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1.发明授权Glass-like insulator for electrically isolating electrodes from ion implanter housing 有权用于将电极与离子注入机外壳电隔离的玻璃状绝缘体公开(公告)号：US06291828B1
公开(公告)日：2001-09-18
申请号：US09469068
申请日：1999-12-21
申请人： Kourosh Saadatmand , David R. Swenson , William F. DiVergilio , Stephen M. Quinn , Zhimin Wan , Victor M. Benveniste
发明人： Kourosh Saadatmand , David R. Swenson , William F. DiVergilio , Stephen M. Quinn , Zhimin Wan , Victor M. Benveniste
IPC分类号： G21K510
CPC分类号： H01J37/3171 , H01J37/12 , H01J2237/038 , H01J2237/04737 , H01J2237/04924
摘要： An electrostatic quadrupole lens assembly (60) is provided for an ion implanter (10) having an axis (86) along which an ion beam passes, comprising: (i) four electrodes (84a-84d) oriented radially outward from the axis (86), approximately 90° apart from each other, such that a first pair of electrodes (84a and 84c) oppose each other approximately 180° apart, and a second pair of electrodes (84b and 84d) also oppose each other approximately 180° apart; (ii) a housing (62) having a mounting surface (64) for mounting the assembly (60) to the implanter, the housing at least partially enclosing the four electrodes (84a-84d); (iii) a first electrical lead (104) for providing electrical power to the first pair of electrodes (84a and 84c); (iv) a second electrical lead (108) for providing electrical power to the second pair of electrodes (84b and 84d); and (v) a plurality of electrically insulating members (92) formed of a glass-like material, comprising at least a first electrically insulating member for attaching the first pair of electrodes (84a and 84c) to the housing, and at least a second electrically insulating member for attaching the second pair of electrodes (84b and 84d) to the housing. The plurality of electrically insulating members (92) are preferably comprised of quartz (SiO2), or a heat resistant and chemical resistant glass material such as Pyrex®. The members (92) resist accumulation of material such as graphite sputtered off of the electrodes (84a-84d) by the ion beam, thus reducing the occurrence of high voltage breakdown and electrical current breakdown.
摘要翻译： 为具有离子束通过的轴线（86）的离子注入机（10）提供静电四极透镜组件（60），包括：（i）从轴线（86）径向向外取向的四个电极（84a-84d） ）彼此大约90°，使得第一对电极（84a和84c）彼此相对大约180°，并且第二对电极（84b和84d）也彼此相对大约180°; （ii）具有用于将所述组件（60）安装到所述注入器的安装表面（64）的壳体（62），所述壳体至少部分地包围所述四个电极（84a-84d）; （iii）用于向所述第一对电极（84a和84c）提供电力的第一电引线（104）; （iv）用于向所述第二对电极（84b和84d）提供电力的第二电引线（108）; 和（v）由玻璃状材料形成的多个电绝缘构件（92），至少包括用于将第一对电极（84a和84c）附接到壳体的第一电绝缘构件，以及至少第二 用于将第二对电极（84b和84d）附接到壳体的电绝缘构件。 多个电绝缘构件（92）优选地由石英（SiO 2）或耐热和耐化学腐蚀的玻璃材料（例如Pyrex）组成。 构件（92）通过离子束阻止溅射在电极（84a-84d）之外的诸如石墨的材料的堆积，从而减少高压击穿和电流击穿的发生。
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2.发明授权公开(公告)号：US06208095B1
公开(公告)日：2001-03-27
申请号：US09219686
申请日：1998-12-23
IPC分类号： H01P700
CPC分类号： H05H7/18
摘要： A compact coil design is provided for a linear accelerator resonator (70) capable of resonating at a predetermined frequency. The coil (90) comprises a plurality of generally circular coil segments (90a-90n), each of the coil segments having a polygonal cross section wherein flat surfaces (122) of adjacent coil segments face each other. The polygonal cross section may take the form of a rectangle having dimensions of length x and width y, wherein dimension x section defines the flat surfaces (122) of adjacent coil segments (90a-90n). The coil segments (90a-90n) are provided with a dual channel construction for providing the introduction of a cooling medium into the coil. The dual channel construction comprises an inlet passageway (118) and an outlet passageway (120) having separate a separate inlet (100) and outlet (102), respectively, at a first end (94) of the coil, and wherein the inlet and outlet passageways (118, 120) are connected and in communication with each other at a second end (96) of the coil.
摘要翻译： 为能够以预定频率谐振的线性加速器谐振器（70）提供了紧凑的线圈设计。 线圈（90）包括多个大致圆形的线圈段（90a-90n），每个线圈段具有多边形横截面，其中相邻线圈段的平坦表面（122）彼此面对。 多边形横截面可以采取具有长度x和宽度y的尺寸的矩形的形式，其中尺寸x部分限定相邻线圈段（90a-90n）的平坦表面（122）。 线圈段（90a-90n）设置有用于将冷却介质引入线圈的双通道结构。 双通道结构包括入口通道（118）和出口通道（120），分别在线圈的第一端（94）处具有单独的入口（100）和出口（102），并且其中入口和 出口通道（118,120）在线圈的第二端（96）处彼此连接并且彼此连通。
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公开(公告)号：US06583429B2
公开(公告)日：2003-06-24
申请号：US10224778
申请日：2002-08-21
IPC分类号： B01D5944
CPC分类号： H05H7/18 , H01J37/3171 , H01J2237/04737
摘要： An ion buncher stage for a linear accelerator system is disclosed for bunching ions in an ion implantation system. The ion buncher stage may be employed upstream of one or more accelerating stages such that the loss of ions in the linear accelerator system is reduced. The invention further includes an asymmetrical double gap buncher stage, as well as a slit buncher stage for further improvement of ion implantation efficiency. Also disclosed are methods for accelerating ions in an ion implanter linear accelerator.
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4.发明授权Slit double gap buncher and method for improved ion bunching in an ion implantation system 有权狭缝双缝隙聚束器和离子注入系统中改进离子聚束的方法公开(公告)号：US06635890B2
公开(公告)日：2003-10-21
申请号：US10224779
申请日：2002-08-21
IPC分类号： H01J37317
CPC分类号： H05H7/18 , H01J37/3171 , H01J2237/04737 , H01J2237/04924
摘要： An ion buncher stage for a linear accelerator system is disclosed for bunching ions in an ion implantation system. The ion buncher stage may be employed upstream of one or more accelerating stages such that the loss of ions in the linear accelerator system is reduced. The invention further includes an asymmetrical double gap buncher stage, as well as a slit buncher stage for further improvement of ion implantation efficiency. Also disclosed are methods for accelerating ions in an ion implanter linear accelerator.
摘要翻译： 公开了用于在离子注入系统中聚束离子的用于线性加速器系统的离子聚束器级。 可以在一个或多个加速阶段的上游使用离子聚束器阶段，使得线性加速器系统中的离子的损失减少。 本发明还包括不对称双间隙聚束器阶段，以及用于进一步提高离子注入效率的狭缝分束器台。 还公开了用于在离子注入机线性加速器中加速离子的方法。
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公开(公告)号：US06653803B1
公开(公告)日：2003-11-25
申请号：US09583157
申请日：2000-05-30
IPC分类号： H05H900
CPC分类号： H05H7/02
摘要： An integrated RF amplifier and resonator is provided for use with an ion accelerator. The amplifier includes an output substantially directly coupled with a resonator coil. The amplifier output may be coupled capacitively or inductively. In addition, an apparatus is provided for accelerating ions in an ion implanter. The apparatus comprises an amplifier with an RF output, a tank circuit with a coil substantially directly coupled to the RF output of the amplifier, and an electrode connected to the coil for accelerating ions. Also provided is a method for coupling an RF amplifier with a resonator in an ion accelerator. The method comprises connecting the RF output of the amplifier to a coupler, and locating the coupler proximate the coil, thereby substantially directly coupling the RF output of the amplifier with the resonator coil.
摘要翻译： 提供集成的RF放大器和谐振器用于离子加速器。 放大器包括基本上直接与谐振器线圈耦合的输出。 放大器输出可以电容或电感耦合。 此外，提供了用于加速离子注入机中的离子的装置。 该装置包括具有RF输出的放大器，具有基本上直接耦合到放大器的RF输出的线圈的振荡电路，以及连接到用于加速离子的线圈的电极。 还提供了一种在离子加速器中将RF放大器与谐振器耦合的方法。 该方法包括将放大器的RF输出连接到耦合器，并将耦合器定位在线圈附近，从而基本上将放大器的RF输出与谐振器线圈直接耦合。
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公开(公告)号：US06653643B2
公开(公告)日：2003-11-25
申请号：US10036144
申请日：2001-12-26
IPC分类号： G21K500
CPC分类号： H05H9/00
摘要： A method and apparatus are disclosed for accelerating ions in an ion implantation system. An ion accelerator is provided which comprises a plurality of energizable electrodes energized by a variable frequency power source, in order to accelerate ions from an ion source. The variable frequency power source allows the ion accelerator to be adapted to accelerate a wide range of ion species to desired energy levels for implantation onto a workpiece, while reducing the cost and size of an ion implantation accelerator.
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公开(公告)号：US08193513B2
公开(公告)日：2012-06-05
申请号：US12184082
申请日：2008-07-31
IPC分类号： H01J27/00
CPC分类号： H01J37/08 , H01J37/3171 , H01J2237/0827 , H01J2237/30472
摘要： A hybrid ion source, comprising a source body configured to create plasma therein, from a first material, wherein the first material comprises one of monatomic gases, small molecule gases, large molecule gases, reactive gases, and solids, a low power plasma generation component operably associated with the source body, a high power plasma generation component operably associated with the source body and an extraction aperture configured to extract ions of the ion plasma from the source body.
摘要翻译： 一种混合离子源，包括被配置为在其中从第一材料产生等离子体的源体，其中第一材料包括单原子气体，小分子气体，大分子气体，反应性气体和固体中的一种，低功率等离子体产生部件 可操作地与源体相关联，与源体可操作地相关联的高功率等离子体产生部件和被配置为从源体提取离子等离子体的离子的提取孔。
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公开(公告)号：US07947966B2
公开(公告)日：2011-05-24
申请号：US12183961
申请日：2008-07-31
IPC分类号： H01J27/02
CPC分类号： H01J27/16 , H01J27/08 , H01J27/205 , H01J37/08 , H01J2237/006 , H01J2237/0817 , H01J2237/082 , H01J2237/31701
摘要： An ion source includes a first plasma chamber including a plasma generating component and a first gas inlet for receiving a first gas such that said plasma generating component and said first gas interact to generate a first plasma within said first plasma chamber, wherein said first plasma chamber further defines an aperture for extracting electrons from said first plasma, and a second plasma chamber including a second gas inlet for receiving a second gas, wherein said second plasma chamber further defines an aperture in substantial alignment with the aperture of said first plasma chamber, for receiving electrons extracted therefrom, such that the electrons and the second gas interact to generate a second plasma within said second plasma chamber, said second plasma chamber further defining an extraction aperture for extracting ions from said second plasma.
摘要翻译： 离子源包括包括等离子体产生部件的第一等离子体室和用于接收第一气体的第一气体入口，使得所述等离子体产生部件和所述第一气体相互作用以在所述第一等离子体室内产生第一等离子体，其中所述第一等离子体室 进一步限定用于从所述第一等离子体提取电子的孔，以及包括用于接收第二气体的第二气体入口的第二等离子体室，其中所述第二等离子体室还限定与所述第一等离子体室的孔基本对准的孔，用于 接收从其提取的电子，使得电子和第二气体相互作用以在所述第二等离子体室内产生第二等离子体，所述第二等离子体室还限定用于从所述第二等离子体提取离子的提取孔。
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9.发明申请公开(公告)号：US20110108058A1
公开(公告)日：2011-05-12
申请号：US12616662
申请日：2009-11-11
IPC分类号： B08B5/00 , C23C16/505 , C23C14/00
CPC分类号： C23C14/48 , H01J37/08 , H01J37/3171 , H01J2237/022 , H01J2237/0225
摘要： Some techniques disclosed herein facilitate cleaning residue from a molecular beam component. For example, in an exemplary method, a molecular beam is provided along a beam path, causing residue build up on the molecular beam component. To reduce the residue, the molecular beam component is exposed to a hydro-fluorocarbon plasma. Exposure to the hydro-fluorocarbon plasma is ended based on whether a first predetermined condition is met, the first predetermined condition indicative of an extent of removal of the residue. Other methods and systems are also disclosed.
摘要翻译： 本文公开的一些技术有助于清除分子束成分的残留物。 例如，在示例性方法中，沿着光束路径提供分子束，导致分子束分量上的残留物积聚。 为了减少残留物，分子束组分暴露于氢氟碳等离子体。 基于是否满足第一预定条件，暴露于氢氟烃等离子体结束，第一预定条件指示残留物的去除程度。 还公开了其它方法和系统。
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公开(公告)号：US20090114815A1
公开(公告)日：2009-05-07
申请号：US11935738
申请日：2007-11-06
IPC分类号： H01J37/317 , B05C5/02 , H01J17/16
CPC分类号： H01J37/026 , H01J37/3171 , H01J2237/0041 , H01J2237/06366
摘要： A plasma electron flood system, comprising a housing configured to contain a gas, and comprising an elongated extraction slit, and a cathode and a plurality of anodes residing therein and wherein the elongated extraction slit is in direct communication with an ion implanter, wherein the cathode emits electrons that are drawn to the plurality of anodes through a potential difference therebetween, wherein the electrons are released through the elongated extraction slit as an electron band for use in neutralizing a ribbon ion beam traveling within the ion implanter.
摘要翻译： 一种等离子体电子泛洪系统，包括构造成容纳气体的壳体，并且包括细长的提取狭缝以及驻留在其中的阴极和多个阳极，并且其中所述细长的提取狭缝与离子注入机直接连通，其中所述阴极 发射通过它们之间的电位差吸引到多个阳极的电子，其中电子通过细长的提取狭缝释放，作为用于中和在离子注入机内行进的带状离子束的电子带。
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