利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

224 条记录 (耗时 0.04 秒)

    Image forming output control device and non-transitory recording medium storing program
    4.
    发明授权
    Image forming output control device and non-transitory recording medium storing program 有权

    公开(公告)号：US10185903B2

    公开(公告)日：2019-01-22

    申请号：US15726339

    申请日：2017-10-05

    申请人： Hiroomi Motohashi ,  Satoru Tanaka

    发明人： Hiroomi Motohashi ,  Satoru Tanaka

    IPC分类号： G06K15/02

    摘要： An image forming output control device includes a duplicate image information detector to receive instruction information from a processing execution control apparatus, compare image information included in a plurality of objects being unit images constituting the instruction information, and detect a plurality of duplicate image information objects, in which the image information is duplicate with each other, in the objects in which identification information for identifying the objects is different from each other; a drawing information generation controller to control a drawing information generator to generate drawing information according to the instruction information; and a drawing result storage unit to store drawing result information being a drawing result of the image information. The drawing information generation controller controls the drawing information generator to generate the drawing information with the drawing result information of the image information included in the duplicate image information objects detected with the duplicate image information detector.

    Cleaning apparatus, cleaning method and recording medium
    6.
    发明授权
    Cleaning apparatus, cleaning method and recording medium 有权
    清洁装置，清洁方法和记录介质

    公开(公告)号：US08308870B2

    公开(公告)日：2012-11-13

    申请号：US12610599

    申请日：2009-11-02

    申请人： Teruomi Minami ,  Takashi Yabuta ,  Satoru Tanaka ,  Hirotaka Maruyama ,  Kouichi Eguchi

    发明人： Teruomi Minami ,  Takashi Yabuta ,  Satoru Tanaka ,  Hirotaka Maruyama ,  Kouichi Eguchi

    IPC分类号： B08B3/08

    CPC分类号： H01L21/67051

    摘要： Disclosed are a cleaning apparatus and a cleaning method, which can collect a chemical liquid without reducing the throughput after a substrate is subjected to a cleaning treatment and dried by using a drying solvent, such as IPA. The disclosed cleaning apparatus carries out a chemical liquid cleaning treatment, a rinsing treatment, and a drying treatment with IPA, in order, on a wafer W while rotating wafer W, and includes a cleaning liquid supply device for supplying a cleaning liquid for cleaning the drain cup and the drain tube to the drain cup in a state where the cleaning liquid is not supplied to the wafer. Also, the apparatus further includes a control unit for controlling respective components of the cleaning apparatus. The control unit, after the cleaning treatment and then the rinsing treatment of wafer W, at the time when the drying treatment is performed by IPA, controls the cleaning liquid to be supplied to the drain cup.

    摘要翻译： 公开了一种清洁装置和清洁方法，其可以在基板经受清洁处理之后收集化学液体而不降低生产量，并通过使用诸如IPA的干燥溶剂进行干燥。 所公开的清洁装置在旋转晶片W的同时在晶片W上进行化学液体清洗处理，漂洗处理和IPA干燥处理，并且包括用于提供用于清洁的清洁液的清洗液供给装置 排水杯和排水管排入排水杯，在清洗液未供给到晶片的状态下。 此外，该装置还包括用于控制清洁装置的各个部件的控制单元。 在通过IPA进行干燥处理之后，控制单元在进行清洁处理，然后进行晶片W的漂洗处理之后，控制向排水杯供给的清洗液。

    Imprinting device and imprinting method
    7.
    发明授权
    Imprinting device and imprinting method 有权
    压印装置和压印方法

    公开(公告)号：US08215944B2

    公开(公告)日：2012-07-10

    申请号：US12810557

    申请日：2008-12-25

    申请人： Yoshiaki Takaya ,  Yuji Hashima ,  Yoshihisa Hayashida ,  Hirosuke Kawaguchi ,  Satoru Tanaka ,  Akihiko Kanai ,  Kazuaki Uehara

    发明人： Yoshiaki Takaya ,  Yuji Hashima ,  Yoshihisa Hayashida ,  Hirosuke Kawaguchi ,  Satoru Tanaka ,  Akihiko Kanai ,  Kazuaki Uehara

    IPC分类号： A01J21/00 ,  A01J25/12 ,  B28B11/08 ,  B29C35/04

    CPC分类号： B29C59/022 ,  B29C33/42 ,  B29C2035/0822 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： The present invention provides an imprinting device and an imprinting method which can uniformly apply pressure between a mold and a molding object and which can increase and decrease a temperature at a fast speed. An imprinting device is for transferring a pattern on a mold to a film molding object and comprises a stage for holding the mold, a pressurizing-chamber casing which configures a pressurizing-chamber together with the molding object, sealing means which airtightly seals a space between the pressurizing-chamber casing and the molding object, opening and closing means which opens and closes the space between the pressurizing-chamber casing and the molding object, pressurizing means which adjusts atmospheric pressure in the pressurizing-chamber, heating means which heats either one of or both of the mold and the molding object, and degassing means which eliminates any gas present between the mold and the molding object.

    摘要翻译： 本发明提供能够均匀地在模具和成型体之间施加压力并且可以以快速的速度增加和降低温度的压印装置和压印方法。 压印装置用于将模具上的图案转印到薄膜成型对象上，并且包括用于保持模具的台，与成型对象一起构成加压室的加压室壳体，密封装置将气密密封 所述加压室壳体和所述成型体，用于打开和关闭所述加压室壳体与所述成型体之间的空间的开闭装置，调节所述加压室内的大气压的加压单元， 或模具和模制对象两者以及脱气装置，其消除了存在于模具和模制对象之间的任何气体。

    COMPOUNDS HAVING NPY Y5 RECEPTOR ANTAGONISTIC ACTIVITY
    8.
    发明申请
    COMPOUNDS HAVING NPY Y5 RECEPTOR ANTAGONISTIC ACTIVITY 失效
    具有NPY Y5受体拮抗活性的化合物

    公开(公告)号：US20120130070A1

    公开(公告)日：2012-05-24

    申请号：US13354881

    申请日：2012-01-20

    申请人： Masahiro SAKAGAMI ,  Hiroshi Hashizume ,  Satoru Tanaka

    发明人： Masahiro SAKAGAMI ,  Hiroshi Hashizume ,  Satoru Tanaka

    IPC分类号： C07D471/04

    CPC分类号： C07D231/12 ,  C07D231/14 ,  C07D233/64 ,  C07D249/08 ,  C07D401/04 ,  C07D401/14 ,  C07D403/04 ,  C07D407/04 ,  C07D413/04 ,  C07D417/04 ,  C07D471/04 ,  C07D487/04

    摘要： This invention provides a compound of the formula (I): a pharmaceutically acceptable salt or solvate thereof, wherein R1 is substituted or unsubstituted alkyl or the like, R2 is hydrogen or substituted or unsubstituted alkyl, Ring A is monocyclic or bicyclic aromatic heterocycle, R3 is substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl or substituted or unsubstituted heterocycle, R4 is halogen, cyano, substituted or unsubstituted alkyl, substituted or unsubstituted cycloalkyl or the like, m is an integer between 0 and 2, n is an integer between 0 and 5, R is halogen, oxo, cyano, nitro, substituted or unsubstituted alkyl or the like, and p is an integer between 0 and 2 as novel compounds having NPY Y5 antagonistic activity.

    摘要翻译： 本发明提供式（I）化合物：其药学上可接受的盐或溶剂合物，其中R 1为取代或未取代的烷基等，R 2为氢或取代或未取代的烷基，环A为单环或双环芳族杂环，R 3 取代或未取代的芳基，取代或未取代的杂芳基或取代或未取代的杂环，R4为卤素，氰基，取代或未取代的烷基，取代或未取代的环烷基等，m为0至2之间的整数，n为0 和5，R是卤素，氧代，氰基，硝基，取代或未取代的烷基等，p是0和2之间的整数，作为具有NPY Y5拮抗活性的新化合物。

    Substrate processing method and substrate processing apparatus
    10.
    发明授权
    Substrate processing method and substrate processing apparatus 有权
    基板处理方法和基板处理装置

    公开(公告)号：US08137478B2

    公开(公告)日：2012-03-20

    申请号：US12857973

    申请日：2010-08-17

    申请人： Kenji Sekiguchi ,  Noritaka Uchida ,  Satoru Tanaka ,  Hiroki Ohno

    发明人： Kenji Sekiguchi ,  Noritaka Uchida ,  Satoru Tanaka ,  Hiroki Ohno

    IPC分类号： B08B7/00 ,  B08B7/04

    CPC分类号： H01L21/67051 ,  B08B3/02 ,  B08B3/024 ,  B08B3/04 ,  H01L21/6708 ,  Y10S134/902

    摘要： A substrate (W) is processed with the use of a process liquid such as a deionized water. Then, a first fluid which is more volatile than the process liquid is supplied to an upper surface of the substrate (W) from a fluid nozzle (12) to form a liquid film. Next, a second fluid which is more volatile than the process liquid is supplied to the upper surface of the substrate (W) from the fluid nozzle (12), while the wafer (W) is being rotated. During this supply operation, a supply position (Sf) of the second fluid to the substrate (W) is moved radially outward from a rotational center (Po) of the substrate (W). As a result, it is possible to prevent the generation of particles on the substrate (W) after it is dried by using the first and second fluids.

    摘要翻译： 使用诸如去离子水的工艺液体处理衬底（W）。 然后，从流体喷嘴（12）向基板（W）的上表面供给比处理液更易挥发的第一流体，形成液膜。 接下来，在晶片（W）旋转的同时，从流体喷嘴（12）向基板（W）的上表面供给比处理液更易挥发的第二流体。 在该供给动作中，第二流体与基板（W）的供给位置（Sf）从基板（W）的旋转中心（Po）向径向外侧移动。 结果，可以防止在通过使用第一和第二流体干燥基板（W）之后产生颗粒。