公开(公告)号：US12211720B2

公开(公告)日：2025-01-28

申请号：US17381813

申请日：2021-07-21

Applicant: Tokyo Electron Limited

Inventor： Tatsuo Hatano ,  Naoki Watanabe ,  Tetsuya Miyashita

IPC: H01L21/677 ,  H01L21/67 ,  H01L21/683

Abstract: A vacuum transfer device configured to transfer a substrate in a vacuum includes: a flat motor including a body, a plurality of electromagnetic coils arrayed in the body, and a current controller that controls a current supplied to the electromagnetic coil; a transfer unit including a substrate holder configured to hold a substrate, and a base having a plurality of magnets arrayed therein and magnetically levitating from a surface of the body by a magnetic field generated by the electromagnetic coil, and move in a magnetically levitating state thereby moving the substrate holder; and a temperature controller configured to adjust temperature of at least a portion of the body. The temperature of the transfer unit is adjusted by stopping the magnetic levitation of the base by controlling the current supplied to the electromagnetic coil, and bringing the base into contact with a temperature-adjusted portion of the body.

公开(公告)号：US12183612B2

公开(公告)日：2024-12-31

申请号：US17573387

申请日：2022-01-11

Applicant: TOKYO ELECTRON LIMITED

Inventor： Tatsuo Hatano ,  Naoki Watanabe

IPC: H01L21/67 ,  H01L21/677 ,  H01L21/683 ,  H01L21/687 ,  H02K41/03 ,  H01L21/68

Abstract: A substrate transfer apparatus for transferring a substrate is disclosed. The apparatus comprises: a transfer unit including a substrate holder configured to hold a substrate, and a base having therein a magnet and configured to move the substrate holder; a planar motor including a main body, a plurality of electromagnetic coils disposed in the main body, and a linear driver configured to supply a current to the electromagnetic coils, and magnetically levitate and linearly drive the base; a substrate detection sensor configured to detect the substrate when the substrate held by the substrate holder passes by; and a transfer controller configured to calculate an actual position of the substrate held by the substrate holder based on detection data of the substrate detection sensor, calculate correction values for a logical position that has been set, and correct a transfer position of the substrate based on the correction values.

公开(公告)号：US20220081757A1

公开(公告)日：2022-03-17

申请号：US17469250

申请日：2021-09-08

Applicant: TOKYO ELECTRON LIMITED

Inventor： Masato Shinada ,  Naoki Watanabe ,  Tetsuya Miyashita ,  Hiroyuki Toshima ,  Einstein Noel Abarra ,  Shota Ishibashi

IPC: C23C14/34 ,  C23C14/54

Abstract: A film forming apparatus is provided. The apparatus comprises a processing chamber accommodating a plurality of substrates; a plurality of substrate supporting units disposed in the processing chamber and configured to place the substrates thereon; a substrate moving mechanism configured to linearly move the substrate supporting units in a first direction; sputter particle emitting units, each having a target for emitting sputter particles into the processing chamber; and a controller configured to control the sputter particle emitting units and the substrate moving mechanism. The controller controls the substrate moving mechanism to linearly move the substrate supporting units on which the substrates are placed in the first direction and controls the sputter particle emitting units to emit sputter particles to be deposited on the substrates.

公开(公告)号：US10566525B2

公开(公告)日：2020-02-18

申请号：US16008659

申请日：2018-06-14

Applicant: Tokyo Electron Limited

Inventor： Hiroki Maehara ,  Naoki Watanabe ,  Kanto Nakamura

IPC: H01L43/12 ,  H01L43/10

Abstract: A method for manufacturing a magnetoresistive element, includes: a first step of preparing a wafer including a first ferromagnetic layer and a first oxide layer provided directly on the first ferromagnetic layer; a second step of forming, after the first step, a second ferromagnetic layer directly on the first oxide layer; a third step of forming, after the second step, an absorbing layer directly on the second ferromagnetic layer; and a fourth step of crystallizing, after the third step, the second ferromagnetic layer by heat treatment. The second ferromagnetic layer contains boron, and the absorbing layer contains a material for absorbing boron from the second ferromagnetic layer by the heat treatment in the fourth step.

公开(公告)号：US09567667B2

公开(公告)日：2017-02-14

申请号：US14490410

申请日：2014-09-18

Applicant: TOKYO ELECTRON LIMITED

Inventor： Shinji Furukawa ,  Naoki Watanabe ,  Hiroshi Miki ,  Tooru Kitada ,  Yasuhiko Kojima

IPC: C23C14/34 ,  H01J37/34 ,  C23C14/08

CPC classification number: C23C14/3464 ,  C23C14/08 ,  C23C14/3485 ,  H01J37/3417 ,  H01J37/3444 ,  H01J37/3464 ,  H01J37/347

Abstract: System and method of insulating film deposition. A sputter deposition chamber comprises a pair of targets made of the same insulating material. Each target is applied with a high frequency power signal concurrently. A phase adjusting unit is used to adjust the phase difference between the high frequency power signals supplied to the pair of targets to a predetermined value, thereby improving the in-plane thickness distribution of a resultant film. The predetermined value is target material specific.

Abstract translation: 绝缘膜沉积的系统和方法。 溅射沉积室包括由相同绝缘材料制成的一对靶。 每个目标同时施加高频功率信号。 相位调整单元用于将提供给该对目标的高频功率信号之间的相位差调整为规定值，从而提高所得到的膜的面内厚度分布。 预定值是目标材料特定的。

公开(公告)号：US11764092B2

公开(公告)日：2023-09-19

申请号：US17779873

申请日：2020-11-20

Applicant: Tokyo Electron Limited

Inventor： Tatsuo Hatano ,  Tetsuya Miyashita ,  Naoki Watanabe ,  Naoyuki Suzuki

IPC: H01L21/677 ,  B25J9/02 ,  B25J9/12 ,  B25J11/00 ,  H02K7/14 ,  H02K41/02 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01L21/67742 ,  B25J9/02 ,  B25J9/12 ,  B25J11/0095 ,  H02K7/14 ,  H02K41/02 ,  H01L21/67167 ,  H01L21/67748 ,  H01L21/68707

Abstract: The substrate transfer apparatus includes a planar motor provided in a transfer chamber and having coils arranged therein; a transfer unit movable on the planar motor; and a control unit configured to control an energization of the coils. The transfer unit includes two bases having magnets arranged thereon and configured to be movable on the planar motor, a substrate support member configured to support a substrate, and a link mechanism configured to connect the two bases and the substrate support member to each other.

公开(公告)号：US11542592B2

公开(公告)日：2023-01-03

申请号：US16246285

申请日：2019-01-11

Applicant: TOKYO ELECTRON LIMITED

Inventor： Masato Shinada ,  Naoki Watanabe ,  Tetsuya Miyashita ,  Hiroaki Chihaya

IPC: C23C14/22 ,  C23C14/35 ,  C23C14/50 ,  H01J37/34

Abstract: A film forming system comprises a chamber, a stage, a holder, a cathode magnet, a shield, a first moving mechanism, and a second moving mechanism. The chamber provides a processing space. The stage is provided in the processing space and configured to support a substrate. The holder is configured to hold a target that is provided in the processing space. The cathode magnet is provided outside the chamber with respect to the target. The shield has a slit and is configured to block particles released from the target around the slit. The first moving mechanism is configured to move the shield between the stage and the target along a scanning direction substantially parallel to a surface of the substrate mounted on the stage. The second moving mechanism is configured to move the cathode magnet along the scanning direction.

公开(公告)号：US10910215B2

公开(公告)日：2021-02-02

申请号：US15639682

申请日：2017-06-30

Applicant: TOKYO ELECTRON LIMITED

Inventor： Naoki Watanabe ,  Tatsuo Hatano ,  Shinji Furukawa ,  Naoyuki Suzuki

IPC: H01L21/02 ,  C23C14/56 ,  C23C14/50 ,  C23C14/34 ,  H01L43/12 ,  H01L21/28

Abstract: There is provided a method of forming an insulating film which includes providing a workpiece having a base portion and a protuberance portion formed to protrude from the base portion; and forming an insulating film on the workpiece by sputtering. The forming an insulating film includes forming the insulating film while changing an angle defined between the workpiece and a target.

公开(公告)号：US12033878B2

公开(公告)日：2024-07-09

申请号：US18230929

申请日：2023-08-07

Applicant: Tokyo Electron Limited

Inventor： Tatsuo Hatano ,  Tetsuya Miyashita ,  Naoki Watanabe ,  Naoyuki Suzuki

IPC: H01L21/677 ,  B25J9/02 ,  B25J9/12 ,  B25J11/00 ,  H02K7/14 ,  H02K41/02 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01L21/67742 ,  B25J9/02 ,  B25J9/12 ,  B25J11/0095 ,  H02K7/14 ,  H02K41/02 ,  H01L21/67167 ,  H01L21/67748 ,  H01L21/68707

Abstract: A substrate transfer apparatus includes a planar motor provided in a transfer chamber and having coils arranged therein, a transfer unit movable on the planar motor, and a control unit configured to control an energization of the coils. The transfer unit includes two bases having magnets arranged thereon and configured to be movable on the planar motor, a substrate support member configured to support a substrate, and a link mechanism configured to connect the two bases and the substrate support member to each other.

公开(公告)号：US11251027B2

公开(公告)日：2022-02-15

申请号：US16881693

申请日：2020-05-22

Applicant: TOKYO ELECTRON LIMITED

Inventor： Tatsuo Hatano ,  Naoki Watanabe ,  Koji Maeda

IPC: H01J37/32 ,  H01L21/687 ,  H01J37/34 ,  C23C14/34 ,  C23C14/50 ,  H01L43/12

Abstract: A stage device for holding a substrate in a processing apparatus for processing the substrate includes a stage, a stage rotating mechanism, and a cold heat transfer mechanism. The stage is configured to hold the substrate in a processing chamber. The stage rotating mechanism includes a rotation shaft extending downward from a center of a bottom surface of the stage and a motor configured to rotate the stage via the rotation shaft. The cold heat transfer mechanism includes at least one cold heat transfer body that is fixedly disposed at a position spaced away from the rotation shaft below the stage and is configured to transfer cold heat of a chiller. The cold heat transfer mechanism is disposed with a gap between the cold heat transfer mechanism and the stage.