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    Mask and method of creating mask as well as electron-beam exposure method and electron-beam exposure device
    1.
    发明授权
    Mask and method of creating mask as well as electron-beam exposure method and electron-beam exposure device 失效
    掩模和创建掩模的方法以及电子束曝光方法和电子束曝光装置

    公开(公告)号：US5952155A

    公开(公告)日：1999-09-14

    申请号：US119593

    申请日：1998-07-21

    申请人： Takayuki Sakakibara ,  Satoru Sagoh ,  Satoru Yamazaki ,  Kiichi Sakamoto ,  Hiroshi Yasuda

    发明人： Takayuki Sakakibara ,  Satoru Sagoh ,  Satoru Yamazaki ,  Kiichi Sakamoto ,  Hiroshi Yasuda

    IPC分类号： G03F1/20 ,  H01J37/317 ,  G03F9/00 ,  A61N5/00 ,  G03C5/00 ,  G21K5/10

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  H01J37/3174 ,  H01J2237/31764 ,  H01J2237/31788

    摘要： A device exposing an object to an electron beam employs a mask formed of a plate of material which blocks the electron beam and which has plural pattern exposure blocks defined therein, each having one or more aperture defining regions therein and, when selected, determining the shaping of the electron beam passing therethrough so as to expose a respective pattern on an object. Each aperture-defining region has a respective single aperture or respective plural, spaced apertures formed therein and having a total area size selected to be smaller than the area size of the aperture defining region, in accordance with controlling the current level of an electron beam passing therethrough, while reducing Coulomb interaction of the electron beam passing through the aperture or apertures of each aperture defining portion of the pattern exposure block.

    摘要翻译： 将物体暴露于电子束的装置使用由阻挡电子束的材料板形成的掩模，并且其中限定有多个图案曝光块，每个在其中具有一个或多个孔限定区域，并且当被选择时，确定成形 的电子束通过其中以使物体上的相应图案曝光。 根据控制电子束通过的电流水平，每个孔限定区域具有形成在其中的相应的单个孔或相应的多个间隔开的孔，并且其总面积尺寸被选择为小于孔限定区域的面积尺寸 同时减少通过孔的电子束或图案曝光块的每个孔限定部分的孔的库仑相互作用。

    Mask and method of creating mask as well as electron-beam exposure method and electron-beam exposure device
    3.
    发明授权
    Mask and method of creating mask as well as electron-beam exposure method and electron-beam exposure device 失效
    掩模和创建掩模的方法以及电子束曝光方法和电子束曝光装置

    公开(公告)号：US5824437A

    公开(公告)日：1998-10-20

    申请号：US685958

    申请日：1996-07-22

    申请人： Takayuki Sakakibara ,  Satoru Sagoh ,  Satoru Yamazaki ,  Kiichi Sakamoto ,  Hiroshi Yasuda

    发明人： Takayuki Sakakibara ,  Satoru Sagoh ,  Satoru Yamazaki ,  Kiichi Sakamoto ,  Hiroshi Yasuda

    IPC分类号： G03F1/20 ,  H01J37/317 ,  G03F9/00

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  H01J37/3174 ,  H01J2237/31764 ,  H01J2237/31788

    摘要： A mask for exposure of an object by an electron beam is formed of a plate of material which blocks the electron beam and which has plural pattern exposure blocks defined therein, each having one or more aperture defining regions therein and, when selected, determining the shaping of the electron beam passing therethrough so as to expose a respective pattern on an object. Each aperture-defining region has one aperture or plural, spaced apertures formed respectively therein, having a total area size, selected to be smaller than the area size of the aperture defining region in accordance with controlling the current level of an electron beam passing therethrough, while reducing Coulomb interaction of the electron beam passing through the aperture or apertures of each aperture defining portion of the pattern exposure block.

    摘要翻译： 用于通过电子束曝光物体的掩模由阻挡电子束并且其中限定有多个图案曝光块的材料板形成，每个在其中具有一个或多个孔限定区域，并且当被选择时，确定成形 的电子束通过其中以使物体上的相应图案曝光。 每个孔限定区域具有根据控制通过其中的电子束的电流水平而分别形成的具有总面积尺寸的一个孔径或多个间隔开的孔，其选择为小于孔限定区域的面积尺寸， 同时减少通过图案曝光块的每个孔限定部分的孔或孔的电子束的库仑相互作用。

    Pattern judging method, mask producing method, and method of dividing block pattern for use in block exposure
    4.
    发明授权
    Pattern judging method, mask producing method, and method of dividing block pattern for use in block exposure 失效
    图案判断方法，掩模制作方法以及块模块曝光中使用的块图案的分割方法

    公开(公告)号：US5537487A

    公开(公告)日：1996-07-16

    申请号：US257204

    申请日：1994-06-09

    申请人： Masaaki Miyajima ,  Hiroshi Yasuda ,  Satoru Yamazaki ,  Kiichi Sakamoto

    发明人： Masaaki Miyajima ,  Hiroshi Yasuda ,  Satoru Yamazaki ,  Kiichi Sakamoto

    IPC分类号： G06F17/50 ,  H01J37/302 ,  G06K9/00

    CPC分类号： G06F17/5081 ,  H01J37/3026

    摘要： A method of dividing a block pattern for use in a block exposure, to be implemented on a computer, divides an arbitrary block which is to be formed in a block mask that is used for the block exposure when the arbitrary block is judged as including a prohibiting pattern which is undesirable from a point of view of the block exposure. This method comprises the steps of (a) dividing the arbitrary block in a first direction to obtain a first block having a first dividing width along a second direction which is perpendicular to the first direction, (b) dividing a remaining block portion of the arbitrary block excluding the first block in the first direction to obtain a first divided portion having a second dividing width along the second direction, and merging the first dividing portion to the first block if the second dividing width is less than a predetermined width, and (c) searching the first block in the first direction after the step (b) and merging one of two adjacent first patterns within the first block to a second block if a pattern interval which is less than a predetermined value extends along the first direction between the first patterns.

    摘要翻译： 将要在计算机上实现的块曝光中使用的块图案分割的方法将当将任意块判断为包括一个块时将要用于块曝光的块掩模中形成的任意块划分为 从块曝光的观点来看，禁止图案是不期望的。 该方法包括以下步骤：（a）沿第一方向划分任意块以获得具有垂直于第一方向的第二方向具有第一分割宽度的第一块，（b）将任意块的剩余块部分 在第一方向排除第一块以获得沿着第二方向具有第二分割宽度的第一分割部分，并且如果第二分割宽度小于预定宽度，则将第一分割部分合并到第一块，并且（c ）在步骤（b）之后沿第一方向搜索第一块，并且如果小于预定值的图案间隔在第一块之间的第一方向上延伸，则将第一块内的两个相邻第一图案中的一个合并到第二块中 模式。

    Pattern judging method and mask producing method using the pattern judging method
    5.
    发明授权
    Pattern judging method and mask producing method using the pattern judging method 失效
    模式判断方法和使用模式判断方法的掩模制作方法

    公开(公告)号：US5347592A

    公开(公告)日：1994-09-13

    申请号：US917260

    申请日：1992-07-23

    申请人： Hiroshi Yasuda ,  Satoru Yamazaki ,  Kiichi Sakamoto

    发明人： Hiroshi Yasuda ,  Satoru Yamazaki ,  Kiichi Sakamoto

    IPC分类号： H01L21/027 ,  G03F1/20 ,  G06F17/50 ,  H01J37/302 ,  G06K9/00

    CPC分类号： G03F1/20 ,  G06F17/5081 ,  H01J37/3026

    摘要： A pattern judging method which is to be implemented on a computer automatically determines whether or not a pattern should be prohibited from being formed in a mask. The pattern judging method includes the steps of (a) dividing an area of the mask where a desired pattern is to be formed into a plurality of regions, (b) calculating a predetermined physical quantity for each of the regions for a case where one or a plurality of openings corresponding to the desired pattern are formed in the mask, and (c) prohibiting the desired pattern from being formed in the mask if the predetermined quantity calculated in the step (b) exceeds a threshold value for at least one of the regions.

    摘要翻译： 要在计算机上实现的模式判断方法自动地确定是否应该禁止在掩模中形成图案。 模式判断方法包括以下步骤：（a）将要形成的期望图案的掩模的区域划分为多个区域，（b）为每个区域计算一个或多个区域的情况下的预定物理量， 如果在步骤（b）中计算的预定量超过阈值中的至少一个，则在掩模中形成对应于期望图案的多个开口，和（c）禁止在掩模中形成期望的图案 地区。