公开(公告)号：US09647242B2

公开(公告)日：2017-05-09

申请号：US13496973

申请日：2010-09-29

申请人： Shunji Fukuda ,  Katsuya Sakayori ,  Yasuhiro Iizumi

发明人： Shunji Fukuda ,  Katsuya Sakayori ,  Yasuhiro Iizumi

IPC分类号： H01J1/62 ,  H01L51/52 ,  B32B15/08 ,  C09J7/02

CPC分类号： H01L51/529 ,  B32B15/08 ,  C09J7/29 ,  C09J2203/326 ,  C09J2400/163 ,  C09J2433/00 ,  C09J2467/00 ,  C09J2479/08 ,  C09J2479/086 ,  C09J2483/00 ,  H01L51/5243 ,  H01L51/5246 ,  H01L51/5259 ,  Y10T428/24942

摘要： Provided is a heat-conductive sealing member which has high moisture barrier properties, has heat dissipation properties, and is capable of encapsulating an element by a simple method. The heat-conductive sealing member has a metal base material, an insulating layer that is formed on the metal base material, has heat conductivity and contains at least polyimide, and a tacky adhesive layer that is formed on the insulating layer and has heat resistance.

公开(公告)号：US20120181914A1

公开(公告)日：2012-07-19

申请号：US13496973

申请日：2010-09-29

申请人： Shunji Fukuda ,  Katsuya Sakayori ,  Yasuhiro Iizumi

发明人： Shunji Fukuda ,  Katsuya Sakayori ,  Yasuhiro Iizumi

IPC分类号： H01J7/24 ,  B32B7/02

CPC分类号： H01L51/529 ,  B32B15/08 ,  C09J7/29 ,  C09J2203/326 ,  C09J2400/163 ,  C09J2433/00 ,  C09J2467/00 ,  C09J2479/08 ,  C09J2479/086 ,  C09J2483/00 ,  H01L51/5243 ,  H01L51/5246 ,  H01L51/5259 ,  Y10T428/24942

摘要： Provided is a heat-conductive sealing member which has high moisture barrier properties, has heat dissipation properties, and is capable of encapsulating an element by a simple method. The heat-conductive sealing member has a metal base material, an insulating layer that is formed on the metal base material, has heat conductivity and contains at least polyimide, and a tacky adhesive layer that is formed on the insulating layer and has heat resistance.

摘要翻译： 本发明提供一种导热性密封件，其具有高的防潮性，具有散热性，并且能够通过简单的方法封装元件。 导热密封构件具有金属基材，在金属基材上形成的绝缘层，具有导热性，至少含有聚酰亚胺，并且在绝缘层上形成有耐热性的粘性层。

公开(公告)号：US20120187399A1

公开(公告)日：2012-07-26

申请号：US13499097

申请日：2010-09-29

申请人： Shunji Fukuda ,  Katsuya Sakayori ,  Keita Arihara ,  Koji Ichimura ,  Kei Amagai

发明人： Shunji Fukuda ,  Katsuya Sakayori ,  Keita Arihara ,  Koji Ichimura ,  Kei Amagai

IPC分类号： H01L27/15 ,  C23C16/52 ,  H05K1/02 ,  B05D5/12 ,  H01L29/786 ,  H01L21/34

CPC分类号： H01L51/0097 ,  H01L27/1218 ,  H01L27/3244 ,  H01L29/78603 ,  H01L29/7869 ,  H01L51/5253 ,  Y02E10/549

摘要： Disclosed is a substrate for a flexible device which, when a TFT is produced on a flexible substrate in which a metal layer and a polyimide layer are laminated, can suppress deterioration of the electrical performance of the TFT due to the surface irregularities of the metal foil surface and can suppress detachment or cracks of the TFT. Also disclosed is a substrate for a thin film element which has excellent surface smoothness and is capable of suppressing deterioration of the characteristics of thin film elements. Also disclosed are methods for manufacturing substrates for thin film elements.

摘要翻译： 公开了一种用于柔性器件的衬底，当在层叠有金属层和聚酰亚胺层的柔性衬底上制造TFT时，可以抑制由于金属箔的表面不规则性引起的TFT的电性能的劣化 可以抑制TFT的剥离或裂纹。 还公开了一种具有优异的表面光滑度并且能够抑制薄膜元件的特性劣化的薄膜元件用基板。 还公开了用于制造薄膜元件用基板的方法。

公开(公告)号：US20120183751A1

公开(公告)日：2012-07-19

申请号：US13498651

申请日：2010-09-29

申请人： Mami Katayama ,  Shunji Fukuda ,  Katsuya Sakayori

发明人： Mami Katayama ,  Shunji Fukuda ,  Katsuya Sakayori

IPC分类号： B32B3/00 ,  G03F7/20 ,  C07C235/36 ,  C09J139/04 ,  C08F126/06 ,  C08F226/06 ,  C09D139/04 ,  C09D11/10 ,  G03F7/027 ,  C07D401/10

CPC分类号： C07D295/18 ,  C07D401/10 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0387 ,  Y10T428/24802

摘要： The present invention is to provide a photosensitive resin composition which has excellent resolution, is low in cost and is applicable to a wide range of applications due to the structure of a polymer precursor in which reaction into a final product is promoted by a basic substance or by heating in the presence of a basic substance. The present invention is also to provide a base generator which is applicable to such a photosensitive resin composition.Disclosed is a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating. Also disclosed is a photosensitive resin composition which comprises the base generator and a polymer precursor in which reaction into a final product is promoted by a basic substance or by heating in the presence of a basic substance.

摘要翻译： 本发明提供一种感光性树脂组合物，其分辨率优异，成本低，适用于广泛应用，因为聚合物前体的结构，其中通过碱性物质促进最终产物的反应或 通过在碱性物质的存在下加热。 本发明还提供一种适用于这种感光性树脂组合物的基底发生器。 公开了具有特定结构的基座发生器，并且通过暴露于电磁辐射和加热而产生基座。 还公开了一种感光性树脂组合物，其包含碱发生剂和聚合物前体，其中通过碱性物质促进最终产物的反应或通过在碱性物质的存在下加热。

公开(公告)号：US20120070781A1

公开(公告)日：2012-03-22

申请号：US13259586

申请日：2010-03-26

申请人： Mami Katayama ,  Shunji Fukuda ,  Katsuya Sakayori ,  Kouji Kawaguchi

发明人： Mami Katayama ,  Shunji Fukuda ,  Katsuya Sakayori ,  Kouji Kawaguchi

IPC分类号： G03F7/027 ,  G03F7/075 ,  B32B3/10 ,  C07D405/12 ,  C07C69/96 ,  C07F7/10 ,  G03F7/20 ,  C07D211/06

CPC分类号： C07D295/18 ,  B33Y70/00 ,  C07D309/12 ,  C07D317/64 ,  C08G73/10 ,  C08G73/22 ,  C08K5/17 ,  C08K5/20 ,  C08L79/04 ,  C08L79/08 ,  C09D7/63 ,  C09D11/03 ,  C09D11/101 ,  G03F7/0037 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0387 ,  G03F7/0757 ,  Y10T428/24802

摘要： An object of the present invention is to provide a base generator which has sensitivity and is applicable to a wide range of applications, and a photosensitive resin composition which is applicable to a wide range of applications due to the structure of a polymer precursor in which reaction into a final product is promoted by a basic substance or by heating in the presence of a basic substance. The base generator generates a base by exposure to electromagnetic radiation and heating. The photosensitive resin composition comprises a polymer precursor in which reaction into a final product is promoted by the base generator and a basic substance or by heating in the presence of a basic substance.

摘要翻译： 本发明的目的是提供一种具有灵敏度并且适用于广泛应用的基底发生器，以及由于聚合物前体的结构而适用于广泛应用的光敏树脂组合物，其中反应 最终产物被碱性物质促进，或在碱性物质存在下加热。 基座发生器通过暴露于电磁辐射和加热而产生基座。 感光性树脂组合物包含聚合物前体，其中通过碱发生剂和碱性物质促进最终产物的反应或通过在碱性物质的存在下加热。

公开(公告)号：US09024312B2

公开(公告)日：2015-05-05

申请号：US13499097

申请日：2010-09-29

申请人： Shunji Fukuda ,  Katsuya Sakayori ,  Keita Arihara ,  Koji Ichimura ,  Kei Amagai

发明人： Shunji Fukuda ,  Katsuya Sakayori ,  Keita Arihara ,  Koji Ichimura ,  Kei Amagai

IPC分类号： H01L29/10 ,  H01L51/00 ,  H01L29/786 ,  H01L27/12 ,  H01L27/32 ,  H01L51/52

CPC分类号： H01L51/0097 ,  H01L27/1218 ,  H01L27/3244 ,  H01L29/78603 ,  H01L29/7869 ,  H01L51/5253 ,  Y02E10/549

摘要： Disclosed is a substrate for a flexible device which, when a TFT is produced on a flexible substrate in which a metal layer and a polyimide layer are laminated, can suppress deterioration of the electrical performance of the TFT due to the surface irregularities of the metal foil surface and can suppress detachment or cracks of the TFT. Also disclosed is a substrate for a thin film element which has excellent surface smoothness and is capable of suppressing deterioration of the characteristics of thin film elements. Also disclosed are methods for manufacturing substrates for thin film elements.

摘要翻译： 公开了一种用于柔性器件的衬底，当在层叠有金属层和聚酰亚胺层的柔性衬底上制造TFT时，可以抑制由于金属箔的表面不规则性引起的TFT的电性能的劣化 可以抑制TFT的剥离或裂纹。 还公开了一种具有优异的表面光滑度并且能够抑制薄膜元件的特性劣化的薄膜元件用基板。 还公开了用于制造薄膜元件用基板的方法。

公开(公告)号：US08476444B2

公开(公告)日：2013-07-02

申请号：US12935112

申请日：2009-03-30

申请人： Mami Katayama ,  Shunji Fukuda ,  Katsuya Sakayori

发明人： Mami Katayama ,  Shunji Fukuda ,  Katsuya Sakayori

IPC分类号： C07D213/72 ,  C07D213/75 ,  C07D211/06

CPC分类号： G03F7/0045 ,  B33Y70/00 ,  C08G73/10 ,  C08G73/22 ,  C08L79/04 ,  C08L79/08 ,  G03F7/038 ,  G03F7/0387 ,  G03F7/20 ,  Y10S430/114 ,  Y10S430/12

摘要： A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance.

摘要翻译： 一种感光性树脂组合物，其分辨率低，成本低，可用于宽范围的聚合物前体的结构，其各自通过碱性物质反应成最终产物，或通过在碱性物质的存在下加热。 感光性树脂组合物包括具有特定结构并通过暴露于电磁辐射和加热而产生碱的基底发生器，以及通过基底发生器和碱性物质或通过加热将聚合物前体反应成最终产物的聚合物前体 存在基本物质。

公开(公告)号：US20110086311A1

公开(公告)日：2011-04-14

申请号：US12935112

申请日：2009-03-30

申请人： Mami Katayama ,  Shunji Fukuda ,  Katsuya Sakayori

发明人： Mami Katayama ,  Shunji Fukuda ,  Katsuya Sakayori

IPC分类号： G03F7/004 ,  C07C235/38 ,  G03F7/20 ,  C07D211/06 ,  C07D295/192 ,  C07D223/04 ,  C07D233/60

CPC分类号： G03F7/0045 ,  B33Y70/00 ,  C08G73/10 ,  C08G73/22 ,  C08L79/04 ,  C08L79/08 ,  G03F7/038 ,  G03F7/0387 ,  G03F7/20 ,  Y10S430/114 ,  Y10S430/12

摘要： A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance.

摘要翻译： 一种感光性树脂组合物，其分辨率低，成本低，可用于宽范围的聚合物前体的结构，其各自通过碱性物质反应成最终产物，或通过在碱性物质的存在下加热。 感光性树脂组合物包括具有特定结构并通过暴露于电磁辐射和加热而产生碱的基底发生器，以及通过基底发生器和碱性物质或通过加热将聚合物前体反应成最终产物的聚合物前体 存在基本物质。

公开(公告)号：US08697332B2

公开(公告)日：2014-04-15

申请号：US13259586

申请日：2010-03-26

申请人： Mami Katayama ,  Shunji Fukuda ,  Katsuya Sakayori ,  Kouji Kawaguchi

发明人： Mami Katayama ,  Shunji Fukuda ,  Katsuya Sakayori ,  Kouji Kawaguchi

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/20 ,  G03F7/30 ,  G03F7/38

CPC分类号： C07D295/18 ,  B33Y70/00 ,  C07D309/12 ,  C07D317/64 ,  C08G73/10 ,  C08G73/22 ,  C08K5/17 ,  C08K5/20 ,  C08L79/04 ,  C08L79/08 ,  C09D7/63 ,  C09D11/03 ,  C09D11/101 ,  G03F7/0037 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0387 ,  G03F7/0757 ,  Y10T428/24802

摘要： An object of the present invention is to provide a base generator which has sensitivity and is applicable to a wide range of applications, and a photosensitive resin composition which is applicable to a wide range of applications due to the structure of a polymer precursor in which reaction into a final product is promoted by a basic substance or by heating in the presence of a basic substance. The base generator generates a base by exposure to electromagnetic radiation and heating. The photosensitive resin composition comprises a polymer precursor in which reaction into a final product is promoted by the base generator and a basic substance or by heating in the presence of a basic substance.

摘要翻译： 本发明的目的是提供一种具有灵敏度并且适用于广泛应用的基底发生器，以及由于聚合物前体的结构而适用于广泛应用的光敏树脂组合物，其中反应 最终产物被碱性物质促进，或在碱性物质存在下加热。 基座发生器通过暴露于电磁辐射和加热而产生基座。 感光性树脂组合物包含聚合物前体，其中通过碱发生剂和碱性物质促进最终产物的反应或通过在碱性物质的存在下加热。

公开(公告)号：US08927122B2

公开(公告)日：2015-01-06

申请号：US12528676

申请日：2008-04-14

申请人： Yoichi Hitomi ,  Shinji Kumon ,  Terutoshi Momose ,  Katsuya Sakayori ,  Kiyohiro Takachi ,  Yoichi Miura ,  Tsuyoshi Yamazaki

发明人： Yoichi Hitomi ,  Shinji Kumon ,  Terutoshi Momose ,  Katsuya Sakayori ,  Kiyohiro Takachi ,  Yoichi Miura ,  Tsuyoshi Yamazaki

IPC分类号： G11B5/60 ,  B05D5/12 ,  H05K1/05 ,  G11B5/48 ,  H05K3/28

CPC分类号： G11B5/4833 ,  C23F1/00 ,  C23F1/02 ,  C23F1/18 ,  C23F1/28 ,  G11B5/3103 ,  G11B5/3133 ,  G11B5/484 ,  G11B5/486 ,  H05K1/056 ,  H05K3/28 ,  H05K3/285 ,  Y10T428/11 ,  Y10T428/1157 ,  Y10T428/1179

摘要： A substrate for suspension comprises a metallic substrate, an insulating layer formed on the metallic substrate, a conductor layer formed on the insulating layer, and a cover layer covering the conductor layer. The insulating layer and the cover layer are formed from different materials, whose coefficients of hygroscopic expansion are in the range between 3×10−6/% RH and 30×10−6/% RH. The difference between the coefficients of hygroscopic expansion of the two materials is 5×10−6/% RH or less.

摘要翻译： 用于悬浮的基板包括金属基板，形成在金属基板上的绝缘层，形成在绝缘层上的导体层和覆盖导体层的覆盖层。 绝缘层和覆盖层由吸湿膨胀系数在3×10 -6 /％RH与30×10 -6 /％RH之间的不同材料形成。 两种材料的吸湿膨胀系数之差为5×10-6 /％RH以下。