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1.发明申请公开(公告)号：US20110108058A1
公开(公告)日：2011-05-12
申请号：US12616662
申请日：2009-11-11
IPC分类号： B08B5/00 , C23C16/505 , C23C14/00
CPC分类号： C23C14/48 , H01J37/08 , H01J37/3171 , H01J2237/022 , H01J2237/0225
摘要： Some techniques disclosed herein facilitate cleaning residue from a molecular beam component. For example, in an exemplary method, a molecular beam is provided along a beam path, causing residue build up on the molecular beam component. To reduce the residue, the molecular beam component is exposed to a hydro-fluorocarbon plasma. Exposure to the hydro-fluorocarbon plasma is ended based on whether a first predetermined condition is met, the first predetermined condition indicative of an extent of removal of the residue. Other methods and systems are also disclosed.
摘要翻译： 本文公开的一些技术有助于清除分子束成分的残留物。 例如，在示例性方法中，沿着光束路径提供分子束，导致分子束分量上的残留物积聚。 为了减少残留物，分子束组分暴露于氢氟碳等离子体。 基于是否满足第一预定条件，暴露于氢氟烃等离子体结束，第一预定条件指示残留物的去除程度。 还公开了其它方法和系统。
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2.发明授权RF coupled plasma abatement system comprising an integrated power oscillator 有权RF耦合等离子体消除系统，其包括集成功率振荡器公开(公告)号：US08932430B2
公开(公告)日：2015-01-13
申请号：US13102206
申请日：2011-05-06
IPC分类号： C23C16/50 , C23C16/503 , C23C16/505 , C23C16/507 , C23C16/52 , H01L21/306 , C23F1/00 , A61H35/00 , C23C16/44 , H01J37/32 , C23C16/06 , C23C16/22
CPC分类号： A61H35/006 , C23C16/4401 , C23C16/4412 , C23C16/50 , H01J37/32128 , H01J37/32174 , H01J37/32844 , Y02C20/30
摘要： The present disclosure is directed towards a method and apparatus for generating an abatement plasma downstream of a processing chamber using an RF plasma ignited and sustained with an integrated power oscillator circuit driven by feedback based upon a load of the abatement plasma. In one embodiment, a plasma ashing system includes an abatement system configured to receive an effluent byproduct from an upstream processing chamber containing a workpiece. The effluent byproduct is provided along an exhaust conduit to a downstream afterburner unit having an integrated power oscillator, that relies upon an oscillating circuit operatively coupled to an antenna to ignite the abatement plasma within the exhaust conduit. The antenna, together with the plasma load, form a resonant tank circuit, which provides a feedback that drives operation of the oscillating circuit, thereby allowing the oscillating circuit to vary its output based upon changes in the abatement plasma load.
摘要翻译： 本公开涉及一种用于使用使用基于消除等离子体的负载的反馈驱动的集成功率振荡器电路点燃和维持的RF等离子体来产生处理室下游的减排等离子体的方法和装置。 在一个实施例中，等离子体灰化系统包括被配置为从包含工件的上游处理室接收流出物副产物的减排系统。 流出物副产物沿着排气管道被提供到具有集成功率振荡器的下游后燃器单元，其依赖于可操作地耦合到天线的振荡电路以点燃排气管道内的消除等离子体。 天线与等离子体负载一起形成谐振回路，其提供驱动振荡电路的操作的反馈，从而允许振荡电路基于消除等离子体负载的变化来改变其输出。
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3.发明申请RF Coupled Plasma Abatement System Comprising an Integrated Power Oscillator 有权RF耦合等离子体消除系统，包括集成功率振荡器公开(公告)号：US20120279657A1
公开(公告)日：2012-11-08
申请号：US13102206
申请日：2011-05-06
IPC分类号： H01L21/306
CPC分类号： A61H35/006 , C23C16/4401 , C23C16/4412 , C23C16/50 , H01J37/32128 , H01J37/32174 , H01J37/32844 , Y02C20/30
摘要： The present disclosure is directed towards a method and apparatus for generating an abatement plasma downstream of a processing chamber using an RF plasma ignited and sustained with an integrated power oscillator circuit driven by feedback based upon a load of the abatement plasma. In one embodiment, a plasma ashing system includes an abatement system configured to receive an effluent byproduct from an upstream processing chamber containing a workpiece. The effluent byproduct is provided along an exhaust conduit to a downstream afterburner unit having an integrated power oscillator, that relies upon an oscillating circuit operatively coupled to an antenna to ignite the abatement plasma within the exhaust conduit. The antenna, together with the plasma load, form a resonant tank circuit, which provides a feedback that drives operation of the oscillating circuit, thereby allowing the oscillating circuit to vary its output based upon changes in the abatement plasma load.
摘要翻译： 本公开涉及一种用于使用使用基于消除等离子体的负载的反馈驱动的集成功率振荡器电路点燃和维持的RF等离子体来产生处理室下游的减排等离子体的方法和装置。 在一个实施例中，等离子体灰化系统包括被配置为从包含工件的上游处理室接收流出物副产物的减排系统。 流出物副产物沿着排气管道被提供到具有集成功率振荡器的下游后燃器单元，其依赖于可操作地耦合到天线的振荡电路以点燃排气管道内的消除等离子体。 天线与等离子体负载一起形成谐振回路，其提供驱动振荡电路的操作的反馈，从而允许振荡电路基于消除等离子体负载的变化来改变其输出。
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4.发明申请WIDE AREA RADIO FREQUENCY PLASMA APPARATUS FOR PROCESSING MULTIPLE SUBSTRATES 审中-公开用于处理多个基板的宽带无线电等离子体设备公开(公告)号：US20110036500A1
公开(公告)日：2011-02-17
申请号：US12910096
申请日：2010-10-22
CPC分类号： H01Q1/364 , H01J37/321 , H01Q21/061 , H05H1/46
摘要： An antenna array for a radio frequency plasma process chamber including, an array of electrodes, an array of dielectric tubes concentrically disposed about each electrode tube to define a chamber configured to be at atmospheric pressure between an outer surface of each electrode tube and an inner surface of the corresponding dielectric tube, and a hermetic seal between each dielectric tube and the plasma process chamber configured to allow a vacuum or low pressure environment in the plasma process chamber.
摘要翻译： 一种用于射频等离子体处理室的天线阵列，其包括电极阵列，同心地设置在每个电极管周围的介电管阵列，以限定被构造为在每个电极管的外表面之间的大气压力的腔室和内表面 并且每个电介质管和等离子体处理室之间的气密密封被配置为允许等离子体处理室中的真空或低压环境。
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5.发明授权Wide area radio frequency plasma apparatus for processing multiple substrates 有权用于处理多个基板的广域射频等离子体装置公开(公告)号：US07845310B2
公开(公告)日：2010-12-07
申请号：US11635227
申请日：2006-12-06
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , H05B31/26
CPC分类号： H01Q1/364 , H01J37/321 , H01Q21/061 , H05H1/46
摘要： An antenna array for a radio frequency plasma process chamber including, an array of electrodes, an array of dielectric tubes concentrically disposed about each electrode tube to define a chamber configured to be at atmospheric pressure between an outer surface of each electrode tube and an inner surface of the corresponding dielectric tube, and a hermetic seal between each dielectric tube and the plasma process chamber configured to allow a vacuum or low pressure in the plasma process chamber.
摘要翻译： 一种用于射频等离子体处理室的天线阵列，其包括电极阵列，同心地设置在每个电极管周围的介电管阵列，以限定被构造为在每个电极管的外表面之间的大气压力的腔室和内表面 以及每个电介质管和等离子体处理室之间的气密密封，其构造成允许等离子体处理室中的真空或低压。
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6.发明申请Wide area radio frequency plasma apparatus for processing multiple substrates 有权用于处理多个基板的广域射频等离子体装置公开(公告)号：US20080138992A1
公开(公告)日：2008-06-12
申请号：US11635227
申请日：2006-12-06
IPC分类号： H01L21/461
CPC分类号： H01Q1/364 , H01J37/321 , H01Q21/061 , H05H1/46
摘要： An antenna array for a radio frequency plasma process chamber including, an array of electrodes, an array of dielectric tubes concentrically disposed about each electrode tube to define a chamber configured to be at atmospheric pressure between an outer surface of each electrode tube and an inner surface of the corresponding dielectric tube, and a hermetic seal between each dielectric tube and the plasma process chamber configured to allow a vacuum or low pressure in the plasma process chamber.
摘要翻译： 一种用于射频等离子体处理室的天线阵列，其包括电极阵列，同心地设置在每个电极管周围的介电管阵列，以限定被构造为在每个电极管的外表面之间的大气压力的腔室和内表面 以及每个电介质管和等离子体处理室之间的气密密封，其构造成允许等离子体处理室中的真空或低压。
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公开(公告)号：US08193513B2
公开(公告)日：2012-06-05
申请号：US12184082
申请日：2008-07-31
IPC分类号： H01J27/00
CPC分类号： H01J37/08 , H01J37/3171 , H01J2237/0827 , H01J2237/30472
摘要： A hybrid ion source, comprising a source body configured to create plasma therein, from a first material, wherein the first material comprises one of monatomic gases, small molecule gases, large molecule gases, reactive gases, and solids, a low power plasma generation component operably associated with the source body, a high power plasma generation component operably associated with the source body and an extraction aperture configured to extract ions of the ion plasma from the source body.
摘要翻译： 一种混合离子源，包括被配置为在其中从第一材料产生等离子体的源体，其中第一材料包括单原子气体，小分子气体，大分子气体，反应性气体和固体中的一种，低功率等离子体产生部件 可操作地与源体相关联，与源体可操作地相关联的高功率等离子体产生部件和被配置为从源体提取离子等离子体的离子的提取孔。
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公开(公告)号：US07947966B2
公开(公告)日：2011-05-24
申请号：US12183961
申请日：2008-07-31
IPC分类号： H01J27/02
CPC分类号： H01J27/16 , H01J27/08 , H01J27/205 , H01J37/08 , H01J2237/006 , H01J2237/0817 , H01J2237/082 , H01J2237/31701
摘要： An ion source includes a first plasma chamber including a plasma generating component and a first gas inlet for receiving a first gas such that said plasma generating component and said first gas interact to generate a first plasma within said first plasma chamber, wherein said first plasma chamber further defines an aperture for extracting electrons from said first plasma, and a second plasma chamber including a second gas inlet for receiving a second gas, wherein said second plasma chamber further defines an aperture in substantial alignment with the aperture of said first plasma chamber, for receiving electrons extracted therefrom, such that the electrons and the second gas interact to generate a second plasma within said second plasma chamber, said second plasma chamber further defining an extraction aperture for extracting ions from said second plasma.
摘要翻译： 离子源包括包括等离子体产生部件的第一等离子体室和用于接收第一气体的第一气体入口，使得所述等离子体产生部件和所述第一气体相互作用以在所述第一等离子体室内产生第一等离子体，其中所述第一等离子体室 进一步限定用于从所述第一等离子体提取电子的孔，以及包括用于接收第二气体的第二气体入口的第二等离子体室，其中所述第二等离子体室还限定与所述第一等离子体室的孔基本对准的孔，用于 接收从其提取的电子，使得电子和第二气体相互作用以在所述第二等离子体室内产生第二等离子体，所述第二等离子体室还限定用于从所述第二等离子体提取离子的提取孔。
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公开(公告)号：US20090114815A1
公开(公告)日：2009-05-07
申请号：US11935738
申请日：2007-11-06
IPC分类号： H01J37/317 , B05C5/02 , H01J17/16
CPC分类号： H01J37/026 , H01J37/3171 , H01J2237/0041 , H01J2237/06366
摘要： A plasma electron flood system, comprising a housing configured to contain a gas, and comprising an elongated extraction slit, and a cathode and a plurality of anodes residing therein and wherein the elongated extraction slit is in direct communication with an ion implanter, wherein the cathode emits electrons that are drawn to the plurality of anodes through a potential difference therebetween, wherein the electrons are released through the elongated extraction slit as an electron band for use in neutralizing a ribbon ion beam traveling within the ion implanter.
摘要翻译： 一种等离子体电子泛洪系统，包括构造成容纳气体的壳体，并且包括细长的提取狭缝以及驻留在其中的阴极和多个阳极，并且其中所述细长的提取狭缝与离子注入机直接连通，其中所述阴极 发射通过它们之间的电位差吸引到多个阳极的电子，其中电子通过细长的提取狭缝释放，作为用于中和在离子注入机内行进的带状离子束的电子带。
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10.发明授权Thin magnetron structures for plasma generation in ion implantation systems 失效用于离子注入系统中等离子体生成的薄磁控管结构公开(公告)号：US06879109B2
公开(公告)日：2005-04-12
申请号：US10600775
申请日：2003-06-20
IPC分类号： H01J37/317 , H05H1/24
CPC分类号： H01J37/32082 , H01J37/3171 , H01J37/3266 , H01J2237/0041
摘要： A plasma generator for space charge neutralization of an ion beam is disclosed and resides within an ion implantation system operable to generate an ion beam and direct the ion beam along a beamline path. The plasma generator comprises an electric field generation system operable to generate an electric field in a portion of the beamline path, and a magnetic field generation system operable to generate a magnetic field in the portion of the beamline path, wherein the magnetic field is perpendicular to the electric field. The plasma generator further comprises a gas source operable to introduce a gas in a region occupied by the electric field and the magnetic field. Electrons in the region move in the region due to the electric field and the magnetic field, respectively, and at least some of the electrons collide with the gas in the region to ionize a portion of the gas, thereby generating a plasma in the region.
摘要翻译： 公开了一种用于离子束的空间电荷中和的等离子体发生器，并且位于离子注入系统内，可操作以产生离子束并沿着束线路径引导离子束。 等离子体发生器包括可操作以在束线路径的一部分中产生电场的电场产生系统，以及可操作以在束线路径的该部分中产生磁场的磁场产生系统，其中磁场垂直于 电场。 等离子体发生器还包括可操作以在由电场和磁场占据的区域中引入气体的气体源。 该区域中的电子分别由于电场和磁场而在该区域内移动，并且至少一些电子与该区域中的气体碰撞以使一部分气体离子化，从而在该区域中产生等离子体。
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