H01L29/06 ,  H01L21/8234 ,  H01L29/66 ,  H01L29/423 ,  H01L29/10 ,  H01L27/088

CPC classification number: H01L29/0665 ,  B82Y10/00 ,  H01L29/0673 ,  H01L29/1037 ,  H01L29/42376 ,  H01L29/42392 ,  H01L29/66439 ,  H01L29/66545 ,  H01L29/775

Abstract: A semiconductor device includes a plurality of channels, source/drain layers, and a gate structure. The channels are sequentially stacked on a substrate and are spaced apart from each other in a first direction perpendicular to a top surface of the substrate. The source/drain layers are connected to the channels and are at opposite sides of the channels in a second direction parallel to the top surface of the substrate. The gate structure encloses the channels. The channels have different lengths in the second direction and different thicknesses in the first direction.

公开(公告)号：US20170244655A1

公开(公告)日：2017-08-24

申请号：US15435730

申请日：2017-02-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Tae-Yong MOON ,  Tae-Jun KIM ,  Hyun-Woo KIM ,  Young-Seung SEO ,  Yeon-Ju SONG ,  Hye-Won OH ,  Sang-Jin LEE ,  Seong-Joon CHO ,  Hyun-Bum JU ,  Jun-Kyu PARK ,  In-Wook SONG ,  Eun-Yeung LEE

IPC: H04L12/58

CPC classification number: H04L51/10 ,  G06Q10/101 ,  H04L12/185 ,  H04L51/046 ,  H04L51/08 ,  H04L51/14 ,  H04L51/32 ,  H04L51/34 ,  H04L65/1089 ,  H04L65/601 ,  H04L67/26

Abstract: According to various example embodiments, a method for sharing a content group of an electronic device may include transmitting, to a server, information for a request to share a content group; receiving an input selecting at least one contact with which the content group is to be shared; transmitting information on the at least one contact to the server; and changing the content group to a shared state when information on the acceptance of sharing the content group from at least one external electronic device corresponding to the at least one contact is received from the server, wherein the content group is capable of being updated by the electronic device or the at least one external electronic device.

公开(公告)号：US20150243520A1

公开(公告)日：2015-08-27

申请号：US14519813

申请日：2014-10-21

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jin PARK ,  Cha-Won KOH ,  Hyun-Woo KIM

IPC: H01L21/311

CPC classification number: H01L21/0273 ,  G03F7/26 ,  G03F7/38 ,  H01L21/02164 ,  H01L21/02277 ,  H01L21/0337 ,  H01L21/31058

Abstract: In a method of forming a pattern of a semiconductor device, a hard mask layer is formed on a substrate. A photoresist film is coated on the hard mask layer. The photoresist film is exposed and developed to form a first photoresist pattern. A smoothing process is performed on the first photoresist pattern to form a second photoresist pattern having a roughness property lower from that of the first photoresist pattern. In the smoothing process, a surface of the first photoresist pattern is treated with an organic solvent. An ALD layer is formed on a surface of the second photoresist pattern. The ALD layer is anisotropically etched to form an ALD layer pattern on a sidewall of the second photoresist pattern. The hard mask layer is etched using the second photoresist pattern and the ALD layer pattern as an etching mask to form a hard mask pattern.

Abstract translation: 在形成半导体器件的图案的方法中，在衬底上形成硬掩模层。 将光致抗蚀剂膜涂覆在硬掩模层上。 光致抗蚀剂膜被曝光和显影以形成第一光致抗蚀剂图案。 在第一光致抗蚀剂图案上进行平滑化处理以形成具有比第一光致抗蚀剂图案低的粗糙度特性的第二光致抗蚀剂图案。 在平滑处理中，用有机溶剂处理第一光致抗蚀剂图案的表面。 在第二光致抗蚀剂图案的表面上形成ALD层。 ALD层被各向异性蚀刻以在第二光致抗蚀剂图案的侧壁上形成ALD层图案。 使用第二光致抗蚀剂图案和ALD层图案作为蚀刻掩模蚀刻硬掩模层以形成硬掩模图案。