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    Master-oscillator power-amplifier (MOPA) excimer or molecular fluorine laser system with long optics lifetime
    1.
    发明申请
    Master-oscillator power-amplifier (MOPA) excimer or molecular fluorine laser system with long optics lifetime 有权
    具有长光学寿命的主振荡器功率放大器（MOPA）准分子或分子氟激光系统

    公开(公告)号：US20070115535A1

    公开(公告)日：2007-05-24

    申请号：US11654780

    申请日：2007-01-18

    申请人： Sergei Govorkov ,  Gongxue Hua ,  Timur Misuryaev ,  Alexander Wiessner ,  Thomas Schmidt ,  Rainer Paetzel

    发明人： Sergei Govorkov ,  Gongxue Hua ,  Timur Misuryaev ,  Alexander Wiessner ,  Thomas Schmidt ,  Rainer Paetzel

    IPC分类号： H01S3/00

    CPC分类号： G03F7/7055 ,  H01S3/0057 ,  H01S3/0835 ,  H01S3/235

    摘要： The lifetime of optical components used in deep-UV (DUV) excimer laser systems, including systems in a MOPA configuration, can be increased by reducing the intensity of pulses incident upon these components. In one approach, an output pulse can be “stretched” in order to reduce the peak power of the pulse. A pulse stretching component can be used, which can be mounted outside the laser enclosure with a horizontal beam path in order to provide a delay line with a minimum impact on the laser system footprint. The horizontal beam path also can minimize the number of optical components in the arm containing the high power beam. A beamsplitting prism can be used with the delay line to avoid the rapid degradation of coatings otherwise exposed to intense UV beams. The prism can expand the beam in the delay line in order to minimize beam intensity and losses due to reflection.

    摘要翻译： 包括在MOPA配置中的系统的深UV（DUV）准分子激光系统中使用的光学部件的寿命可以通过降低入射在这些部件上的脉冲的强度来增加。 在一种方法中，输出脉冲可以被“拉伸”，以便降低脉冲的峰值功率。 可以使用脉冲拉伸部件，其可以安装在具有水平光束路径的激光外壳外部，以便提供对激光系统占地面积具有最小影响的延迟线。 水平光束路径还可以使包含高功率光束的臂中的光学部件的数量最小化。 分束棱镜可以与延迟线一起使用，以避免涂层的快速退化，否则暴露于强烈的UV光束。 棱镜可以在延迟线中扩展光束，以便最小化光束强度和由于反射引起的损耗。

    Master-oscillator power-amplifier (MOPA) excimer or molecular fluorine laser system with long optics lifetime
    2.
    发明申请
    Master-oscillator power-amplifier (MOPA) excimer or molecular fluorine laser system with long optics lifetime 有权
    具有长光学寿命的主振荡器功率放大器（MOPA）准分子或分子氟激光系统

    公开(公告)号：US20050002425A1

    公开(公告)日：2005-01-06

    申请号：US10881103

    申请日：2004-06-30

    申请人： Sergei Govorkov ,  Gongxue Hua ,  Timur Misuryaev ,  Alexander Wiessner ,  Thomas Schmidt ,  Rainer Paetzel

    发明人： Sergei Govorkov ,  Gongxue Hua ,  Timur Misuryaev ,  Alexander Wiessner ,  Thomas Schmidt ,  Rainer Paetzel

    IPC分类号： H01S3/00 ,  H01S3/10 ,  H01S3/22

    CPC分类号： G03F7/7055 ,  H01S3/0057 ,  H01S3/0835 ,  H01S3/235

    摘要： The lifetime of optical components used in deep-UV (DUV) excimer laser systems, including systems in a MOPA configuration, can be increased by reducing the intensity of pulses incident upon these components. In one approach, an output pulse can be “stretched” in order to reduce the peak power of the pulse. A pulse stretching component can be used, which can be mounted outside the laser enclosure with a horizontal beam path in order to provide a delay line with a minimum impact on the laser system footprint. The horizontal beam path also can minimize the number of optical components in the arm containing the high power beam. A beamsplitting prism can be used with the delay line to avoid the rapid degradation of coatings otherwise exposed to intense UV beams. The prism can expand the beam in the delay line in order to minimize beam intensity and losses due to reflection.

    摘要翻译： 包括在MOPA配置中的系统的深UV（DUV）准分子激光系统中使用的光学部件的寿命可以通过降低入射到这些部件上的脉冲的强度来增加。 在一种方法中，输出脉冲可以被“拉伸”，以便降低脉冲的峰值功率。 可以使用脉冲拉伸部件，其可以安装在具有水平光束路径的激光外壳外部，以便提供对激光系统占地面积具有最小影响的延迟线。 水平光束路径还可以使包含高功率光束的臂中的光学部件的数量最小化。 分束棱镜可以与延迟线一起使用，以避免涂层的快速退化，否则暴露于强烈的UV光束。 棱镜可以在延迟线中扩展光束，以便最小化光束强度和由于反射引起的损耗。

    Master oscillator - power amplifier excimer laser system
    8.
    发明申请
    Master oscillator - power amplifier excimer laser system 有权
    主振荡器 - 功率放大器准分子激光系统

    公开(公告)号：US20060171439A1

    公开(公告)日：2006-08-03

    申请号：US11371411

    申请日：2006-03-09

    申请人： Sergei Govorkov ,  Rainer Paetzel

    发明人： Sergei Govorkov ,  Rainer Paetzel

    IPC分类号： H01S3/22

    CPC分类号： H01S3/2366 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/225 ,  H01S3/2325 ,  H01S3/2333 ,  H01S3/235

    摘要： A Master Oscillator (MO)—Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirements of advanced lithography scanner systems. A MOPA-based laser system can provide both high pulse energies and high spectral purity. A MOPA system can utilize a multi-pass PA, as well as a special beam path capable of reducing the amount of ASE (Amplified Spontaneous Emission) and feedback to the MO. Lithography scanner optics are primarily fused silica, such that the peak pulse power must be kept low to avoid material compaction when a MOPA system is used with lithography applications. This conflict between the demand for high average power and the low peak power requirement of the pulsed excimer laser source can be resolved by using a novel beam path to generate a sufficiently long pulse length.

    摘要翻译： 主振荡器（MO） - 功率放大器（PA）配置（MOPA）可以有利地用于微光刻应用的准分子激光系统，其中半导体制造商需要40W或更高的功率，以支持先进的吞吐量要求 光刻扫描仪系统。 基于MOPA的激光系统可以提供高脉冲能量和高光谱纯度。 MOPA系统可以利用多通道PA，以及能够减少ASE（放大自发发射）量和向MO的反馈的特殊光束路径。 平版印刷扫描仪光学器件主要是熔融石英，使得峰值脉冲功率必须保持较低，以避免当MOPA系统与光刻应用一起使用时的材料压实。 可以通过使用新颖的光束路径来产生足够长的脉冲长度来解决脉冲准分子激光源的高平均功率需求和低峰值功率需求之间的这种冲突。

    Excimer or molecular fluorine laser system with precision timing
    9.
    发明申请
    Excimer or molecular fluorine laser system with precision timing 有权
    准分子或分子氟激光系统具有精确时序

    公开(公告)号：US20050031004A1

    公开(公告)日：2005-02-10

    申请号：US10699763

    申请日：2003-11-03

    申请人： Dirk Basting ,  Sergei Govorkov ,  Rainer Paetzel ,  Igor Bragin ,  Andreas Targsdorf

    发明人： Dirk Basting ,  Sergei Govorkov ,  Rainer Paetzel ,  Igor Bragin ,  Andreas Targsdorf

    IPC分类号： H01S3/00 ,  H01S3/0971 ,  H01S3/22 ,  H01S3/225 ,  H01S3/23

    CPC分类号： H01S3/225 ,  H01S3/073 ,  H01S3/09702 ,  H01S3/09713 ,  H01S3/2258

    摘要： A Master Oscillator (MO)—Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirements of advanced lithography scanner systems. The timing of discharges in discharge chambers of the MO and PA can be precisely controlled using a common pulser to drive the respective chambers. The timing of the discharges further can be controlled through the timing of the pre-ionization in the chambers, or through control of the reset current in the final compression stages of the pulser. A common pulser, or separate pulser circuits, also can be actively controlled in time using a feedback loop, with precision timing being achieved through control of the pre-ionization in each individual discharge chamber. Yet another system provides for real-time compensation of time delay jitter of discharge pulses in the chambers.

    摘要翻译： 主振荡器（MO） - 功率放大器（PA）配置（MOPA）可以有利地用于微光刻应用的准分子激光系统，其中半导体制造商需要40W或更高的功率，以支持先进的吞吐量要求 光刻扫描仪系统。 可以使用公共脉冲发生器来精确地控制MO和PA的放电室中的放电定时以驱动各个室。 放电的时间进一步可以通过室内预电离的定时或通过控制脉冲发生器的最终压缩级中的复位电流来控制。 公共脉冲发生器或单独的脉冲发生器电路也可以使用反馈回路在时间上有效地控制，通过在每个单独的放电室中控制预电离来实现精确时序。 另一个系统提供对腔室中的放电脉冲的时间延迟抖动的实时补偿。

    Excimer or molecular fluorine laser system with precision timing
    10.
    发明授权
    Excimer or molecular fluorine laser system with precision timing 有权
    准分子或分子氟激光系统具有精确时序

    公开(公告)号：US07308013B2

    公开(公告)日：2007-12-11

    申请号：US10699763

    申请日：2003-11-03

    申请人： Dirk Basting ,  Sergei Govorkov ,  Rainer Paetzel ,  Igor Bragin ,  Andreas Targsdorf

    发明人： Dirk Basting ,  Sergei Govorkov ,  Rainer Paetzel ,  Igor Bragin ,  Andreas Targsdorf

    IPC分类号： H01S3/22

    CPC分类号： H01S3/225 ,  H01S3/073 ,  H01S3/09702 ,  H01S3/09713 ,  H01S3/2258

    摘要： A Master Oscillator (MO)—Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirements of advanced lithography scanner systems. The timing of discharges in discharge chambers of the MO and PA can be precisely controlled using a common pulser to drive the respective chambers. The timing of the discharges further can be controlled through the timing of the pre-ionization in the chambers, or through control of the reset current in the final compression stages of the pulser. A common pulser, or separate pulser circuits, also can be actively controlled in time using a feedback loop, with precision timing being achieved through control of the pre-ionization in each individual discharge chamber. Yet another system provides for real-time compensation of time delay jitter of discharge pulses in the chambers.

    摘要翻译： 主振荡器（MO） - 功率放大器（PA）配置（MOPA）可以有利地用于微光刻应用的准分子激光系统，其中半导体制造商需要40W或更高的功率，以支持先进的吞吐量要求 光刻扫描仪系统。 可以使用公共脉冲发生器来精确地控制MO和PA的放电室中的放电定时以驱动各个室。 放电的时间进一步可以通过室内预电离的定时或通过控制脉冲发生器的最终压缩级中的复位电流来控制。 公共脉冲发生器或单独的脉冲发生器电路也可以使用反馈回路在时间上有效地控制，通过在每个单独的放电室中控制预电离来实现精确定时。 另一个系统提供对腔室中的放电脉冲的时间延迟抖动的实时补偿。