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    Gas discharge laser with pulse multiplier
    4.
    发明授权
    Gas discharge laser with pulse multiplier 有权
    带脉冲倍增器的气体放电激光器

    公开(公告)号：US06535531B1

    公开(公告)日：2003-03-18

    申请号：US10006913

    申请日：2001-11-29

    申请人： Scott T. Smith ,  Alexander I. Ershov ,  Rajasekhar M. Rao

    发明人： Scott T. Smith ,  Alexander I. Ershov ,  Rajasekhar M. Rao

    IPC分类号： H01S310

    CPC分类号： G03F7/7055 ,  H01S3/0057 ,  H01S3/036 ,  H01S3/0385 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2258

    摘要： A gas discharge laser with a pulse multiplier. In the pulse multiplier, short pulses from the laser are divided into portions and all or all but one of these portions are delayed in delay legs by different time periods and recombined to provide a stretched output pulse having substantially reduced intensity and longer duration as compared to the pulse from the laser. Focusing optics are included in each delay leg to assure that beam size and angular spread of each portion of the combined pulse is not substantially different from other portions of the pulse.

    摘要翻译： 具有脉冲倍增器的气体放电激光器。 在脉冲乘法器中，来自激光器的短脉冲被分成多个部分，全部或全部，但是这些部分中的一个在延迟支路中延迟不同的时间段，并且重新组合以提供具有显着降低的强度和更长持续时间的拉伸输出脉冲，与 来自激光的脉冲。 每个延迟支路都包括聚焦光学元件，以确保组合脉冲的每个部分的光束尺寸和角度扩展与脉冲的其他部分基本不同。

    Active spectral control of DUV light source
    5.
    发明授权
    Active spectral control of DUV light source 有权
    DUV光源的主动光谱控制

    公开(公告)号：US07852889B2

    公开(公告)日：2010-12-14

    申请号：US11510037

    申请日：2006-08-25

    申请人： Wayne J. Dunstan ,  Robert N. Jacques ,  Rajasekhar M. Rao ,  Fedor B. Trintchouk

    发明人： Wayne J. Dunstan ,  Robert N. Jacques ,  Rajasekhar M. Rao ,  Fedor B. Trintchouk

    IPC分类号： H01S3/086 ,  H01S3/097 ,  H01S3/1055 ,  H01S3/22

    CPC分类号： H01S3/13 ,  G03F7/70575 ,  H01S3/134 ,  H01S3/136

    摘要： According to aspects of an embodiment of the disclosed subject matter, a line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control method and apparatus are disclosed which may comprise a bandwidth metrology module measuring the bandwidth of a laser output flight pulse beam pulse produced by the light source and providing a bandwidth measurement; a bandwidth error signal generator receiving the bandwidth measurement and a bandwidth setpoint and providing a bandwidth error signal; an active bandwidth controller providing a fine bandwidth correction actuator signal and a coarse bandwidth correction actuator signal responsive to the bandwidth error. The fine bandwidth correction actuator and the coarse bandwidth correction actuator each may induce a respective modification of the light source behavior that reduces bandwidth error. The coarse and fine bandwidth correction actuators each may comprise a plurality of bandwidth correction actuators.

    摘要翻译： 根据所公开的主题的实施例的方面，公开了一种窄的高平均功率高脉冲重复激光微光刻光源带宽控制方法和装置，其可以包括测量激光输出飞行脉冲带宽的带宽测量模块 由光源产生的光束脉冲并提供带宽测量; 接收带宽测量和带宽设定点并提供带宽误差信号的带宽误差信号发生器; 有源带宽控制器提供精细的带宽校正致动器信号和响应于带宽误差的粗略带宽校正致动器信号。 精细带宽校正致动器和粗带宽校正致动器各自可以引起减少带宽误差的光源特性的相应修改。 粗略和精细带宽校正致动器各自可以包括多个带宽校正致动器。

    Active spectral control of DUV light source
    6.
    发明申请
    Active spectral control of DUV light source 有权
    DUV光源的主动光谱控制

    公开(公告)号：US20070195836A1

    公开(公告)日：2007-08-23

    申请号：US11510037

    申请日：2006-08-25

    申请人： Wayne J. Dunstan ,  Robert N. Jacques ,  Rajasekhar M. Rao ,  Fedor B. Trintchouk

    发明人： Wayne J. Dunstan ,  Robert N. Jacques ,  Rajasekhar M. Rao ,  Fedor B. Trintchouk

    IPC分类号： H01S3/13

    CPC分类号： H01S3/13 ,  G03F7/70575 ,  H01S3/134 ,  H01S3/136

    摘要： According to aspects of an embodiment of the disclosed subject matter, a line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control method and apparatus are disclosed which may comprise a bandwidth metrology module measuring the bandwidth of a laser output flight pulse beam pulse produced by the light source and providing a bandwidth measurement; a bandwidth error signal generator receiving the bandwidth measurement and a bandwidth setpoint and providing a bandwidth error signal; an active bandwidth controller providing a fine bandwidth correction actuator signal and a coarse bandwidth correction actuator signal responsive to the bandwidth error. The fine bandwidth correction actuator and the coarse bandwidth correction actuator each may induce a respective modification of the light source behavior that reduces bandwidth error. The coarse and fine bandwidth correction actuators each may comprise a plurality of bandwidth correction actuators.

    摘要翻译： 根据所公开的主题的实施例的方面，公开了一种窄的高平均功率高脉冲重复激光微光刻光源带宽控制方法和装置，其可以包括测量激光输出飞行脉冲带宽的带宽测量模块 由光源产生的光束脉冲并提供带宽测量; 接收带宽测量和带宽设定点并提供带宽误差信号的带宽误差信号发生器; 有源带宽控制器提供精细的带宽校正致动器信号和响应于带宽误差的粗略带宽校正致动器信号。 精细带宽校正致动器和粗带宽校正致动器各自可以引起减少带宽误差的光源特性的相应修改。 粗略和精细带宽校正致动器各自可以包括多个带宽校正致动器。

    Optical mountings for gas discharge MOPA laser spectral analysis module
    7.
    发明授权
    Optical mountings for gas discharge MOPA laser spectral analysis module 有权
    用于气体放电MOPA激光光谱分析模块的光学安装

    公开(公告)号：US06873418B1

    公开(公告)日：2005-03-29

    申请号：US10676224

    申请日：2003-09-30

    申请人： James K. Howey ,  Rajasekhar M. Rao

    发明人： James K. Howey ,  Rajasekhar M. Rao

    IPC分类号： G01B9/02 ,  G01J11/00 ,  G02B7/02 ,  G02B7/182 ,  H01S3/13

    CPC分类号： G02B7/1825 ,  G01J11/00 ,  G02B7/021

    摘要： A wavemeter for a high repetition rate gas discharge laser having an output laser bean comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000 Hz and above, is disclosed which may comprise an adjustable optic mounting containing an optic element having an assigned vertical optical plane in the wavemeter optical layout and comprising: a mounting dowel pin positioned on a platform holding the components of the wavemeter; a dowel receiving opening on the adjustable mirror mounting a tangent to which is in the assigned vertical optical plane. The adjustable optic mounting may contain a tilt mechanism incorporated into the adjustable optic mounting enabling tilting the optic element about an axis in a plane parallel to a platform holding components of the wavemeter. The mounting may also have an optic receiving recess indexed to the size of the optic element. The optic element may be retained by at least one spring clip and may be a flat rectangular mirror or a circular optic, e.g., a mirror or a lens. The mounting may also have an optic mounting frame containing an optical element; a slit assembly containing a microslit adapted to selectively pass a slit of the optical output of the optical diffusion element to a succeeding optical element, moveably mounted to the optic mounting frame; a microslit position adjustment mechanism moving the slit assembly from a retracted position exposing the optic diffusion element for purposes of alignment to a down position with the slit aligned and moving the microslit into alignment.

    摘要翻译： 一种用于具有输出激光束的高重复率气体放电激光器的波长计，其包括脉冲输出大于或等于15mJ /脉冲，亚纳米带宽调谐范围脉冲具有飞行器带宽精度和数十个飞行器带宽精度范围， 用于以4000Hz及以上的脉冲重复频率在脉冲到脉冲基础上测量带宽，其可以包括可调光学安装件，其包含在波长计光学布局中具有指定的垂直光学平面的光学元件，并且包括：安装销钉 位于保持波长计的组件的平台上; 可调节镜上的定位销接收开口安装在指定的垂直光学平面中的切线。 可调节光学安装件可以包含结合到可调节光学安装件中的倾斜机构，使得可以在与保持波长计的部件的平台平行的平面中的轴线处倾斜光学元件。 安装件还可以具有与光学元件的尺寸分度的光学接收凹部。 光学元件可以由至少一个弹簧夹保持，并且可以是平面矩形镜或圆形光学器件，例如镜子或透镜。 安装件还可以具有包含光学元件的光学安装框架; 狭缝组件，其包含适于选择性地将光扩散元件的光输出的狭缝传递到可移动地安装到光学安装框架的后续光学元件的微型灯; 微型位置调节机构使狭缝组件从缩回位置移动，该缩回位置暴露光学扩散元件，以便对准到下部位置，同时狭缝对准并将微光线移动到对准位置。

    Very high repetition rate narrow band gas discharge laser system
    9.
    发明授权
    Very high repetition rate narrow band gas discharge laser system 失效

    公开(公告)号：US07006547B2

    公开(公告)日：2006-02-28

    申请号：US10815386

    申请日：2004-03-31

    申请人： Thomas D. Steiger ,  Edward P. Holtaway ,  Bryan Moosman ,  Rajasekhar M. Rao

    发明人： Thomas D. Steiger ,  Edward P. Holtaway ,  Bryan Moosman ,  Rajasekhar M. Rao

    IPC分类号： H01S3/22

    CPC分类号： H01S3/038 ,  H01S3/0057 ,  H01S3/07 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/104 ,  H01S3/1305 ,  H01S3/2333

    摘要： A method and apparatus for producing a very high repetition rate gas discharge laser system in a MOPA configuration is disclosed which may comprise a master oscillator gas discharge layer system producing a beam of oscillator laser output light pulses at a very high pulse repetition rate; at least two power amplification gas discharge laser systems receiving laser output light pulses from the master oscillator gas discharge laser system and each of the at least two power amplification gas discharge laser systems amplifying some of the received laser output light pulses at a pulse repetition that is a fraction of the very high pulse repetition rate equal to one over the number of the at least two power amplification gas discharge laser systems to form an amplified output laser light pulse beam at the very high pulse repetition rate, which may be positioned in series with respect to the oscillator laser output light pulse beam. The apparatus and method may further comprise a beam delivery unit connected to the laser light output of the power amplification laser system. The apparatus and method may be a very high repetition rate gas discharge laser system in a MOPO configuration. The apparatus and method may comprise a compression head comprising a compression head charge storage device being charged at x times per second; a gas discharge chamber comprising at least two sets of paired gas discharge electrodes; at least two magnetically saturable switches, respectively connected between the compression head charge storage device and one of the at least two sets of paired electrodes and comprising first and second opposite biasing windings having a first biasing current for the first biasing winding and a second biasing current for the second biasing winding and comprising a switching circuit to switch the biasing current from the first biasing current to the second biasing current such that only one of the at least two switches receives the first biasing current at a repetition rate equal to x divided by the number of the at least two sets of paired electrodes while the remainder of the at least two magnetically saturable switches receives the second biasing current. The apparatus and method may be utilized as a lithography tool or for producing laser produced plasma EUV light.

    Gas discharge MOPA laser spectral analysis module
    10.
    发明授权
    Gas discharge MOPA laser spectral analysis module 有权

    公开(公告)号：US06894785B2

    公开(公告)日：2005-05-17

    申请号：US10676907

    申请日：2003-09-30

    申请人： Rajasekhar M. Rao ,  John T. Melchior ,  Holger K. Glatzel

    发明人： Rajasekhar M. Rao ,  John T. Melchior ,  Holger K. Glatzel

    IPC分类号： H01S3/23 ,  G01B9/02

    CPC分类号： H01S3/2366 ,  H01S3/03 ,  H01S3/2333

    摘要： A spectral analysis module, including a wavemeter, for a high repetition rate gas discharge laser having a laser output beam comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000 Hz and above, is disclosed which may comprise a primary beam-splitter in the path of the laser output laser of the gas discharge laser operative to pass the vast majority of the output beam and to reflect a first small portion of the output beam, the primary beam splitter oriented at an angle to sufficiently reduce the fluence on the primary beam-splitter, and creating overlapping fresnel reflections in the first small portion of the laser output beam; a secondary beam splitter made from a material having a damage threshold sufficiently high to tolerate the fluence created by the overlapping portion of the fresnel reflections in the first small portion of the output laser beam, the secondary beam splitter reflecting the vast majority of the first small portion of the output laser beam and passing a second small portion of the output laser beam; a telescoping optic in the path of the second small portion of the output beam operative to demagnify the second small portion of the output beam onto a first stage diffuser receiving the demagnified second small portion of the output laser beam, the demagnification selected to keep the fluence in the overlapping fresnel reflections in the second small portion of the output laser beam below the damage threshold of the first stage diffuser. The telescoping optic may demagnify a long axis of the second small portion of the output laser beam more than a short axis of the second small portion of the output laser beam, redistributing the fluence of the second small portion of the laser output beam across the first stage diffuser to keep any portion of the first stage diffuser from exceeding the damage threshold for the material from which the first stage diffuser is made. The vast majority of the first small portion of the laser output beam may be reflected into a power detection module. A second stage diffuser may creating a narrow cone of a focused second small portion of the laser output beam before the beam enters an interferometer.