TiW platinum interconnect and method of making the same
    2.
    发明授权
    TiW platinum interconnect and method of making the same 有权
    TiW铂互连及其制作方法

    公开(公告)号:US06956274B2

    公开(公告)日:2005-10-18

    申请号:US10044009

    申请日:2002-01-11

    IPC分类号: B81B7/00 H01L27/095

    CPC分类号: B81B7/0006

    摘要: A metallization stack is provided for use as a contact structure in an integrated MEMS device. The metallization stack comprises a titanium-tungsten adhesion and barrier layer formed with a platinum layer formed on top. The platinum feature is formed by sputter etching the platinum in argon, followed by a wet etch in aqua regia using an oxide hardmask. Alternatively, the titanium-tungsten and platinum layers are deposited sequentially and patterned by a single plasma etch process with a photoresist mask.

    摘要翻译: 提供金属化堆叠用作集成MEMS器件中的接触结构。 金属化堆叠包括形成在顶部形成有铂层的钛 - 钨粘合和阻挡层。 铂特征是通过在氩气中溅射蚀刻铂,然后使用氧化物硬掩模在王水中进行湿式蚀刻而形成的。 或者,通过用光致抗蚀剂掩模的单等离子体蚀刻工艺顺序地沉积钛 - 钨和铂层并图案化。

    TiW platinum interconnect and method of making the same
    3.
    发明授权
    TiW platinum interconnect and method of making the same 有权
    TiW铂互连及其制作方法

    公开(公告)号:US06878626B1

    公开(公告)日:2005-04-12

    申请号:US10325091

    申请日:2002-12-20

    IPC分类号: B81B7/00 H01L21/44

    CPC分类号: B81B7/0006

    摘要: A metallization stack is provided for use as a contact structure in an integrated MEMS device. The metallization stack includes a titanium-tungsten adhesion and barrier layer formed with a platinum layer formed on top. The platinum feature is formed by sputter etching the platinum in argon, followed by a wet etch in aqua regia using an oxide hardmask. Alternatively, the titanium-tungsten and platinum layers are deposited sequentially and patterned by a single plasma etch process with a photoresist mask.

    摘要翻译: 提供金属化堆叠用作集成MEMS器件中的接触结构。 金属化堆叠包括形成在顶部形成有铂层的钛 - 钨粘合和阻挡层。 铂特征是通过在氩气中溅射蚀刻铂,然后使用氧化物硬掩模在王水中进行湿式蚀刻而形成的。 或者,通过用光致抗蚀剂掩模的单等离子体蚀刻工艺顺序地沉积钛 - 钨和铂层并图案化。

    Method for thin film deposition matching rate of expansion of shadow mask to rate of expansion of substrate
    6.
    发明授权
    Method for thin film deposition matching rate of expansion of shadow mask to rate of expansion of substrate 有权
    薄膜沉积匹配扩散率与掩膜膨胀速率的方法

    公开(公告)号:US06821561B2

    公开(公告)日:2004-11-23

    申请号:US10106385

    申请日:2002-03-26

    IPC分类号: C23C1404

    CPC分类号: C23C14/042

    摘要: A shadow mask material is selected so that the expansion characteristics of the shadow mask during thin film deposition closely match the expansion characteristics of the substrate. The shadow mask material is typically one with a low coefficient of thermal expansion (CTE). The shadow mask material must typically meet additional criteria, such as mechanical strength, feature quality, and dimensional accuracy criteria.

    摘要翻译: 选择阴影掩模材料,使得薄膜沉积期间荫罩的膨胀特性与基板的膨胀特性紧密匹配。 荫罩材料通常是具有低热膨胀系数(CTE)的材料。 荫罩材料通常必须符合额外的标准,例如机械强度,特征质量和尺寸精度标准。

    Optical mirror coatings for high-temperature diffusion barriers and mirror shaping
    10.
    发明授权
    Optical mirror coatings for high-temperature diffusion barriers and mirror shaping 有权
    用于高温扩散屏障和镜面成型的光学镜面涂层

    公开(公告)号:US06508561B1

    公开(公告)日:2003-01-21

    申请号:US09981369

    申请日:2001-10-17

    IPC分类号: G02B7182

    CPC分类号: G02B26/0833 G02B5/0875

    摘要: Optical mirror coatings are used for high-temperature diffusion barriers and mirror shaping. Certain materials for use as high-temperature diffusion barriers under optical mirror coatings include metals that have high melting and/or boiling points and amorphous and partially recrystallized inorganic amorphous materials that have high glass transition temperatures (Tg). Candidate metals are selected based upon the boiling point or a combination of melting point and boiling point. Candidate amorphous and partially recrystallized inorganic amorphous materials are selected based upon the glass transition temperature. Optical mirrors having such high-temperature diffusion barriers maintain reflectivity when exposed to elevated temperatures, and are particularly useful in optical Micro Electro-Mechanical Systems (MEMS) that are exposed to high-temperature manufacturing processes. Optical mirrors are shaped using tensile and/or compressive films.

    摘要翻译: 光学镜面涂层用于高温扩散屏障和镜面成型。 在光镜涂层下用作高温扩散阻挡层的某些材料包括具有高熔点和/或沸点的金属和具有高玻璃化转变温度(Tg)的无定形和部分再结晶的无机非晶材料。 基于沸点或熔点和沸点的组合选择候选金属。 基于玻璃化转变温度选择候选无定形和部分重结晶的无机非晶材料。 具有这种高温扩散屏障的光学反射镜在暴露于升高的温度时保持反射性,并且在暴露于高温制造工艺的光学微机电系统(MEMS)中特别有用。 光学反射镜使用拉伸和/或压缩薄膜成型。