公开(公告)号：US20060207537A1

公开(公告)日：2006-09-21

申请号：US11357087

申请日：2006-02-21

申请人： Shigeru Nakajima ,  Motoo Nakamura ,  Naoki Kira

发明人： Shigeru Nakajima ,  Motoo Nakamura ,  Naoki Kira

IPC分类号： F01L1/34

CPC分类号： F01L1/3442 ,  F01L1/024 ,  F01L2001/34483 ,  F16D1/101 ,  F16D3/04 ,  F16D25/061

摘要： A variable valve timing control device includes a housing member, a rotor member assembled on the housing member so as to rotate relative thereto, a vane provided on the rotor member, a fluid pressure chamber divided into an advanced angle chamber and a retarded angle chamber by the vane, a lock mechanism for restricting or allowing a relative rotation between the housing member and the rotor member by a lock member, a fluid pressure circuit for controlling an operation fluid to be supplied to or discharged from the advanced angle chamber, the retarded angle chamber, and the lock mechanism, a plate provided on the housing member and integrally rotating with the housing member, an engaging groove formed on the plate, and a contacting member arranged in the engaging groove so as to rotate integrally with the plate and engaging with a coupling member so as to be assembled thereon.

摘要翻译： 一种可变气门正时控制装置，包括壳体构件，组装在壳体构件上以相对于其旋转的转子构件，设置在转子构件上的叶片，被分为前进角室和延迟角室的流体压力室， 叶片，用于通过锁定构件限制或允许壳体构件和转子构件之间的相对旋转的锁定机构，用于控制要从提前角室供给或排出的操作流体的流体压力回路，延迟角 所述锁定机构，设置在所述壳体部件上并与所述壳体部件一体旋转的板，形成在所述板上的接合槽，以及设置在所述接合槽中以使其与所述板一体旋转并与 联接构件，以便组装在其上。

公开(公告)号：US06782854B2

公开(公告)日：2004-08-31

申请号：US10649619

申请日：2003-08-28

申请人： Motoo Nakamura ,  Shigeru Nakajima

发明人： Motoo Nakamura ,  Shigeru Nakajima

IPC分类号： F01L134

CPC分类号： F01L1/3442 ,  F01L2001/34473 ,  F01L2001/34479 ,  F01L2001/34483

摘要： A valve timing control device includes a rotation member for opening and closing values, a rotation transmitting member rotatably mounted on the rotation member, a fluid chamber defined between the rotation member and the rotation transmitting member, a vane fitted into a vane groove formed on the rotation member or the rotation transmitting member so as to divide the fluid chamber into a advance angle pressure chamber and a retard angle pressure chamber, the vane groove having contacting portions contacted with the vane and an elastic member disposed between the vane and the rotation member or the rotation transmitting member, wherein the radial length between the bottom portion of the vane groove and a bottom portion side end portion of the contacting portion is larger than a radial length between the bottom portion of the vane groove and an engaging portion of the vane engaged with the elastic member.

摘要翻译： 气门正时控制装置包括用于打开和关闭数值的旋转构件，可旋转地安装在旋转构件上的旋转传递构件，限定在旋转构件和旋转传递构件之间的流体室，安装在形成在旋转构件 旋转构件或旋转传递构件，以便将流体室分成提前角压力室和延迟角压力室，叶片槽具有与叶片接触的接触部分和设置在叶片和旋转构件之间的弹性构件， 旋转传递部件，其中，所述叶片槽的底部与所述接触部的底部侧端部之间的径向长度大于所述叶片槽的底部与所述叶片的接合部之间的径向长度， 与弹性构件。

公开(公告)号：US08124181B2

公开(公告)日：2012-02-28

申请号：US11907968

申请日：2007-10-18

申请人： Kazuhide Hasebe ,  Takehiko Fujita ,  Shigeru Nakajima ,  Jun Ogawa

发明人： Kazuhide Hasebe ,  Takehiko Fujita ,  Shigeru Nakajima ,  Jun Ogawa

IPC分类号： C23C16/40

CPC分类号： H01L21/67109 ,  H01L21/02238 ,  H01L21/02255 ,  H01L21/31662

摘要： An oxidation method includes supplying oxidizing and deoxidizing gases to a process field by spouting the gases in lateral directions respectively from first and second groups of gas spouting holes. Each group of holes is disposed adjacent to target substrates on one side of the process field and arrayed over a length corresponding to the process field in a vertical direction. Gases are exhausted through an exhaust port disposed opposite to the first and second groups of gas spouting holes with the process field interposed therebetween and present over a length corresponding to the process field in the vertical direction. This causes the gases to flow along the surfaces of the target substrates, thus forming gas flows parallel with the target substrates. The process field is heated by a heater disposed around the process container to generate oxygen radicals and hydroxyl group radicals within the process field.

摘要翻译： 氧化方法包括通过分别从第一和第二组气体喷射孔喷射气体在横向方向向工艺场提供氧化和脱氧气体。 每组孔与过程场一侧的目标衬底相邻设置，并且在垂直方向上排列在对应于过程场的长度上。 气体通过与第一和第二组气体喷射孔相对设置的排气口排出，其中过程场介于它们之间并且在垂直方向上存在超过对应于过程场的长度。 这使得气体沿着目标基板的表面流动，从而形成与目标基板平行的气体流。 工艺场由设置在加工容器周围的加热器加热，以在工艺场内产生氧自由基和羟基自由基。

公开(公告)号：US20110065280A1

公开(公告)日：2011-03-17

申请号：US12852543

申请日：2010-08-09

申请人： Shigeru Nakajima ,  Kazuhide Hasebe ,  Hidetami Yaegashi ,  Eiichi Nishimura

发明人： Shigeru Nakajima ,  Kazuhide Hasebe ,  Hidetami Yaegashi ,  Eiichi Nishimura

IPC分类号： H01L21/306

CPC分类号： H01L21/31144 ,  C23C16/26 ,  C23C16/34 ,  C23C16/45542 ,  H01J37/32082 ,  H01L21/02115 ,  H01L21/0217 ,  H01L21/02274 ,  H01L21/0228 ,  H01L21/0337 ,  H01L21/31122 ,  H01L21/32135

摘要： The method includes a film-forming process which forms a carbon film, to isotropically coat a surface of a silicon film pattern in which a first line portion formed of a silicon film that is formed on a target etching film on a substrate is arranged, an etchback process which etches back the carbon film such that the carbon film is removed from an upper portion of the first line portion and remains as a side wall portion of the first line portion, and a silicon film removing process which forms a mask pattern in which the side wall portion is arranged, by removing the first line portion.

摘要翻译： 该方法包括一个形成碳膜的成膜方法，以均匀地涂覆硅衬底上形成在靶蚀刻膜上的由硅膜形成的第一线部分的硅膜图案的表面， 回蚀处理，其蚀刻碳膜，使得碳膜从第一线部分的上部被去除并保留为第一线部分的侧壁部分，以及硅膜去除工艺，其形成掩模图案，其中 通过移除第一线部分来布置侧壁部分。

公开(公告)号：US20080163838A1

公开(公告)日：2008-07-10

申请号：US11885761

申请日：2006-02-10

申请人： Taiyu Iwata ,  Kenji Fujiwaki ,  Shigeru Nakajima

发明人： Taiyu Iwata ,  Kenji Fujiwaki ,  Shigeru Nakajima

IPC分类号： F01L1/344

CPC分类号： F01L1/022 ,  F01L1/3442 ,  F01L2001/34436 ,  F01L2001/34473 ,  F01L2001/34483

摘要： A valve timing control apparatus is provided having a locking mechanism that can minimize the accumulation of foreign material in a concave engagement part, can minimize the penetration of foreign material to the sliding parts of a locking member, and can reduce the sliding resistance of the locking member. A locking mechanism (5) is provided with a sliding groove (52) provided to an outer rotor (2); a locking member (53) capable of sliding along the sliding groove (52); and a concave engagement part (51) that is provided to the inner rotor (3), is formed to be capable of engaging with the locking member (53) in a state in which the phase of relative rotation is a lock phase, and has an inlet port (58) capable of introducing hydraulic fluid. Flow channels (57) for hydraulic fluid are provided to at least one of the sliding groove (52) and the locking member (53), are formed along the sliding direction of the locking member (53), and are communicatingly connected to the concave engagement part (51).

摘要翻译： 一种气门正时控制装置，其具有锁定机构，该锁定机构可使外部材料在凹形接合部分中的积聚最小化，能够最大限度地减少外部材料对锁定构件的滑动部分的渗透，并且可以降低锁定的滑动阻力 会员。 锁定机构（5）设置有设置在外转子（2）上的滑动槽（52）; 能够沿着滑动槽（52）滑动的锁定构件（53）。 以及设置在所述内转子（3）上的凹形卡合部（51），能够以相对旋转相位为锁定相的状态与所述卡定部件（53）卡合， 能够引入液压流体的入口（58）。 用于液压流体的流动通道（57）设置在滑动槽（52）和锁定构件（53）中的至少一个上，沿着锁定构件（53）的滑动方向形成，并且连通地连接到凹部 接合部（51）。

公开(公告)号：US20050245099A1

公开(公告)日：2005-11-03

申请号：US11110931

申请日：2005-04-21

申请人： Atsushi Endo ,  Tomonori Fujiwara ,  Yuichiro Morozumi ,  Katsushige Harada ,  Shigeru Nakajima ,  Dong-Kyun Choi ,  Haruhiko Furuya ,  Kazuo Yabe

发明人： Atsushi Endo ,  Tomonori Fujiwara ,  Yuichiro Morozumi ,  Katsushige Harada ,  Shigeru Nakajima ,  Dong-Kyun Choi ,  Haruhiko Furuya ,  Kazuo Yabe

IPC分类号： B08B5/00 ,  B08B7/00 ,  B08B7/04 ,  C23C16/00 ,  C23C16/44 ,  H01L21/304 ,  H01L21/3065 ,  H01L21/31 ,  H01L21/469

CPC分类号： B08B7/0035 ,  C23C16/4405 ,  Y10S438/90

摘要： A method of using a film formation apparatus for a semiconductor process includes a step of removing a by-product film deposited on an inner surface of a reaction chamber of the film formation apparatus. This step is performed while supplying a cleaning gas containing hydrogen fluoride into the reaction chamber, and forming a first atmosphere within the reaction chamber, which allows water to be present as a liquid film.

摘要翻译： 使用半导体工艺的成膜装置的方法包括除去沉积在成膜装置的反应室的内表面上的副产物膜的步骤。 在向反应室供给含有氟化氢的清洁气体的同时进行该步骤，并且在反应室内形成允许水以液膜形式存在的第一气氛。

公开(公告)号：US20050087713A1

公开(公告)日：2005-04-28

申请号：US10927393

申请日：2004-08-27

申请人： Yoshiyuki Kawai ,  Masaki Kobayashi ,  Shigeru Nakajima

发明人： Yoshiyuki Kawai ,  Masaki Kobayashi ,  Shigeru Nakajima

IPC分类号： F01L1/34 ,  F01L1/344 ,  F16K35/00

CPC分类号： F01L1/3442 ,  F01L1/022 ,  F01L2001/34453 ,  F01L2001/34483

摘要： A valve opening-closing timing control device includes a housing member rotating together with one of a cam shaft and a crank shaft of a combustion engine, a rotor member rotatably attached to said housing member; and rotating together with the other of said crank shaft and said cam shaft, a hydraulic pressure chamber formed between said housing member and said rotor member, the hydraulic pressure chamber being divided into an advance angle hydraulic chamber and a retard angle hydraulic chamber by a vane integrally provided with said rotor member, a lock mechanism including a lock member movably provided at the housing member and a receiving portion formed at said rotor member for receiving the lock member, whereby the lock mechanism restricts a relative rotation between the rotor member and the housing member by advancing the lock member into the receiving portion and allows the relative rotation between the rotor member and the housing member by retracting the lock member from the receiving portion, a hydraulic pressure circuit for supplying hydraulic fluid to said advance angle hydraulic chamber, said retard angle hydraulic chamber, and said lock mechanism, and a projecting portion formed at a bottom of said receiving portion and including a top end face smaller than a sectional area of said lock member.

摘要翻译： 一种开阀正时控制装置，包括与内燃机的凸轮轴和曲轴中的一个一起旋转的壳体构件，可旋转地附接到所述壳体构件的转子构件; 并与所述曲轴和所述凸轮轴中的另一个一起旋转，形成在所述壳体构件和所述转子构件之间的液压室，所述液压室被叶片分为前进角液压室和延迟角液压室 与所述转子构件一体设置的锁定机构，包括可移动地设置在所述壳体构件上的锁定构件和形成在所述转子构件处的用于接收所述锁定构件的容纳部的锁定机构，由此所述锁定机构限制所述转子构件与所述壳体之间的相对旋转 构件，其通过使所述锁定构件进入所述接收部，并且通过使所述锁定构件从所述接收部收回而允许所述转子构件与所述壳体构件之间的相对旋转;液压回路，用于向所述提前角液压室供给液压流体，所述延迟 角度液压室和所述锁定机构，以及形成在其上的突出部分 所述接收部分的底部包括小于所述锁定构件的截面面积的顶端面。

公开(公告)号：US06482720B2

公开(公告)日：2002-11-19

申请号：US09842319

申请日：2001-04-26

申请人： Takashi Sugino ,  Shigeru Nakajima

发明人： Takashi Sugino ,  Shigeru Nakajima

IPC分类号： H01L21322

CPC分类号： H01L29/66462 ,  H01L21/306

摘要： In manufacturing compound semiconductor device, a plasma treatment is carried out by exposing surface of compound semiconductor material including AlAs or InAs exposing in atmosphere at manufacturing process in plasma of gas including any of P, N, H, and Ar at substrate temperature of less than 200° C. Desirably a second plasma treatment is carried out by exposing said compound semiconductor material in plasma of gas including p at higher substrate temperature continuously after said plasma treatment without taking the substrate out in air.

公开(公告)号：US5878782A

公开(公告)日：1999-03-09

申请号：US703873

申请日：1996-08-27

申请人： Shigeru Nakajima

发明人： Shigeru Nakajima

IPC分类号： F01L1/34 ,  F01L1/344 ,  F16K11/07 ,  F16K31/06 ,  F15B13/044

CPC分类号： F16K31/0613 ,  F01L1/3442 ,  F16K11/0716 ,  F01L2001/34426 ,  Y10T137/86622 ,  Y10T137/86702

摘要： A switching valve has a cylindrical housing including a bore, an inlet port, a first inlet-outlet port, and a second inlet-outlet port which open to the hollow. A valve member slidably disposed in the bore has a ringed groove around its periphery. The valve member can open or block a portion between the groove and the first inlet-outlet port and a portion between the groove and the second inlet-outlet port. The groove formed outside the valve member always communicates with the inlet port and can communicate with the first and second inlet-outlet ports. A single drain port is formed within the valve member so that the single drain port can communicate with the first and second inlet-outlet ports. The valve member is caused to slide by a solenoid.

摘要翻译： 切换阀具有圆柱形壳体，该圆柱形壳体包括孔，入口，第一入口 - 出口和向中空开口的第二入口 - 出口。 可滑动地设置在孔中的阀构件具有围绕其周边的环形槽。 阀构件可以打开或阻挡凹槽和第一入口 - 出口之间的部分以及凹槽和第二入口 - 出口之间的部分。 形成在阀构件外部的凹槽总是与入口连通并且可以与第一和第二入口 - 出口连通。 单个排出口形成在阀构件内，使得单个排出口能够与第一和第二入口 - 出口连通。 阀构件被螺线管滑动。

公开(公告)号：US5783304A

公开(公告)日：1998-07-21

申请号：US796815

申请日：1997-02-06

申请人： Shigeru Nakajima ,  Mitsuru Wakitani

发明人： Shigeru Nakajima ,  Mitsuru Wakitani

IPC分类号： D06M11/00 ,  A61L9/01 ,  A61L9/16 ,  B01D53/04 ,  B01J20/28 ,  D01F6/18 ,  D06M11/63 ,  D06M23/00 ,  D06M101/00 ,  D06M101/16 ,  D06M101/18 ,  D06M101/28 ,  D06M101/32 ,  D02G3/00

CPC分类号： B01J20/28023 ,  A61L9/01 ,  A61L9/16 ,  B01D53/02 ,  B01J20/28033 ,  D01F6/18 ,  D06M11/63 ,  B01D2253/202 ,  B01D2253/25 ,  B01D2257/406 ,  B01D2257/90 ,  Y10T428/2913 ,  Y10T428/2969 ,  Y10T442/2885

摘要： Disclosed are acidic or basic gas absorptive fiber having both a degree of acidic gas absorption of 70% or higher and a degree of basic gas absorption of 80% or higher, and also fabric comprising the fiber. The fiber and fabric, after having absorbed acidic and basic gases, can easily be restored to its original condition if they are exposed to clean air. The fiber is preferably crosslinked acrylic fiber, which has a specific increase in its nitrogen content resulting from crosslinking with hydrazine, a specific amount of carboxyl groups resulting from modification with nitrile groups, a specific ratio of free carboxyl groups to all carboxyl groups existing therein, and a specific equilibrated pH in water, and which is prepared from acrylic fiber through crosslinking with hydrazine, hydrolysis, and conversion of carboxyl groups therein into metal carboxylate groups. The fiber and fabric are durable to cycle use.

摘要翻译： 公开了酸性气体吸收度为70％以上，碱性气体吸收度为80％以上的酸性或碱性气体吸收性纤维，以及包含纤维的织物。 在吸收酸性和碱性气体后，纤维和织物如果暴露于清洁空气中，可以很容易地恢复到原来的状态。 纤维优选是交联的丙烯酸纤维，其由于与肼交联而产生的氮含量特异性增加，由腈基修饰产生的特定量的羧基，游离羧基与存在于其中的所有羧基的比例， 和水中的特定平衡pH，并且其由丙烯酸纤维通过与肼交联制备，水解和羧基转化为金属羧酸盐基团。 纤维和织物耐用循环使用。