Semiconductor analysis arrangement and method therefor
    1.
    发明授权
    Semiconductor analysis arrangement and method therefor 有权
    半导体分析安排及其方法

    公开(公告)号:US06635839B1

    公开(公告)日:2003-10-21

    申请号:US09838672

    申请日:2001-04-19

    IPC分类号: B07C500

    CPC分类号: G01N21/9501 G01R31/311

    摘要: Semiconductor die analysis is enhanced using a system that is adapted to perturb a die in a test chamber and to detect a response from the die to the perturbation. According to an example embodiment of the present invention, a semiconductor die analysis system includes a test chamber and a docking arrangement adapted to dock with the test chamber. A die is held in the docking arrangement and is presented inside of the test chamber when the docking arrangement is docked with the chamber. Two or more perturbation devices are used to perturb the die, and controller is adapted to control the perturbation. A data acquisition arrangement receives data from the die in response to the perturbation, and the data is used for analyzing the die.

    摘要翻译: 使用适于扰动测试室中的管芯并检测从管芯到扰动的响应的系统来增强半导体管芯分析。 根据本发明的示例性实施例,半导体管芯分析系统包括测试室和适于与测试室对接的对接装置。 模具保持在对接装置中,并且当对接装置与腔室对接时,将模具放置在测试室的内部。 使用两个或更多个扰动装置扰乱管芯,并且控制器适于控制扰动。 数据采集​​装置响应于扰动从管芯接收数据,并且数据用于分析管芯。

    Fiber optic semiconductor analysis arrangement and method therefor
    2.
    发明授权
    Fiber optic semiconductor analysis arrangement and method therefor 失效
    光纤半导体分析布置及其方法

    公开(公告)号:US06844928B1

    公开(公告)日:2005-01-18

    申请号:US09838717

    申请日:2001-04-19

    IPC分类号: G01N21/95 G01N21/00

    CPC分类号: G01N21/9501

    摘要: The operability of light-based semiconductor die analysis is enhanced using a method and arrangement that directs light between a light source and a die. In one example embodiment of the present invention, a light source is directed to a die in a semiconductor analysis arrangement using a fiber optic cable. The analysis arrangement is adapted to use light received via the fiber optic cable to analyze the die. The analysis includes one or more light-based applications, such as stimulating a selected portion of the die with the light and detecting a response therefrom. In this manner, light can be directed to a die in a variety of analysis implementations, such as for analyzing a die in a test chamber.

    摘要翻译: 使用在光源和管芯之间引导光的方法和装置来增强基于光的半导体管芯分析的可操作性。 在本发明的一个示例实施例中,使用光纤电缆将光源引导到半导体分析装置中的管芯。 分析装置适于使用经由光纤电缆接收的光来分析模具。 该分析包括一种或多种基于光的应用,例如用光刺激所述裸片的选定部分并检测其中的响应。 以这种方式,可以在各种分析实现中将光导向模具,例如用于在测试室中分析模具。

    Semiconductor analysis arrangement and method therefor
    3.
    发明授权
    Semiconductor analysis arrangement and method therefor 失效
    半导体分析安排及其方法

    公开(公告)号:US06700659B1

    公开(公告)日:2004-03-02

    申请号:US09838671

    申请日:2001-04-19

    IPC分类号: G01N2188

    CPC分类号: G01R31/311 G01N21/9501

    摘要: The operability of light-based semiconductor die analysis is enhanced using a method and arrangement that can detect light leakage between a light source and a die. In one example embodiment of the present invention, a light source is directed to a semiconductor analysis arrangement using, for example, a fiber optic cable. The analysis arrangement is adapted to use light from the light source for analyzing the die. A light detection arrangement detects a condition of light leakage from the system and generates a signal representing the condition of light leakage. The generated signal can then be used to control the semiconductor analysis arrangement, such as by deactivating the light source in response to a detected leak, or by allowing the light source to function in response to not detecting a leak.

    摘要翻译: 使用可以检测光源和管芯之间的光泄漏的方法和装置来增强基于光的半导体管芯分析的可操作性。 在本发明的一个示例性实施例中,使用例如光纤电缆将光源引导到半导体分析装置。 分析装置适于使用来自光源的光来分析模具。 光检测装置检测来自系统的光泄漏的状况,并产生表示漏光状况的信号。 所产生的信号然后可以用于控制半导体分析装置,例如通过响应于检测到的泄漏而停用光源,或者通过允许光源响应于不检测泄漏而起作用。

    Indirect stimulation of an integrated circuit die
    4.
    发明授权
    Indirect stimulation of an integrated circuit die 失效
    间接刺激集成电路管芯

    公开(公告)号:US06870379B1

    公开(公告)日:2005-03-22

    申请号:US10164739

    申请日:2002-06-06

    CPC分类号: G01R31/311

    摘要: Analysis of a semiconductor die is enhanced by the stimulation the die and the detection of a response to the stimulation. According to an example embodiment of the present invention, a semiconductor die is analyzed using indirect stimulation of a portion of the die, and detecting a response therefrom. First, selected portion of circuitry within the die is stimulated. The stimulation of the selected portion induces a second portion of circuitry within the die to generate an external emission. The emission is detected and the die is analyzed therefrom. In one particular implementation, a response from the selected portion is inhibited from interfering with the detection of the emission from the second portion of circuitry.

    摘要翻译: 通过刺激模具和检测对刺激的响应来增强半导体管芯的分析。 根据本发明的示例性实施例,使用间接刺激芯片的一部分并且从其检测响应来分析半导体管芯。 首先,刺激模具内的电路的选定部分。 所选部分的刺激引起管芯内的电路的第二部分以产生外部发射。 检测发射并从中分析模具。 在一个具体实现中,来自所选择的部分的响应被禁止干扰来自电路的第二部分的发射的检测。

    Substrate removal as a functional of sonic analysis
    6.
    发明授权
    Substrate removal as a functional of sonic analysis 失效
    基底去除作为声波分析的函数

    公开(公告)号:US06350624B1

    公开(公告)日:2002-02-26

    申请号:US09409304

    申请日:1999-09-29

    IPC分类号: H01L21302

    CPC分类号: G01N1/32 G01R31/311

    摘要: Substrate removal for post-manufacturing analysis of a semiconductor device is enhanced via a method and system that use sonic energy in the control of the removal process. According to an example embodiment of the present invention, sonic energy is reflected off of a region of a semiconductor chip having a portion of substrate removed from the back side of the chip. The reflections are detected and used to determine the thickness of substrate in the back side. In this manner, the substrate removal process can be efficiently and accurately controlled.

    摘要翻译: 通过在控制去除过程中使用声能的方法和系统来增强用于半导体器件后制造分析的衬底去除。 根据本发明的示例性实施例,声能被从芯片的背面去除的衬底的一部分的半导体芯片的区域反射出来。 检测反射并用于确定背面底物的厚度。 以这种方式,可以有效且准确地控制基板去除处理。

    Atomic force microscopy and signal acquisition via buried insulator
    8.
    发明授权
    Atomic force microscopy and signal acquisition via buried insulator 失效
    原子力显微镜和通过埋层绝缘子的信号采集

    公开(公告)号:US06448096B1

    公开(公告)日:2002-09-10

    申请号:US09864656

    申请日:2001-05-23

    IPC分类号: H01L2100

    摘要: Analysis of a semiconductor die having silicon-on-insulator (SOI) structure is enhanced by accessing the circuitry within the die from the back side without necessarily breaching the insulator layer of the SOI structure. According to an example embodiment of the present invention, a semiconductor die having a SOI structure and a backside opposite circuitry in a circuit side is analyzed. An atomic force microscope is scanned across a thinned portion of the back side. The microscope responds to an electrical characteristic, such as a logic state, coupled from circuitry via the insulator portion of the die over which the microscope is being scanned. The response of the microscope to the die is detected and used to detect an electrical characteristic of the die.

    摘要翻译: 通过从背面访问管芯内的电路而不必破坏SOI结构的绝缘体层来增强具有绝缘体上硅(SOI)结构的半导体管芯的分析。 根据本发明的示例性实施例,分析了具有SOI结构的半导体管芯和电路侧的背面相反的电路。 原子力显微镜扫描在背面的薄部分。 显微镜响应诸如逻辑状态的电特性,该电特性通过显微镜正被扫描的裸片的绝缘体部分从电路耦合。 检测显微镜对管芯的响应,并用于检测管芯的电气特性。

    Circuit access and analysis for a SOI flip-chip die
    9.
    发明授权
    Circuit access and analysis for a SOI flip-chip die 失效
    SOI倒装芯片的电路访问和分析

    公开(公告)号:US06448095B1

    公开(公告)日:2002-09-10

    申请号:US09755013

    申请日:2001-01-05

    IPC分类号: H01L2100

    CPC分类号: H01L22/20 G01R31/307

    摘要: Analysis of a flip-chip type IC die having SOI structure is enhanced via analysis and repair of the die that make possible analysis that would typically result in the die being in a state of disrepair. According to an example embodiment of the present invention, a focused ion beam (FIB) is directed at a back side of a flip-chip die having a circuitry in a circuit side opposite a back side, wherein the circuitry including silicon on insulator (SOI) structure. The FIB is used to remove a selected portion of substrate including a portion of the insulator of the SOI structure from the die. The removed substrate exposes an insulator region in the die, and a signal is coupled from circuitry in the die via the exposed insulator region and used to analyze the die. Material is deposited in the exposed region and the selected portion of the die that had been removed is reconstructed. The reconstruction takes place before, during or after the signal is coupled, depending upon the die being analyzed and the type of analysis being performed. In this manner, access for analyzing the die is improved via the ability to couple a signal through the insulator and to repair a portion of the die that has been altered for analysis. Analysis that would otherwise be destructive can be performed and the ability of the die to function after analysis can be maintained.

    摘要翻译: 具有SOI结构的倒装芯片型IC芯片的分析通过分析和修复模具得到增强,这使得可能的分析通常导致模具处于失修状态。 根据本发明的一个示例性实施例,聚焦离子束(FIB)指向倒装芯片的背面,该倒装芯片的背面具有电路侧的电路,其中包括绝缘体上的硅(SOI) ) 结构体。 FIB用于从芯片去除包括SOI结构的绝缘体的一部分的衬底的选定部分。 去除的衬底暴露了管芯中的绝缘体区域,并且信号通过暴露的绝缘体区域从管芯中的电路耦合并用于分析管芯。 材料沉积在暴露的区域中,并且已经去除的模具的选定部分被重建。 重建在信号耦合之前,期间或之后进行,这取决于正在分析的管芯和正在执行的分析的类型。 以这种方式,通过能够通过绝缘体耦合信号并修复已经被改变以用于分析的芯片的一部分的能力来提高用于分析芯片的访问。 否则可以进行破坏性的分析,可以保持分析后的模具功能的能力。