公开(公告)号：US20180195173A1

公开(公告)日：2018-07-12

申请号：US15862190

申请日：2018-01-04

Applicant: TOKYO ELECTRON LIMITED

Inventor： Hitoshi KATO ,  Yukio OHIZUMI ,  Manabu HONMA ,  Takeshi KOBAYASHI

IPC: C23C16/455 ,  C23C14/50 ,  C23C14/04 ,  H01L21/304 ,  H01L21/67 ,  H01L21/687 ,  C23C14/26 ,  C23C14/22 ,  B05C11/10

CPC classification number: C23C16/45551 ,  B05C11/1031 ,  C23C14/042 ,  C23C14/228 ,  C23C14/26 ,  C23C14/505 ,  C23C16/402 ,  C23C16/45546 ,  C23C16/4584 ,  C23C16/52 ,  H01L21/304 ,  H01L21/67051 ,  H01L21/67126 ,  H01L21/68764 ,  H01L21/68771 ,  H01L21/68792

Abstract: There is provided a substrate processing apparatus for performing film formation by supplying a processing gas to a substrate, including: a rotary table provided in a processing container; a mounting stand provided to mount the substrate and configured to be revolved by rotating the rotary table; a processing gas supply part configured to supply a processing gas to a region through which the mounting stand passes by the rotation of the rotary table; a rotation shaft rotatably provided in a portion rotating together with the rotary table and configured to support the mounting stand; a driven gear provided on the rotation shaft; a driving gear provided along an entire circumference of a revolution trajectory of the driven gear to face the revolution trajectory of the driven gear and configured to constitute a magnetic gear mechanism with the driven gear; and a rotating mechanism configured to rotate the driving gear.

公开(公告)号：US20240068090A1

公开(公告)日：2024-02-29

申请号：US18236058

申请日：2023-08-21

Applicant: KITZ SCT CORPORATION ,  TOKYO ELECTRON LIMITED

Inventor： Yoshifumi HOSHINO ,  Kaito SUZUKI ,  Yukio OHIZUMI

IPC: C23C14/56 ,  F16K3/02

CPC classification number: C23C14/564 ,  F16K3/0209

Abstract: A gate valve, a substrate processing apparatus, and a substrate processing method which can improve the airtightness and cleanliness of a vacuum processing chamber and a vacuum preliminary chamber. A gate valve has a face facing a vacuum processing chamber and a face facing a vacuum preliminary chamber, the faces abutting on annular sealing members surrounding entire circumferences of substrate loading/unloading ports of the vacuum processing chamber and the vacuum preliminary chamber, and openably and closably connects the vacuum processing chamber and the vacuum preliminary chamber. The gate valve includes sealing channels provided between the sealing members doubly provided outside and inside surrounding the entire circumference of at least one of the substrate loading/unloading ports and between other sealing members doubly provided outside and inside in one or more parts inside the gate valve, and a gas circulation channel including the sealing channels.

公开(公告)号：US20170218514A1

公开(公告)日：2017-08-03

申请号：US15420352

申请日：2017-01-31

Applicant: TOKYO ELECTRON LIMITED

Inventor： Hitoshi KATO ,  Yukio OHIZUMI ,  Manabu HONMA ,  Takeshi KOBAYASHI

IPC: C23C16/458 ,  H01L21/687 ,  C23C16/40 ,  H01J37/32 ,  C23C16/455 ,  C23C16/50

CPC classification number: C23C16/4584 ,  C23C16/402 ,  C23C16/4409 ,  C23C16/45527 ,  C23C16/45536 ,  C23C16/45551 ,  C23C16/45585 ,  H01J37/3244 ,  H01J37/32715 ,  H01J37/32733 ,  H01J37/32779 ,  H01L21/68764 ,  H01L21/68771 ,  H01L21/68785 ,  H01L21/68792

Abstract: A substrate processing apparatus includes a mounting stand installed to rotate about a rotation shaft extending along a rotary shaft of a rotary table and configured to hold a substrate, and a magnetic gear mechanism including a driven gear configured to rotate the mounting stand about the rotation shaft and a driving gear configured to drive the driven gear. The driven gear is connected to the mounting stand via the rotation shaft and installed to rotate in such a direction as to rotate the mounting stand. The driving gear is disposed in a state in which the driving surface faces the driven surface passing through a predetermined position on a movement orbit of the driven gear moving along with the rotation of the rotary table.

公开(公告)号：US20170067160A1

公开(公告)日：2017-03-09

申请号：US15255565

申请日：2016-09-02

Applicant: TOKYO ELECTRON LIMITED

Inventor： Hitoshi KATO ,  Yukio OHIZUMI ,  Manabu HONMA

IPC: C23C16/455 ,  H01L21/02 ,  C23C16/458

CPC classification number: C23C16/45551 ,  C23C16/402 ,  C23C16/45536 ,  C23C16/45578 ,  C23C16/4584 ,  H01L21/02164 ,  H01L21/0228 ,  H01L21/68764 ,  H01L21/68771 ,  H01L21/68792

Abstract: There is provided a substrate processing apparatus for processing a substrate by supplying a processing gas to the substrate while revolving the substrate, the substrate processing apparatus including: a rotary table installed within a processing container; a rotating mechanism configured to rotate the rotary table; a support part installed in a rotary shaft of the rotary table below the rotary table; an opening portion formed in the rotary table to correspond to amounting position where the substrate is mounted; a mounting part rotatably supported by the support part through the opening portion, and configured to mount the substrate thereon such that a height level of an upper surface of the substrate coincides with a height level of an upper surface of the rotary table; and a rotating mechanism configured to rotate the mounting part.

Abstract translation: 提供了一种基板处理装置，用于通过在旋转基板的同时向基板提供处理气体来处理基板，该基板处理装置包括：安装在处理容器内的旋转台; 旋转机构，其构造成旋转所述旋转台; 安装在旋转工作台下方的旋转台的旋转轴上的支撑部; 形成在所述旋转台中的开口部，以对应于安装所述基板的重合位置; 安装部，其通过所述开口部由所述支撑部可旋转地支撑，并且被构造成将所述基板安装在其上，使得所述基板的上表面的高度水平与所述旋转台的上表面的高度水平重合; 以及旋转机构，其构造成旋转所述安装部。