WAFER SYSTEM WITH PARTIAL CUTS
    9.
    发明申请
    WAFER SYSTEM WITH PARTIAL CUTS 有权
    具有部分CUTS的WAFER系统

    公开(公告)号:US20080153262A1

    公开(公告)日:2008-06-26

    申请号:US11615929

    申请日:2006-12-22

    IPC分类号: H01L21/304

    CPC分类号: H01L21/78

    摘要: A wafer system is provided including providing a wafer having a topside and a backside, forming a partial cut from the topside of the wafer within a wafer rim and thinning the wafer from the backside for exposing the partial cut at the backside within the wafer rim.

    摘要翻译: 提供晶片系统,其包括提供具有顶侧和后侧的晶片,在晶片边缘内从晶片的顶侧形成部分切割,并从晶片边缘减薄晶片,以暴露晶片边缘内侧的部分切割。