公开(公告)号：US4303464A

公开(公告)日：1981-12-01

申请号：US130407

申请日：1980-03-14

申请人： Takashi Suzuki ,  Shin-ichi Akai ,  Hideki Mori ,  Katsunosuke Aoyagi ,  Takashi Shimoda ,  Kazuhisa Matsumoto ,  Masami Sasaki

发明人： Takashi Suzuki ,  Shin-ichi Akai ,  Hideki Mori ,  Katsunosuke Aoyagi ,  Takashi Shimoda ,  Kazuhisa Matsumoto ,  Masami Sasaki

IPC分类号： C30B15/04 ,  C30B15/00 ,  C30B27/02 ,  C30B29/44 ,  H01L21/18 ,  H01L21/208

CPC分类号： C30B27/02 ,  C30B15/00 ,  C30B29/44

摘要： Gallium phosphide single crystals with low defect density which are manufactured by the liquid encapsulation Czochralski pulling method and which are characterized in that they are doped or not doped with at least one kind of dopant which is electrically active in gallium phosphide and are so doped as to have at least one dopant such as boron or some other strongly reducing impurity which has a reducing activity equal to or greater than that of boron remain in the crystals in a quantity not less than 1.times.10.sup.17 cm.sup.-3 and the sum of dislocation etch pit density and small conical etch pit density of the surface (111)B which has been subjected to etching for 3 to 5 minutes with RC etchant at a temperature of 65.degree. C..about.75.degree. C. after removing the mechanically damaged layer on the surface does not exceed 1.times.10.sup.5 cm.sup.-2, and a method of manufacturing the crystals.

摘要翻译： 具有低缺陷密度的磷化镓单晶，其通过液体封装Czochralski拉制法制造，其特征在于它们掺杂或未掺杂至少一种在磷化镓中具有电活性并且掺杂的掺杂剂 具有等于​​或大于硼的还原活性的至少一种掺杂剂如硼或一些其它强还原杂质在晶体中保留不少于1×10 17 cm -3，并且位错蚀刻坑密度和 表面（111）B的小锥形蚀刻坑密度，已经在65℃的温度下用RC蚀刻剂蚀刻3至5分钟。去除表面上的机械损伤层之后的差值75℃ 超过1×10 5 cm -2，以及制造晶体的方法。

公开(公告)号：US4063972A

公开(公告)日：1977-12-20

申请号：US667867

申请日：1976-03-17

申请人： Shin-ichi Akai ,  Hideki Mori ,  Takashi Shimoda ,  Shin-ichi Iguchi

发明人： Shin-ichi Akai ,  Hideki Mori ,  Takashi Shimoda ,  Shin-ichi Iguchi

IPC分类号： C30B19/00 ,  C30B19/06 ,  C30B19/10 ,  H01L21/208

CPC分类号： C30B19/064 ,  C30B19/106 ,  Y10S117/906 ,  Y10S438/925

摘要： A plurality of single-crystal epitaxial layers of semiconductors are simultaneously grown on a plurality of suitable substrates from the liquid phase by a method which includes the step of consecutively, and at times simultaneously, supplying small portions of liquid solution from a solution reservoir onto all the surfaces of the substrates in a plurality of wells which are provided on a surface of a rotatable circular lower plate so that epitaxial growth can be simultaneously carried out in all wells. The solution reservoir is positioned on a radius of the lower plate on which a circular upper plate is also provided in a non-rotatable state relative to the solution reservoir. Small portions of liquid solution are supplied by rotating the lower plate relative to the upper plate and the solution reservoir, and constrained in shape and volume which are adjusted by the upper plate and the wells. The composition and doping level of epitaxial layers are controlled through vapor-liquid communication.

摘要翻译： 多个半导体单晶外延层通过一种方法从液相同时生长在多个合适的基板上，该方法包括以下步骤：连续地并且有时同时将液体溶液的一小部分从溶液储存器供应到所有 多个孔中的基板的表面设置在可旋转的圆形下板的表面上，使得外延生长可以在所有的孔中同时进行。 溶液储存器定位在下板的半径上，圆形上板也相对于溶液储存器设置在不可旋转的状态。 通过相对于上板和溶液储存器旋转下板来供应液体溶液的小部分，并且受到由上板和井调节的形状和体积的约束。 外延层的组成和掺杂水平通过气液相通来控制。

公开(公告)号：US3933538A

公开(公告)日：1976-01-20

申请号：US322522

申请日：1973-01-10

申请人： Shin-ichi Akai ,  Hideki Mori ,  Nobuo Takahashi ,  Shin-ichi Iguchi

发明人： Shin-ichi Akai ,  Hideki Mori ,  Nobuo Takahashi ,  Shin-ichi Iguchi

IPC分类号： C30B19/02 ,  C30B19/04 ,  C30B19/06 ,  C30B19/08 ,  C30B19/10 ,  H01L21/208 ,  H01L21/368 ,  H01L7/38

CPC分类号： C30B19/106 ,  C30B19/02 ,  C30B19/04 ,  C30B19/063 ,  C30B19/08 ,  H01L21/02395 ,  H01L21/02521 ,  H01L21/02543 ,  H01L21/02546 ,  H01L21/02625 ,  Y10S117/912 ,  Y10S148/006 ,  Y10S148/072 ,  Y10S148/17 ,  Y10S438/925

摘要： Single-crystal epitaxial layers of compound semiconductors or mixed semiconductors are grown on suitable substrates from the liquid phase, which consists of a molten metallic solvent dissolving a source material of the semiconductors, and within which the temperature gradient is produced so that in a high temperature region of the liquid solution a solid source material is dissolving into the liquid solution with at least a portion of the solid source material always at an undissolved state and in a low temperature region of the liquid solution an epitaxial layer is depositing onto the substrate, the temperatures in the liquid solution being kept constant during the epitaxial growth. Each substrate is positioned in one of a number of slots which are provided in the upper surface of a slider and it is successively transferred with the slider to contact with the liquid solution. The composition and/or the doping level of each epitaxial layer are controlled by the composition and/or the doping level of the solid source material which is selected from a pre-synthesized material, i.e., a solid film produced on the liquid solution by supersaturation and a film deposited on the liquid solution from the vapor phase.

摘要翻译： 化合物半导体或混合半导体的单晶外延层从液相生长在合适的基底上，液相由溶解半导体源材料的熔融金属溶剂组成，其中产生温度梯度，使得在高温 液体溶液的区域，固体源材料溶解到液体溶液中，其中固体源材料的至少一部分总是处于未溶解状态，并且在液体溶液的低温区域中，外延层沉积到基底上， 在外延生长期间液体溶液中的温度保持恒定。 每个基板定位在设置在滑块的上表面中的多个狭槽中的一个中，并且随着滑块被连续转移以与液体溶液接触。 每个外延层的组成和/或掺杂水平由固体源材料的组成和/或掺杂水平控制，固体源材料选自预合成材料，即通过过饱和在液体溶液上产生的固体膜 以及从气相沉积在液体溶液上的膜。

公开(公告)号：US08463161B2

公开(公告)日：2013-06-11

申请号：US13036284

申请日：2011-02-28

申请人： Hideki Mori

发明人： Hideki Mori

IPC分类号： G03G15/08

CPC分类号： G03G15/1605 ,  G03G21/1623 ,  G03G21/168 ,  G03G2221/1642

摘要： An image forming apparatus includes an image bearing member; a belt unit which is rotatable in contact with the image bearing member and which is capable of being drawn out of a main assembly of the image forming apparatus; a cam member for switching a position of the belt member relative to the image bearing member; a motor for rotating the cam member; a controller for controlling the motor to contact and space the belt member relative to the image bearing member; a lever movable between a first position in which the belt member is fixed to the main assembly of the image forming apparatus and a second position in which the belt member is capable of being drawn out of the main assembly of the image forming apparatus; and a spacing mechanism for spacing the belt member from the image bearing member by converting movement of the lever from the first position to the second position to a rotation of the cam member, when the belt member is contacted to the image bearing member.

摘要翻译： 图像形成装置包括：图像承载部件; 带单元，其能够与图像承载构件接触地旋转并且能够从图像形成装置的主组件中拉出; 凸轮构件，用于切换带构件相对于图像承载构件的位置; 用于使所述凸轮构件旋转的马达; 控制器，用于控制马达相对于图像承载部件接触和间隔皮带部件; 可在第一位置和第二位置之间移动的杆，其中，所述带构件固定到所述图像形成装置的主组件，在所述第二位置，所述带构件能够从所述图像形成装置的主组件引出; 以及间隔机构，用于当带构件与图像承载构件接触时，通过将杠杆的运动从第一位置转移到第二位置，使带构件与图像承载构件间隔开。

公开(公告)号：US08300954B2

公开(公告)日：2012-10-30

申请号：US12383809

申请日：2009-03-27

申请人： Yuya Aoki ,  Takuo Morimura ,  Shinobu Yamada ,  Hirosuke Nagano ,  Kentaro Fukazawa ,  Hideki Mori ,  Yasuhiko Suga ,  Shunsuke Harasaki ,  Seiichi Inomata ,  Tetsujiro Kondo

发明人： Yuya Aoki ,  Takuo Morimura ,  Shinobu Yamada ,  Hirosuke Nagano ,  Kentaro Fukazawa ,  Hideki Mori ,  Yasuhiko Suga ,  Shunsuke Harasaki ,  Seiichi Inomata ,  Tetsujiro Kondo

IPC分类号： G06K9/62 ,  G06K9/46

CPC分类号： G06T3/403

摘要： An information processing apparatus includes a first classification unit configured to set each of pixels forming a first image as a pixel of interest and classify the pixels of interest into one of a plurality of provided classes of a first type in accordance with a predetermined rule; a feature amount generation unit configured to generate a shifted waveform whose phase is shifted with respect to a waveform of the first image containing the pixels of interest and configured to generate a feature amount; a second classification unit configured to be provided with a plurality of classes of a second type in accordance with the feature amount for each of the plurality of classes of the first type and configured to classify the pixels of interest; and a prediction calculation unit configured to predictively calculate pixels forming a second image.

摘要翻译： 信息处理设备包括：第一分类单元，被配置为将形成第一图像的每个像素设置为感兴趣的像素，并根据预定规则将感兴趣的像素分类为多个提供的第一类别中的一个; 特征量产生单元，被配置为生成相移相对于包含感兴趣像素的第一图像的波形的移位波形，并且被配置为生成特征量; 第二分类单元，被配置为根据第一类型的多个类中的每一个的特征量被提供有多个第二类的类别，并且被配置为对感兴趣的像素进行分类; 以及预测计算单元，被配置为预测地计算形成第二图像的像素。

公开(公告)号：US20100246934A1

公开(公告)日：2010-09-30

申请号：US12738760

申请日：2008-10-22

申请人： Yoshinori Hayashi ,  Hiroshi Wakaba ,  Yoko Ono ,  Koichi Miyazono ,  Hideki Mori

发明人： Yoshinori Hayashi ,  Hiroshi Wakaba ,  Yoko Ono ,  Koichi Miyazono ,  Hideki Mori

IPC分类号： G06K9/00

CPC分类号： H01L22/20 ,  G01N21/9503 ,  H01L22/12

摘要： An inspection apparatus of a disk-shaped substrate able to precisely quantitatively inspect positions of formation of film layers formed on the surface of a disk-shaped substrate is provided, that is, an inspection apparatus of a disk-shaped substrate on which film layers are formed designed to generate captured image data expressing a captured image corresponding to a field of view based on image signals successively output from an image capturing unit capturing an image of a predetermined surface at an outer circumference part of the disk-shaped substrate and to generate film layer edge position information Y4E24 (θ) expressing longitudinal direction positions at corresponding positions (θ) along the circumferential direction of an edge line E24 of a film layer image part ISa (24) corresponding to the film layer 24 on the surface image ISa with reference to, from the captured image data, longitudinal direction positions YE15aL (θ) at the different positions (θ) along the circumferential direction of a boundary line E15a between a surface image part ISa corresponding to the predetermined surface on the captured image and its outer image part IBKL.

摘要翻译： 提供了能够精确地定量检查形成在盘状基板的表面上的膜层的形成位置的盘状基板的检查装置，即，其中膜层为 被形成为基于从在盘状基板的外周部分捕获预定表面的图像的图像捕获单元连续输出的图像信号生成表示与视场相对应的拍摄图像的拍摄图像数据，并且生成胶片 沿着与表面图像ISa上的薄膜层24相对应的薄膜层图像部分ISa（24）的边缘线E24的圆周方向的相应位置（＆amp;θ）表示纵向位置的层边缘位置信息Y4E24（＆ 参考来自拍摄图像数据的不同位置处的纵向位置YE15aL（＆amp; tas）沿着与捕获图像上的预定表面相对应的表面图像部分ISa与其外部图像部分IBKL之间的边界线E15a的圆周方向。

公开(公告)号：US20100177953A1

公开(公告)日：2010-07-15

申请号：US12376469

申请日：2007-08-09

申请人： Yoshinori Hayashi ,  Takeki Kogawa ,  Hideki Mori ,  Akimasa Hori

发明人： Yoshinori Hayashi ,  Takeki Kogawa ,  Hideki Mori ,  Akimasa Hori

IPC分类号： G06K9/00

CPC分类号： G01B11/08 ,  G01B11/24 ,  G01N21/9503 ,  G01R31/311

摘要： [Problem] An inspecting device and an inspecting method enabling better precision inspection for a processing region formed on a surface of a semiconductor wafer or other disc wafer are provided.[Means for Solution] The inspecting device is configured having image capturing means 130a, 130b for capturing an image of an outer edge and its neighboring region of a rotating wafer 10, wafer outer edge position measuring means 200 for measuring the radial direction position of the outer edge at each of the plurality of rotational angle positions θn of the wafer 10 based on the images obtained by the image capturing means 130a, 130b, an edge-to-edge distance measuring means 200 for measuring the edge-to-edge distance Bθn, between the outer edge of the wafer 10 and the edge of an insulating film 11 at each of the plurality of rotational angle positions θn based on the images obtained by the image capturing means 130a, and an inspection information generating means 200 for generating predetermined inspection information based on the radial direction position Aθn of the outer edge of the wafer 10 and the edge-to-edge distance Bθn.

摘要翻译： [问题]提供一种检查装置和对形成在半导体晶片或其他盘晶片的表面上的处理区域进行更好的精密检查的检查方法。 [解决方案]检查装置配置有用于捕获旋转晶片10的外边缘及其相邻区域的图像的图像捕获装置130a，130b，用于测量旋转晶片10的径向位置的晶片外边缘位置测量装置200 基于由图像捕获装置130a，130b获得的图像的晶片10的多个旋转角度位置＆amp; t的每一个的外边缘; n边缘到边缘距离测量装置200，用于测量边缘到边缘 距离B＆amp; N; n，基于由图像捕获装置130a获得的图像，在多个旋转角度位置＆amp; tt中的每一个的晶片10的外边缘和绝缘膜11的边缘之间; n， n是根据晶片10的外边缘的径向位置A和距离n以及边缘到边缘距离B的关系产生预定检查信息的装置; n。

公开(公告)号：US20100066998A1

公开(公告)日：2010-03-18

申请号：US12595699

申请日：2008-04-25

申请人： Yoshinori Hayashi ,  Masao Kawamura ,  Hideki Mori

发明人： Yoshinori Hayashi ,  Masao Kawamura ,  Hideki Mori

IPC分类号： G01N21/00

CPC分类号： G01N21/9503

摘要： [Problem] To provide a surface inspection apparatus able to suitably inspect the outer circumference edge part of a semiconductor wafer or other plate-shaped member.[Technical Solution] A semiconductor wafer inspection apparatus 10 has a camera lens 22 arranged facing an outer circumference edge part 101 of a semiconductor wafer 100, an imaging surface 24 arranged facing an outer circumference end face of a semiconductor wafer 100 via the camera lens 22, a mirror 12 forming an image of a first outer circumference bevel surface 101b of the semiconductor wafer 100 on the imaging surface 24 via the camera lens 22, a mirror 14 forming an image of a second outer circumference bevel surface 101c of the semiconductor wafer 100 on the imaging surface 24 via the camera lens 22, a correction lens 26 forming an image of an outer circumference end face 101a of the semiconductor wafer 100 on the imaging surface 24 via the center part of the camera lens 22, and an illumination light guide lamp part 18 illuminating surfaces so that, compared with the outer circumference end face 101a, the first outer circumference bevel surface 101b and second outer circumference bevel surface 101c become brighter.

摘要翻译： [问题]提供一种能够适当地检查半导体晶片或其他板状部件的外周缘部的表面检查装置。 技术方案半导体晶片检查装置10具有面向半导体晶片100的外周缘部101配置的摄像透镜22，经由照相机镜头22配置成与半导体晶片100的外周端面相对配置的摄像面24 ，通过照相机镜头22在成像面24上形成半导体晶片100的第一外周斜面101b的图像的反射镜12，形成半导体晶片100的第二外周斜面101c的图像的反射镜 通过照相机镜头22在成像表面24上，通过照相机镜头22的中心部分在成像表面24上形成半导体晶片100的外周端面101a的图像的校正透镜26和照明光导 灯部18照射表面，使得与外周端面101a相比，第一外周斜面101b和第二外圆周面 斜面101c变得更亮。

公开(公告)号：US20090177415A1

公开(公告)日：2009-07-09

申请号：US12086081

申请日：2006-12-05

申请人： Yoshinori Hayashi ,  Hideki Mori

发明人： Yoshinori Hayashi ,  Hideki Mori

IPC分类号： G01B11/30

CPC分类号： G01B11/303 ,  G01N21/9501

摘要： [Problem] To provide a surface roughness inspection system enabling suitable inspection even when the surface of the object being inspected is curved.[Means for Solution] A system having an imaging unit 20 having a line sensor 22 and scanning the surface of an object being inspected 101 in a direction perpendicular to the direction of extension of the line sensor 22 and outputting a density signal for each pixel from the line sensor 22 and a processing unit 50 processing the density signal from the line sensor 22 of the imaging unit 20, the processing unit 50 having a means for acquiring a pixel density value based on a density signal from the line sensor 22 (S2) and a density state generating means for generating a density state information Pf showing the density state in the scan direction of the object surface based on all of the pixel density values acquired for the object surface 101 being inspected (S7).

摘要翻译： [问题]提供一种表面粗糙度检查系统，即使被检查物体的表面弯曲，也能够进行适当的检查。 [解决方案]具有成像单元20的系统具有线传感器22，并且在垂直于线传感器22的延伸方向的方向上扫描被检查物体101的表面，并输出每个像素的浓度信号 线传感器22和处理单元50处理来自成像单元20的线传感器22的浓度信号，处理单元50具有用于基于来自线传感器22的密度信号获取像素密度值的装置（S2） 密度状态产生装置，用于基于对被检测物体表面101获得的所有像素密度值，生成表示物体表面的扫描方向上的浓度状态的浓度状态信息Pf（S7）。

公开(公告)号：US07279719B2

公开(公告)日：2007-10-09

申请号：US10393024

申请日：2003-03-21

申请人： Yoshinobu Suehiro ,  Hideki Mori ,  Tatsuya Takashima

发明人： Yoshinobu Suehiro ,  Hideki Mori ,  Tatsuya Takashima

IPC分类号： H01L29/22

CPC分类号： H01L33/60 ,  H01L33/486 ,  H01L33/507 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/48465 ,  H01L2924/181 ,  H01L2924/1815 ,  Y10S428/917 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/00012

摘要： A counter reflecting surface is provided opposite to a light emitting element in its light emitting surface. A side reflecting member having an inclined reflecting surface is provided apart from and so as to surround the light emitting element. A phosphor layer is provided on the counter reflecting surface and the reflecting surface of the side reflecting member.

摘要翻译： 反射面相对于其发光面的发光元件设置。 具有倾斜的反射表面的侧反射部件设置成围绕发光元件并且围绕发光元件。 荧光体层设置在反射反射面和侧面反射部件的反射面上。