公开(公告)号：US06609909B2

公开(公告)日：2003-08-26

申请号：US09981633

申请日：2001-10-17

申请人： Taiichiro Aoki ,  Akihiko Nakamura ,  Akinori Nishie

发明人： Taiichiro Aoki ,  Akihiko Nakamura ,  Akinori Nishie

IPC分类号： F27D500

CPC分类号： H01L21/67109 ,  Y10S414/136

摘要： A heat treatment apparatus comprises: a chamber; a cooling plate and a heating plate disposed within the chamber vertically spaced from each other; plural lift pins used to support a material to be treated; a supporting member for supporting the plural lift pins; and an elevator member to which the supporting member is attached through a joint so that the supporting member can be selectively made rotatable and can be fixed at any inclined angle, wherein distances of tips of each of the lift pins from the heating or cooling plate are initially adjusted to be uniform through inclination of the supporting member while the tips contact the heating or cooling plate, after which the supporting member is fixed in an adjusted inclined angle and then the material to be treated is lifted up with the plural lift pins to closely approach the heating or cooling plate during heat treatment.

摘要翻译： 一种热处理设备包括：一个室; 设置在所述室内的冷却板和加热板，其彼此垂直间隔开; 用于支撑要处理的材料的多个提升销; 用于支撑多个提升销的支撑构件; 以及电梯构件，支撑构件通过接头附接到所述电梯构件，使得所述支撑构件能够选择性地制造为可旋转的并且可以以任何倾斜角度被固定，其中每个提升销的顶部距加热或冷却板的距离为 最初通过支撑构件的倾斜调节为均匀，同时尖端接触加热或冷却板，之后将支撑构件以调整的倾斜角度固定，然后将多个提升销钉紧紧地提升待处理材料 在热处理过程中接近加热或冷却板。

公开(公告)号：US07300889B2

公开(公告)日：2007-11-27

申请号：US10914523

申请日：2004-08-09

申请人： Hiroki Endo ,  Taiichiro Aoki ,  Akihiko Nakamura

发明人： Hiroki Endo ,  Taiichiro Aoki ,  Akihiko Nakamura

IPC分类号： H01L

CPC分类号： H01L21/02337 ,  H01L21/02282 ,  H01L21/316 ,  H01L21/76828

摘要： A method for forming a coating film, comprises the steps of: applying a raw material of a low dielectric constant onto a surface of a plate-like material; reducing oxygen concentration in the atmosphere surrounding the plate-like material to be less than or equal to 1% before a surface temperature of said plate-like material to be treated rises to 200° C.; thereafter heating said plate-like material to a temperature greater than or equal to 400° C.; and then maintaining the oxygen content in the atmosphere to be less than or equal to 1% until the surface temperature of said plate-like material to be treated lowers to 200° C. The raw material is an organic SOG obtained by hydrolyzing and condensing at least one alkoxysilane compound into an organic solvent under an acid catalyst.

摘要翻译： 形成涂膜的方法包括以下步骤：将低介电常数的原料施加到板状材料的表面上; 在板状材料的表面温度升高到200℃之前，将板状材料周围的气氛中的氧浓度降低至1％以下。 然后将所述板状材料加热至大于或等于400℃的温度; 然后将大气中的氧含量保持在1％以下，直到所述板状材料的表面温度降低到200℃为止。原料是通过水解和缩合至少一种烷氧基硅烷得到的有机SOG 在酸催化剂下形成有机溶剂。

公开(公告)号：US07166184B2

公开(公告)日：2007-01-23

申请号：US10778947

申请日：2004-02-16

申请人： Akihiko Nakamura ,  Taiichiro Aoki ,  Seiji Ohishi ,  Tamotsu Sasaki

发明人： Akihiko Nakamura ,  Taiichiro Aoki ,  Seiji Ohishi ,  Tamotsu Sasaki

IPC分类号： G03B27/32 ,  H01L21/68

CPC分类号： G03F7/3021 ,  Y10S134/902

摘要： A multi-stage type processing apparatus which can be positioned in a limited space without having a complicated driving mechanism, includes processing units which are stacked in a multi-stage state in the vertical direction. Each processing unit has a cup surrounding a substrate and a chuck for retaining and rotating a substrate, and the cup can be elevated and lowered with respect to the chuck. A cylinder unit is contracted and thereby all the cups are unitarily lowered, so that the top surface of the chuck is located in a slightly upper position with respect to the top surface of the cup. In this state, a substrate is mounted on the chuck and attracted. Next, the cylinder unit is extended and thereby all the cups are unitarily elevated so as to accommodate the substrate therein. In this state, developing liquid is dropped from a nozzle for developing liquid onto the center of the substrate, and a motor is driven to rotate the chuck (the substrate) via a drive shaft and a timing belt to allow the developing liquid to cover the entire surface of the substrate.

摘要翻译： 可以定位在有限空间中而不具有复杂驱动机构的多级型处理装置包括在垂直方向上以多级状态堆叠的处理单元。 每个处理单元具有围绕基板的杯和用于保持和旋转基底的卡盘，并且杯可以相对于卡盘升高和降低。 气缸单元收缩，从而所有的杯子一体地降低，使得卡盘的顶表面相对于杯的顶表面位于较高的位置。 在这种状态下，将基板安装在卡盘上并被吸引。 接下来，气缸单元延伸，从而所有的杯子一体地升高，以便容纳衬底。 在这种状态下，显影液从用于显影液的喷嘴滴落到基板的中心，驱动马达驱动以通过驱动轴和同步皮带旋转卡盘（基板），以使显影液覆盖 基片的整个表面。

公开(公告)号：US20050009363A1

公开(公告)日：2005-01-13

申请号：US10914523

申请日：2004-08-09

申请人： Hiroki Endo ,  Taiichiro Aoki ,  Akihiko Nakamura

发明人： Hiroki Endo ,  Taiichiro Aoki ,  Akihiko Nakamura

IPC分类号： H01L21/20 ,  H01L21/31 ,  H01L21/312 ,  H01L21/314 ,  H01L21/316 ,  H01L21/768 ,  C23F3/00 ,  B23P9/00 ,  H01L21/469

CPC分类号： H01L21/02337 ,  H01L21/02282 ,  H01L21/316 ,  H01L21/76828

摘要： A method for forming a coating film, comprises the steps of: applying a raw material of a low dielectric constant onto a surface of a plate-like material to be treated; reducing oxygen concentration in the atmosphere surrounding the plate-like material to be less than or equal to 1% before a surface temperature of said plate-like material to be treated rises to 200° C.; thereafter heating said plate-like material to be treated to a temperature greater than or equal to 400° C.; and then maintaining the oxygen content in the atmosphere to be less than or equal to 1% until the surface temperature of said plate-like material to be treated lowers to 200° C. The raw material is an organic SOG obtained by hydrolyzing and condensing at least one alkoxysilane compound expressed by the following equation (I) into an organic solvent under an acid catalyst, RnSi(OR1)4-n   (I) where R is an alkyl group or an aryl group having a carbon number of 1-4, R1is an alkyl group having a carbon number of 1-4, and n is an integer of 0-2.

摘要翻译： 一种形成涂膜的方法，包括以下步骤：将低介电常数的原料施加到待处理的板状材料的表面上; 在待处理的板状材料的表面温度升高到200℃之前，将板状材料周围的气氛中的氧浓度降低至1％以下。 然后将待处理的板状材料加热至大于或等于400℃的温度; 然后将气氛中的氧含量保持在1％以下，直到所述待处理的板状材料的表面温度降至200℃为止。原料是通过水解和冷凝得到的有机SOG 由下式（I）表示的至少一种烷氧基硅烷化合物在酸催化剂RnSi（OR 1）4-n（I）表示的有机溶剂中，其中R是烷基或碳数为1的芳基 -4，R 1是碳数为1-4的烷基，n为0-2的整数。

公开(公告)号：US07569253B2

公开(公告)日：2009-08-04

申请号：US10997068

申请日：2004-11-24

申请人： Taiichiro Aoki

发明人： Taiichiro Aoki

IPC分类号： B05D3/02

CPC分类号： H01L21/6715 ,  B05D3/0218 ,  G03F7/168 ,  H01L21/67109 ,  H01L21/67178

摘要： A film-forming method is provided in which generation of an edge bead can be prevented even in a case where the thickness of a coating solution is large, and includes the steps of applying a coating solution onto a substrate to be treated such that thickness of the coating solution is 20 μm or more, placing the substrate into a heating space defined within an oven unit in which heating devices are provided in upper and lower portions of the heating space, and heating the substrate at a temperature-rising rate of 80 to 120° C./10 min so as to remove a solvent within the coating solution while keeping the substrate in a non-contact state with respect to the heating devices.

摘要翻译： 提供了一种成膜方法，其中即使在涂布溶液的厚度大的情况下也能够防止边缘珠的产生，并且包括以下步骤：将涂布溶液涂覆在待处理的基材上，使得 涂布溶液为20μm以上，将基板放置在加热装置内设置的加热空间内，加热装置设置在加热空间的上部和下部，并以80℃的升温速度加热基板 120℃×10分钟，以便在保持基板相对于加热装置处于非接触状态的同时除去涂布溶液中的溶剂。

公开(公告)号：US06287067B1

公开(公告)日：2001-09-11

申请号：US08947543

申请日：1997-10-11

申请人： Hidenori Miyamoto ,  Susumu Okano ,  Koji Ueda ,  Taiichiro Aoki

发明人： Hidenori Miyamoto ,  Susumu Okano ,  Koji Ueda ,  Taiichiro Aoki

IPC分类号： B65H100

CPC分类号： H01L21/67161 ,  B23P21/004 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/67742 ,  Y10S414/135 ,  Y10S414/136

摘要： A processing unit structure 1 a plurality of processing units 2, . . . , assembled together continuously in a horizontal direction, wherein a transfer portion 3 is provided on the top of each processing unit 2, . . . , for transferring the plate-like material to be processed between adjacent one of the processing units. A transfer device, such as a shuttle (SH) is provided in each of the transfer portions 3. Each processing unit 2 performs a series of processes on the plate-like material and is constructed with processing blocks 4 and 4 and a transfer portion 3 in the form of a transfer robot (R) positioned between the processing blocks 4 and 4. Further, each processing unit 2. . . is independent from one another so that it is possible to selectively add and remove different ones of the processing units with respect to the processing unit structure 1.

摘要翻译： 处理单元结构1是多个处理单元2，...。 。 。 在水平方向上连续地组装在一起，其中传送部分3设置在每个处理单元2的顶部。 。 。 用于在相邻的一个处理单元之间传送待处理的板状材料。 在每个转印部分3中设置有诸如梭（SH）的转印装置。每个处理单元2对板状材料执行一系列处理，并且由处理块4和4以及转印部3 以位于处理块4和4之间的传送机器人（R）的形式。此外，每个处理单元2。 。 彼此独立，使得可以相对于处理单元结构1选择性地添加和去除处理单元中的不同处理单元。

公开(公告)号：US07005009B2

公开(公告)日：2006-02-28

申请号：US10308964

申请日：2002-12-03

申请人： Taiichiro Aoki ,  Seiji Ohishi ,  Hiroshi Yamabe ,  Hitoshi Obata

发明人： Taiichiro Aoki ,  Seiji Ohishi ,  Hiroshi Yamabe ,  Hitoshi Obata

IPC分类号： B05C13/00

CPC分类号： H01L21/67346 ,  B05C5/0279 ,  H01L21/67046 ,  H01L21/67051

摘要： The object of the present invention is to provide an apparatus suitable for forming a thick film having a thickness on a surface of a substrate such as a glass substrate, a semiconductor wafer or the like. In the apparatus according to the present invention, a stock station for a substrate and a treatment station for a substrate are adjacent to each other, portions for coating, film-forming, cleaning and drying are provided in the treatment station, a tray having a concave portion for accommodating a substrate defined on the surface thereof is provided, and a transfer device circulates the tray around the portions for coating, film-forming, cleaning and drying.

公开(公告)号：US20050196536A1

公开(公告)日：2005-09-08

申请号：US10997068

申请日：2004-11-24

申请人： Taiichiro Aoki

发明人： Taiichiro Aoki

IPC分类号： B05D3/02 ,  H01L21/027

CPC分类号： H01L21/6715 ,  B05D3/0218 ,  G03F7/168 ,  H01L21/67109 ,  H01L21/67178

摘要： A film-forming method is provided in which generation of an edge bead can be prevented even in a case where the thickness of a coating solution is large. A substrate to be treated W is heated while being mounted on pins which are provided in the upper surface of a partition plate. A resist solution applied onto the substrate to be treated W is formed into a film by heating. After heating, a slight projection is formed at a position measured 4 mm from the outer peripheral end of the film towards the inside in a radial direction. However, since the projection does not substantially affect the uniformity, it is enough to remove the outer peripheral portion measured 2 mm from the outer peripheral end toward the inside in a radial direction by using a rinse liquid.

摘要翻译： 提供一种成膜方法，其中即使在涂布溶液的厚度大的情况下也可以防止边缘珠的产生。 待处理的基板W被安装在设置在隔板的上表面上的销上。 通过加热将施加在被处理基板W上的抗蚀剂溶液形成为膜。 加热后，在距膜的外周端部向径向内侧测量的位置处形成稍微的突起。 然而，由于突起基本上不影响均匀性，因此通过使用冲洗液体将从外周端向外侧2mm向外侧测量的外周部分沿径向移除是足够的。

公开(公告)号：US07153365B2

公开(公告)日：2006-12-26

申请号：US10745275

申请日：2003-12-23

申请人： Taiichiro Aoki

发明人： Taiichiro Aoki

IPC分类号： B05C13/00

CPC分类号： H01L21/6838 ,  H01L21/6715 ,  H01L21/67346

摘要： A tray, used for transferring a substrate and conducting a coating process, includes a recessed portion to accommodate a substrate, the depth of the recessed portion being substantially the same as the thickness of the substrate, and a one-step-lower gutter which is provided on an outer periphery of said recessed portion or inside the outer periphery of said recessed portion. The tray may further comprise a plurality of attracting grooves which are provided concentrically in a surface of said recessed portion; attracting holes which are provided in each attracting groove, respective attracting passages by which said attracting holes are connected to a vacuum source, and a pre-dispensing area which is formed on the same surface as the recessed portion to receive a coating liquid from a nozzle

摘要翻译： 用于传送衬底和进行涂覆工艺的托盘包括：凹部，用于容纳衬底，凹部的深度与衬底的厚度基本相同;以及一步下槽，其为 设置在所述凹部的外周或​​所述凹部的外周内。 托盘还可以包括多个吸引槽，它们同心地设置在所述凹部的表面中; 在每个吸引槽中设置吸引孔，将吸引孔连接到真空源的各吸引通路和与凹部相同的表面形成的预分配区域，以从喷嘴接收涂布液

公开(公告)号：US6071673A

公开(公告)日：2000-06-06

申请号：US138073

申请日：1998-08-21

申请人： Etsuko Iguchi ,  Toshimasa Nakayama ,  Taiichiro Aoki

发明人： Etsuko Iguchi ,  Toshimasa Nakayama ,  Taiichiro Aoki

IPC分类号： G03F7/004 ,  C09D5/00 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027 ,  G03F7/00

CPC分类号： G03F7/091 ,  Y10S430/151

摘要： The present invention provides a method for the formation of a pattern, which comprises applying an antireflective coating film-forming composition solution comprising (A) a compound which undergoes crosslinking reaction when irradiated with actinic rays and (B) a dye to a substrate to form a coating film thereon, entirely irradiating the coating film with actinic rays to form an antireflective coating film, applying a resist solution to the antireflective coating film, drying the coated material to form a resist layer, and then subjecting the coated material to lithographic treatment to form a resist pattern on the antireflective coating film. The method enables the formation of a resist pattern having an excellent dimensional accuracy and section shape without causing the formation of an intermixed layer between the resist composition and antireflective coating film.

摘要翻译： 本发明提供了形成图案的方法，其包括施加抗反射涂膜组合物溶液，其包含（A）当用光化射线照射时经历交联反应的化合物和（B）染料至基底以形成 其上涂覆膜，用光化射线全面照射涂膜以形成抗反射涂膜，将抗蚀剂溶液施加到抗反射涂膜上，干燥涂覆的材料以形成抗蚀剂层，然后将涂覆的材料进行平版印刷处理 在抗反射涂膜上形成抗蚀剂图案。 该方法能够形成具有优异的尺寸精度和截面形状的抗蚀剂图案，而不会在抗蚀剂组合物和抗反射涂膜之间形成混合层。