公开(公告)号：US07985866B2

公开(公告)日：2011-07-26

申请号：US12076625

申请日：2008-03-20

申请人： Takahiro Iwahama ,  Tatsuya Nakano ,  Keizo Inoue ,  Hiroto Miyake ,  Tsukasa Yoshida ,  Mitsuru Ohno ,  Yoshinori Funaki

发明人： Takahiro Iwahama ,  Tatsuya Nakano ,  Keizo Inoue ,  Hiroto Miyake ,  Tsukasa Yoshida ,  Mitsuru Ohno ,  Yoshinori Funaki

IPC分类号： C07D305/14 ,  C07D305/00

CPC分类号： C07D303/22 ,  C07D305/06 ,  C08F24/00

摘要： Disclosed is an oxetane-containing vinyl ether compound including one or more aromatic or non-aromatic carbocycles and/or two or more vinyl ether structures, such as a compound of Formula: wherein Ring Z1 is non-aromatic carbocycle; Ra is vinyl group of Formula: wherein each of R1, R2, and R3 is hydrogen or C1-C4 alkyl; Wa is single bond or organic group having a valence of (m+1); X1 is, for example, hydrocarbon; “m” and “q” are each 1 or 2; and “p” is 0 to 5. Also disclosed is an alicyclic epoxy-containing vinyl ether compound of Formula: wherein Ring Z2 is non-aromatic carbocycle; Rb is vinyl group of Formula: wherein R4, R5 and R6 are each hydrogen or C1-C4 alkyl; Wb is single bond or organic group having a valence of (r+1); Rc and Rd are hydrogen or alkyl; and “r” and “s” are 1 or 2.

摘要翻译： 公开了包含一种或多种芳族或非芳族碳环和/或两个或多个乙烯基醚结构的含氧杂环丁烷的乙烯基醚化合物，例如下式的化合物：其中环Z1是非芳族碳环; Ra是式的乙烯基：其中R 1，R 2和R 3各自是氢或C 1 -C 4烷基; Wa是单键或化合价（m + 1）的有机基团; X1是例如烃; “m”和“q”分别为1或2; 并且“p”为0至5.还公开了下式的脂环族环氧基乙烯基醚化合物：其中环Z2是非芳族碳环; Rb是式的乙烯基：其中R 4，R 5和R 6各自为氢或C 1 -C 4烷基; Wb是单键或化合价（r + 1）的有机基团; Rc和R d是氢或烷基; “r”和“s”为1或2。

公开(公告)号：US20080234455A1

公开(公告)日：2008-09-25

申请号：US12076625

申请日：2008-03-20

申请人： Takahiro Iwahama ,  Tatsuya Nakano ,  Keizo Inoue ,  Hiroto Miyake ,  Tsukasa Yoshida ,  Mitsuru Ohno ,  Yoshinori Funaki

发明人： Takahiro Iwahama ,  Tatsuya Nakano ,  Keizo Inoue ,  Hiroto Miyake ,  Tsukasa Yoshida ,  Mitsuru Ohno ,  Yoshinori Funaki

IPC分类号： C08F24/00 ,  C07D303/02 ,  C07D305/00

CPC分类号： C07D303/22 ,  C07D305/06 ,  C08F24/00

摘要： Disclosed is an oxetane-containing vinyl ether compound including one or more aromatic or non-aromatic carbocycles and/or two or more vinyl ether structures, such as a compound of Formula: wherein Ring Z1 is non-aromatic carbocycle; Ra is vinyl group of Formula: wherein each of R1, R2, and R3 is hydrogen or C1-C4 alkyl; Wa is single bond or organic group having a valence of (m+1); X1 is, for example, hydrocarbon; “m” and “q” are each 1 or 2; and “p” is 0 to 5. Also disclosed is an alicyclic epoxy-containing vinyl ether compound of Formula: wherein Ring Z2 is non-aromatic carbocycle; Rb is vinyl group of Formula: wherein R4, R5 and R6 are each hydrogen or C1-C4 alkyl; Wb is single bond or organic group having a valence of (r+1); Rc and Rd are hydrogen or alkyl; and “r” and “s” are 1 or 2.

摘要翻译： 公开了包含一种或多种芳族或非芳族碳环和/或两个或多个乙烯基醚结构的含氧杂环丁烷的乙烯基醚化合物，例如下式的化合物：其中环Z 1是非 - 芳香碳环 R a是乙烯基，其中R 1，R 2和R 3各自为氢 或C 1 -C 4烷基; 化合物是单键或化合价（m + 1）的有机基团。 X 1是例如烃; “m”和“q”分别为1或2; 并且“p”为0至5.还公开了下式的脂环族环氧基乙烯基醚化合物：其中Z 2是非芳族碳环; R b是下式的乙烯基：其中R 4，R 5和R 6各自是氢或C 1 -C 1-4烷基; W是单键或化合价（r + 1）的有机基团。 R d和R d是氢或烷基; “r”和“s”为1或2。

公开(公告)号：US07105268B2

公开(公告)日：2006-09-12

申请号：US10239051

申请日：2001-12-11

申请人： Yoshinori Funaki ,  Kiyoharu Tsutsumi ,  Keizo Inoue ,  Tomoko Adachi

发明人： Yoshinori Funaki ,  Kiyoharu Tsutsumi ,  Keizo Inoue ,  Tomoko Adachi

IPC分类号： G03F7/039 ,  G03F7/26 ,  C08F20/28 ,  C07D311/94 ,  C07D313/20

CPC分类号： G03F7/0395 ,  G03F7/0397 ,  Y10S430/109

摘要： A polymeric compound for photoresist of the invention includes at least one monomer unit represented by following Formula (I): wherein R1, R2, R3, R4 and R5 are the same or different and are each a hydrogen atom or a methyl group; m, p and q each denote an integer of from 0 to 2; and n denotes 0 or 1, where the hydroxyl group and carbonyloxy group extending from a principle chain in the formula are independently combined with either of two carbon atoms on the far-left portion of the rings. By using the polymeric compound for photoresist as a base of a photoresist, the resulting photoresist exhibits well-rounded adhesion to substrates and resistance to etching.

摘要翻译： 本发明的光刻胶用高分子化合物包括至少一种由下式（I）表示的单体单元：其中R 1，R 2，R 3， R 4，R 4和R 5相同或不同，各自为氢原子或甲基; m，p和q分别表示0〜2的整数。 并且n表示0或1，其中从式中的主链延伸的羟基和羰氧基独立地与环的最左部分的两个碳原子中的任一个结合。 通过使用光致抗蚀剂的高分子化合物作为光致抗蚀剂的基底，所得到的光致抗蚀剂表现出对基底的良好的圆形粘附性和耐蚀刻性。

公开(公告)号：US06692889B1

公开(公告)日：2004-02-17

申请号：US09806857

申请日：2001-04-05

申请人： Yoshinori Funaki ,  Kiyoharu Tsutsumi ,  Akira Takaragi ,  Keizo Inoue

发明人： Yoshinori Funaki ,  Kiyoharu Tsutsumi ,  Akira Takaragi ,  Keizo Inoue

IPC分类号： G03F7004

CPC分类号： G03F7/0392 ,  G03F7/0045 ,  G03F7/021 ,  G03F7/023 ,  G03F7/0233 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/164 ,  Y10S430/106

摘要： A polymeric compound of the invention includes at least one monomer unit selected from the following formulae (I), (II), (III) and (IV): (wherein R1 is a hydrogen atom or a methyl group, R2 and R3 are each a hydrogen atom, a hydroxyl group or a —COOR4 group, where R4 is, e.g., a t-butyl group or a 2-tetrahydropyranyl group; R5 and R6 are each a hydrogen atom, a hydroxyl group or an oxo group; R7, R8 and R9 are each a hydrogen atom or a methyl group; R10 and R11 are each a hydrocarbon group having 1 to 8 carbon atoms; R12, R13 and R14 are each a hydrogen atom, a hydroxyl group or a methyl group, where if all of R12 to R14 are each a hydrogen atom or a hydroxyl group, R10 and R11 are not coincidentally methyl groups) [wherein, when the compound includes, for example, a monomer unit of Formula (III), the compound further includes at least one monomer unit selected from among, for example, a monomer unit represented by the following Formula (V): (wherein R15 and R16 are each a hydrogen atom, a hydroxyl group or a carboxyl group; R17 is a hydroxyl group, an oxo group or a carboxyl group; and R1 has the same meaning as defined above)]. This polymeric compound has high etching resistance, as well as satisfactory transparency, alkali-solubility and adhesion, and is therefore useful as a photoresist resin.

摘要翻译： 本发明的高分子化合物包括至少一种选自下式（I），（II），（III）和（IV）的单体单元:(其中R 1是氢原子或甲基， 2>和R 3各自为氢原子，羟基或-COOR 4基团，其中R 4为例如叔丁基或2-四氢吡喃基; R 5为氢原子， R 6和R 6各自为氢原子，羟基或氧代基; R 7，R 8和R 9各自为氢原子或甲基; R 10和R 8为氢原子， 11>各自为具有1至8个碳原子的烃基; R 12，R 13和R 14各自为氢原子，羟基或甲基，其中如果全部R 12， 至R 14各自为氢原子或羟基，R 10和R 11不是甲基），其中，当该化合物包括例如式（III）的单体单元时， 该化合物还包括至少一种单体单元，其选自例如由下式（V）表示的单体单元:(其中 R 15和R 16各自为氢原子，羟基或羧基; R 17是羟基，氧代基或羧基; 和R 1具有与上述相同的含义]]。 该高分子化合物具有高耐蚀刻性，以及令人满意的透明度，碱溶性和粘附性，因此可用作光致抗蚀剂树脂。

公开(公告)号：US20120027342A1

公开(公告)日：2012-02-02

申请号：US13260880

申请日：2010-03-30

申请人： Tsukasa Yoshida ,  Yoshinori Funaki ,  Yo Yamato

发明人： Tsukasa Yoshida ,  Yoshinori Funaki ,  Yo Yamato

IPC分类号： G02B6/12 ,  B29C59/02 ,  B05D5/06 ,  C08F279/02 ,  C08G64/02

CPC分类号： G02B6/02033 ,  C08G59/027 ,  C08G65/14 ,  C08L63/08 ,  C09D4/00

摘要： Provided is a cationically polymerizable resin composition which has a low viscosity, is easy to work, and is extremely rapidly cured upon irradiation with light to give a cured product excellent in optical transparency, flexibility, thermal stability, and post-heating bendability.The cationically polymerizable resin composition includes an oxetane-ring-containing vinyl ether compound (A) and/or an alicyclic-epoxy-group-containing vinyl ether compound (B); an oligomer or polymer (C) containing, in the molecule, at least one selected from oxetane group, epoxy group, hydroxyl group, vinyl ether group, and an aliphatic or alicyclic unsaturated hydrocarbon group and having a molecular weight of 500 or more; and an oxetane compound (D) containing no vinyl ether group and having 6 or more carbon atoms.

摘要翻译： 本发明提供一种粘度低，易于加工的光聚合性树脂组合物，在照射光时极其固化，得到光学透明性，柔软性，热稳定性和后加热弯曲性优异的固化物。 阳离子聚合性树脂组合物包含含氧杂环丁烷环的乙烯基醚化合物（A）和/或含脂环式环氧基的乙烯基醚化合物（B）; 在分子中含有选自氧杂环丁烷基，环氧基，羟基，乙烯基醚基和脂族或脂环族不饱和烃基中的至少一种，分子量为500以上的低分子或聚合物（C） 和不含乙烯基醚基并且具有6个或更多个碳原子的氧杂环丁烷化合物（D）。

公开(公告)号：US06440636B1

公开(公告)日：2002-08-27

申请号：US09703677

申请日：2000-11-02

申请人： Toru Ushirogouchi ,  Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Yoshinori Funaki ,  Kiyoharu Tsutsumi ,  Akira Takaragi ,  Keizo Inoue

发明人： Toru Ushirogouchi ,  Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Yoshinori Funaki ,  Kiyoharu Tsutsumi ,  Akira Takaragi ,  Keizo Inoue

IPC分类号： G03F7004

CPC分类号： G03F7/0397 ,  C08F20/18 ,  C08F20/30

摘要： A polymeric compound includes at least one monomeric unit of the following formula (I): wherein R1 is a hydrogen atom or a methyl group; and each of R2 and R3 is independently a hydrogen atom or a hydroxyl group. The polymeric compound may include the monomeric unit and at least one monomeric unit selected from monomeric units represented by the following formulae (IIa) and (IIb): wherein R1 is a hydrogen atom or a methyl group; each of R4 and R5 is, for example, a hydrogen atom, a hydroxyl group, an oxo group, or a carboxyl group, wherein R4 and R5 are not concurrently hydrogen atoms; and each of R7 and R8 is independently a hydrogen atom, a hydroxyl group, or an oxo group. The polymeric compound have a high etching resistance in addition to satisfactory transparency, alkali-solubility, and adhesion.

摘要翻译： 聚合化合物包括至少一种下式（I）的单体单元：其中R1是氢原子或甲基; R2和R3各自独立地为氢原子或羟基。 聚合化合物可以包括单体单元和选自下式（IIa）和（IIb）表示的单体单元的至少一种单体单元：其中R 1是氢原子或甲基; R4和R5各自为例如氢原子，羟基，氧代基或羧基，其中R4和R5不同时为氢原子; R 7和R 8各自独立地为氢原子，羟基或氧代基。 除了令人满意的透明性，碱溶性和粘合性之外，高分子化合物具有高的耐蚀刻性。

公开(公告)号：US06391520B1

公开(公告)日：2002-05-21

申请号：US09463138

申请日：2000-03-20

申请人： Tatsuya Nakano ,  Yoshinori Funaki

发明人： Tatsuya Nakano ,  Yoshinori Funaki

IPC分类号： G03F7004

CPC分类号： G03F7/0045 ,  G03F7/039 ,  G03F7/0397

摘要： The photoresist resin composition comprises a polymer having an adamantane skeleton represented by the following formula and a photoactive acid precursor: wherein R1 represents a hydrogen atom or a methyl group; R2, R3, and R4 are the same or different from each other, each representing a hydrogen atom, a halogen atom, an alkyl group, a hydroxyl group, a hydroxylmethyl group, a carboxyl group, a functional group which forms a hydroxyl group, a hydroxymethyl group or a carboxyl group by elimination with an acid; at least one of the substituents R2 to R4 is the functional group defined above; X represents an ester bond or an amide bond; and each of m and n is 0 or 1. The above photoresist resin composition is highly resistant to an etching solution, solubilizable by irradiation with light, and capable of giving minute patterns.

摘要翻译： 光致抗蚀剂树脂组合物包含具有由下式表示的金刚烷骨架的聚合物和光活性酸前体：其中R1表示氢原子或甲基; R2，R3和R4彼此相同或不同，各自表示氢原子，卤素原子，烷基，羟基，羟甲基，羧基，形成羟基的官能团， 用酸去除羟甲基或羧基; 取代基R2至R4中的至少一个是上述定义的官能团; X表示酯键或酰胺键; m和n分别为0或1.上述光致抗蚀剂树脂组合物对蚀刻溶液具有高度的耐蚀性，可通过光照射而溶解，并且能够产生微小的图案。

公开(公告)号：US06486265B1

公开(公告)日：2002-11-26

申请号：US09719395

申请日：2001-02-22

申请人： Yasutaka Ishii ,  Yoshinori Funaki ,  Tatsuya Nakano

发明人： Yasutaka Ishii ,  Yoshinori Funaki ,  Tatsuya Nakano

IPC分类号： C08F800

CPC分类号： C08J7/12

摘要： An invented method for the surface modification of a molded plastic treats a molded plastic with an oxygen-atom-containing gas such as oxygen, carbon monoxide, a nitrogen oxide, or a sulfur oxide in the presence of N-hydroxyphthalimide or another imide compound represented by the following formula (1): wherein R1 and R2 are each, identical to or different from each other, a hydrogen atom, a halogen atom, an alkyl group, an aryl group, a cycloalkyl group, a hydroxyl group, an alkoxy group, a carboxyl group, an alkoxycarbonyl group, or an acyl group, or R1 and R2 may be combined to form a double bond or an aromatic or non-aromatic ring; X is an oxygen atom or a hydroxyl group. An invented method for modifying a polymer treats a polymer with an oxygen-atom-containing gas such as oxygen, carbon monoxide, a nitrogen oxide, or a sulfur oxide in the presence of the imide compound represented by the formula (1).

摘要翻译： 用于模塑塑料的表面改性的发明方法在N-羟基邻苯二甲酰亚胺或其它酰亚胺化合物的存在下，用含氧原子的气体例如氧，一氧化碳，氮氧化物或硫氧化物处理模塑塑料 通过下式（1）表示：其中R 1和R 2各自彼此相同或不同，为氢原子，卤素原子，烷基，芳基，环烷基，羟基，烷氧基 ，羧基，烷氧基羰基或酰基，或者R 1和R 2可以结合形成双键或芳族或非芳族环; X是氧原子或羟基。 在式（1）表示的酰亚胺化合物的存在下，本发明的改性聚合物可以用含氧原子的气体如氧，一氧化碳，氮氧化物或硫氧化物处理聚合物。

公开(公告)号：US07090925B2

公开(公告)日：2006-08-15

申请号：US10807326

申请日：2004-03-24

申请人： Shinya Nagano ,  Jiichiro Hashimoto ,  Kiyoharu Tsutsumi ,  Yoshinori Funaki

发明人： Shinya Nagano ,  Jiichiro Hashimoto ,  Kiyoharu Tsutsumi ,  Yoshinori Funaki

IPC分类号： B32B27/00 ,  C08G73/10

CPC分类号： C08J5/18 ,  C08G73/10 ,  C08G73/18 ,  C08J2379/04 ,  C08L79/04 ,  Y10T428/1023 ,  Y10T428/24917 ,  Y10T428/31504 ,  Y10T428/31681 ,  Y10T428/31721

摘要： A material for dielectric films is a polymerizable composition containing an adamantanepolycarboxylic acid represented by following Formula (1):wherein X is a hydrogen atom, a carboxyl group or a hydrocarbon group; and Y1, Y2, Y3 and Y4 are the same as or different from one another and are each a single bond or a bivalent aromatic cyclic group; an aromatic polyamine represented by following Formula (2): wherein Ring Z is a monocyclic or polycyclic aromatic ring; and R1 and R2 are each a substituent bound to Ring Z, are the same as or different from each other and are each an amino group, a mono-substituted amino group, a hydroxyl group or a mercapto group; and a solvent other than ketones and aldehydes, in which the adamantanepolycarboxylic acid and aromatic polyamine are dissolved in the solvent

摘要翻译： 介电膜用材料是含有下述式（1）表示的金刚烷多元羧酸的聚合性组合物：其中X为氢原子，羧基或烃基; 和Y 1，Y 2，Y 3和Y 4相同或不同，并且 各自为单键或二价芳族环基; 由下式（2）表示的芳族多胺：其中环Z是单环或多环芳环; R 1和R 2各自为与环Z结合的取代基，彼此相同或不同，并且各自为氨基，单取代的氨基 基，羟基或巯基; 和除酮和醛之外的溶剂，其中金刚烷多羧酸和芳族多胺溶解在溶剂中

公开(公告)号：US6054507A

公开(公告)日：2000-04-25

申请号：US37563

申请日：1998-03-09

申请人： Yoshinori Funaki ,  Kiyoharu Tsutsumi ,  Takeji Hashimoto ,  Masafumi Harada

发明人： Yoshinori Funaki ,  Kiyoharu Tsutsumi ,  Takeji Hashimoto ,  Masafumi Harada

IPC分类号： B01J31/06 ,  B01J35/00 ,  B01J37/04 ,  B01J31/28 ,  B05D7/14 ,  C08K3/08 ,  C08K9/10

CPC分类号： B82Y30/00 ,  B01J31/063 ,  B01J31/1616 ,  B01J35/0013 ,  B01J37/04

摘要： There are disclosed a metal-organic polymer composite structure, particularly a porous metal-organic polymer composite structure, for use as functional materials such as catalysts, and a method for producing the structure. The composite structure is composed of a microphase-separated structure from a block copolymer in which a metalphilic polymer chain and a metalphobic polymer chain are bonded together at each end, and ultrafine metal particles are contained in the metalphilic polymer phase of the microphase-separated structure.

摘要翻译： 公开了用作功能材料如催化剂的金属 - 有机聚合物复合结构，特别是多孔金属 - 有机聚合物复合结构体及其制造方法。 该复合结构由嵌段共聚物的微相分离结构构成，其中金属亲水性聚合物链和金属离子聚合物链各自结合在一起，超细金属颗粒包含在微相分离结构的金属聚合物相中 。