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公开(公告)号:US20170317054A1
公开(公告)日:2017-11-02
申请号:US15237428
申请日:2016-08-15
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Chih-Chiang TSAO , Hsiu-Jen LIN , Chun-Cheng LIN , Chih-Wei LIN , Ming-Da CHENG , Ching-Hua HSIEH , Chung-Shi LIU
IPC: H01L25/065 , H01L21/56 , H01L21/683 , H01L23/00 , H01L25/00 , H01L21/48 , H01L21/50 , H01L21/60
CPC classification number: H01L25/0652 , H01L21/486 , H01L21/50 , H01L21/561 , H01L21/563 , H01L21/568 , H01L21/6835 , H01L21/6836 , H01L23/3128 , H01L23/5387 , H01L23/5389 , H01L24/02 , H01L24/19 , H01L24/20 , H01L24/97 , H01L25/0657 , H01L25/105 , H01L25/50 , H01L2021/6003 , H01L2021/60052 , H01L2021/6009 , H01L2021/60247 , H01L2021/60255 , H01L2221/68331 , H01L2221/68359 , H01L2221/68368 , H01L2221/68372 , H01L2224/02331 , H01L2224/02373 , H01L2224/02379 , H01L2224/04105 , H01L2224/12105 , H01L2224/24137 , H01L2224/32225 , H01L2224/73267 , H01L2224/92244 , H01L2224/97 , H01L2225/06517 , H01L2225/06548 , H01L2225/06568 , H01L2225/1035 , H01L2225/1058 , H01L2924/15311 , H01L2924/3511 , H01L2224/83
Abstract: A package structure includes a molding material, at least one through-via, at least one conductor, at least one dummy structure and an underfill. The through-via extends through the molding material. The conductor is present on the through-via. The dummy structure is present on the molding material and includes a dielectric material. The underfill is at least partially present between the conductor and the dummy structure.
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公开(公告)号:US20240290734A1
公开(公告)日:2024-08-29
申请号:US18655596
申请日:2024-05-06
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Chih-Hsuan TAI , Ting-Ting KUO , Yu-Chih HUANG , Chih-Wei LIN , Hsiu-Jen LIN , Chih-Hua CHEN , Ming-Da CHENG , Ching-Hua HSIEH , Hao-Yi TSAI , Chung-Shi LIU
IPC: H01L23/00 , H01L21/683 , H01L23/31
CPC classification number: H01L24/02 , H01L21/6835 , H01L21/6836 , H01L23/3114 , H01L23/3135 , H01L24/19 , H01L24/96 , H01L24/97 , H01L23/3128 , H01L2221/68327 , H01L2221/6834 , H01L2221/68359 , H01L2221/68372 , H01L2224/02311 , H01L2224/02319 , H01L2224/02331 , H01L2224/02371 , H01L2224/02379 , H01L2224/02381 , H01L2224/12105
Abstract: A package structure includes a semiconductor device, a molding compound, a first dielectric layer, and a through-via. The molding compound is in contact with a sidewall of the semiconductor device. The first dielectric layer is over the molding compound and the semiconductor device. The through-via is in the molding compound and the first dielectric layer. The through-via is a continuous element and in contact with the first dielectric layer.
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公开(公告)号:US20220165689A1
公开(公告)日:2022-05-26
申请号:US17670481
申请日:2022-02-13
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Chih-Hsuan TAI , Ting-Ting KUO , Yu-Chih HUANG , Chih-Wei LIN , Hsiu-Jen LIN , Chih-Hua CHEN , Ming-Da CHENG , Ching-Hua HSIEH , Hao-Yi TSAI , Chung-Shi LIU
IPC: H01L23/00 , H01L23/31 , H01L21/683
Abstract: A package structure includes a semiconductor device, a molding compound, a first dielectric layer, and a through-via. The molding compound is in contact with a sidewall of the semiconductor device. The first dielectric layer is over the molding compound and the semiconductor device. The through-via is in the molding compound and the first dielectric layer. The through-via is a continuous element and in contact with the first dielectric layer.
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公开(公告)号:US20200294944A1
公开(公告)日:2020-09-17
申请号:US16888758
申请日:2020-05-31
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Chih-Hsuan TAI , Ting-Ting KUO , Yu-Chih HUANG , Chih-Wei LIN , Hsiu-Jen LIN , Chih-Hua CHEN , Ming-Da CHENG , Ching-Hua HSIEH , Hao-Yi TSAI , Chung-Shi LIU
IPC: H01L23/00 , H01L23/31 , H01L21/683
Abstract: A package structure includes a semiconductor device, a molding compound, a first dielectric layer, and a through-via. The molding compound is in contact with a sidewall of the semiconductor device. The first dielectric layer is over the molding compound and the semiconductor device. The through-via is in the molding compound and the first dielectric layer. The through-via is a continuous element and in contact with the first dielectric layer.
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公开(公告)号:US20180286823A1
公开(公告)日:2018-10-04
申请号:US15726260
申请日:2017-10-05
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Chih-Hsuan TAI , Ting-Ting KUO , Yu-Chih HUANG , Chih-Wei LIN , Hsiu-Jen LIN , Chih-Hua CHEN , Ming-Da CHENG , Ching-Hua HSIEH , Hao-Yi TSAI , Chung-Shi LIU
Abstract: A method of forming a package structure includes disposing a semiconductor device over a first dielectric layer, wherein a first redistribution line is in the first dielectric layer, forming a molding compound over the first dielectric layer and in contact with a sidewall of the semiconductor device, forming a second dielectric layer over the molding compound and the semiconductor device, forming a first opening in the second dielectric layer, the molding compound, and the first dielectric layer to expose the first redistribution line, and forming a first conductor in the first opening, wherein the first conductor is electrically connected to the first redistribution line.
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公开(公告)号:US20180315728A1
公开(公告)日:2018-11-01
申请号:US15499962
申请日:2017-04-28
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Hao-Jan PEI , Chih-Chiang TSAO , Wei-Yu CHEN , Hsiu-Jen LIN , Ming-Da CHENG , Ching-Hua HSIEH , Chung-Shi LIU
CPC classification number: H01L24/19 , H01L21/565 , H01L21/6835 , H01L23/293 , H01L23/3128 , H01L24/13 , H01L24/25 , H01L24/73 , H01L24/96 , H01L25/105 , H01L2221/68345 , H01L2221/68368 , H01L2224/13024 , H01L2224/19 , H01L2224/25171 , H01L2224/2518 , H01L2224/73209 , H01L2225/1035 , H01L2225/1058 , H01L2924/3511
Abstract: Structures and formation methods of a chip package are provided. The method includes forming a protective layer to surround a semiconductor die, and the protective layer has opposing first and second surfaces. The method also includes forming a dielectric layer over the first surface of the protective layer and the semiconductor die. The method further includes forming a conductive feature over the dielectric layer such that the conductive feature is electrically connected to a conductive element of the semiconductor die. In addition, the method includes printing a warpage-control element over the second surface of the protective layer and the semiconductor die such that the semiconductor die is between the warpage-control element and the dielectric layer.
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公开(公告)号:US20200279823A1
公开(公告)日:2020-09-03
申请号:US16876371
申请日:2020-05-18
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Hao-Jan PEI , Chih-Chiang TSAO , Wei-Yu CHEN , Hsiu-Jen LIN , Ming-Da CHENG , Ching-Hua HSIEH , Chung-Shi LIU
Abstract: A method for forming a package structure is provided. The method includes forming a protective layer to surround a semiconductor die and forming a conductive structure over the protective layer. The method also includes disposing a polymer-containing material over the protective layer to partially surround the conductive structure. The method further includes curing the polymer-containing material to form a warpage-control element.
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公开(公告)号:US20190252340A1
公开(公告)日:2019-08-15
申请号:US16398119
申请日:2019-04-29
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd
Inventor: Hao-Jan PEI , Chih-Chiang TSAO , Wei-Yu CHEN , Hsiu-Jen LIN , Ming-Da CHENG , Ching-Hua HSIEH , Chung-Shi LIU
CPC classification number: H01L24/19 , H01L21/565 , H01L21/6835 , H01L23/293 , H01L23/3128 , H01L24/13 , H01L24/25 , H01L24/73 , H01L24/96 , H01L25/105 , H01L25/115 , H01L2221/68345 , H01L2221/68368 , H01L2224/13024 , H01L2224/19 , H01L2224/25171 , H01L2224/2518 , H01L2224/73209 , H01L2225/1035 , H01L2225/1058 , H01L2924/3511
Abstract: A package structure is provided. The package structure includes a semiconductor die and a protective layer surrounding the semiconductor die. The package structure also includes a conductive structure and a warpage-control element over a same side of the protective layer. A bottom surface of the warpage-control element is higher than a bottom surface of the conductive structure. The bottom surface of the warpage-control element is lower than a top surface of the conductive bump.
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