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    Mirror arrangement and method of manufacturing thereof, optical system and lithographic method of manufacturing a miniaturized device
    1.
    发明申请
    Mirror arrangement and method of manufacturing thereof, optical system and lithographic method of manufacturing a miniaturized device 审中-公开
    镜面布置及其制造方法，制造小型化装置的光学系统和光刻方法

    公开(公告)号：US20060018045A1

    公开(公告)日：2006-01-26

    申请号：US10971002

    申请日：2004-10-25

    申请人： Timo Moeller ,  Martin Ross-Messemer ,  Frank Hoeller ,  Sascha Bleidistel

    发明人： Timo Moeller ,  Martin Ross-Messemer ,  Frank Hoeller ,  Sascha Bleidistel

    IPC分类号： G02B5/08

    CPC分类号： G03F7/70266 ,  G02B5/10

    摘要： A mirror arrangement for reflecting electromagnetic radiation, the mirror arrangement comprising: a substrate having a mirror side facing towards the radiation to be reflected and a back side opposite to the mirror side, wherein a mirror surface is provided on the mirror side and wherein an actuator arrangement for generating a deformation of the substrate is mounted on the back side of the substrate, wherein the actuator arrangement comprises at least one active layer having an areal adhering contact with a portion of the back side of the substrate; wherein the at least one active layer has a first layer thickness at a first location within the portion and a second layer thickness at a second location disposed at a distance from the first location within the portion, wherein the first layer thickness differs from the second layer thickness by more than 1%; and wherein the at least one active layer comprises at least one of a ferroelectric material, a piezoelectric material, a magnetostrictive material, an electrostrictive material and a memory metal alloy.

    摘要翻译： 一种用于反射电磁辐射的反射镜装置，所述反射镜装置包括：基板，其具有面向待反射的辐射的反射镜侧和与所述反射镜侧相反的后侧，其中在所述反射镜侧设置有镜面， 用于产生基板的变形的布置安装在基板的背面上，其中致动器装置包括至少一个有源层，其与基板的背面的一部分具有面接合接触; 其中所述至少一个活性层在所述部分内的第一位置处具有第一层厚度，并且在第二位置处具有第二层厚度，所述第二层厚度设置在所述部分内与所述第一位置相距一定距离处，其中所述第一层厚度与所述第二层厚度不同 厚度超过1％; 并且其中所述至少一个有源层包括铁电材料，压电材料，磁致伸缩材料，电致伸缩材料和记忆金属合金中的至少一种。

    Projection Exposure Tool for Microlithography and Method for Microlithographic Exposure
    3.
    发明申请
    Projection Exposure Tool for Microlithography and Method for Microlithographic Exposure 审中-公开
    用于微光刻的投影曝光工具和微光刻曝光方法

    公开(公告)号：US20130182264A1

    公开(公告)日：2013-07-18

    申请号：US13788042

    申请日：2013-03-07

    申请人： Jochen Hetzler ,  Sascha Bleidistel ,  Toralf Gruner ,  Joachim Hartjes

    发明人： Jochen Hetzler ,  Sascha Bleidistel ,  Toralf Gruner ,  Joachim Hartjes

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70133 ,  G03F7/70608 ,  G03F7/70733 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7049

    摘要： A projection exposure tool for microlithography for exposing a substrate is disclosed. The tool includes a projection objective. The tool also includes an optical measuring apparatus for determining a surface topography of the substrate before the substrate is exposed. The measuring apparatus has a measuring beam path which extends outside of the projection objective. The measuring apparatus is a wavefront measuring apparatus configured to determine topography measurement values simultaneously at a number of points on the substrate surface.

    摘要翻译： 公开了一种用于曝光衬底的用于微光刻的投影曝光工具。 该工具包括投影物镜。 该工具还包括用于在衬底暴露之前确定衬底的表面形貌的光学测量装置。 测量装置具有延伸到投影物镜外部的测量光束路径。 所述测量装置是波面测量装置，其被配置为在所述基板表面上的多个点处同时确定地形测量值。

    CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL COMPONENT AND A MEASURING DEVICE
    4.
    发明申请
    CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL COMPONENT AND A MEASURING DEVICE 审中-公开
    反射光学元件和测量装置的目标投影目标

    公开(公告)号：US20120218536A1

    公开(公告)日：2012-08-30

    申请号：US13423344

    申请日：2012-03-19

    申请人： Sascha Bleidistel ,  Toralf Gruner ,  Christoph Zaczek ,  Ralf Mueller

    发明人： Sascha Bleidistel ,  Toralf Gruner ,  Christoph Zaczek ,  Ralf Mueller

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70258 ,  G02B13/143 ,  G02B17/0856 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/706

    摘要： A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.

    摘要翻译： 用于通过成像辐射将物体场映射到图像场上的反射折射投影物镜。 投影物镜包括至少一个反射光学部件和测量装置。 在投影物镜的操作期间，反射光学部件反射成像辐射的第一部分并透射成像辐射的第二部分。 成像辐射的反射的第一部分至少部分地有助于对象场的成像。 成像辐射的透射的第二部分至少部分地被馈送到测量装置。 这允许在成像辐射的图像位置处的感光层同时曝光并借助测量装置监测成像辐射。

    OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    7.
    发明申请
    OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
    微波投影曝光装置的光学系统

    公开(公告)号：US20080309904A1

    公开(公告)日：2008-12-18

    申请号：US12188652

    申请日：2008-08-08

    申请人： Aurelian Dodoc ,  Albrecht Ehrmann ,  Sascha Bleidistel

    发明人： Aurelian Dodoc ,  Albrecht Ehrmann ,  Sascha Bleidistel

    IPC分类号： G03B27/42

    CPC分类号： G02B3/12 ,  G03F7/70341

    摘要： An optical system of a microlithographic projection exposure apparatus contains a module, which can be fitted in the optical system and removed from it as a unit. The module contains a cavity which can be completely filled with a liquid and hermetically sealed, and a concavely curved optical surface which bounds the cavity at the top during operation of the projection exposure apparatus. This makes it possible to fill the module outside the optical system. The module can be tilted there so that no air bubble, which prevents complete filling, can form below the concavely curved optical surface.

    摘要翻译： 微光刻投影曝光装置的光学系统包含可以安装在光学系统中并作为一个单元从其中移除的模块。 该模块包含一个可完全充满液体并密封的空腔，以及在投影曝光设备的操作期间界定顶部空腔的凹曲面的光学表面。 这使得可以将模块填充到光学系统外部。 模块可以在那里倾斜，从而不会形成阻止完全填充的气泡，可以形成在凹曲面的光学表面之下。

    PROJECTION EXPOSURE APPARATUS AND OPTICAL SYSTEM
    9.
    发明申请
    PROJECTION EXPOSURE APPARATUS AND OPTICAL SYSTEM 有权
    投影曝光装置和光学系统

    公开(公告)号：US20120320353A1

    公开(公告)日：2012-12-20

    申请号：US13589313

    申请日：2012-08-20

    申请人： Sascha Bleidistel ,  Bernhard Geuppert

    发明人： Sascha Bleidistel ,  Bernhard Geuppert

    IPC分类号： G03B27/34

    CPC分类号： G03F7/70833 ,  G02B7/023 ,  G03F7/70258 ,  G03F7/70825 ,  H01L41/0913 ,  H02N2/0095 ,  H02N2/021 ,  H02N2/028

    摘要： The disclosure relates to a projection exposure apparatus and an optical system, such as a projection objective or an illumination system in a projection exposure apparatus for microlithography, that includes at least one optical element and at least one manipulator having a drive device for the optical element. The drive device can have at least one movable partial element and at least one stationary partial element movable relative to one another in at least one direction of movement.

    摘要翻译： 本发明涉及投影曝光装置和光学系统，例如用于微光刻的投影曝光装置中的投影物镜或照明系统，其包括至少一个光学元件和至少一个具有用于光学元件的驱动装置的操纵器 。 驱动装置可以具有至少一个可移动部分元件和至少一个可在至少一个运动方向上相对于彼此移动的固定部分元件。

    Projection exposure apparatus and optical system
    10.
    发明授权
    Projection exposure apparatus and optical system 有权
    投影曝光装置和光学系统

    公开(公告)号：US08269948B2

    公开(公告)日：2012-09-18

    申请号：US12390685

    申请日：2009-02-23

    申请人： Sascha Bleidistel ,  Bernhard Geuppert

    发明人： Sascha Bleidistel ,  Bernhard Geuppert

    IPC分类号： G03B27/54 ,  G03B27/52

    CPC分类号： G03F7/70833 ,  G02B7/023 ,  G03F7/70258 ,  G03F7/70825 ,  H01L41/0913 ,  H02N2/0095 ,  H02N2/021 ,  H02N2/028

    摘要： The disclosure relates to a projection exposure apparatus and an optical system, such as a projection objective or an illumination system in a projection exposure apparatus for microlithography, that includes at least one optical element and at least one manipulator having a drive device for the optical element. The drive device can have at least one movable partial element and at least one stationary partial element movable relative to one another in at least one direction of movement.

    摘要翻译： 本发明涉及投影曝光装置和光学系统，例如用于微光刻的投影曝光装置中的投影物镜或照明系统，其包括至少一个光学元件和至少一个具有用于光学元件的驱动装置的操纵器 。 驱动装置可以具有至少一个可移动部分元件和至少一个可在至少一个运动方向上相对于彼此移动的固定部分元件。