Method for manufacturing a magnetic write pole having straight side walls and a well defined track-width
    1.
    发明授权
    Method for manufacturing a magnetic write pole having straight side walls and a well defined track-width 有权
    用于制造具有直的侧壁和良好限定的轨道宽度的磁性写入极的方法

    公开(公告)号:US08371019B1

    公开(公告)日:2013-02-12

    申请号:US13187370

    申请日:2011-07-20

    Abstract: A method for manufacturing a magnetic write head having a write pole with a very narrow track width, straight well defined sides and a well defined trailing edge width (e.g. track-width). The method includes uses two separate chemical mechanical polishing processes that stop at separate CMP stop layers. The first CMP stop layer is deposited directly over a RIEable fill layer. A RIE mask, is formed over the fill layer and first CMP stop layer, the RIE mask having an opening. A trench then is formed in the RIEable fill layer. A second CMP stop layer is then deposited into the trench and over the RIE mask, followed by plating of a magnetic material. First and second chemical mechanical polishing processes are then performed, the first stopping at the first CMP stop and the second stopping at the second CMP stop.

    Abstract translation: 一种用于制造具有非常窄的轨道宽度的写入极,直的明确定义的侧面和明确的后缘宽度(例如,轨道宽度)的磁性写入头的方法。 该方法包括使用在分开的CMP停止层处停止的两个单独的化学机械抛光工艺。 第一CMP停止层直接沉积在RIEable填充层上。 RIE掩模形成在填充层和第一CMP停止层上,RIE掩模具有开口。 然后在RIEable填充层中形成沟槽。 然后将第二CMP停止层沉积到沟槽中并在RIE掩模上方,然后电镀磁性材料。 然后执行第一和第二化学机械抛光工艺,首先在第一CMP停止时停止,在第二CMP停止时第二次停止。

    METHOD FOR MANUFACTURING A MAGNETIC WRITE POLE HAVING STRAIGHT SIDE WALLS AND A WELL DEFINED TRACK-WIDTH
    2.
    发明申请
    METHOD FOR MANUFACTURING A MAGNETIC WRITE POLE HAVING STRAIGHT SIDE WALLS AND A WELL DEFINED TRACK-WIDTH 有权
    用于制造具有直立侧壁和良好定义轨迹宽度的磁性写入点的方法

    公开(公告)号:US20130019467A1

    公开(公告)日:2013-01-24

    申请号:US13187370

    申请日:2011-07-20

    Abstract: A method for manufacturing a magnetic write head having a write pole with a very narrow track width, straight well defined sides and a well defined trailing edge width (e.g. track-width). The method includes uses two separate chemical mechanical polishing processes that stop at separate CMP stop layers. The first CMP stop layer is deposited directly over a RIEable fill layer. A RIE mask, is formed over the fill layer and first CMP stop layer, the RIE mask having an opening. A trench then is formed in the RIEable fill layer. A second CMP stop layer is then deposited into the trench and over the RIE mask, followed by plating of a magnetic material. First and second chemical mechanical polishing processes are then performed, the first stopping at the first CMP stop and the second stopping at the second CMP stop.

    Abstract translation: 一种用于制造具有非常窄的轨道宽度的写入极,直的明确定义的侧面和明确的后缘宽度(例如,轨道宽度)的磁性写入头的方法。 该方法包括使用在分开的CMP停止层处停止的两个单独的化学机械抛光工艺。 第一CMP停止层直接沉积在RIEable填充层上。 RIE掩模形成在填充层和第一CMP停止层上,RIE掩模具有开口。 然后在RIEable填充层中形成沟槽。 然后将第二CMP停止层沉积到沟槽中并在RIE掩模上方,然后电镀磁性材料。 然后执行第一和第二化学机械抛光工艺,首先在第一CMP停止时停止,在第二CMP停止时第二次停止。

    PROCESS TO MAKE PMR WRITER WITH LEADING EDGE SHIELD (LES) AND LEADING EDGE TAPER (LET)
    9.
    发明申请
    PROCESS TO MAKE PMR WRITER WITH LEADING EDGE SHIELD (LES) AND LEADING EDGE TAPER (LET) 失效
    具有导向边缘屏蔽(LES)和导线边缘(LET)的PMR写入的过程

    公开(公告)号:US20120125886A1

    公开(公告)日:2012-05-24

    申请号:US12954485

    申请日:2010-11-24

    Abstract: Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material.

    Abstract translation: 提供了具有锥形前缘的前缘屏蔽和锥形磁极的制造方法。 前缘屏蔽可以通过利用CMP停止层形成。 CMP停止层可以有助于防止磁性材料的过度抛光。 对于具有锥形前缘的锥形磁极,将磁性材料沉积在平坦化表面上,形成图案化的抗蚀剂材料,并且暴露的磁性材料被蚀刻以形成磁性材料的至少一个锥形表面。

Patent Agency Ranking