Pillar devices and methods of making thereof
    1.
    发明申请
    Pillar devices and methods of making thereof 有权
    支柱装置及其制造方法

    公开(公告)号:US20090179310A1

    公开(公告)日:2009-07-16

    申请号:US12007781

    申请日:2008-01-15

    IPC分类号: H01L29/868 H01L21/20

    摘要: A method of making a semiconductor device includes providing an insulating layer containing a plurality of openings, forming a first semiconductor layer in the plurality of openings in the insulating layer and over the insulating layer, and removing a first portion of the first semiconductor layer, such that first conductivity type second portions of the first semiconductor layer remain in lower portions of the plurality of openings in the insulating layer, and upper portions of the plurality of openings in the insulating layer remain unfilled. The method also includes forming a second semiconductor layer in the upper portions of the plurality of openings in the insulating layer and over the insulating layer, and removing a first portion of the second semiconductor layer located over the insulating layer. The second conductivity type second portions of the second semiconductor layer remain in upper portions of the plurality of openings in the insulating layer to form a plurality of pillar shaped diodes in the plurality of openings.

    摘要翻译: 制造半导体器件的方法包括提供包含多个开口的绝缘层,在绝缘层中的多个开口中并在绝缘层之上形成第一半导体层,以及去除第一半导体层的第一部分, 第一半导体层的第一导电类型的第二部分保留在绝缘层中的多个开口的下部,并且绝缘层中的多个开口的上部保持未填充。 该方法还包括在绝缘层中的多个开口的上部和绝缘层上形成第二半导体层,以及去除位于绝缘层之上的第二半导体层的第一部分。 第二半导体层的第二导电类型的第二部分保留在绝缘层中的多个开口的上部,以在多个开口中形成多个柱状二极管。

    PILLAR DEVICES AND METHODS OF MAKING THEREOF
    2.
    发明申请
    PILLAR DEVICES AND METHODS OF MAKING THEREOF 有权
    支柱装置及其制造方法

    公开(公告)号:US20110136326A1

    公开(公告)日:2011-06-09

    申请号:US13026381

    申请日:2011-02-14

    IPC分类号: H01L21/36

    摘要: A method of making a semiconductor device includes providing an insulating layer containing a plurality of openings, forming a first semiconductor layer in the plurality of openings in the insulating layer and over the insulating layer, and removing a first portion of the first semiconductor layer, such that first conductivity type second portions of the first semiconductor layer remain in lower portions of the plurality of openings in the insulating layer, and upper portions of the plurality of openings in the insulating layer remain unfilled. The method also includes forming a second semiconductor layer in the upper portions of the plurality of openings in the insulating layer and over the insulating layer, and removing a first portion of the second semiconductor layer located over the insulating layer. The second conductivity type second portions of the second semiconductor layer remain in upper portions of the plurality of openings in the insulating layer to form a plurality of pillar shaped diodes in the plurality of openings.

    摘要翻译: 制造半导体器件的方法包括提供包含多个开口的绝缘层,在绝缘层中的多个开口中并在绝缘层之上形成第一半导体层,以及去除第一半导体层的第一部分, 第一半导体层的第一导电类型的第二部分保留在绝缘层中的多个开口的下部,并且绝缘层中的多个开口的上部保持未填充。 该方法还包括在绝缘层中的多个开口的上部和绝缘层上形成第二半导体层,以及去除位于绝缘层之上的第二半导体层的第一部分。 第二半导体层的第二导电类型的第二部分保留在绝缘层中的多个开口的上部,以在多个开口中形成多个柱状二极管。

    Pillar devices and methods of making thereof
    4.
    发明授权
    Pillar devices and methods of making thereof 有权
    支柱装置及其制造方法

    公开(公告)号:US07906392B2

    公开(公告)日:2011-03-15

    申请号:US12007781

    申请日:2008-01-15

    摘要: A method of making a semiconductor device includes providing an insulating layer containing a plurality of openings, forming a first semiconductor layer in the plurality of openings in the insulating layer and over the insulating layer, and removing a first portion of the first semiconductor layer, such that first conductivity type second portions of the first semiconductor layer remain in lower portions of the plurality of openings in the insulating layer, and upper portions of the plurality of openings in the insulating layer remain unfilled. The method also includes forming a second semiconductor layer in the upper portions of the plurality of openings in the insulating layer and over the insulating layer, and removing a first portion of the second semiconductor layer located over the insulating layer. The second conductivity type second portions of the second semiconductor layer remain in upper portions of the plurality of openings in the insulating layer to form a plurality of pillar shaped diodes in the plurality of openings.

    摘要翻译: 制造半导体器件的方法包括提供包含多个开口的绝缘层,在绝缘层中的多个开口中并在绝缘层之上形成第一半导体层,以及去除第一半导体层的第一部分, 第一半导体层的第一导电类型的第二部分保留在绝缘层中的多个开口的下部,并且绝缘层中的多个开口的上部保持未填充。 该方法还包括在绝缘层中的多个开口的上部和绝缘层上形成第二半导体层,以及去除位于绝缘层之上的第二半导体层的第一部分。 第二半导体层的第二导电类型的第二部分保留在绝缘层中的多个开口的上部,以在多个开口中形成多个柱状二极管。

    Electrode diffusions in two-terminal non-volatile memory devices
    10.
    发明授权
    Electrode diffusions in two-terminal non-volatile memory devices 有权
    双端非易失性存储器件中的电极扩散

    公开(公告)号:US08592793B2

    公开(公告)日:2013-11-26

    申请号:US13100657

    申请日:2011-05-04

    IPC分类号: H01L47/00

    摘要: A non-volatile memory device includes a plurality of pillars, where each of the plurality of pillars contains a non-volatile memory cell containing a steering element and a storage element and at least one of a top corner or a bottom corner of each of the plurality of pillars is rounded. A method of making non-volatile memory device includes forming a stack of device layers, and patterning the stack to form a plurality of pillars, where each of the plurality of pillars contains a non-volatile memory cell that contains a steering element and a storage element, and where at least one of top corner or bottom corner of each of the plurality of pillars is rounded.

    摘要翻译: 非易失性存储器件包括多个支柱,其中多个支柱中的每个支柱包含含有转向元件和存储元件的非易失性存储单元,并且每个的顶角或底角中的至少一个 多个柱子是圆形的。 制造非易失性存储器件的方法包括形成器件层堆叠,以及图案化堆叠以形成多个柱,其中多个柱中的每个柱包含含有转向元件和存储器的非易失性存储单元 并且其中所述多个柱中的每一个的顶角或底角中的至少一个是圆形的。