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    RESIST ADHENSION TO CARBON OVERCOATS FOR NANOIMPRINT LITHOGRAPHY
    1.
    发明申请
    RESIST ADHENSION TO CARBON OVERCOATS FOR NANOIMPRINT LITHOGRAPHY 审中-公开
    碳纳米尺度对碳纳米管的耐蚀性

    公开(公告)号：US20110195276A1

    公开(公告)日：2011-08-11

    申请号：US12703887

    申请日：2010-02-11

    申请人： Wei Hu ,  Nobuo Kurataka ,  Yuan Xu ,  Gennady Gauzner

    发明人： Wei Hu ,  Nobuo Kurataka ,  Yuan Xu ,  Gennady Gauzner

    IPC分类号： G11B5/702 ,  B05D5/08 ,  B05D3/12

    CPC分类号： G11B5/855 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： In an imprint lithography process, a carbon overcoat (COC) layer has nitrogen introduced into an upper surface region thereof before application of an adhesion layer to the COC/substrate combination. This results in the formation of a thin layer of nitrogenated carbon at the surface of the COC layer that promotes covalent bonding with the functional groups of the adhesion layer and, thus, significantly improves resist adhesion upon imprint template removal. Thus, an embodiment of an imprint lithography method comprises introducing nitrogen into an upper surface region of the COC layer, forming an adhesion layer on the nitrogenated COC layer, forming resist on the adhesion layer, contacting the resist with an imprint template having patterned features formed therein such that the resist fills the patterned features of the imprint template, and separating the imprint template from the resist such that a negative image of the patterned features is formed in the resist. An embodiment of an imprint structure comprises a substrate, a COC layer formed on the substrate, the COC layer having a nitrogenated upper surface region formed therein, and adhesion layer formed on the COC layer, and resist formed on the adhesion layer.

    摘要翻译： 在压印光刻工艺中，在向COC /衬底组合施加粘附层之前，碳覆盖层（COC）层将氮气引入其上表面区域。 这导致在COC层的表面上形成薄层的氮化碳，其促进与粘合层的官能团的共价键，并且因此显着提高印模模板去除时的抗附着力。 因此，压印光刻方法的一个实施例包括将氮气引入COC层的上表面区域，在氮化COC层上形成粘合层，在粘合层上形成抗蚀剂，使抗蚀剂与形成图案的特征的印模模板接触 其中抗蚀剂填充压印模板的图案化特征，以及将印​​模模板与抗蚀剂分离，使得图案特征的负像形成在抗蚀剂中。 压印结构的实施例包括基板，形成在基板上的COC层，其中形成有氮化的上表面区域的COC层和形成在COC层上的粘合层，以及形成在粘合层上的抗蚀剂。

    Method for fabricating patterned magnetic recording media
    4.
    发明授权
    Method for fabricating patterned magnetic recording media 失效
    图案化磁记录介质的制造方法

    公开(公告)号：US07378028B2

    公开(公告)日：2008-05-27

    申请号：US10859202

    申请日：2004-06-03

    申请人： Koichi Wago ,  HongYing Wang ,  Nobuo Kurataka ,  Gennady Gauzner ,  Neil Deeman

    发明人： Koichi Wago ,  HongYing Wang ,  Nobuo Kurataka ,  Gennady Gauzner ,  Neil Deeman

    IPC分类号： G11B11/00

    CPC分类号： G11B5/855 ,  Y10T428/24802

    摘要： A method of fabricating a patterned magnetic layer comprises sequential steps of:(a) providing a workpiece comprising a non-magnetic substrate, a layer of magnetic material overlying a surface of the substrate, and a layer of a non-magnetic material overlying the layer of magnetic material;(b) forming a layer of a mask material on the layer of non-magnetic material;(c) forming a topographical pattern comprising a plurality of recesses in the layer of mask material;(d) selectively removing portions of the layer of non-magnetic material proximate lower portions of the recesses, thereby exposing selected portions of the layer of magnetic material;(e) treating the exposed portions of the layer of magnetic material with a liquid for reducing the magnetic properties thereof; and(f) removing the topographically patterned layer of mask material.

    摘要翻译： 制造图案化磁性层的方法包括以下顺序的步骤：（a）提供包括非磁性衬底的工件，覆盖在衬底表面上的一层磁性材料，以及覆盖该层的非磁性材料层 的磁性材料; （b）在非磁性材料层上形成掩模材料层; （c）在所述掩模材料层中形成包括多个凹部的形貌图案; （d）选择性地去除所述凹陷的下部附近的非磁性材料层的部分，从而暴露所述磁性材料层的选定部分; （e）用液体处理磁性材料层的暴露部分以降低其磁特性; 和（f）去除掩模材料的地形图案层。

    Dry passivation process for stamper/imprinter family making for patterned recording media
    5.
    发明授权
    Dry passivation process for stamper/imprinter family making for patterned recording media 有权
    干式钝化工艺用于压模/印刷机家族制作图案化记录介质

    公开(公告)号：US07150844B2

    公开(公告)日：2006-12-19

    申请号：US10685462

    申请日：2003-10-16

    申请人： Neil N. Deeman ,  Hong Ying Wang ,  Gennady Gauzner ,  Nobuo Kurataka

    发明人： Neil N. Deeman ,  Hong Ying Wang ,  Gennady Gauzner ,  Nobuo Kurataka

    IPC分类号： B29C33/42 ,  C25D1/10

    CPC分类号： C25D1/20 ,  C25D1/00 ,  C25D1/10

    摘要： A method of manufacturing a stamper/imprinter for use in patterning of a recording medium comprises sequential steps of: (a) providing a substrate/workpiece comprising a topographically patterned surface including a plurality of projections and depressions corresponding to a pattern to be formed in a surface of the recording medium; (b) forming a thin release layer in conformal contact with the topographically patterned surface by means of a dry process; (c) forming a thicker layer of a material in conformal contact with the thin passivation layer on the topographically patterned surface; and (d) separating the thicker layer of material from the topographically patterned surface to form therefrom a stamper/imprinter including an imprinting surface having a negative image replica of the topographically patterned surface, separation of the thicker layer of material from the topographically patterned surface being facilitated by the thin release layer formed by the dry process.

    摘要翻译： 一种制造用于记录介质图形化的压模/打印机的方法包括以下步骤：（a）提供基板/工件，该基板/工件包括地形图形表面，其包括对应于待形成的图案的多个凸起和凹陷 记录介质的表面; （b）通过干法形成与地形图形表面保形接触的薄释放层; （c）在地形图形表面上形成与薄钝化层保形接触的材料的较厚层; 以及（d）将厚层材料与地形图案化的表面分离以形成压模/打印机，其包括具有地形图形表面的负图像复制品的压印表面，较厚的材料层与地形图形表面的分离是 由通过干法形成的薄释放层促进。

    METHOD AND SYSTEM FOR OPTICAL CALLIBRATION DISCS
    8.
    发明申请
    METHOD AND SYSTEM FOR OPTICAL CALLIBRATION DISCS 审中-公开
    光学识别盘的方法和系统

    公开(公告)号：US20130143002A1

    公开(公告)日：2013-06-06

    申请号：US13311302

    申请日：2011-12-05

    申请人： Nobuo Kurataka ,  Gennady Gauzner ,  Zhaoning Yu

    发明人： Nobuo Kurataka ,  Gennady Gauzner ,  Zhaoning Yu

    IPC分类号： B32B3/10 ,  C23F1/04 ,  B05D3/06 ,  B05D5/00

    CPC分类号： G11B5/855 ,  B32B1/08 ,  B32B3/30 ,  B32B2551/00 ,  G03F7/0002 ,  Y10T428/24612

    摘要： A system and method for optical calibration discs includes dispensing a resist layer on a portion of a substrate. A surface of the substrate and a topographically patterned surface of predetermined objects of a template are contacted together, wherein the contacting causes the resist layer between the portion of the substrate and the template to conform to the topographically patterned surface, and the resist layer includes nano-scale voids. The nano-scale voids are reduced by longer spread time, thinner resist, and removal of the residual resist layer together with the voids by using a descum step. The resist layer is hardened into a negative image of the topographically patterned surface, wherein the negative image includes surfaces that are operable to be individually measured by an optical reader. The substrate and the template are separated, wherein the resist layer adheres to the surface of the substrate.

    摘要翻译： 用于光学校准盘的系统和方法包括在基底的一部分上分配抗蚀剂层。 基板的表面和模板的预定物体的地形图形表面接触在一起，其中所述接触使得所述基板的所述部分与所述模板之间的所述抗蚀剂层与所述地形图形表面一致，并且所述抗蚀剂层包括纳米 规模空白。 通过使用除尘步骤，纳米级空隙通过较长的铺展时间，更薄的抗蚀剂和残余抗蚀剂层与空隙一起去除而减少。 抗蚀剂层被硬化成地形图案化表面的负像，其中负像包括可操作以由光学读取器单独测量的表面。 分离基板和模板，其中抗蚀剂层粘附到基板的表面。

    ANALYSIS OF PATTERN FEATURES
    9.
    发明申请
    ANALYSIS OF PATTERN FEATURES 审中-公开
    模式特征分析

    公开(公告)号：US20140014621A1

    公开(公告)日：2014-01-16

    申请号：US13798130

    申请日：2013-03-13

    申请人： Zhaoning Yu ,  Nobuo Kurataka ,  Gennady Gauzner

    发明人： Zhaoning Yu ,  Nobuo Kurataka ,  Gennady Gauzner

    IPC分类号： B05C21/00

    CPC分类号： G03F7/0002 ,  C09K13/00 ,  G03F7/40 ,  G11B5/746 ,  G11B5/855

    摘要： The embodiments disclose a method for an electron curing reverse-tone process, including depositing an etch-resistant layer onto a patterned imprinted resist layer fabricated onto a hard mask layer deposited onto a substrate, curing the etch-resistant layer using an electron beam dose during etching processes of imprinted pattern features into the hard mask and into the substrate and using analytical processes to quantify reduced pattern feature placement drift errors and to quantify increased pattern feature size uniformity of imprinted pattern features etched.

    摘要翻译： 实施方案公开了一种用于电子固化反相色调工艺的方法，包括将沉积抗蚀刻层的图案印刷的抗蚀剂层沉积在沉积在基底上的硬掩模层上，使用电子束剂量固化耐蚀刻层 将印刷图案特征蚀刻到硬掩模中并进入基底，并使用分析过程来量化减少的图案特征位移漂移误差并量化蚀刻的印记图案特征的增加的图案特征尺寸均匀性。

    Utilizing permanent master for making stampers/imprinters for patterning of recording media
    10.
    发明授权
    Utilizing permanent master for making stampers/imprinters for patterning of recording media 失效
    利用永久主人制作刻印机/打印机来记录媒体的图案化

    公开(公告)号：US07105280B1

    公开(公告)日：2006-09-12

    申请号：US10436057

    申请日：2003-05-13

    申请人： Neil Deeman ,  Gennady Gauzner ,  Christopher Formato ,  Nobuo Kurataka

    发明人： Neil Deeman ,  Gennady Gauzner ,  Christopher Formato ,  Nobuo Kurataka

    IPC分类号： G11B5/20

    CPC分类号： G11B5/855 ,  B81C99/009

    摘要： A method of manufacturing a stamper/imprinter for use in patterning of a recording medium, comprising sequential steps of: (a) providing a permanent master comprising a body of a substantially rigid material having a surface with a topographical pattern formed therein comprising a patterned plurality of spaced-apart recesses with a plurality of non-recessed areas therebetween, the topographical pattern corresponding to a pattern to be formed in a recording medium; (b) forming a layer of a substantially rigid material over the surface of the permanent master with the topographical pattern formed therein; (c) separating the layer of a substantially rigid material from the master, the layer of a substantially rigid material having an imprinting surface with a topographical pattern formed therein replicating the topographical pattern of the permanent master; and (d) repeating steps (b) and (c) multiple times with the permanent master provided in step (a) to form a plurality of stampers/imprinters.

    摘要翻译： 一种用于制造用于记录介质图案化的压模/打印机的方法，包括以下顺序的步骤：（a）提供永久性主机，其包括具有形成在其中的形状图案的表面的基本刚性材料的主体，包括图案化多个 间隔开的凹部，其间具有多个非凹陷区域，所述形状图案对应于要在记录介质中形成的图案; （b）在永久性主体的表面上形成基本上刚性的材料层，其中形成有形貌图案; （c）将基本上刚性的材料层与主体分离，具有压印表面的基本刚性材料的层，其中形成有形成图形的图案，复制永久性主体的形貌图案; 和（d）用步骤（a）中提供的永久主机重复步骤（b）和（c）多次以形成多个冲压机/冲压机。