Method for producing polymer, polymer for lithography, resist composition, and method for producing substrate
    1.
    发明授权
    Method for producing polymer, polymer for lithography, resist composition, and method for producing substrate 有权
    聚合物的制造方法,光刻用的聚合物,抗蚀剂组合物以及基材的制造方法

    公开(公告)号:US09109060B2

    公开(公告)日:2015-08-18

    申请号:US13382397

    申请日:2010-07-07

    摘要: A method for producing a polymer is provided. The polymer improves variations in the content ratio and molecular weights of a copolymer's constitutional units, solvent solubility, and the sensitivity of a resist composition using such a polymer. The method includes polymerizing two or more monomers while adding with a polymerization initiator to obtain the polymer, feeding a first solution containing first composition monomers in an initial polymerization stage, and starting dropwise addition of a second solution containing second composition monomers after or simultaneously with the feeding of the first solution. The second composition is equal to a target composition ratio of the polymer to be obtained. The first composition is calculated in advance based on a target composition ratio and the reactivity of the monomers. The above dropping rate is set to high.

    摘要翻译: 提供聚合物的制造方法。 聚合物改善共聚物的结构单元的含量比和分子量的变化,溶剂的溶解度以及使用这种聚合物的抗蚀剂组合物的灵敏度。 该方法包括聚合两种或更多种单体,同时加入聚合引发剂以获得聚合物,在初始聚合阶段中加入含有第一组合物单体的第一溶液,并在第二组合物单体或与其同时开始滴加含有第二组合物单体的第二溶液 喂养第一种方案。 第二组合物等于所得聚合物的目标组成比。 基于目标组成比和单体的反应性,预先计算第一组合物。 上述滴加速度设定为高。

    Polymer and method for producing same

    公开(公告)号:US09840568B2

    公开(公告)日:2017-12-12

    申请号:US14122801

    申请日:2012-05-30

    摘要: The time when at least a monomer and a chain transfer agent are supplied in a reactor and the solution temperature in the reactor has reached a predetermined polymerization temperature is set as starting time (T0), and the time when a process to terminate the polymerization is started is set as ending time (T1). A polymerization initiator is supplied into the reactor between (T0) and just before [(T1)−(T0)/2] and between [(T1)−(T0)/2] and (T1). The total mass of the polymerization initiator supplied to the reactor between (T0) and (T1) is set as (IA), and the total mass of the polymerization initiator supplied between [(T0−T1)/2] and (T1) is set as (IB). The (IA) is set 50 to 100 mass % of the entire polymerization initiator. Using a production method in which 0.50

    POLYMER AND METHOD FOR PRODUCING SAME
    4.
    发明申请
    POLYMER AND METHOD FOR PRODUCING SAME 有权
    聚合物及其生产方法

    公开(公告)号:US20140114034A1

    公开(公告)日:2014-04-24

    申请号:US14122801

    申请日:2012-05-30

    IPC分类号: C08F2/38 C08F4/04

    摘要: The time when at least a monomer and a chain transfer agent are supplied in a reactor and the solution temperature in the reactor has reached a predetermined polymerization temperature is set as starting time (T0), and the time when a process to terminate the polymerization is started is set as ending time (T1). A polymerization initiator is supplied into the reactor between (T0) and just before [(T1)−(T0)/2] and between [(T1)−(T0)/2] and (T1). The total mass of the polymerization initiator supplied to the reactor between (T0) and (T1) is set as (IA), and the total mass of the polymerization initiator supplied between [(T0−T1)/2] and (T1) is set as (IB). The (IA) is set 50 to 100 mass % of the entire polymerization initiator. Using a production method in which 0.50

    摘要翻译: 将反应器中至少提供单体和链转移剂并将反应器中的溶液温度达到预定聚合温度的时间设定为起始时间(T0),并且终止聚合的时间为 开始设置为结束时间(T1)。 在(T0)和[(T1) - (T0)/ 2]之间以及[(T1) - (T0)/ 2]和(T1)之间,在反应器内提供聚合引发剂。 在(T0)和(T1)之间供给到反应器中的聚合引发剂的总质量设定为(IA),在[(T0-T1)/ 2]和(T1)之间供应的聚合引发剂的总质量为 设为(IB)。 (IA)设定为整个聚合引发剂的50〜100质量%。 使用其中满足0.50 <(IB)/(IA)<1.00的制备方法,以高聚合速率制备聚合物,其显示出较小的分子量变化并且在末端残留的链转移剂残留量较少 聚合物链。

    COPOLYMERS FOR LITHOGRAPHY AND METHOD FOR PRODUCING SAME, RESIST COMPOSITION, METHOD FOR PRODUCING SUBSTRATE WITH PATTERN FORMED THEREUPON, METHOD FOR EVALUATING COPOLYMERS, AND METHOD FOR ANALYZING COPOLYMER COMPOSITIONS
    5.
    发明申请
    COPOLYMERS FOR LITHOGRAPHY AND METHOD FOR PRODUCING SAME, RESIST COMPOSITION, METHOD FOR PRODUCING SUBSTRATE WITH PATTERN FORMED THEREUPON, METHOD FOR EVALUATING COPOLYMERS, AND METHOD FOR ANALYZING COPOLYMER COMPOSITIONS 有权
    用于制备它的共聚物及其制备方法,耐蚀组合物,用于形成图案的基板的生产方法,用于评价共聚物的方法和分析共聚物组合物的方法

    公开(公告)号:US20130224654A1

    公开(公告)日:2013-08-29

    申请号:US13879737

    申请日:2011-10-14

    IPC分类号: G03F7/004

    摘要: A target variable analysis unit (11) calculates the triad fractions of monomer units in the composition of a known polymer sample from the copolymerization reactivity ratios of the monomer units to obtain a target variable. A waveform processing unit (12) processes NMR measurements, signals, etc. An explanatory variable analysis unit (13) obtains explanatory variables from the amount of chemical shift and signal strength in the NMR measurements of the known sample. A model generation unit (14) determines the regression equation of the regression model of the target variable and the explanatory variables by partial least squares regression, and obtains regression model coefficients. A sample analysis unit (15) uses the regression model to calculate the triad fractions for an unknown copolymer sample from the amount of chemical shift and signal strength in the NMR measurements of the unknown copolymer sample. By using a copolymer for lithography in which the total of the triad fractions obtained in this way is not more than 20 mole % in the copolymer, a resist composition with excellent solubility and sensitivity can be manufactured.

    摘要翻译: 目标可变分析单元(11)根据单体单元的共聚反应性比率计算已知聚合物样品的组成中单体单元的三单元组分数,以获得目标变量。 波形处理单元(12)处理NMR测量,信号等。解释变量分析单元(13)从已知样本的NMR测量中的化学位移和信号强度的量中获得解释变量。 模型生成单元(14)通过偏最小二乘回归确定目标变量回归模型的回归方程和解释变量,得到回归模型系数。 样品分析单元(15)使用回归模型从未知共聚物样品的NMR测量中的化学位移和信号强度的量来计算未知共聚物样品的三单元组分数。 通过使用共聚物,其中在共聚物中以这种方式获得的三单元组分数的总和不超过20摩尔%,可以制造出具有优异的溶解度和灵敏度的抗蚀剂组合物。

    METHOD FOR PRODUCING POLYMER, POLYMER FOR LITHOGRAPHY, RESIST COMPOSITION, AND METHOD FOR PRODUCING SUBSTRATE
    6.
    发明申请
    METHOD FOR PRODUCING POLYMER, POLYMER FOR LITHOGRAPHY, RESIST COMPOSITION, AND METHOD FOR PRODUCING SUBSTRATE 有权
    生产聚合物的方法,用于平版印刷的聚合物,耐蚀组合物和生产基材的方法

    公开(公告)号:US20120115086A1

    公开(公告)日:2012-05-10

    申请号:US13382397

    申请日:2010-07-07

    IPC分类号: G03F7/20 G03F7/004 C08F224/00

    摘要: A method for producing a polymer is provided. The polymer improves variations in the content ratio and molecular weights of a copolymer's constitutional units, solvent solubility, and the sensitivity of a resist composition using such a polymer. The method includes polymerizing two or more monomers while adding with a polymerization initiator to obtain the polymer, feeding a first solution containing first composition monomers in an initial polymerization stage, and starting dropwise addition of a second solution containing second composition monomers after or simultaneously with the feeding of the first solution. The second composition is equal to a target composition ratio of the polymer to be obtained. The first composition is calculated in advance based on a target composition ratio and the reactivity of the monomers. The above dropping rate is set to high.

    摘要翻译: 提供聚合物的制造方法。 聚合物改善共聚物的结构单元的含量比和分子量的变化,溶剂的溶解度以及使用这种聚合物的抗蚀剂组合物的灵敏度。 该方法包括聚合两种或更多种单体,同时加入聚合引发剂以获得聚合物,在初始聚合阶段中加入含有第一组合物单体的第一溶液,并在第二组合物单体或与其同时开始滴加含有第二组合物单体的第二溶液 喂养第一种方案。 第二组合物等于所得聚合物的目标组成比。 基于目标组成比和单体的反应性,预先计算第一组合物。 上述滴加速度设定为高。