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    FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
    1.
    发明申请
    FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD 有权
    流体处理结构，平面设备和设备制造方法

    公开(公告)号：US20120249982A1

    公开(公告)日：2012-10-04

    申请号：US13404746

    申请日：2012-02-24

    申请人： Theodorus Petrus Maria CADEE ,  Raymond Wilhelmus Louis Lafarre

    发明人： Theodorus Petrus Maria CADEE ,  Raymond Wilhelmus Louis Lafarre

    IPC分类号： G03B27/52 ,  B23P17/04 ,  F03B11/02

    CPC分类号： G03F7/70341 ,  Y10T29/494 ,  Y10T137/8593

    摘要： A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure, wherein the fluid handling structure has a main body with an undersurface, a moveable member moveable relative to the main body, and a self-regulating mechanism to maintain a gap of a certain size between a bottom surface of the moveable member and the facing surface independent of the size of a gap between the undersurface and the facing surface.

    摘要翻译： 一种流体处理结构，其构造成将浸没液体供应到在投影系统和面向流体处理结构的相对表面之间限定的空间中，其中流体处理结构具有带有下表面的主体，可相对于主体移动的可移动构件， 以及自动调节机构，以在所述可移动部件的底表面和所述相对表面之间保持一定尺寸的间隙，而与所述下表面和所述相对表面之间的间隙的尺寸无关。

    Measuring method, measuring apparatus, lithographic apparatus and device manufacturing method
    2.
    发明授权
    Measuring method, measuring apparatus, lithographic apparatus and device manufacturing method 有权
    测量方法，测量仪器，光刻设备和器件制造方法

    公开(公告)号：US08593646B2

    公开(公告)日：2013-11-26

    申请号：US13369614

    申请日：2012-02-09

    申请人： Arie Jeffrey Den Boef ,  Marcel Hendrikus Maria Beems ,  Theodorus Petrus Maria Cadee ,  Raymond Wilhelmus Louis Lafarre

    发明人： Arie Jeffrey Den Boef ,  Marcel Hendrikus Maria Beems ,  Theodorus Petrus Maria Cadee ,  Raymond Wilhelmus Louis Lafarre

    IPC分类号： G01B11/14 ,  G01B11/00

    CPC分类号： G01B11/14 ,  G01B11/00 ,  G02B21/0048 ,  G02B26/105 ,  G03F7/70625 ,  G03F9/7088

    摘要： An apparatus (AS) measures positions of marks (202) on a lithographic substrate (W). A measurement optical system comprises illumination subsystem (504) for illuminating the mark with a spot of radiation (206) and as detecting subsystem (580) for detecting radiation diffracted by the mark. The substrate and measurement optical system move relative to one another at a first velocity (vW) so as to scan the mark while synchronously moving the spot of radiation relative to the reference frame (RF) of the measurement optical system at a second velocity (vSPOT). The spot scans the mark at a third velocity (vEFF) which is lower than the first velocity to allow more time for accurate position measurements to be acquired. In one embodiment, an objective lens (524) remains fixed in relation to the reference frame while a moving optical element (562) imparts the movement of the radiation spot relative to the reference frame.

    摘要翻译： 设备（AS）测量光刻基板（W）上的标记（202）的位置。 测量光学系统包括用于利用辐射点（206）照亮标记的照明子系统（504）和用于检测由标记衍射的辐射的检测子系统（580）。 基板和测量光学系统以第一速度（vW）相对于彼此移动，以便以第二速度（vSPOT）同步地相对于测量光学系统的参考系（RF）移动辐射点来扫描标记 ）。 该点以低于第一速度的第三速度（vEFF）扫描标记，以允许更多时间获取准确的位置测量。 在一个实施例中，物镜（524）相对于参考框架保持固定，而移动的光学元件（562）相对于参考框架赋予辐射点的移动。

    Fluid handling structure, a lithographic apparatus and a device manufacturing method
    3.
    发明授权
    Fluid handling structure, a lithographic apparatus and a device manufacturing method 有权
    流体处理结构，光刻设备和装置制造方法

    公开(公告)号：US08830441B2

    公开(公告)日：2014-09-09

    申请号：US13404746

    申请日：2012-02-24

    申请人： Theodorus Petrus Maria Cadee ,  Raymond Wilhelmus Louis Lafarre

    发明人： Theodorus Petrus Maria Cadee ,  Raymond Wilhelmus Louis Lafarre

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/70341 ,  Y10T29/494 ,  Y10T137/8593

    摘要： A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure, wherein the fluid handling structure has a main body with an undersurface, a moveable member moveable relative to the main body, and a self-regulating mechanism to maintain a gap of a certain size between a bottom surface of the moveable member and the facing surface independent of the size of a gap between the undersurface and the facing surface.

    摘要翻译： 一种流体处理结构，其构造成将浸没液体供应到在投影系统和面向流体处理结构的相对表面之间限定的空间中，其中流体处理结构具有带有下表面的主体，可相对于主体移动的可移动构件， 以及自动调节机构，以在所述可移动部件的底表面和所述相对表面之间保持一定尺寸的间隙，而与所述下表面和所述相对表面之间的间隙的尺寸无关。