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    Integrated substrate transfer module
    1.
    发明授权
    Integrated substrate transfer module 有权
    集成基板传输模块

    公开(公告)号：US07330021B2

    公开(公告)日：2008-02-12

    申请号：US11018236

    申请日：2004-12-21

    申请人： Shinichi Kurita ,  Emanuel Beer ,  Hung T. Nguyen ,  Benjamin Johnston ,  Fayez E. Abboud

    发明人： Shinichi Kurita ,  Emanuel Beer ,  Hung T. Nguyen ,  Benjamin Johnston ,  Fayez E. Abboud

    IPC分类号： G01R13/04

    CPC分类号： G09G3/006 ,  G01R31/2893 ,  G01R31/305

    摘要： A substrate table and method for supporting and transferring a substrate are provided. The substrate table includes a segmented stage having an upper surface for supporting a substrate, and an end effector. The end effector includes two or more spaced apart fingers and an upper surface for supporting a substrate. The end effector is at least partially disposed and moveable within the segmented stage such that the fingers of the end effector and the segmented stage interdigitate to occupy the same horizontal plane. The segmented stage is adapted to raise and lower about the end effector.

    摘要翻译： 提供了用于支撑和转移衬底的衬底台和方法。 衬底台包括具有用于支撑衬底的上表面的分段段和端部执行器。 末端执行器包括两个或更多间隔开的指状物和用于支撑基底的上表面。 末端执行器至少部分地设置并在分段台内移动，使得末端执行器和分段台阶的指状物相互指向以占据相同的水平面。 分段段适于围绕末端执行器升高和降低。

    Integrated substrate transfer module
    2.
    发明授权
    Integrated substrate transfer module 有权
    集成基板传输模块

    公开(公告)号：US07919972B2

    公开(公告)日：2011-04-05

    申请号：US12016834

    申请日：2008-01-18

    申请人： Shinichi Kurita ,  Emanuel Beer ,  Hung T. Nguyen ,  Benjamin Johnston ,  Fayez E. Abboud

    发明人： Shinichi Kurita ,  Emanuel Beer ,  Hung T. Nguyen ,  Benjamin Johnston ,  Fayez E. Abboud

    IPC分类号： G01R13/00 ,  G01R31/02

    CPC分类号： G09G3/006 ,  G01R31/2893 ,  G01R31/305

    摘要： A system and method for supporting and transferring a substrate relative to a plurality of testing columns are provided. The system includes a testing table adapted to support and move the substrate relative to the plurality of testing columns. The testing table may include an end effector disposed therein to transfer the substrate relative to an upper surface of the testing table. The method includes transferring the substrate to the testing table and moving the substrate relative to the plurality of testing columns. Signals indicative of electronic device performance are sensed to determine operability of the devices on the substrate.

    摘要翻译： 提供了一种用于相对于多个测试柱支撑和传送衬底的系统和方法。 该系统包括适于相对于多个测试柱支撑和移动衬底的测试台。 测试台可以包括设置在其中的端部执行器，以相对于测试台的上表面传送衬底。 该方法包括将衬底转移到测试台并相对于多个测试柱移动衬底。 感测指示电子设备性能的信号以确定衬底上的器件的可操作性。

    Electron beam test system with integrated substrate transfer module
    3.
    发明授权
    Electron beam test system with integrated substrate transfer module 有权
    具有集成衬底传输模块的电子束测试系统

    公开(公告)号：US06833717B1

    公开(公告)日：2004-12-21

    申请号：US10778982

    申请日：2004-02-12

    申请人： Shinichi Kurita ,  Emanuel Beer ,  Hung T. Nguyen ,  Benjamin Johnston

    发明人： Shinichi Kurita ,  Emanuel Beer ,  Hung T. Nguyen ,  Benjamin Johnston

    IPC分类号： G01R31305

    CPC分类号： G09G3/006 ,  G01R31/2893 ,  G01R31/305

    摘要： A method and integrated system for electron beam testing a substrate is provided. In one aspect, the integrated system includes a transfer chamber having a substrate table disposed therein. The substrate table is capable of moving a substrate within the testing chamber in both horizontal and vertical directions. The substrate table includes a first stage moveable in a first dimension, a second stage moveable in a second dimension, and a third stage moveable in a third dimension. Each stage moves independently in its respective dimension. The system also includes a load lock chamber disposed adjacent a first side of the testing chamber, and a prober storage assembly disposed beneath the testing chamber. A prober stack assembly is disposed adjacent a second side of the testing chamber and arranged to transfer one or more probers between the prober storage assembly and the testing chamber. Further, one or more electron beam testing devices are disposed on an upper surface of the testing chamber.

    摘要翻译： 提供了一种用于电子束测试衬底的方法和集成系统。 一方面，集成系统包括具有设置在其中的衬底台的传送室。 衬底台能够在水平和垂直方向上移动测试室内的衬底。 基板台包括可在第一维度上移动的第一阶段，可在第二维度中移动的第二阶段和可在第三维度上移动的第三阶段。 每个阶段在其各自的维度上独立地移动。 该系统还包括邻近测试室的第一侧设置的负载锁定室，以及设置在测试室下方的探测器存储组件。 探测器堆叠组件设置在测试室的第二侧附近，并布置成在探测器存储组件和测试室之间传送一个或多个探测器。 此外，一个或多个电子束测试装置设置在测试室的上表面上。

    Transfer chamber for vacuum processing system
    4.
    发明授权
    Transfer chamber for vacuum processing system 有权
    真空处理系统传送室

    公开(公告)号：US08033772B2

    公开(公告)日：2011-10-11

    申请号：US11386257

    申请日：2006-03-21

    申请人： Shinichi Kurita ,  Emanuel Beer ,  Hung T. Nguyen ,  Wendell T. Blonigan

    发明人： Shinichi Kurita ,  Emanuel Beer ,  Hung T. Nguyen ,  Wendell T. Blonigan

    IPC分类号： C23C14/34 ,  C23C16/00 ,  B65H1/00

    CPC分类号： H01L21/67196 ,  C23C14/566 ,  C23C16/54 ,  H01L21/67126 ,  H01L21/67739 ,  H01L21/67748 ,  Y10S414/135

    摘要： A transfer chamber for a substrate processing tool includes a main body having side walls adapted to couple to at least one processing chamber and at least one load lock chamber. The main body houses at least a portion of a robot adapted to transport a substrate between the processing chamber and the load lock chamber. A lid couples to and seals a top of the main body of the transfer chamber. The transfer chamber also has a domed bottom adapted to couple to and to seal a bottom portion of the main body of the transfer chamber.

    摘要翻译： 用于基板处理工具的传送室包括具有适于耦合到至少一个处理室和至少一个装载锁定室的侧壁的主体。 主体容纳至少一部分适于在处理室和加载锁定室之间输送基板的机器人。 盖子连接到并密封传送室主体的顶部。 传送室还具有适于联接到传送室的主体的底部并且密封传送室的主体的底部的圆顶形底部。

    Transfer chamber for vacuum processing system
    5.
    发明授权
    Transfer chamber for vacuum processing system 有权
    真空处理系统传送室

    公开(公告)号：US07018517B2

    公开(公告)日：2006-03-28

    申请号：US10601185

    申请日：2003-06-20

    申请人： Shinichi Kurita ,  Emanuel Beer ,  Hung T. Nguyen ,  Wendell T. Blonigan

    发明人： Shinichi Kurita ,  Emanuel Beer ,  Hung T. Nguyen ,  Wendell T. Blonigan

    IPC分类号： C23C14/34 ,  C23C16/00

    CPC分类号： H01L21/67196 ,  C23C14/566 ,  C23C16/54 ,  H01L21/67126 ,  H01L21/67739 ,  H01L21/67748 ,  Y10S414/135

    摘要： A transfer chamber for a substrate processing tool includes a main body having side walls adapted to couple to at least one processing chamber and at least one load lock chamber. The main body houses at least a portion of a robot adapted to transport a substrate between the processing chamber and the load lock chamber. A lid couples to and seals a top of the main body of the transfer chamber. The transfer chamber also has a domed bottom adapted to couple to and to seal a bottom portion of the main body of the transfer chamber.

    摘要翻译： 用于基板处理工具的传送室包括具有适于耦合到至少一个处理室和至少一个装载锁定室的侧壁的主体。 主体容纳至少一部分适于在处理室和加载锁定室之间输送基板的机器人。 盖子连接到并密封传送室主体的顶部。 传送室还具有适于联接到传送室的主体的底部并且密封传送室的主体的底部的圆顶形底部。

    Substrate support
    7.
    发明授权
    Substrate support 失效
    基材支持

    公开(公告)号：US07735710B2

    公开(公告)日：2010-06-15

    申请号：US10990094

    申请日：2004-11-16

    申请人： Shinichi Kurita ,  Wendell T. Blonigan ,  Suhail Anwar ,  Toshio Kiyotake ,  Hung T. Nguyen

    发明人： Shinichi Kurita ,  Wendell T. Blonigan ,  Suhail Anwar ,  Toshio Kiyotake ,  Hung T. Nguyen

    IPC分类号： H01L21/68

    CPC分类号： H01L21/68 ,  H01L21/68728 ,  H01L21/68778 ,  H01L21/68792 ,  Y10S414/136 ,  Y10S414/139 ,  Y10S414/141

    摘要： A method and apparatus for supporting a substrate is generally provided. In one aspect, an apparatus for supporting a substrate includes a support plate having a first body disposed proximate thereto. A first pushing member is radially coupled to the first body and adapted to urge the substrate in a first direction parallel to the support plate when the first body rotates. In another aspect, a load lock chamber having a substrate support that supports a substrate placed thereon includes a cooling plate that is moved to actuate at least one alignment mechanism. The alignment mechanism includes a pushing member that urges the substrate in a first direction towards a center of the support. The pushing member may additionally rotate about an axis perpendicular to the first direction.

    摘要翻译： 通常提供用于支撑衬底的方法和装置。 在一个方面，一种用于支撑衬底的装置包括具有靠近其设置的第一主体的支撑板。 第一推动构件径向耦合到第一主体并且适于在第一主体旋转时沿平行于支撑板的第一方向推动基板。 在另一方面，具有支撑其上放置的基板的基板支撑件的装载锁定室包括移动以致动至少一个对准机构的冷却板。 对准机构包括推动构件，其沿朝向支撑件的中心的第一方向推动基板。 推动构件可以另外围绕垂直于第一方向的轴旋转。

    Substrate support
    8.
    发明授权
    Substrate support 有权
    基材支持

    公开(公告)号：US06824343B2

    公开(公告)日：2004-11-30

    申请号：US10084762

    申请日：2002-02-22

    申请人： Shinichi Kurita ,  Wendell T. Blonigan ,  Suhail Anwar ,  Toshio Kiyotake ,  Hung T. Nguyen

    发明人： Shinichi Kurita ,  Wendell T. Blonigan ,  Suhail Anwar ,  Toshio Kiyotake ,  Hung T. Nguyen

    IPC分类号： B65G4724

    CPC分类号： H01L21/68 ,  H01L21/68728 ,  H01L21/68778 ,  H01L21/68792 ,  Y10S414/136 ,  Y10S414/139 ,  Y10S414/141

    摘要： A method and apparatus for supporting a substrate is generally provided. In one aspect, an apparatus for supporting a substrate includes a support plate having a first body disposed proximate thereto. A first pushing member is radially coupled to the first body and adapted to urge the substrate in a first direction parallel to the support plate when the first body rotates. In another aspect, a load lock chamber having a substrate support that supports a substrate placed thereon includes a cooling plate that is moved to actuate at least one alignment mechanism. The alignment mechanism includes a pushing member that urges the substrate in a first direction towards a center of the support. The pushing member may additionally rotate about an axis perpendicular to the first direction.

    摘要翻译： 通常提供用于支撑衬底的方法和装置。 在一个方面，一种用于支撑衬底的装置包括具有靠近其设置的第一主体的支撑板。 第一推动构件径向耦合到第一主体并且适于在第一主体旋转时沿平行于支撑板的第一方向推动基板。 在另一方面，具有支撑其上放置的基板的基板支撑件的装载锁定室包括移动以致动至少一个对准机构的冷却板。 对准机构包括推动构件，其沿朝向支撑件的中心的第一方向推动基板。 推动构件可以另外围绕垂直于第一方向的轴旋转。