公开(公告)号：US20170069345A1

公开(公告)日：2017-03-09

申请号：US14848442

申请日：2015-09-09

Applicant: Seagate Technology LLC

Inventor： Michael J. Stirniman ,  Xiaoding Ma ,  Paul M. Jones ,  Hamid R. Samani ,  Tommy T. Cheung ,  Christopher L. Platt ,  Qian Guo ,  Yang Yang

IPC: G11B5/725 ,  C23C16/56 ,  C23C16/48 ,  C23C16/26 ,  G11B5/84 ,  C23C16/50

CPC classification number: C23C16/56 ,  G11B5/8408

Abstract: Methods of forming a magnetic storage disc, the method including depositing a carbon containing material on a magnetic recording layer to form a carbon containing layer, wherein the carbon containing layer is deposited using chemical vapor deposition, ion beam deposition, or filtered cathodic arc deposition; treating the carbon containing layer with a source of oxygen to form an oxygen layer; and depositing a lubricant on the oxygen layer.

Abstract translation: 形成磁存储盘的方法，所述方法包括在磁记录层上沉积含碳材料以形成含碳层，其中使用化学气相沉积，离子束沉积或过滤的阴极电弧沉积沉积含碳层; 用氧源处理含碳层以形成氧层; 并在氧层上沉积润滑剂。

公开(公告)号：US20160163517A1

公开(公告)日：2016-06-09

申请号：US14939659

申请日：2015-11-12

Applicant: Seagate Technology LLC

Inventor： Samuel Lewis Tanaka ,  Christopher L. Platt ,  Thomas Larson Greenberg

IPC: H01J37/32 ,  H01K1/18

CPC classification number: H01J37/32568 ,  C23C16/26 ,  C23C16/50 ,  H01J37/3233 ,  H01J37/32403 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32541 ,  H01J2237/032 ,  H01J2237/3321 ,  H01K1/18

Abstract: A chemical vapor deposition source that includes at least one plate to which first and second electrical connection posts are coupled. The chemical vapor deposition source also includes a filament having a first end and a second end. The first end of the filament is electrically connected to the first electrical connection post and the second end of the filament is electrically connected to the second electrical connection post. The chemical vapor deposition source further includes at least one filament holder electrically insulated from the at least one plate. The at least one filament holder holds a portion of the filament between the first end and the second end.

Abstract translation: 化学气相沉积源，其包括至少一个板，第一和第二电连接柱与所述至少一个板连接。 化学气相沉积源还包括具有第一端和第二端的细丝。 灯丝的第一端电连接到第一电连接柱，灯丝的第二端电连接到第二电连接柱。 化学气相沉积源还包括与至少一个板电绝缘的至少一个灯丝架。 所述至少一个灯丝保持器将所述灯丝的一部分保持在所述第一端和所述第二端之间。

公开(公告)号：US09991099B2

公开(公告)日：2018-06-05

申请号：US14939659

申请日：2015-11-12

Applicant: Seagate Technology LLC

Inventor： Samuel Lewis Tanaka ,  Christopher L. Platt ,  Thomas Larson Greenberg

IPC: H01J37/32 ,  H01K1/18 ,  C23C16/26 ,  C23C16/50

CPC classification number: H01J37/32568 ,  C23C16/26 ,  C23C16/50 ,  H01J37/3233 ,  H01J37/32403 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32541 ,  H01J2237/032 ,  H01J2237/3321 ,  H01K1/18

Abstract: A chemical vapor deposition source that includes at least one plate to which first and second electrical connection posts are coupled. The chemical vapor deposition source also includes a filament having a first end and a second end. The first end of the filament is electrically connected to the first electrical connection post and the second end of the filament is electrically connected to the second electrical connection post. The chemical vapor deposition source further includes at least one filament holder electrically insulated from the at least one plate. The at least one filament holder holds a portion of the filament between the first end and the second end.

公开(公告)号：US20170040140A1

公开(公告)日：2017-02-09

申请号：US14820160

申请日：2015-08-06

Applicant: Seagate Technology LLC

Inventor： Samuel L. Tanaka ,  Christopher L. Platt ,  Thomas L. Greenberg

IPC: H01J37/07 ,  H01J37/02 ,  G11B5/85 ,  C23C16/50

CPC classification number: H01J37/07 ,  C23C16/50 ,  G11B5/85 ,  H01J37/023 ,  H01J37/32018 ,  H01J37/3266 ,  H01J37/32669 ,  H01J2237/3321

Abstract: Provided herein is an apparatus comprising a deposition chamber with a cathode, and a means for creating an asymmetric field about the cathode.

Abstract translation: 本文提供了一种包括具有阴极的沉积室和用于产生围绕阴极的不对称场的装置的装置。

公开(公告)号：US20160097118A1

公开(公告)日：2016-04-07

申请号：US14798570

申请日：2015-07-14

Applicant: Seagate Technology LLC

Inventor： Samuel L. Tanaka ,  Thomas L. Greenberg ,  Christopher L. Platt ,  Joseph Tong

IPC: C23C16/26 ,  C23C16/44 ,  H01J37/32 ,  C23C16/505

CPC classification number: C23C16/26 ,  C23C16/44 ,  C23C16/505 ,  H01J37/321 ,  H01J37/32403 ,  H01J37/32651 ,  H01J37/3266

Abstract: A deposition system may have at least a substrate mounted within a sealed chamber. A radio frequency energy can be supplied to an inductive source affixed to the sealed chamber with the inductive source having an inductive coil surrounding a tube. Coupling the radio frequency energy into a gas pumped into the sealed chamber creates plasma to uniformly deposit a thin layer on a surface of the substrate.

Abstract translation: 沉积系统可以具有安装在密封室内的至少一个衬底。 无线电频率能量可以被提供给固定到密封室的感应源，感应源具有围绕管的感应线圈。 将射频能量耦合到泵入密封室中的气体中产生等离子体以在基底的表面上均匀沉积薄层。