摘要:
A can for a lithium secondary battery and a lithium secondary battery using the same, where guide slots are formed in a bottom wall and a sidewall of the can of the lithium secondary battery so that the can is symmetrically bent about a longitudinal axis thereof when the lithium secondary battery is compressed in a direction orthogonal to the longitudinal axis, thus preventing a short circuit from occurring between electrode plates of the of the electrode assembly located within the can resulting in improved safety of the lithium secondary battery. Alternatively, embossing portions are formed in a bottom wall of the can for the lithium secondary battery while protruding toward an inner portion of the can, so that the bottom wall of the can is outwardly bent when the lithium secondary battery is subject to compression in a direction orthogonal to the longitudinal axis, resulting in improved safety of the lithium secondary battery.
摘要:
A can for a lithium secondary battery and a lithium secondary battery using the same, where guide slots are formed in a bottom wall and a sidewall of the can of the lithium secondary battery so that the can is symmetrically bent about a longitudinal axis thereof when the lithium secondary battery is compressed in a direction orthogonal to the longitudinal axis, thus preventing a short circuit from occurring between electrode plates of the of the electrode assembly located within the can resulting in improved safety of the lithium secondary battery. Alternatively, embossing portions are formed in a bottom wall of the can for the lithium secondary battery while protruding toward an inner portion of the can, so that the bottom wall of the can is outwardly bent when the lithium secondary battery is subject to compression in a direction orthogonal to the longitudinal axis, resulting in improved safety of the lithium secondary battery.
摘要:
An apparatus and method for beamforming of a terminal in a Multiple Input Multiple Output (MIMO) wireless communication system are provided. The method includes transmitting sounding signals beamformed through a plurality of beamforming weight vectors in sequence, receiving control information indicative of an uplink weight vector determined by a base station and a maximum channel quality value using the sounding signals and transmitting a transmit signal beamformed with the uplink weight vector via a plurality of antennas.
摘要:
Methods of forming a metal interconnection structure are provided. The methods include forming an insulating layer on a semiconductor substrate including a first metal interconnection. The insulating layer is patterned to form an opening that exposes the first metal interconnection. A first diffusion barrier layer is formed on the exposed first metal interconnection. After forming the first diffusion barrier layer, a second diffusion barrier layer is formed on the first diffusion barrier layer in the opening, the second diffusion barrier layer contacting a sidewall of the opening. A second metal interconnection is formed on the second diffusion barrier layer.
摘要:
A thin film forming apparatus according to the embodiment includes a plurality of vapor deposition sources respectively separated from each other, a plurality of nozzle bodies connected to upper portions of the respective vapor deposition sources, and a plurality of nozzles connected to upper portions of the respective nozzle bodies. A nozzle hole of each of the nozzles is formed on a same vapor deposition line. Thus, according to the embodiment, the first organic material and the second organic material respectively sprayed through a first nozzle hole and a second nozzle hole can be uniformly mixed by disposing the first nozzle hole and the second nozzle on the same vapor deposition line.
摘要:
Methods of forming a semiconductor device include providing a substrate having an area including a source and a drain region of a transistor. A nickel (Ni) metal film is formed on the substrate area including the source and the drain region. A first heat-treatment process is performed including heating the substrate including the metal film from a first temperature to a second temperature at a first ramping rate and holding the substrate including the metal film at the second temperature for a first period of time. A second heat-treatment process is then performed including heating the substrate including the metal film from a third temperature to a fourth temperature at a second ramping rate and holding the substrate at the fourth temperature for a second period of time. The fourth temperature is different from the second temperature and the second period of time is different from the first period of time. The sequentially performed first and second heat-treatment processes convert the Ni metal layer on the source and drain regions into a NiSi layer on the source and drain regions and a NiSi2 layer between the NiSi layer and the source and drain regions.
摘要:
In a method of forming an integrated circuit device, an opening is formed extending through a first and a second insulating layers and through a semiconductor layer therebetween to a surface of a substrate. The opening includes a recess in a sidewall thereof between the first and second insulating layers adjacent the semiconductor layer. A conductive plug is formed on the sidewall of the opening and on the surface of the substrate and laterally extending into the recess between the first and second insulating layers to contact the semiconductor layer. The semiconductor layer may be selectively etched at the sidewall without substantially etching the first and second insulating layers at the sidewall of the opening to form the recess between the first and second insulating layers. Related devices are also discussed.
摘要:
A semiconductor memory device and a method of fabricating the same are disclosed. The semiconductor memory device may include a conductive layer doped with impurities, a non-conductive layer on the conductive layer and undoped with impurities, an interlayer insulating film on the non-conductive layer and having a contact hole for exposing an upper surface of the non-conductive layer, an ohmic tungsten film on the contact hole, a lower portion of the ohmic tungsten film permeating the non-conductive layer to come in contact with the conductive layer, a tungsten nitride film on the contact hole on the ohmic tungsten film, and a tungsten film on the tungsten nitride film to fill the contact hole.
摘要:
Contacts having different characteristics may be created by forming a first silicide layer over a first device region of a substrate, and then forming a second silicide layer over a second device region while simultaneously further forming the first silicide layer. A first contact hole may be formed in a dielectric layer over a first device region of a substrate. A silicide layer may then be formed in the first contact hole. A second contact hole may be formed after the first contact hole and silicide layer is formed. A second silicidation may then be performed in the first and second contact holes.
摘要:
An organic light emitting device according to an exemplary embodiment of the present invention includes: a substrate; a first signal line and a second signal line formed on the substrate and intersecting each other; a common voltage line formed on the substrate, and intersecting one of the first signal line and the second signal line; a switching thin film transistor connected to the first signal line and the second signal line; a driving thin film transistor connected to the switching thin film transistor; an insulating layer covering the first signal line, the second signal line, the switching thin film transistor, and the driving thin film transistor; a pixel electrode formed on the insulating layer, and electrically connected to the driving thin film transistor; an organic light emitting member formed on the pixel electrode and including an emission layer and a member layer; and a common electrode formed on the organic light emitting member, wherein the member layer is made of a plurality of layers including electrons or holes, and at least one layer of the member layer is disposed between the common voltage line and the common electrode to electrically connect between the common voltage line and the common electrode.