Semiconductor device manufacturing method

    公开(公告)号:US10600773B2

    公开(公告)日:2020-03-24

    申请号:US15445988

    申请日:2017-03-01

    摘要: A semiconductor device manufacturing method includes stacking a second semiconductor chip on a first surface of a first semiconductor chip such that the at bump electrode overlies the position of a first through silicon via in the first semiconductor chip, stacking a third semiconductor chip on the second semiconductor chip such that a second bump electrode on the second semiconductor chip overlies the position of a second through silicon via in the third semiconductor chip to form a chip stacked body, connecting the first and second bump electrodes of the chip stacked body to the first and the second through silicon vias by reflowing the bump material, placing the chip stacked body on the first substrate such that the first surface of the first semiconductor chip faces the second surface, and sealing the second surface and the first, second, and third semiconductor chips with a filling resin.

    Semiconductor device manufacturing method

    公开(公告)号:US10903200B2

    公开(公告)日:2021-01-26

    申请号:US16793323

    申请日:2020-02-18

    摘要: A semiconductor device manufacturing method includes stacking a second semiconductor chip on a first surface of a first semiconductor chip such that the at bump electrode overlies the position of a first through silicon via in the first semiconductor chip, stacking a third semiconductor chip on the second semiconductor chip such that a second bump electrode on the second semiconductor chip overlies the position of a second through silicon via in the third semiconductor chip to form a chip stacked body, connecting the first and second bump electrodes of the chip stacked body to the first and the second through silicon vias by reflowing the bump material, placing the chip stacked body on the first substrate such that the first surface of the first semiconductor chip faces the second surface, and sealing the second surface and the first, second, and third semiconductor chips with a filling resin.

    Apparatus and method for manufacturing semiconductor device

    公开(公告)号:US10090273B2

    公开(公告)日:2018-10-02

    申请号:US14636168

    申请日:2015-03-02

    发明人: Naoyuki Komuta

    IPC分类号: B23K1/00 H01L23/00 B23K3/047

    摘要: A manufacturing apparatus of a semiconductor device includes a stage, a head unit configured to face the stage, a driving unit configured to move the head unit towards and away from the stage, a heating unit configured to heat the head unit, and a control unit configured to control the driving unit to move the head unit away from the stage when the heating unit heats the head unit.