摘要:
A method for producing a polymer is provided. The polymer improves variations in the content ratio and molecular weights of a copolymer's constitutional units, solvent solubility, and the sensitivity of a resist composition using such a polymer. The method includes polymerizing two or more monomers while adding with a polymerization initiator to obtain the polymer, feeding a first solution containing first composition monomers in an initial polymerization stage, and starting dropwise addition of a second solution containing second composition monomers after or simultaneously with the feeding of the first solution. The second composition is equal to a target composition ratio of the polymer to be obtained. The first composition is calculated in advance based on a target composition ratio and the reactivity of the monomers. The above dropping rate is set to high.
摘要:
A target variable analysis unit (11) calculates the triad fractions of monomer units in the composition of a known polymer sample from the copolymerization reactivity ratios of the monomer units to obtain a target variable. A waveform processing unit (12) processes NMR measurements, signals, etc. An explanatory variable analysis unit (13) obtains explanatory variables from the amount of chemical shift and signal strength in the NMR measurements of the known sample. A model generation unit (14) determines the regression equation of the regression model of the target variable and the explanatory variables by partial least squares regression, and obtains regression model coefficients. A sample analysis unit (15) uses the regression model to calculate the triad fractions for an unknown copolymer sample from the amount of chemical shift and signal strength in the NMR measurements of the unknown copolymer sample. By using a copolymer for lithography in which the total of the triad fractions obtained in this way is not more than 20 mole % in the copolymer, a resist composition with excellent solubility and sensitivity can be manufactured.
摘要:
The time when at least a monomer and a chain transfer agent are supplied in a reactor and the solution temperature in the reactor has reached a predetermined polymerization temperature is set as starting time (T0), and the time when a process to terminate the polymerization is started is set as ending time (T1). A polymerization initiator is supplied into the reactor between (T0) and just before [(T1)−(T0)/2] and between [(T1)−(T0)/2] and (T1). The total mass of the polymerization initiator supplied to the reactor between (T0) and (T1) is set as (IA), and the total mass of the polymerization initiator supplied between [(T0−T1)/2] and (T1) is set as (IB). The (IA) is set 50 to 100 mass % of the entire polymerization initiator. Using a production method in which 0.50
摘要:
The time when at least a monomer and a chain transfer agent are supplied in a reactor and the solution temperature in the reactor has reached a predetermined polymerization temperature is set as starting time (T0), and the time when a process to terminate the polymerization is started is set as ending time (T1). A polymerization initiator is supplied into the reactor between (T0) and just before [(T1)−(T0)/2] and between [(T1)−(T0)/2] and (T1). The total mass of the polymerization initiator supplied to the reactor between (T0) and (T1) is set as (IA), and the total mass of the polymerization initiator supplied between [(T0−T1)/2] and (T1) is set as (IB). The (IA) is set 50 to 100 mass % of the entire polymerization initiator. Using a production method in which 0.50
摘要:
A target variable analysis unit (11) calculates the triad fractions of monomer units in the composition of a known polymer sample from the copolymerization reactivity ratios of the monomer units to obtain a target variable. A waveform processing unit (12) processes NMR measurements, signals, etc. An explanatory variable analysis unit (13) obtains explanatory variables from the amount of chemical shift and signal strength in the NMR measurements of the known sample. A model generation unit (14) determines the regression equation of the regression model of the target variable and the explanatory variables by partial least squares regression, and obtains regression model coefficients. A sample analysis unit (15) uses the regression model to calculate the triad fractions for an unknown copolymer sample from the amount of chemical shift and signal strength in the NMR measurements of the unknown copolymer sample. By using a copolymer for lithography in which the total of the triad fractions obtained in this way is not more than 20 mole % in the copolymer, a resist composition with excellent solubility and sensitivity can be manufactured.
摘要:
A method for producing a polymer is provided. The polymer improves variations in the content ratio and molecular weights of a copolymer's constitutional units, solvent solubility, and the sensitivity of a resist composition using such a polymer. The method includes polymerizing two or more monomers while adding with a polymerization initiator to obtain the polymer, feeding a first solution containing first composition monomers in an initial polymerization stage, and starting dropwise addition of a second solution containing second composition monomers after or simultaneously with the feeding of the first solution. The second composition is equal to a target composition ratio of the polymer to be obtained. The first composition is calculated in advance based on a target composition ratio and the reactivity of the monomers. The above dropping rate is set to high.