中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

5 records (took 0.012 seconds)

    Substrate processing apparatus
    1.
    发明授权
    Substrate processing apparatus 有权
    基板加工装置

    公开(公告)号：US09305818B2

    公开(公告)日：2016-04-05

    申请号：US14460428

    申请日：2014-08-15

    Applicant: Tokyo Electron Limited

    Inventor： Yuji Kamikawa ,  Takafumi Tsuchiya ,  Koji Egashira

    IPC: H01L21/677 ,  H01L21/687

    CPC classification number: H01L21/67775 ,  H01L21/67727 ,  H01L21/67733 ,  H01L21/67736 ,  H01L21/67769 ,  H01L21/67778 ,  H01L21/687 ,  H01L2221/68368 ,  Y10S414/14

    Abstract: A substrate processing apparatus, which utilizes a first transfer apparatus and a second transfer apparatus which are configured to transfer a transfer container containing a plurality of substrates, along a first transfer path and a second transfer path whose lateral positions differ from each other, respectively, including a first load port where the transfer container is loaded and unloaded by the first transfer apparatus, and a second load port that is arranged stepwise with respect to the first load port, with the transfer container being loaded to and unloaded from the second load port by the second transfer apparatus.

    Abstract translation: 一种基板处理装置，其利用第一传送装置和第二传送装置，所述第一传送装置和第二传送装置分别沿着第一传送路径和横向位置彼此不同的第二传送路径传送包含多个基板的传送容器， 包括第一装载口，其中所述转运容器由所述第一转运装置装载和卸载;以及第二装载端口，其相对于所述第一装载端口逐步布置，所述转运容器被装载到所述第二装载端口并从所述第二装载端口卸载 通过第二传送装置。

    NOZZLE CLEANING DEVICE, NOZZLE CLEANING METHOD, AND SUBSTRATE PROCESSING APPARATUS
    3.
    发明申请
    NOZZLE CLEANING DEVICE, NOZZLE CLEANING METHOD, AND SUBSTRATE PROCESSING APPARATUS 审中-公开
    喷嘴清洁装置，喷嘴清洁方法和基板处理装置

    公开(公告)号：US20130319470A1

    公开(公告)日：2013-12-05

    申请号：US13904315

    申请日：2013-05-29

    Applicant: Tokyo Electron Limited

    Inventor： Yoshihiro Kai ,  Shinya Ishikawa ,  Yuji Kamikawa ,  Shuichi Nagamine ,  Naoki Shindo

    IPC: B08B9/032

    CPC classification number: H01L29/1608 ,  B05B1/36 ,  B05B15/555 ,  B05B15/557 ,  B08B3/102 ,  B08B9/0321 ,  B08B9/0328 ,  H01L21/67051 ,  H01L29/7813

    Abstract: A nozzle cleaning device is capable of uniformly cleaning a nozzle from a front end of the nozzle to an upper part thereof. The nozzle cleaning device includes a storage tank, a liquid discharging portion and an overflow discharging portion. The storage tank has a cylindrical inner peripheral surface and is configured to store therein a cleaning liquid that cleans a nozzle used in a substrate process. The liquid discharging portion is configured to discharge the cleaning liquid into the storage tank toward a position eccentric with respect to a central axis of the cylindrical inner peripheral surface to store the cleaning liquid within the storage tank and configured to form a vortex flow of the cleaning liquid revolving within the storage tank. The overflow discharging portion is configured to discharge the cleaning liquid that overflows the storage tank.

    Abstract translation: 喷嘴清洁装置能够从喷嘴的前端到其上部均匀地清洁喷嘴。 喷嘴清洁装置包括储罐，液体排出部分和溢流排放部分。 储罐具有圆筒形的内周面，并且构造成在其中存储清洁基板工艺中使用的喷嘴的清洗液。 液体排出部分被配置成将清洁液体排出到相对于圆筒形内周面的中心轴线偏心的位置，以将清洗液储存在储罐内，并且构造成形成清洁的涡流 液体在储罐内旋转。 溢流排出部被配置为排出溢出储罐的清洗液。

    Evaporator, evaporation method and substrate processing apparatus
    5.
    发明授权
    Evaporator, evaporation method and substrate processing apparatus 有权
    蒸发器，蒸发法和底物处理装置

    公开(公告)号：US09003674B2

    公开(公告)日：2015-04-14

    申请号：US14033829

    申请日：2013-09-23

    Applicant: Tokyo Electron Limited

    Inventor： Mikio Nakashima ,  Yuji Kamikawa

    IPC: F26B5/00 ,  F26B5/16 ,  B01D1/02 ,  B01D1/30 ,  B01D1/06 ,  B01B1/00

    CPC classification number: B01D1/065 ,  B01B1/005 ,  B01D1/02 ,  B01D1/30 ,  F26B5/00 ,  F26B5/16

    Abstract: Disclosed are an evaporator, an evaporation method, and a substrate processing apparatus, which can increase the concentration of generated vapor of an organic solvent and efficiently heat the organic solvent. The evaporator includes a fluid tube, a liquid organic solvent supply device for supplying the organic solvent liquid to one end of the fluid tube, and heating units for heating the fluid tube. The fluid tube has a cross section that increases from the one end to the other end. When the organic solvent liquid supplied to one end of the fluid tube is heated, the organic solvent vapor is discharged from the other end of the fluid tube. The substrate processing apparatus includes the above-described evaporator.

    Abstract translation: 公开了一种蒸发器，蒸发方法和基板处理装置，其可以增加有机溶剂的产生蒸气的浓度并有效地加热有机溶剂。 蒸发器包括流体管，用于将有机溶剂液体供给到流体管的一端的液体有机溶剂供给装置，以及用于加热流体管的加热单元。 流体管具有从一端到另一端增加的横截面。 当提供给流体管的一端的有机溶剂液体被加热时，有机溶剂蒸气从流体管的另一端排出。 基板处理装置包括上述蒸发器。

Patent Agency Ranking