公开(公告)号：US20210147982A1

公开(公告)日：2021-05-20

申请号：US17159244

申请日：2021-01-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： MINKYU SUNG ,  SUNG-KI LEE ,  DOUGYONG SUNG ,  SANG-HO LEE ,  KANGMIN JEON

IPC: C23C16/455 ,  H01L21/683 ,  H01J37/32 ,  C23C16/509

Abstract: A gas injection module includes a showerhead having first injection holes on a first region of the showerhead and second injection holes on a second region of the showerhead, the second region being outside the first region, a first distribution plate on the showerhead and having first and second upper passages respectively connected to the first and second injection holes, and a flow rate controller on the first and second upper passages of the first distribution plate. The flow rate controller reduces a difference in pressure within the first and second upper passages so that the gas may have similar flow rates within the first and second injection holes.

公开(公告)号：US20230143327A1

公开(公告)日：2023-05-11

申请号：US17850478

申请日：2022-06-27

Applicant: Samsung Electronics Co., Ltd.

Inventor： DONGSEOK HAN ,  Seunghan BAEK ,  KYUNG-SUN KIM ,  Nam Kyun KIM ,  SANG KI NAM ,  KUIHYUN YOON ,  KANGMIN JEON

IPC: H01J37/32 ,  H01L21/683

CPC classification number: H01J37/32642 ,  H01J37/32724 ,  H01J37/32807 ,  H01L21/6833 ,  H01J2237/2007 ,  H01J2237/334

Abstract: Disclosed are focus rings, substrate processing apparatuses including the same, and substrate processing methods using the same. The focus ring comprises a first ring formed around an axis that extends in a first direction and a second ring separate from the first ring and formed around the axis. A portion of an inner lateral surface of the second ring is in contact with a portion of an outer lateral surface of the first ring. When viewed from a cross-sectional view from a direction perpendicular to the axis, a first angle between the outer lateral surface and the first direction is different from a second angle between the inner lateral surface and the first direction.

公开(公告)号：US20200157682A1

公开(公告)日：2020-05-21

申请号：US16509946

申请日：2019-07-12

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： MINKYU SUNG ,  SUNG-KI LEE ,  DOUGYONG SUNG ,  SANG-HO LEE ,  KANGMIN JEON

IPC: C23C16/455 ,  C23C16/509 ,  H01J37/32 ,  H01L21/683

Abstract: A gas injection module includes a showerhead having first injection holes on a first region of the showerhead and second injection holes on a second region of the showerhead, the second region being outside the first region, a first distribution plate on the showerhead and having first and second upper passages respectively connected to the first and second injection holes, and a flow rate controller on the first and second upper passages of the first distribution plate. The flow rate controller reduces a difference in pressure within the first and second upper passages so that the gas may have similar flow rates within the first and second injection holes.

公开(公告)号：US20160203996A1

公开(公告)日：2016-07-14

申请号：US15074290

申请日：2016-03-18

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： KANGMIN JEON ,  KYUNG-SUN KIM ,  DOUGYONG SUNG ,  TAE-HWA KIM ,  HEUNGSIK PARK ,  JUNG MIN KIM

IPC: H01L21/3065

CPC classification number: H01L21/3065 ,  H01J37/32449 ,  H01J37/32816 ,  H01J37/32834 ,  H01J37/32889 ,  H01J2237/332 ,  H01J2237/334 ,  H01L21/02118 ,  H01L21/02274 ,  H01L21/30655 ,  H01L21/31116 ,  H01L21/31138 ,  H01L21/32136 ,  H01L21/67069 ,  H01L27/11582

Abstract: Provided are a substrate manufacturing method and a substrate manufacturing apparatus used therefor. The substrate manufacturing method includes providing a substrate having a mask film into a chamber. A plasma reaction is induced in the chamber. A first gas and a second gas are alternately provided into the chamber to etch the substrate. Each of the first and second gases is provided into the chamber at a stabilized feed pressure including a pressure fluctuation profile comprising a square wave shape.

Abstract translation: 提供了一种基板制造方法和用于其的基板制造装置。 衬底制造方法包括将具有掩模膜的衬底提供到腔室中。 在室中诱导等离子体反应。 交替地将第一气体和第二气体提供到腔室中以蚀刻衬底。 第一和第二气体中的每一个以包括方波形状的压力波动分布的稳定的进料压力被提供到室中。