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公开(公告)号：US08193513B2
公开(公告)日：2012-06-05
申请号：US12184082
申请日：2008-07-31
IPC分类号： H01J27/00
CPC分类号： H01J37/08 , H01J37/3171 , H01J2237/0827 , H01J2237/30472
摘要： A hybrid ion source, comprising a source body configured to create plasma therein, from a first material, wherein the first material comprises one of monatomic gases, small molecule gases, large molecule gases, reactive gases, and solids, a low power plasma generation component operably associated with the source body, a high power plasma generation component operably associated with the source body and an extraction aperture configured to extract ions of the ion plasma from the source body.
摘要翻译： 一种混合离子源，包括被配置为在其中从第一材料产生等离子体的源体，其中第一材料包括单原子气体，小分子气体，大分子气体，反应性气体和固体中的一种，低功率等离子体产生部件 可操作地与源体相关联，与源体可操作地相关联的高功率等离子体产生部件和被配置为从源体提取离子等离子体的离子的提取孔。
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公开(公告)号：US07947966B2
公开(公告)日：2011-05-24
申请号：US12183961
申请日：2008-07-31
IPC分类号： H01J27/02
CPC分类号： H01J27/16 , H01J27/08 , H01J27/205 , H01J37/08 , H01J2237/006 , H01J2237/0817 , H01J2237/082 , H01J2237/31701
摘要： An ion source includes a first plasma chamber including a plasma generating component and a first gas inlet for receiving a first gas such that said plasma generating component and said first gas interact to generate a first plasma within said first plasma chamber, wherein said first plasma chamber further defines an aperture for extracting electrons from said first plasma, and a second plasma chamber including a second gas inlet for receiving a second gas, wherein said second plasma chamber further defines an aperture in substantial alignment with the aperture of said first plasma chamber, for receiving electrons extracted therefrom, such that the electrons and the second gas interact to generate a second plasma within said second plasma chamber, said second plasma chamber further defining an extraction aperture for extracting ions from said second plasma.
摘要翻译： 离子源包括包括等离子体产生部件的第一等离子体室和用于接收第一气体的第一气体入口，使得所述等离子体产生部件和所述第一气体相互作用以在所述第一等离子体室内产生第一等离子体，其中所述第一等离子体室 进一步限定用于从所述第一等离子体提取电子的孔，以及包括用于接收第二气体的第二气体入口的第二等离子体室，其中所述第二等离子体室还限定与所述第一等离子体室的孔基本对准的孔，用于 接收从其提取的电子，使得电子和第二气体相互作用以在所述第二等离子体室内产生第二等离子体，所述第二等离子体室还限定用于从所述第二等离子体提取离子的提取孔。
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3.发明申请公开(公告)号：US20110108058A1
公开(公告)日：2011-05-12
申请号：US12616662
申请日：2009-11-11
IPC分类号： B08B5/00 , C23C16/505 , C23C14/00
CPC分类号： C23C14/48 , H01J37/08 , H01J37/3171 , H01J2237/022 , H01J2237/0225
摘要： Some techniques disclosed herein facilitate cleaning residue from a molecular beam component. For example, in an exemplary method, a molecular beam is provided along a beam path, causing residue build up on the molecular beam component. To reduce the residue, the molecular beam component is exposed to a hydro-fluorocarbon plasma. Exposure to the hydro-fluorocarbon plasma is ended based on whether a first predetermined condition is met, the first predetermined condition indicative of an extent of removal of the residue. Other methods and systems are also disclosed.
摘要翻译： 本文公开的一些技术有助于清除分子束成分的残留物。 例如，在示例性方法中，沿着光束路径提供分子束，导致分子束分量上的残留物积聚。 为了减少残留物，分子束组分暴露于氢氟碳等离子体。 基于是否满足第一预定条件，暴露于氢氟烃等离子体结束，第一预定条件指示残留物的去除程度。 还公开了其它方法和系统。
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公开(公告)号：US20090114815A1
公开(公告)日：2009-05-07
申请号：US11935738
申请日：2007-11-06
IPC分类号： H01J37/317 , B05C5/02 , H01J17/16
CPC分类号： H01J37/026 , H01J37/3171 , H01J2237/0041 , H01J2237/06366
摘要： A plasma electron flood system, comprising a housing configured to contain a gas, and comprising an elongated extraction slit, and a cathode and a plurality of anodes residing therein and wherein the elongated extraction slit is in direct communication with an ion implanter, wherein the cathode emits electrons that are drawn to the plurality of anodes through a potential difference therebetween, wherein the electrons are released through the elongated extraction slit as an electron band for use in neutralizing a ribbon ion beam traveling within the ion implanter.
摘要翻译： 一种等离子体电子泛洪系统，包括构造成容纳气体的壳体，并且包括细长的提取狭缝以及驻留在其中的阴极和多个阳极，并且其中所述细长的提取狭缝与离子注入机直接连通，其中所述阴极 发射通过它们之间的电位差吸引到多个阳极的电子，其中电子通过细长的提取狭缝释放，作为用于中和在离子注入机内行进的带状离子束的电子带。
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5.发明授权Thin magnetron structures for plasma generation in ion implantation systems 失效用于离子注入系统中等离子体生成的薄磁控管结构公开(公告)号：US06879109B2
公开(公告)日：2005-04-12
申请号：US10600775
申请日：2003-06-20
IPC分类号： H01J37/317 , H05H1/24
CPC分类号： H01J37/32082 , H01J37/3171 , H01J37/3266 , H01J2237/0041
摘要： A plasma generator for space charge neutralization of an ion beam is disclosed and resides within an ion implantation system operable to generate an ion beam and direct the ion beam along a beamline path. The plasma generator comprises an electric field generation system operable to generate an electric field in a portion of the beamline path, and a magnetic field generation system operable to generate a magnetic field in the portion of the beamline path, wherein the magnetic field is perpendicular to the electric field. The plasma generator further comprises a gas source operable to introduce a gas in a region occupied by the electric field and the magnetic field. Electrons in the region move in the region due to the electric field and the magnetic field, respectively, and at least some of the electrons collide with the gas in the region to ionize a portion of the gas, thereby generating a plasma in the region.
摘要翻译： 公开了一种用于离子束的空间电荷中和的等离子体发生器，并且位于离子注入系统内，可操作以产生离子束并沿着束线路径引导离子束。 等离子体发生器包括可操作以在束线路径的一部分中产生电场的电场产生系统，以及可操作以在束线路径的该部分中产生磁场的磁场产生系统，其中磁场垂直于 电场。 等离子体发生器还包括可操作以在由电场和磁场占据的区域中引入气体的气体源。 该区域中的电子分别由于电场和磁场而在该区域内移动，并且至少一些电子与该区域中的气体碰撞以使一部分气体离子化，从而在该区域中产生等离子体。
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公开(公告)号：US06664548B2
公开(公告)日：2003-12-16
申请号：US10209397
申请日：2002-07-31
IPC分类号： H01J2706
CPC分类号： H01J37/08 , H01J2237/0815 , H01J2237/083 , H01J2237/0835 , H01J2237/31701
摘要： An ion source is disclosed having an elongated slit for providing a ribbon ion beam for use in an ion implantation system. The source comprises a coaxial inductive coupling antenna for RF excitation of plasma within a cylindrical source housing, as well as circumferential magnets disposed within the housing for generating azimuthal multi-cusped magnetic fields for plasma confinement. Also disclosed is a liner for the housing interior providing thermal barrier between the plasma and the outer housing wall so as to mitigate or reduce condensation within the plasma confinement chamber.
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7.发明授权公开(公告)号：US06208095B1
公开(公告)日：2001-03-27
申请号：US09219686
申请日：1998-12-23
IPC分类号： H01P700
CPC分类号： H05H7/18
摘要： A compact coil design is provided for a linear accelerator resonator (70) capable of resonating at a predetermined frequency. The coil (90) comprises a plurality of generally circular coil segments (90a-90n), each of the coil segments having a polygonal cross section wherein flat surfaces (122) of adjacent coil segments face each other. The polygonal cross section may take the form of a rectangle having dimensions of length x and width y, wherein dimension x section defines the flat surfaces (122) of adjacent coil segments (90a-90n). The coil segments (90a-90n) are provided with a dual channel construction for providing the introduction of a cooling medium into the coil. The dual channel construction comprises an inlet passageway (118) and an outlet passageway (120) having separate a separate inlet (100) and outlet (102), respectively, at a first end (94) of the coil, and wherein the inlet and outlet passageways (118, 120) are connected and in communication with each other at a second end (96) of the coil.
摘要翻译： 为能够以预定频率谐振的线性加速器谐振器（70）提供了紧凑的线圈设计。 线圈（90）包括多个大致圆形的线圈段（90a-90n），每个线圈段具有多边形横截面，其中相邻线圈段的平坦表面（122）彼此面对。 多边形横截面可以采取具有长度x和宽度y的尺寸的矩形的形式，其中尺寸x部分限定相邻线圈段（90a-90n）的平坦表面（122）。 线圈段（90a-90n）设置有用于将冷却介质引入线圈的双通道结构。 双通道结构包括入口通道（118）和出口通道（120），分别在线圈的第一端（94）处具有单独的入口（100）和出口（102），并且其中入口和 出口通道（118,120）在线圈的第二端（96）处彼此连接并且彼此连通。
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公开(公告)号：US07800083B2
公开(公告)日：2010-09-21
申请号：US11935738
申请日：2007-11-06
IPC分类号： G21G1/10
CPC分类号： H01J37/026 , H01J37/3171 , H01J2237/0041 , H01J2237/06366
摘要： A plasma electron flood system, comprising a housing configured to contain a gas, and comprising an elongated extraction slit, and a cathode and a plurality of anodes residing therein and wherein the elongated extraction slit is in direct communication with an ion implanter, wherein the cathode emits electrons that are drawn to the plurality of anodes through a potential difference therebetween, wherein the electrons are released through the elongated extraction slit as an electron band for use in neutralizing a ribbon ion beam traveling within the ion implanter.
摘要翻译： 一种等离子体电子泛洪系统，包括构造成容纳气体的壳体，并且包括细长的提取狭缝以及驻留在其中的阴极和多个阳极，并且其中所述细长的提取狭缝与离子注入机直接连通，其中所述阴极 发射通过它们之间的电位差吸引到多个阳极的电子，其中电子通过细长的提取狭缝释放，作为用于中和在离子注入机内行进的带状离子束的电子带。
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公开(公告)号：US07750314B2
公开(公告)日：2010-07-06
申请号：US12183787
申请日：2008-07-31
CPC分类号： H01J37/08 , H01J2237/0815 , H01J2237/31701
摘要： An elevated temperature RF ion source system, comprising an ion source body, an RF antenna coil external to the ion source body, a vacuum enclosure surrounding both the outside surface of the ion source body and the RF antenna coil, at least one power supply, a gas delivery system operatively coupled to the ion source body, a vacuum condition between the outside surface of the ion source body and the RF antenna coil, the RF antenna coil operatively coupled to the at least one power supply, and a water cooling system operatively coupled to the RF antenna coil and the vacuum enclosure.
摘要翻译： 一种高温RF离子源系统，包括离子源体，离子源体外部的RF天线线圈，围绕离子源体的外表面和RF天线线圈的真空外壳，至少一个电源， 可操作地耦合到离子源体的气体输送系统，离子源体的外表面和RF天线线圈之间的真空条件，可操作地耦合到至少一个电源的RF天线线圈和可操作地连接到水冷系统的水冷系统 耦合到RF天线线圈和真空外壳。
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公开(公告)号：US20090114841A1
公开(公告)日：2009-05-07
申请号：US12183961
申请日：2008-07-31
IPC分类号： H01J27/02
CPC分类号： H01J27/16 , H01J27/08 , H01J27/205 , H01J37/08 , H01J2237/006 , H01J2237/0817 , H01J2237/082 , H01J2237/31701
摘要： An ion source includes a first plasma chamber including a plasma generating component and a first gas inlet for receiving a first gas such that said plasma generating component and said first gas interact to generate a first plasma within said first plasma chamber, wherein said first plasma chamber further defines an aperture for extracting electrons from said first plasma, and a second plasma chamber including a second gas inlet for receiving a second gas, wherein said second plasma chamber further defines an aperture in substantial alignment with the aperture of said first plasma chamber, for receiving electrons extracted therefrom, such that the electrons and the second gas interact to generate a second plasma within said second plasma chamber, said second plasma chamber further defining an extraction aperture for extracting ions from said second plasma.
摘要翻译： 离子源包括包括等离子体产生部件的第一等离子体室和用于接收第一气体的第一气体入口，使得所述等离子体产生部件和所述第一气体相互作用以在所述第一等离子体室内产生第一等离子体，其中所述第一等离子体室 进一步限定用于从所述第一等离子体提取电子的孔，以及包括用于接收第二气体的第二气体入口的第二等离子体室，其中所述第二等离子体室还限定与所述第一等离子体室的孔基本对准的孔，用于 接收从其提取的电子，使得电子和第二气体相互作用以在所述第二等离子体室内产生第二等离子体，所述第二等离子体室还限定用于从所述第二等离子体提取离子的提取孔。
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