公开(公告)号：US5780359A

公开(公告)日：1998-07-14

申请号：US570058

申请日：1995-12-11

申请人： William Brown ,  Harald Herchen ,  Walter Merry ,  Michael Welch

发明人： William Brown ,  Harald Herchen ,  Walter Merry ,  Michael Welch

IPC分类号： H01L21/302 ,  H01L21/02 ,  H01L21/027 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/3213

CPC分类号： H01L21/02071 ,  H01L21/31138

摘要： A process for producing a strip removes photoresist and extraneous deposits of polymer residue on the top surface and sidewalls of a post-metal etch wafer. The photoresist and residue are processed simultaneously by a chemical mechanism comprising reactive species derived from a microwave-excited fluorine-containing downstream gas, and a physical mechanism comprising ion bombardment that results from a radio frequency excited plasma and accompanying wafer self bias. A vacuum pump draws stripped photoresist and residues from the surface of the wafer and exhausts them from the chamber.

公开(公告)号：US6062237A

公开(公告)日：2000-05-16

申请号：US060173

申请日：1998-04-14

申请人： William Brown ,  Harald Herchen ,  Walter Merry ,  Michael Welch

发明人： William Brown ,  Harald Herchen ,  Walter Merry ,  Michael Welch

IPC分类号： H01L21/302 ,  H01L21/02 ,  H01L21/027 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/3213 ,  B08B6/00

CPC分类号： H01L21/02071 ,  H01L21/31138

摘要： A process for producing a strip removes photoresist and extraneous deposits of polymer residue on the top surface and sidewalls of a post-metal etch wafer. The photoresist and residue are processed simultaneously by a chemical mechanism comprising reactive species derived from a microwave-excited fluorine-containing downstream gas, and a physical mechanism comprising ion bombardment that results from a radio frequency excited plasma and accompanying wafer self bias. A vacuum pump draws stripped photoresist and residues from the surface of the wafer and exhausts them from the chamber.

摘要翻译： 制造带材的方法在后金属蚀刻晶片的顶表面和侧壁上去除光致抗蚀剂和聚合物残余物的外来沉积物。 光致抗蚀剂和残余物通过包含衍生自微波激发的含氟下游气体的反应物质的化学机理以及由射频激发等离子体和伴随的晶片自偏压产生的离子轰击的物理机理同时进行处理。 真空泵从晶片的表面吸出剥离的光致抗蚀剂和残留物，并将其从室中排出。

公开(公告)号：US5948168A

公开(公告)日：1999-09-07

申请号：US947820

申请日：1997-10-09

申请人： Hongching Shan ,  Harald Herchen ,  Michael Welch

发明人： Hongching Shan ,  Harald Herchen ,  Michael Welch

IPC分类号： H05H1/46 ,  C23C16/44 ,  C23C16/452 ,  C23C16/455 ,  C23C16/50 ,  C23C16/511 ,  C23C16/52 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  C23C16/00

CPC分类号： C23C16/45565 ,  C23C16/452 ,  C23C16/511 ,  C23C16/52 ,  H01J37/32229 ,  H01J37/32357 ,  H01J37/3244 ,  Y10S438/935

摘要： A plasma reactor has plural dielectric gas injection tubes extending from a gas injection source and through a microwave guide and into the top of the reactor chamber. The semiconductor wafer rests near the bottom of the chamber on a wafer pedestal connected to a bias RF power source which is controlled independently of the microwave source coupled to the microwave guide. The microwaves from the waveguide ignite and maintain a plasma in each of the tubes. Gas flow through the tubes carries the plasmas in all the tubes into the chamber and into contact with the wafer surface.

摘要翻译： 等离子体反应器具有多个介电气体注入管，其从气体注入源延伸并通过微波引导件并进入反应器室的顶部。 半导体晶片位于连接到偏置RF电源的晶片基座上的室底部附近，偏置RF电源独立于耦合到微波引导件的微波源控制。 来自波导的微波在每个管中点燃并保持等离子体。 通过管的气体流将所有管中的等离子体携带到室中并与晶片表面接触。

公开(公告)号：US5702530A

公开(公告)日：1997-12-30

申请号：US494297

申请日：1995-06-23

申请人： Hongching Shan ,  Harald Herchen ,  Michael Welch

发明人： Hongching Shan ,  Harald Herchen ,  Michael Welch

IPC分类号： H05H1/46 ,  C23C16/44 ,  C23C16/452 ,  C23C16/455 ,  C23C16/50 ,  C23C16/511 ,  C23C16/52 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  C23C16/00

CPC分类号： C23C16/45565 ,  C23C16/452 ,  C23C16/511 ,  C23C16/52 ,  H01J37/32229 ,  H01J37/32357 ,  H01J37/3244 ,  Y10S438/935

摘要： A plasma reactor has plural dielectric gas injection tubes extending from a gas injection source and through a microwave guide and into the top of the reactor chamber. The semiconductor wafer rests near the bottom of the chamber on a wafer pedestal connected to a bias RF power source which is controlled independently of the microwave source coupled to the microwave guide. The microwaves from the waveguide ignite and maintain a plasma in each of the tubes. Gas flow through the tubes carries the plasmas in all the tubes into the chamber and into contact with the wafer surface.

摘要翻译： 等离子体反应器具有多个介电气体注入管，其从气体注入源延伸并通过微波引导件并进入反应器室的顶部。 半导体晶片位于连接到偏置RF电源的晶片基座上的室底部附近，偏置RF电源独立于耦合到微波引导件的微波源控制。 来自波导的微波在每个管中点燃并保持等离子体。 通过管的气体流将所有管中的等离子体携带到室中并与晶片表面接触。

公开(公告)号：US06267549B1

公开(公告)日：2001-07-31

申请号：US09088965

申请日：1998-06-02

申请人： William Brown ,  Michael Welch

发明人： William Brown ,  Michael Welch

IPC分类号： B25J1804

CPC分类号： B25J9/107 ,  H01L21/67742

摘要： A wafer handling robot system (10) operates in a wafer chamber (40) and comprises two independent robot blades, an upper blade (18) surmounting a lower blade (26). A pair of wafers (28, 32) are supported and positioned at the outer ends (78) of the upper and lower blades (18, 26). The upper robot blade (18) keeps an upper wafer (28) at a level just above the level at which the lower robot blade (26) keeps a lower wafer (32). Because the wafers are virtually at the same level, the same wafer lift mechanism can be used in the wafer chamber to lift and remove or replace the wafers on the two blades. By offsetting the height of the wafers by minimal amounts, the throughput of the system can be increased by up to a factor of two over a single robot blade system, particularly if the robot is the limiting factor on throughput. This throughput enhancement represents a substantial gain with a relatively simple and inexpensive addition to the equipment.

摘要翻译： 晶片处理机器人系统（10）在晶片室（40）中操作并且包括两个独立的机器人刀片，上部刀片（18），其覆盖下部刀片（26）。 一对晶片（28,32）被支撑并定位在上和下叶片（18,26）的外端（78）处。 上部机器人刀片（18）将上部晶片（28）保持在刚好在下部机器人刀片（26）保持下部晶片（32）的水平面上方的水平面上。 因为晶片实际上处于相同的水平，所以可以在晶片室中使用相同的晶片提升机构来提升和移除或更换两个叶片上的晶片。 通过将晶片的高度最小化，通过单个机器人刀片系统可以将系统的吞吐量提高高达2倍，特别是如果机器人是吞吐量的限制因素。 这种吞吐量增加代表了相当大的增益，相对简单和便宜的设备添加。

公开(公告)号：US20060144931A1

公开(公告)日：2006-07-06

申请号：US10905375

申请日：2004-12-30

申请人： Michael Welch

发明人： Michael Welch

IPC分类号： G06K15/00 ,  G06K7/10

CPC分类号： G06Q30/0603

摘要： A device for communications may include a scanner to scan an object or code. The device for communications may also include a processor to perform a selected function related to the scanned object or.

摘要翻译： 用于通信的设备可以包括用于扫描对象或代码的扫描仪。 用于通信的设备还可以包括用于执行与被扫描对象相关的所选功能的处理器。

公开(公告)号：US20060098027A1

公开(公告)日：2006-05-11

申请号：US10984469

申请日：2004-11-09

申请人： Myra Rice ,  Michael Welch

发明人： Myra Rice ,  Michael Welch

IPC分类号： G09G5/00

CPC分类号： H04M3/42042 ,  H04M1/576 ,  H04M1/72555 ,  H04M3/42059 ,  H04M2203/2038 ,  H04M2250/12

摘要： The present invention describes a method and apparatus for providing an image in association with a call between two or more communication devices. In one exemplary embodiment of the present invention, a personal image of a user is either selected or modified responsive to supplied mood data. The resulting personal image is output to an output device in association with the call. In some embodiments, the personal image is output to a display in association with the call. In other embodiments, the personal image is output to a transceiver, which transmits the personal image to a remote communication device in association with the call.

摘要翻译： 本发明描述了一种用于提供与两个或更多个通信设备之间的呼叫相关联的图像的方法和装置。 在本发明的一个示例性实施例中，响应于所提供的心情数据，选择或修改用户的个人图像。 所产生的个人图像与呼叫相关联地输出到输出设备。 在一些实施例中，将个人图像与呼叫相关联地输出到显示器。 在其他实施例中，将个人图像输出到收发器，收发器将个人图像发送到与呼叫相关联的远程通信设备。

公开(公告)号：US06774806B1

公开(公告)日：2004-08-10

申请号：US09396809

申请日：1999-09-14

申请人： John Lesly Kingsford Bannell ,  David Mark Falconer ,  Thomas Simon Colaco Osorio ,  Michael Welch

发明人： John Lesly Kingsford Bannell ,  David Mark Falconer ,  Thomas Simon Colaco Osorio ,  Michael Welch

IPC分类号： G08B2100

CPC分类号： G01D13/26 ,  G01D5/39 ,  G05B19/41875 ,  G05B23/0235 ,  G05B2219/37205 ,  Y02P90/22 ,  Y02P90/86

摘要： A method of monitoring an element of a plant is disclosed which comprises the steps of: (a) producing an image representing the state of the element and recording the image in the form of a data set; (b) comparing the data set with a norm in order to determine a change in the state of the element; and (c) producing a signal which represents the change in the state of the element.

摘要翻译： 公开了一种监视工厂元件的方法，包括以下步骤：（a）产生表示元件状态并以数据集的形式记录图像的图像;（b）将数据集与 规范，以确定元素状态的变化; 和（c）产生表示元件状态变化的信号。

公开(公告)号：US06232236B1

公开(公告)日：2001-05-15

申请号：US09365999

申请日：1999-08-03

申请人： Hongqing Shan ,  Claes Bjorkman ,  Paul Luscher ,  Richard Mett ,  Michael Welch

发明人： Hongqing Shan ,  Claes Bjorkman ,  Paul Luscher ,  Richard Mett ,  Michael Welch

IPC分类号： H01L2100

CPC分类号： H01J37/32082 ,  H01J37/32165

摘要： An apparatus and method for controlling a plasma in a plasma processing system. The apparatus comprises a wafer support pedestal surrounded by a process kit that is driven by an RF signal. Both an electrode (cathode) in the pedestal and the process kit are driven with an RF signal to establish a primary plasma above the pedestal and a secondary plasma above the process kit.

摘要翻译： 一种用于控制等离子体处理系统中的等离子体的装置和方法。 该装置包括由RF信号驱动的处理套件包围的晶片支撑台座。 基座中的电极（阴极）和处理套件都用RF信号驱动，以在基座上建立初级等离子体，并在工艺组件上方形成二次等离子体。

公开(公告)号：US5865937A

公开(公告)日：1999-02-02

申请号：US517177

申请日：1995-08-21

申请人： Hongching Shan ,  Hiroji Hanawa ,  Robert Wu ,  Michael Welch

发明人： Hongching Shan ,  Hiroji Hanawa ,  Robert Wu ,  Michael Welch

IPC分类号： H05H1/46 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  C23F1/08

CPC分类号： H01J37/32174

摘要： In a plasma reactor including a vacuum chamber for containing at least a reactant gas at a selected pressure and a semiconductor wafer to be processed, a pair of electrodes for capacitively coupling radio frequency power into the chamber and a radio frequency source having a radio frequency power terminal, a circuit for coupling the radio frequency source to the pair of electrodes includes a coil having plural conductive windings and a pair of terminals bounding plural ones of the windings, the pair of terminals coupled to respective ones of the pair of electrodes, one of the windings connected to the power terminal of the radio frequency source, and a grounded conductive tap contacting the coil and slidable along the plural ones of the windings between the pair of terminals for varying a ratio of power apportioned between the pair of electrodes.

摘要翻译： 在包括用于在选定压力下容纳至少一种反应气体的真空室和待处理的半导体晶片的等离子体反应器中，将用于将射频功率电容耦合到腔室中的一对电极和具有射频功率的射频源 端子，用于将射频源耦合到该对电极的电路包括具有多个导体绕组的线圈和限定多个绕组的一对端子，该对端子耦合到该对电极中的相应电极， 连接到射频源的电源端子的绕组以及与线圈接触的接地导线，并且可以沿着一对端子之间的多个绕组滑动，以改变在该对电极之间分配的功率比。