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1.发明授权Quinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetate 失效使用基本上由3-甲基-3-甲氧基丁醇和丙二醇烷基醚乙酸酯组成的混合溶剂的喹诺酮叠氮化物正光致抗蚀剂
公开(公告)号：US5853947A
公开(公告)日：1998-12-29
申请号：US576748
申请日：1995-12-21
IPC分类号： G03F7/004 , G03F7/022 , G03F7/023 , H01L21/027 , G03C1/61
CPC分类号： G03F7/0048 , G03F7/022 , G03F7/0236
摘要： A photosensitive positive working photosensitive composition suitable for use as a photoresist, which comprises an admixture of at least one water insoluble, aqueous alkali soluble, film forming novolak resin; at least one o-diazonaphthoquinone photosensitizer; and a photoresist solvent mixture comprising a propylene glycol alkyl ether acetate and 3-methyl-3-methoxy butanol and process for producing such a composition.
摘要翻译： 适合用作光致抗蚀剂的感光性正性感光性组合物，其包含至少一种不溶于水的碱溶性水溶性成膜酚醛清漆树脂的混合物; 至少一种邻二氮萘醌光敏剂; 以及包含丙二醇烷基醚乙酸酯和3-甲基-3-甲氧基丁醇的光致抗蚀剂溶剂混合物及其制备方法。
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2.发明授权
公开(公告)号：US5739265A
公开(公告)日：1998-04-14
申请号：US530847
申请日：1995-09-20
CPC分类号： C08G8/08 , G03F7/0236
摘要： A process for producing a water insoluble, aqueous alkali soluble, film forming novolak resin having low metal ions, made by the fractionation of a phenol formaldehyde condensation product, a process for producing a resin a photoresist composition of superior quality containing such novolak resin, and a method for producing a semiconductor device using such photoresist composition.
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3.发明授权Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom 失效分离苯酚甲醛缩合物和由其制备的光致抗蚀剂组合物
公开(公告)号：US5976761A
公开(公告)日：1999-11-02
申请号：US47571
申请日：1998-03-25
CPC分类号： C08G8/08 , G03F7/0236
摘要： A process for producing a water insoluble, aqueous alkali soluble, film forming novolak resin having low metal ions, made by the fractionation of a phenol formaldehyde condensation product, a process for producing a resin a photoresist composition of superior quality containing such novolak resin, and a method for producing a semiconductor device using such photoresist composition.
摘要翻译： 通过分解苯酚甲醛缩合产物制备具有低金属离子的水不溶性水溶性成膜酚醛清漆树脂的方法，含有这种酚醛清漆树脂的具有优良品质的光致抗蚀剂组合物的方法，以及 使用这种光致抗蚀剂组合物的半导体器件的制造方法。
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4.发明授权Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom 失效分离苯酚甲醛缩合物和由其制备的光致抗蚀剂组合物
公开(公告)号：US5693749A
公开(公告)日：1997-12-02
申请号：US530648
申请日：1995-09-20
CPC分类号： G03F7/0236 , C08G8/08
摘要： A process for producing a water insoluble, aqueous alkali soluble, film forming novolak resin fraction having a low metal ion content, made by the fractionation of a phenol formaldehyde condensation product, a process for producing a photoresist compositions containing such a novolak resin, and a method for producing a semiconductor device using such a photoresist composition.
摘要翻译： 通过分解苯酚甲醛缩合产物制备具有低金属离子含量的水不溶性水溶性成膜酚醛清漆树脂级分的方法，制备含有这种酚醛清漆树脂的光致抗蚀剂组合物的方法和 使用这种光致抗蚀剂组合物的半导体器件的制造方法。
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公开(公告)号：US6106995A
公开(公告)日：2000-08-22
申请号：US373319
申请日：1999-08-12
IPC分类号： G03F7/004 , C09D5/00 , C09D179/00 , G03F7/09 , G03F7/11 , H01L21/027 , G03C1/492
CPC分类号： G03F7/091
摘要： The present invention relates to an antireflective coating composition comprising an admixture of:a) a polymer defined by the following structure: ##STR1## where, R.sub.1 & R.sub.2 are independently hydrogen, or C.sub.1 to C.sub.5 alkylR.sub.3 is a methyl, ethyl, propyl or butyl groupR.sub.4 -R.sub.7 are independently hydrogen, or C.sub.1 to C.sub.5 alkyln=10 to 50,000(b) a fluorine-containing, sparingly water-soluble (0.1%-10% by weight in water) organic C.sub.3 -C.sub.13 aliphatic carboxylic acid;(c) a non-metallic hydroxide; and(d) a solvent.The invention also relates to a method for producing such an antireflective coating composition and to a method for producing a microelectronic device using such an antireflective coating composition in conjunction with a photoresist composition.
摘要翻译： 本发明涉及一种抗反射涂料组合物，其包含以下混合物的混合物：a）由以下结构定义的聚合物：其中R1和R2独立地为氢，或C1至C5烷基，R3为甲基，乙基，丙基或丁基R4 -R7独立地为氢，或C 1至C 5烷基n = 10至50,000（b）含氟的微水溶性（0.1重量％-10重量％的水）有机C 3 -C 13脂族羧酸; （c）非金属氢氧化物; 和（d）溶剂。 本发明还涉及一种制备这种抗反射涂料组合物的方法和一种使用这种抗反射涂料组合物与光致抗蚀剂组合物一起生产微电子器件的方法。
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6.发明授权Metal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefrom 失效使用离子交换催化剂在极性溶剂中的酚醛清漆树脂中的金属离子还原，并由其制备光致抗蚀剂组合物
公开(公告)号：US5521052A
公开(公告)日：1996-05-28
申请号：US365659
申请日：1994-12-30
CPC分类号： C08G8/04 , G03F7/004 , Y10S430/106 , Y10S438/948
摘要： The present invention provides methods for producing water insoluble, aqueous alkali soluble, film forming novolak resins having an extremely low level of metal ions, utilizing treated anion and cation exchange resins. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resin and for producing semiconductor devices using such photoresist compositions.
摘要翻译： 本发明提供了利用处理过的阴离子和阳离子交换树脂生产具有极低水平金属离子的水不溶性水溶性成膜酚醛清漆树脂的方法。 还提供了一种用于生产具有来自这种酚醛清漆树脂的非常低水平的金属离子并且使用这种光致抗蚀剂组合物制造半导体器件的光致抗蚀剂组合物的方法。
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公开(公告)号：US5371169A
公开(公告)日：1994-12-06
申请号：US953031
申请日：1992-09-28
申请人： Ping H. Lu , Anthony Canize , Dinesh N. Khanna , M. Dalil Rahman
发明人： Ping H. Lu , Anthony Canize , Dinesh N. Khanna , M. Dalil Rahman
IPC分类号： C08L61/04 , C08L61/06 , G03F7/023 , H01L21/027 , C08G14/04
CPC分类号： G03F7/0236 , C08L61/04
摘要： The present invention provides mixture of at least two novolak resins with a molecular weight distribution overlap of at least 50% and having dissolution rates which differ by a factor of at least 2.0. A method is also provided for producing such novolak resin mixtures.
摘要翻译： 本发明提供了至少两种酚醛清漆树脂的混合物，分子量分布重叠率至少为50％，溶解速率至少为2.0。 还提供了用于生产这种酚醛清漆树脂混合物的方法。
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8.发明授权Antireflective coating compositions for photoresist compositions and use thereof 失效用于光致抗蚀剂组合物的抗反射涂料组合物及其用途
公开(公告)号：US5994430A
公开(公告)日：1999-11-30
申请号：US841750
申请日：1997-04-30
申请人： Shuji Ding , Ping-Hung Lu , Dinesh N. Khanna , Jianhui Shan , Dana L. Durham , Ralph R. Dammel , M. Dalil Rahman
发明人： Shuji Ding , Ping-Hung Lu , Dinesh N. Khanna , Jianhui Shan , Dana L. Durham , Ralph R. Dammel , M. Dalil Rahman
IPC分类号： G03F7/11 , C08F8/30 , C08F212/14 , C08L25/18 , C09B69/10 , G03F7/09 , H01L21/027 , C08K5/00
CPC分类号： C09B69/106 , G03F7/091
摘要： The present invention relates to an antireflective coating composition comprising a novel polymer in a solvent composition. The invention further comprises processes for using the antireflective coating composition in photolithography. The antireflective coating composition comprises a novel polymer and a solvent composition, where the novel polymer of the antireflective coating comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm and at least one unit that contains no aromatic funtionality. The solvent may be organic, preferrably, a solvent of low toxicity, or it may be water, which may additionally contain other water miscible organic solvents.
摘要翻译： 本发明涉及一种抗反射涂料组合物，其包含溶剂组合物中的新型聚合物。 本发明还包括在光刻中使用抗反射涂料组合物的方法。 抗反射涂料组合物包含新型聚合物和溶剂组合物，其中抗反射涂层的新型聚合物包含至少一个含有吸收约180nm至约450nm的染料的单元和至少一个不含芳香族官能团的单元。 溶剂可以是有机的，优选地是低毒性的溶剂，或者它可以是水，其可另外含有其它与水可混溶的有机溶剂。
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9.发明授权Image formation utilizing photosensitive compositions containing low metal content p-cresol oligomers 失效使用含有低金属含量对甲酚低聚物的光敏组合物的图像形成
公开(公告)号：US5858627A
公开(公告)日：1999-01-12
申请号：US920564
申请日：1997-08-29
IPC分类号： G03F7/022 , G03F7/023 , H01L21/027 , G03F7/38
CPC分类号： G03F7/023 , G03F7/0236
摘要： Process for producing a photosensitizer comprising a diazo ester of a p-cresol oligomer where at least one of the hydroxy groups on the p-cresol ring has been esterified with diazo-sulfonyl chloride comprising from about 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride, or a mixture thereof; and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitive the photoresist composition, a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition, and a suitable solvent.
摘要翻译： 制备包含对甲酚低聚物的重氮酯的光敏剂的方法，其中对甲酚环上的至少一个羟基已用重氮磺酰氯酯化，包括约60-100摩尔％2,1,4 或2,1,5-重氮磺酰氯，或其混合物; 以及光致抗蚀剂，其包含光致抗蚀剂组合物中以足以使光致抗蚀剂组合物均匀感光的量的光敏剂的混合物，水不溶性的碱溶性酚醛清漆树脂，酚醛清漆树脂以光致抗蚀剂组合物的量存在 足以形成基本均匀的光致抗蚀剂组合物和合适的溶剂。
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公开(公告)号：US5981145A
公开(公告)日：1999-11-09
申请号：US846986
申请日：1997-04-30
申请人： Shuji Ding , Dinesh N. Khanna , Ping-Hung Lu , Jianhui Shan , Ralph R. Dammel , Dana L. Durham , M. Dalil Rahman , Iain McCulloch
发明人： Shuji Ding , Dinesh N. Khanna , Ping-Hung Lu , Jianhui Shan , Ralph R. Dammel , Dana L. Durham , M. Dalil Rahman , Iain McCulloch
IPC分类号： G03F7/11 , C08F8/00 , C08F8/30 , G03F7/09 , H01L21/027
CPC分类号： G03F7/091 , C08F8/00 , C08F8/30 , C08F12/24 , C08F212/14 , C08F2810/20
摘要： The present invention relates to a novel polymer suitable for use as an antireflective coating or as an additive in photoresist for absorption of reflected light. The novel polymer comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm and at least one unit that contains no aromatic funtionality. The polymer is soluble in organic solvents, preferrably solvents of low toxicity, or it may be soluble in water, which may additionally contain other water miscible organic solvents.
摘要翻译： 本发明涉及一种适合用作抗反射涂层的新型聚合物或作为用于吸收反射光的光刻胶中的添加剂。 该新型聚合物包含至少一个含有吸收约180nm至约450nm的染料的单元和至少一个不含芳香官能团的单元。 聚合物可溶于有机溶剂中，优选低毒性溶剂，或者它可溶于水，其可另外含有其它与水可混溶的有机溶剂。
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