公开(公告)号：US08753803B2

公开(公告)日：2014-06-17

申请号：US12878828

申请日：2010-09-09

申请人： Yoshihisa Kawamura ,  Eishi Shiobara ,  Shinichi Ito

发明人： Yoshihisa Kawamura ,  Eishi Shiobara ,  Shinichi Ito

IPC分类号： G03F7/20

CPC分类号： G03F7/0002

摘要： According to one embodiment, a pattern forming method is disclosed. The method can include selectively providing a curing agent to a pattern in a template, contacting the template provided the curing agent to a substrate, irradiating the curing agent with light where the template and the substrate are contacted each other to harden the curing agent, demolding the template from the substrate to form a curing agent pattern on the substrate, and etching the substrate on a basis of the curing agent pattern.

摘要翻译： 根据一个实施例，公开了一种图案形成方法。 该方法可以包括选择性地向模板中的图案提供固化剂，使提供固化剂的模板与基底接触，用光照射固化剂，其中模板和基底彼此接触以硬化固化剂，脱模 所述模板从所述基板在所述基板上形成固化剂图案，并且基于所述固化剂图案来蚀刻所述基板。

公开(公告)号：US20100078860A1

公开(公告)日：2010-04-01

申请号：US12563461

申请日：2009-09-21

申请人： Ikuo Yoneda ,  Kentaro Matsunaga ,  Yukiko Kikuchi ,  Yoshihisa Kawamura ,  Eishi Shiobara ,  Shinichi Ito ,  Tetsuro Nakasugi ,  Hirokazu Kato

发明人： Ikuo Yoneda ,  Kentaro Matsunaga ,  Yukiko Kikuchi ,  Yoshihisa Kawamura ,  Eishi Shiobara ,  Shinichi Ito ,  Tetsuro Nakasugi ,  Hirokazu Kato

IPC分类号： B29C35/08

CPC分类号： B29C37/0003 ,  B29C35/0888 ,  B29C37/006 ,  B29C59/022 ,  B29C2035/0822 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An imprint method includes applying a light curable resin on a substrate to be processed, the substrate including first and second regions on which the light curable resin is applied, contacting an imprint mold with the light curable resin, curing the light curable resin by irradiating the light curable resin with light passing through the imprint mold, generating gas by performing a predetermined process to the light curable resin applied on a region of the substrate, the region including at least the first region, wherein an amount of gas generated from the light curable resin applied on the first region is larger than an amount of gas generated from the light curable resin of the second region, and forming a pattern by separating the imprint mold from the light curable resin after the gas being generated.

摘要翻译： 压印方法包括将光固化树脂施加在待加工的基板上，所述基板包括施加有光固化树脂的第一和第二区域，使印模与光固化树脂接触，通过照射光固化树脂来固化光固化树脂 光固化树脂，其光通过压印模具，通过对施加在基板的区域上的光固化树脂进行预定处理产生气体，该区域至少包括第一区域，其中从光可固化 施加在第一区域上的树脂大于由第二区域的光固化树脂产生的气体的量，并且在产生气体之后通过从光固化树脂分离压印模具来形成图案。

公开(公告)号：US20110059406A1

公开(公告)日：2011-03-10

申请号：US12878828

申请日：2010-09-09

申请人： Yoshihisa KAWAMURA ,  Eishi Shiobara ,  Shinichi Ito

发明人： Yoshihisa KAWAMURA ,  Eishi Shiobara ,  Shinichi Ito

IPC分类号： G03F7/20

CPC分类号： G03F7/0002

摘要： According to one embodiment, a pattern forming method is disclosed. The method can include selectively providing a curing agent to a pattern in a template, contacting the template provided the curing agent to a substrate, irradiating the curing agent with light where the template and the substrate are contacted each other to harden the curing agent, demolding the template from the substrate to form a curing agent pattern on the substrate, and etching the substrate on a basis of the curing agent pattern.

摘要翻译： 根据一个实施例，公开了一种图案形成方法。 该方法可以包括选择性地向模板中的图案提供固化剂，使提供固化剂的模板与基底接触，用光照射固化剂，其中模板和基底彼此接触以硬化固化剂，脱模 所述模板从所述基板在所述基板上形成固化剂图案，并且基于所述固化剂图案来蚀刻所述基板。

公开(公告)号：US08419995B2

公开(公告)日：2013-04-16

申请号：US12563461

申请日：2009-09-21

申请人： Ikuo Yoneda ,  Kentaro Matsunaga ,  Yukiko Kikuchi ,  Yoshihisa Kawamura ,  Eishi Shiobara ,  Shinichi Ito ,  Tetsuro Nakasugi ,  Hirokazu Kato

发明人： Ikuo Yoneda ,  Kentaro Matsunaga ,  Yukiko Kikuchi ,  Yoshihisa Kawamura ,  Eishi Shiobara ,  Shinichi Ito ,  Tetsuro Nakasugi ,  Hirokazu Kato

IPC分类号： B28B11/08 ,  B29C35/08

CPC分类号： B29C37/0003 ,  B29C35/0888 ,  B29C37/006 ,  B29C59/022 ,  B29C2035/0822 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An imprint method includes applying a light curable resin on a substrate to be processed, the substrate including first and second regions on which the light curable resin is applied, contacting an imprint mold with the light curable resin, curing the light curable resin by irradiating the light curable resin with light passing through the imprint mold, generating gas by performing a predetermined process to the light curable resin applied on a region of the substrate, the region including at least the first region, wherein an amount of gas generated from the light curable resin applied on the first region is larger than an amount of gas generated from the light curable resin of the second region, and forming a pattern by separating the imprint mold from the light curable resin after the gas being generated.

摘要翻译： 压印方法包括将光固化树脂施加在待加工的基板上，所述基板包括施加有光固化树脂的第一和第二区域，使印模与光固化树脂接触，通过照射光固化树脂来固化光固化树脂 光固化树脂，其光通过压印模具，通过对施加在基板的区域上的光固化树脂进行预定处理产生气体，该区域至少包括第一区域，其中从光可固化 施加在第一区域上的树脂大于由第二区域的光固化树脂产生的气体的量，并且在产生气体之后通过从光固化树脂分离压印模具来形成图案。

公开(公告)号：US08747682B2

公开(公告)日：2014-06-10

申请号：US12849599

申请日：2010-08-03

申请人： Kentaro Matsunaga ,  Tomoya Oori ,  Eishi Shiobara ,  Yukiko Sato ,  Yoshihisa Kawamura

发明人： Kentaro Matsunaga ,  Tomoya Oori ,  Eishi Shiobara ,  Yukiko Sato ,  Yoshihisa Kawamura

IPC分类号： C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  H01B13/00 ,  B44C1/22

CPC分类号： H01L21/0337 ,  B81C1/00031 ,  B81C2201/0149

摘要： According to one embodiment, a pattern formation method is disclosed. The method includes forming a plurality of regions on a foundation and the plurality of the regions correspond to different pattern sizes. The method includes separating each of a plurality of block copolymers from another one of the plurality of the block copolymers and segregating the each of the plurality of the block copolymers into a corresponding one of the regions. The method includes performing a phase separation of the each of the block copolymers of each of the regions. The method includes selectively removing a designated phase of each of the phase-separated block copolymers to form a pattern of the each of the block copolymers and the pattern has a different pattern size for the each of the regions.

摘要翻译： 根据一个实施例，公开了图案形成方法。 该方法包括在基础上形成多个区域，并且多个区域对应于不同的图案尺寸。 该方法包括从多个嵌段共聚物中的另一个嵌段共聚物中分离多个嵌段共聚物，并将多个嵌段共聚物中的每一个分离成相应的一个区域。 该方法包括进行每个区域的每个嵌段共聚物的相分离。 该方法包括选择性地除去每个相分离的嵌段共聚物的指定相以形成每个嵌段共聚物的图案，并且该图案对于每个区域具有不同的图案尺寸。

公开(公告)号：US20110034029A1

公开(公告)日：2011-02-10

申请号：US12849599

申请日：2010-08-03

申请人： Kentaro MATSUNAGA ,  Tomoya Oori ,  Eishi Shiobara ,  Yukiko Sato ,  Yoshihisa Kawamura

发明人： Kentaro MATSUNAGA ,  Tomoya Oori ,  Eishi Shiobara ,  Yukiko Sato ,  Yoshihisa Kawamura

IPC分类号： H01L21/306

CPC分类号： H01L21/0337 ,  B81C1/00031 ,  B81C2201/0149

摘要： According to one embodiment, a pattern formation method is disclosed. The method includes forming a plurality of regions on a foundation and the plurality of the regions correspond to different pattern sizes. The method includes separating each of a plurality of block copolymers from another one of the plurality of the block copolymers and segregating the each of the plurality of the block copolymers into a corresponding one of the regions. The method includes performing a phase separation of the each of the block copolymers of each of the regions. The method includes selectively removing a designated phase of each of the phase-separated block copolymers to form a pattern of the each of the block copolymers and the pattern has a different pattern size for the each of the regions.

摘要翻译： 根据一个实施例，公开了图案形成方法。 该方法包括在基础上形成多个区域，并且多个区域对应于不同的图案尺寸。 该方法包括从多个嵌段共聚物中的另一个嵌段共聚物中分离多个嵌段共聚物，并将多个嵌段共聚物中的每一个分离成相应的一个区域。 该方法包括进行每个区域的每个嵌段共聚物的相分离。 该方法包括选择性地除去每个相分离的嵌段共聚物的指定相以形成每个嵌段共聚物的图案，并且该图案对于每个区域具有不同的图案尺寸。

公开(公告)号：US08187797B2

公开(公告)日：2012-05-29

申请号：US12562423

申请日：2009-09-18

申请人： Eishi Shiobara ,  Shinichi Ito

发明人： Eishi Shiobara ,  Shinichi Ito

IPC分类号： G03F7/26 ,  B29C35/08 ,  B28B7/30

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： A template having a first recess pattern is brought into contact with a mask material formed on a substrate. The mask material with which the first recess pattern is filled is cured. A mask material pattern is formed on the substrate by releasing the template from the mask material. A resist pattern is formed to cover a part of the mask material pattern by forming a resist on the mask material pattern and selectively irradiating radiation onto the resist and thereafter developing the resist. The substrate is processed by using the mask material pattern and the resist pattern as a mask.

摘要翻译： 具有第一凹部图案的模板与形成在基板上的掩模材料接触。 固化第一凹部图案的掩模材料。 通过从掩模材料中释放模板，在基板上形成掩模材料图案。 通过在掩模材料图案上形成抗蚀剂并选择性地将辐射照射到抗蚀剂上，然后显影抗蚀剂，形成抗蚀剂图案以覆盖掩模材料图案的一部分。 通过使用掩模材料图案和抗蚀图案作为掩模来处理基板。

公开(公告)号：US07794923B2

公开(公告)日：2010-09-14

申请号：US11654565

申请日：2007-01-18

申请人： Eishi Shiobara ,  Kentaro Matsunaga ,  Daisuke Kawamura ,  Tomoyuki Takeishi ,  Kei Hayasaki ,  Shinichi Ito

发明人： Eishi Shiobara ,  Kentaro Matsunaga ,  Daisuke Kawamura ,  Tomoyuki Takeishi ,  Kei Hayasaki ,  Shinichi Ito

IPC分类号： G03F7/00

CPC分类号： G03F7/70341 ,  Y10S430/162

摘要： A substrate processing method including while a liquid is supplied between a processing target substrate to be applied with exposure treatment and a projection optical system of an exposure apparatus for carrying out the exposure treatment, prior to providing a resist film on a first main face of the processing target substrate that is provided for liquid immersion exposure for carrying out the exposure treatment at a side to be applied with the exposure treatment, selectively applying at least hydrophobic treatment with respect to a region in a predetermined range from a peripheral rim part of a second main face opposite to the first main face.

摘要翻译： 一种基板处理方法，包括在将待施加曝光处理的处理对象基板和用于进行曝光处理的曝光装置的投影光学系统之间提供液体之前，在将抗蚀剂膜提供在第一主面 为了进行曝光处理的一侧进行曝光处理而设置的液浸曝光处理对象基板，从第二图像的外围边缘部选择性地施加相对于规定范围的区域的至少疏水处理 主面与第一主面相对。

公开(公告)号：US20100139421A1

公开(公告)日：2010-06-10

申请号：US12702549

申请日：2010-02-09

申请人： Shinichi Ito ,  Eishi Shiobara

发明人： Shinichi Ito ,  Eishi Shiobara

IPC分类号： G01N15/06

CPC分类号： G01N15/02 ,  G01N2015/0053 ,  Y10T436/25 ,  Y10T436/2575

摘要： A method for evaluating chemical solution includes determining number of particles in liquid for each size of the particles by measurement, expressing a relationship between size of the particles and number of particles corresponding to the size by a function based on the number of particles for each size of the particles determined by the measurement, and evaluating influence of particles having size less than or equal to a measurement limit in the liquid based on the function.

摘要翻译： 用于评估化学溶液的方法包括通过测量确定每种尺寸的颗粒的液体中的颗粒数量，通过基于每种尺寸的颗粒数量来表示颗粒尺寸与颗粒尺寸之间的关系与基于颗粒数的函数关系 通过测量确定的颗粒，并且基于该功能评估液体中尺寸小于或等于测量极限的颗粒的影响。

公开(公告)号：US07294586B2

公开(公告)日：2007-11-13

申请号：US11029375

申请日：2005-01-06

申请人： Kenji Kawano ,  Shinichi Ito ,  Eishi Shiobara

发明人： Kenji Kawano ,  Shinichi Ito ,  Eishi Shiobara

IPC分类号： H01L21/31

CPC分类号： H01L21/67115 ,  G03F7/0042 ,  G03F7/0392 ,  G03F7/38 ,  H01L21/0273 ,  H01L21/67109

摘要： A method of processing a substrate, comprising forming a chemically amplified resist film on a substrate, irradiating energy beams to the chemically amplified resist film to form a latent image therein, carrying out heat treatment with respect to the chemically amplified resist film, heating treatment being carried out in a manner of relatively moving a heating section for heating the chemically amplified resist film and the substrate forming a gas stream flowing reverse to the relatively moving direction of the heating section between the lower surface of the heating section and the chemically amplified resist film.

摘要翻译： 一种处理衬底的方法，包括在衬底上形成化学放大抗蚀剂膜，将能量束照射到化学放大抗蚀剂膜上以在其中形成潜像，对化学放大抗蚀剂膜进行热处理，加热处理为 以相对移动用于加热化学放大抗蚀剂膜的加热部分和形成在加热部分的下表面和化学放大抗蚀剂膜之间形成与加热部分的相对移动方向相反的方向流动的气流的加热部分的方式进行 。