Biomolecule-carbon nanostructure nanocomposites for optoelectronic devices

    公开(公告)号:US10224499B2

    公开(公告)日:2019-03-05

    申请号:US15547914

    申请日:2016-01-29

    Abstract: An optoelectronic device comprises a nanocomposite comprising a carbon nanostructure having a surface and a biomolecule adsorbed on the surface and forming a heterojunction at the interface of the carbon nanostructure and the biomolecule, the carbon nanostructure and the biomolecule each characterized by respective conduction band edges and valence band edges. The device further comprises first and second electrodes in electrical communication with the nanocomposite. The conduction band edge offset, the valence band edge offset, or both, across the heterojunction is greater in energy than the binding energy of an exciton generated in the carbon nanostructure or the biomolecule upon the absorption of light such that the exciton dissociates at the heterojunction to an electron, which is injected into one of the carbon nanostructure and the biomolecule, and a hole, which is injected into the other of the carbon nanostructure and the biomolecule.

    NANODOME-GRAPHENE PLASMONIC SUBSTRATES

    公开(公告)号:US20210396916A1

    公开(公告)日:2021-12-23

    申请号:US17289386

    申请日:2019-10-30

    Inventor: Judy Z. Wu

    Abstract: Plasmonic substrates are provided which may be used in a variety of optoelectronic devices, e.g., biosensors and photodetectors. The plasmonic substrate may comprise a layer of graphene and a plurality of discrete, individual transition metal chalcogenide nanodomes distributed on a surface of the layer of graphene, each nanodome surrounded by bare graphene. Methods for making and using the plasmonic substrates are also provided.

    Atomic layer deposition of ultrathin tunnel barriers

    公开(公告)号:US10593871B2

    公开(公告)日:2020-03-17

    申请号:US15985979

    申请日:2018-05-22

    Abstract: Methods for forming tunnel barrier layers are provided, including a method comprising exposing a surface of a material, the surface free of oxygen, to an initial water pulse for a pulse time and at a pulse temperature, the pulse time and pulse temperature selected to maximize hydroxylation of the surface; and exposing the hydroxylated surface to alternating, separated pulses of precursors under conditions to induce reactions between the hydroxylated surface and the precursors to form a tunnel barrier layer on the surface of the material via atomic layer deposition (ALD), the tunnel barrier layer having an average thickness of no more than 1 nm and being formed without an intervening interfacial layer between the tunnel barrier layer and the surface of the material.

    ATOMICALLY TUNED ULTRATHIN MEMRISTORS
    7.
    发明公开

    公开(公告)号:US20240074332A1

    公开(公告)日:2024-02-29

    申请号:US18280305

    申请日:2022-05-31

    Abstract: Memristors are provided, which, in embodiments, comprise a bottom electrode; a top electrode in electrical communication with the bottom electrode, wherein one or both of the bottom and top electrodes is a Schottky electrode; and a dielectric stack between the bottom and top electrodes, the dielectric stack forming a top interface with a bottom surface of the top electrode and a bottom interface with a top surface of the bottom electrode, the dielectric stack comprising a plurality of atomic layer deposition (ALD)-grown atomic sublayers, the plurality comprising an ALD-grown atomic sublayer of a first metal oxide and an ALD-grown atomic sublayer of a second metal oxide. The second metal oxide is different from the first metal oxide and has a greater concentration of oxygen vacancies (VO) than the first metal oxide. The dielectric stack has a thickness of no more than about 5 nm.

    ATOMIC LAYER DEPOSITION OF ULTRATHIN TUNNEL BARRIERS

    公开(公告)号:US20190013463A1

    公开(公告)日:2019-01-10

    申请号:US15985979

    申请日:2018-05-22

    CPC classification number: H01L43/12 H01L39/223 H01L39/2493 H01L43/08

    Abstract: Methods for forming tunnel barrier layers are provided, including a method comprising exposing a surface of a material, the surface free of oxygen, to an initial water pulse for a pulse time and at a pulse temperature, the pulse time and pulse temperature selected to maximize hydroxylation of the surface; and exposing the hydroxylated surface to alternating, separated pulses of precursors under conditions to induce reactions between the hydroxylated surface and the precursors to form a tunnel barrier layer on the surface of the material via atomic layer deposition (ALD), the tunnel barrier layer having an average thickness of no more than 1 nm and being formed without an intervening interfacial layer between the tunnel barrier layer and the surface of the material.

    SUPERCONDUCTING NEUROMORPHIC COMPUTING DEVICES AND CIRCUITS

    公开(公告)号:US20240152742A1

    公开(公告)日:2024-05-09

    申请号:US18280530

    申请日:2022-03-08

    Inventor: Hao Li Judy Z. Wu

    CPC classification number: G06N3/065 G06N10/40

    Abstract: A neuromorphic computing circuit includes a plurality of memristors that function as synapses. The neuromorphic computing circuit also includes a superconducting quantum interference device (SQUID) coupled to the plurality of memristors. The SQUID functions as a neuron such that the plurality of memristors and the SQUID form a neural unit of the neuromorphic computing circuit.

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